DE69940916D1 - Fotohärtbare flüssige Harzzusammensetzung - Google Patents

Fotohärtbare flüssige Harzzusammensetzung

Info

Publication number
DE69940916D1
DE69940916D1 DE69940916T DE69940916T DE69940916D1 DE 69940916 D1 DE69940916 D1 DE 69940916D1 DE 69940916 T DE69940916 T DE 69940916T DE 69940916 T DE69940916 T DE 69940916T DE 69940916 D1 DE69940916 D1 DE 69940916D1
Authority
DE
Germany
Prior art keywords
resin composition
liquid resin
photohardenable liquid
photohardenable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69940916T
Other languages
English (en)
Inventor
Tetsuya Yamamura
Akira Takeuchi
Tsuyoshi Watanabe
Takashi Ukachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Original Assignee
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP05272998A external-priority patent/JP3824286B2/ja
Priority claimed from JP05886298A external-priority patent/JP4017236B2/ja
Priority claimed from JP06209098A external-priority patent/JP4017238B2/ja
Application filed by JSR Corp, Japan Fine Coatings Co Ltd, DSM IP Assets BV filed Critical JSR Corp
Application granted granted Critical
Publication of DE69940916D1 publication Critical patent/DE69940916D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
DE69940916T 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung Expired - Lifetime DE69940916D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP05272998A JP3824286B2 (ja) 1998-02-18 1998-02-18 光硬化性樹脂組成物
JP5886198 1998-02-24
JP05886298A JP4017236B2 (ja) 1998-02-24 1998-02-24 光硬化性液状樹脂組成物
JP06209098A JP4017238B2 (ja) 1998-02-24 1998-02-26 光硬化性液状樹脂組成物

Publications (1)

Publication Number Publication Date
DE69940916D1 true DE69940916D1 (de) 2009-07-09

Family

ID=27462810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69940916T Expired - Lifetime DE69940916D1 (de) 1998-02-18 1999-02-18 Fotohärtbare flüssige Harzzusammensetzung

Country Status (3)

Country Link
US (2) US6287745B1 (de)
EP (1) EP0938026B1 (de)
DE (1) DE69940916D1 (de)

Families Citing this family (69)

