DE69706816T2 - Photohärtbare Harzzusammensetzung zur Verwendung zum Photo-Herstellen dreidimensionaler Objekte - Google Patents

Photohärtbare Harzzusammensetzung zur Verwendung zum Photo-Herstellen dreidimensionaler Objekte

Info

Publication number
DE69706816T2
DE69706816T2 DE69706816T DE69706816T DE69706816T2 DE 69706816 T2 DE69706816 T2 DE 69706816T2 DE 69706816 T DE69706816 T DE 69706816T DE 69706816 T DE69706816 T DE 69706816T DE 69706816 T2 DE69706816 T2 DE 69706816T2
Authority
DE
Germany
Prior art keywords
group
compound
resin composition
ethyl
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69706816T
Other languages
German (de)
English (en)
Other versions
DE69706816D1 (de
Inventor
Akira Takeuchi
Takashi Ukachi
Tsuyoshi Watanabe
Tetsuya Yamamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Original Assignee
JSR Corp
Japan Fine Coatings Co Ltd
DSM NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26579727&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69706816(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by JSR Corp, Japan Fine Coatings Co Ltd, DSM NV filed Critical JSR Corp
Application granted granted Critical
Publication of DE69706816D1 publication Critical patent/DE69706816D1/de
Publication of DE69706816T2 publication Critical patent/DE69706816T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Epoxy Resins (AREA)
  • Polyethers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69706816T 1996-12-13 1997-12-12 Photohärtbare Harzzusammensetzung zur Verwendung zum Photo-Herstellen dreidimensionaler Objekte Expired - Lifetime DE69706816T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP35289396A JP3765896B2 (ja) 1996-12-13 1996-12-13 光学的立体造形用光硬化性樹脂組成物
US08/989,407 US5981616A (en) 1996-12-13 1997-12-12 Photo-curable resin composition used for photo fabication of three-dimensional objects

Publications (2)

Publication Number Publication Date
DE69706816D1 DE69706816D1 (de) 2001-10-25
DE69706816T2 true DE69706816T2 (de) 2002-04-25

Family

ID=26579727

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69706816T Expired - Lifetime DE69706816T2 (de) 1996-12-13 1997-12-12 Photohärtbare Harzzusammensetzung zur Verwendung zum Photo-Herstellen dreidimensionaler Objekte

Country Status (4)

Country Link
US (3) US5981616A (enExample)
EP (1) EP0848294B1 (enExample)
JP (1) JP3765896B2 (enExample)
DE (1) DE69706816T2 (enExample)

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JP3765896B2 (ja) 2006-04-12
EP0848294B1 (en) 2001-09-19
DE69706816D1 (de) 2001-10-25
US5981616A (en) 1999-11-09
US6365644B1 (en) 2002-04-02
USRE42593E1 (en) 2011-08-02
EP0848294A1 (en) 1998-06-17

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