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DE69940916D1 (de) * 1998-02-18 2009-07-09 Dsm Ip Assets Bv Fotohärtbare flüssige Harzzusammensetzung
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
US6379866B2 (en) 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
US6287748B1 (en) 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
US6579917B1 (en) * 1999-02-24 2003-06-17 Sanyo Electric Co., Ltd. Surface treatment agent for model
JP4350832B2 (ja) * 1999-04-19 2009-10-21 Ｊｓｒ株式会社 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物
DE60031238D1 (de) * 1999-08-12 2006-11-23 Mitsui Chemicals Inc Lichthärtbare harzzusammensetzung für dichtungsmaterialien und verfahren zum dichten
ATE364871T1 (de) * 1999-09-10 2007-07-15 Nagracard Sa Verfahren und nachrichtenübertragungssystem für datenbanken
JP2001081438A (ja) * 1999-09-14 2001-03-27 Sony Chem Corp 接続材料
GB9921779D0 (en) 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
EP1299770A2 (de) * 2000-06-09 2003-04-09 Dsm N.V. Harzzusammensetzung und dreidimensionales objekt
JP2002040632A (ja) * 2000-07-21 2002-02-06 Showa Denko Kk レジストインキ組成物
KR100828313B1 (ko) * 2000-09-19 2008-05-08 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 반사방지 조성물
US6849333B2 (en) 2001-05-18 2005-02-01 Corning Incorporated Optical fiber with an improved primary coating composition
US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US7060156B2 (en) * 2001-07-23 2006-06-13 Vrac, Llc Three-dimensional spacer fabric resin interlaminar infusion media process and vacuum-induced reinforcing composite laminate structures
US7048985B2 (en) * 2001-07-23 2006-05-23 Vrac, Llc Three-dimensional spacer fabric resin infusion media and reinforcing composite lamina
US6810187B2 (en) 2001-07-27 2004-10-26 Corning Incorporated Optical waveguide thermoplastic elastomer coating
ATE302231T1 (de) * 2001-12-06 2005-09-15 Huntsman Adv Mat Switzerland Wärmehärtbare harzzusammensetzung
US6689463B2 (en) 2001-12-18 2004-02-10 Corning Incorporated Secondary coating composition for optical fibers
AU2003218051A1 (en) * 2002-03-08 2003-09-22 Rensselaer Polytechnic Institute Accelerators for cationic photopolymerization
US20030198824A1 (en) * 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
CN100576069C (zh) * 2002-05-03 2009-12-30 Dsm;Ip财产有限公司 可辐射固化树脂组合物及利用该组合物的快速成型方法
WO2004001507A1 (en) * 2002-06-20 2003-12-31 Dsm Ip Assets B.V. Compositions comprising a benzophenone photoinitiator
US6850681B2 (en) * 2002-08-22 2005-02-01 Addison Clear Wave, Llc Radiation-curable flame retardant optical fiber coatings
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
CA2503143A1 (en) * 2002-11-06 2004-05-21 Nippon Kayaku Kabushiki Kaisha Sealing material for liquid crystal and liquid crystal display cell using same
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
CA2521615A1 (en) * 2003-04-08 2004-10-21 Nippon Kayaku Kabushiki Kaisha Liquid crystal sealing agent and liquid crystalline display cell using the same
JP4161850B2 (ja) * 2003-05-13 2008-10-08 コニカミノルタエムジー株式会社 感光性組成物、感光性平版印刷版、及びその画像形成方法
JP2005015627A (ja) * 2003-06-26 2005-01-20 Jsr Corp 光硬化性液状樹脂組成物
JP4551638B2 (ja) * 2003-08-01 2010-09-29 富士フイルム株式会社 固体撮像装置の製造方法
JP2005056998A (ja) * 2003-08-01 2005-03-03 Fuji Photo Film Co Ltd 固体撮像装置およびその製造方法
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
US20050101684A1 (en) * 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
WO2005045523A1 (en) * 2003-11-06 2005-05-19 Huntsman Advanced Materials (Switzerland) Gmbh Photocurable composition for producing cured articles having high clarity and improved mechanical properties
WO2005056675A1 (en) * 2003-11-21 2005-06-23 Lord Corporation Dual-stage wafer applied underfills
JP2005153273A (ja) * 2003-11-25 2005-06-16 Nitto Denko Corp 樹脂シート、液晶セル基板、液晶表示装置、エレクトロルミネッセンス表示装置用基板、エレクトロルミネッセンス表示装置および太陽電池用基板
US7560519B2 (en) * 2004-06-02 2009-07-14 Lord Corporation Dual-stage wafer applied underfills
EP1720072B1 (de) * 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Zusammensetzungen und Verfahren für Immersionslithografie
JP4744200B2 (ja) 2005-06-20 2011-08-10 シーメット株式会社 平滑化した造形端面を有する立体造形物
US7541391B2 (en) * 2005-09-02 2009-06-02 General Electric Company Self-forming polymer waveguide and waveguide material with reduced shrinkage
EP1939234B2 (de) * 2005-09-29 2018-04-11 Cmet Inc. Harzzusammensetzung für optischen dreidimensionalen formkörper
EP1801142B1 (de) * 2005-12-16 2016-02-24 Canon Kabushiki Kaisha Harzzusammensetzung, gehärtetes Harzprodukt und Flüssigkeitsausstosskopf
WO2007124911A1 (en) * 2006-05-01 2007-11-08 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three dimensional imaging process using the same
US9423638B2 (en) 2006-07-14 2016-08-23 Dexerials Corporation Resin composition and display unit
EP2067810B1 (de) * 2006-09-29 2013-10-09 DIC Corporation Kationenpolymerisierbare harzzusammensetzung mit einem mehrfach verzweigten polyether-polyol, haftmittel mit der zusammensetzung sowie beschichtung und polarisierungsplatte mit dem haftmittel
EP1918778B1 (de) 2006-10-30 2016-08-03 Rohm and Haas Electronic Materials LLC Zusammensetzungen und Verfahren für Immersionslithografie
US20100227941A1 (en) * 2007-03-20 2010-09-09 Dsm Ip Assets B.V. Stereolithography resin compositions and three-dimensional objects made therefrom
WO2008126868A1 (ja) 2007-04-09 2008-10-23 Sony Chemical & Information Device Corporation 画像表示装置
JP5470735B2 (ja) 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
JP4973876B2 (ja) * 2007-08-22 2012-07-11 信越化学工業株式会社 パターン形成方法及びこれに用いるパターン表面コート材
JP2009199058A (ja) 2007-11-05 2009-09-03 Rohm & Haas Electronic Materials Llc 液浸リソグラフィーのための組成物および方法
JP2009244421A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 平版印刷版の製版方法
US20120028041A1 (en) * 2009-02-16 2012-02-02 Soken Chemical & Engineering Co., Ltd. Radiation-Curable Adhesive Composition for Optical Component and Adhesive Optical Component
KR101714798B1 (ko) * 2009-03-13 2017-03-09 디에스엠 아이피 어셋츠 비.브이. 방사선-경화성 수지 조성물 및 이를 이용한 쾌속 3차원 이미지화 방법
JP5430345B2 (ja) 2009-10-26 2014-02-26 Ｊｓｒ株式会社 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物
US20110300367A1 (en) * 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
KR20130106507A (ko) * 2012-03-20 2013-09-30 삼성디스플레이 주식회사 실링 조성물 및 이를 이용한 표시 패널의 제조방법
RU2015118591A (ru) * 2012-10-19 2016-12-10 ДАУ ГЛОБАЛ ТЕКНОЛОДЖИЗ ЭлЭлСи Дисперсии полимерных частиц с полиолами
CN104837920A (zh) 2012-11-19 2015-08-12 惠普发展公司，有限责任合伙企业 用于三维(3d)打印的组合物
CN109503761B (zh) 2013-11-05 2022-02-01 科思创(荷兰)有限公司 用于加成制造的稳定的基质填充的液体可辐射固化树脂组合物
JP2015225205A (ja) * 2014-05-28 2015-12-14 京セラドキュメントソリューションズ株式会社 光偏向器及び該光偏向器を備えた画像形成装置
JP6568218B2 (ja) 2014-12-23 2019-08-28 ブリヂストン アメリカズ タイヤ オペレーションズ、 エルエルシー 化学線硬化型高分子混合物、硬化高分子混合物、及び関連するプロセス
JP6706740B2 (ja) * 2015-02-16 2020-06-10 パナソニックＩｐマネジメント株式会社 封止用アクリル樹脂組成物とその硬化物、製造方法、その樹脂組成物を用いた半導体装置とその製造方法
US11097531B2 (en) 2015-12-17 2021-08-24 Bridgestone Americas Tire Operations, Llc Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing
JP6798071B2 (ja) * 2016-03-14 2020-12-09 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物
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Also Published As

Publication number Publication date
US6727035B2 (en) 2004-04-27
EP0938026B1 (de) 2009-05-27
US20020048717A1 (en) 2002-04-25
US6287745B1 (en) 2001-09-11
EP0938026A1 (de) 1999-08-25

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