DE69434767D1 - Halbleiterbauelement mit Aggregat von Mikro-Nadeln aus Halbleitermaterial - Google Patents
Halbleiterbauelement mit Aggregat von Mikro-Nadeln aus HalbleitermaterialInfo
- Publication number
- DE69434767D1 DE69434767D1 DE69434767T DE69434767T DE69434767D1 DE 69434767 D1 DE69434767 D1 DE 69434767D1 DE 69434767 T DE69434767 T DE 69434767T DE 69434767 T DE69434767 T DE 69434767T DE 69434767 D1 DE69434767 D1 DE 69434767D1
- Authority
- DE
- Germany
- Prior art keywords
- needles
- aggregate
- micro
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title 2
- 239000000463 material Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
- G02B6/1245—Geodesic lenses
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C23/00—Digital stores characterised by movement of mechanical parts to effect storage, e.g. using balls; Storage elements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/0036—Switches making use of microelectromechanical systems [MEMS]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
- H01L21/3083—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/3086—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12102—Lens
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12173—Masking
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/10—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
- H01L33/18—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/947—Subphotolithographic processing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/962—Quantum dots and lines
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/964—Roughened surface
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Led Devices (AREA)
- Light Receiving Elements (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27419193 | 1993-11-02 | ||
JP27419193 | 1993-11-02 | ||
JP31274793 | 1993-11-17 | ||
JP31274793 | 1993-11-17 | ||
JP16202894 | 1994-07-14 | ||
JP16202894 | 1994-07-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69434767D1 true DE69434767D1 (de) | 2006-07-27 |
DE69434767T2 DE69434767T2 (de) | 2006-11-09 |
Family
ID=27321938
Family Applications (8)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69433696T Expired - Fee Related DE69433696T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69433694T Expired - Fee Related DE69433694T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69433727T Expired - Fee Related DE69433727T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69418143T Expired - Fee Related DE69418143T2 (de) | 1993-11-02 | 1994-11-02 | Verfahren zur Herstellung eines Aggregats von Mikro-Nadeln aus Halbleitermaterial |
DE69434767T Expired - Fee Related DE69434767T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69433728T Expired - Fee Related DE69433728T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69434745T Expired - Fee Related DE69434745T2 (de) | 1993-11-02 | 1994-11-02 | Verfahren zur Herstellung eines Aggregats von Mikro-Nadeln aus Halbleitermaterial und Verfahren zur Herstellung eines Halbleiterbauelements mit einem solchen Aggregat |
DE69433695T Expired - Fee Related DE69433695T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit Aggregat von Mikro-Nadeln aus Halbleitermaterial |
Family Applications Before (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69433696T Expired - Fee Related DE69433696T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69433694T Expired - Fee Related DE69433694T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69433727T Expired - Fee Related DE69433727T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69418143T Expired - Fee Related DE69418143T2 (de) | 1993-11-02 | 1994-11-02 | Verfahren zur Herstellung eines Aggregats von Mikro-Nadeln aus Halbleitermaterial |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69433728T Expired - Fee Related DE69433728T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit einem Aggregat von Mikro-Nadeln aus Halbleitermaterial |
DE69434745T Expired - Fee Related DE69434745T2 (de) | 1993-11-02 | 1994-11-02 | Verfahren zur Herstellung eines Aggregats von Mikro-Nadeln aus Halbleitermaterial und Verfahren zur Herstellung eines Halbleiterbauelements mit einem solchen Aggregat |
DE69433695T Expired - Fee Related DE69433695T2 (de) | 1993-11-02 | 1994-11-02 | Halbleiterbauelement mit Aggregat von Mikro-Nadeln aus Halbleitermaterial |
Country Status (3)
Country | Link |
---|---|
US (4) | US6033928A (de) |
EP (8) | EP0652600B1 (de) |
DE (8) | DE69433696T2 (de) |
Families Citing this family (94)
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JP3378465B2 (ja) * | 1997-05-16 | 2003-02-17 | 株式会社東芝 | 発光装置 |
DE69825939T2 (de) | 1997-05-30 | 2005-09-15 | Matsushita Electric Industrial Co., Ltd., Kadoma | Anordnung mit Quanten-Schachteln |
US6188097B1 (en) * | 1997-07-02 | 2001-02-13 | Micron Technology, Inc. | Rough electrode (high surface area) from Ti and TiN |
JP4071360B2 (ja) * | 1997-08-29 | 2008-04-02 | 株式会社東芝 | 半導体装置 |
US7344499B1 (en) | 1998-06-10 | 2008-03-18 | Georgia Tech Research Corporation | Microneedle device for extraction and sensing of bodily fluids |
US6503231B1 (en) | 1998-06-10 | 2003-01-07 | Georgia Tech Research Corporation | Microneedle device for transport of molecules across tissue |
KR100271211B1 (ko) * | 1998-07-15 | 2000-12-01 | 윤덕용 | 나노결정을 이용한 비휘발성 기억소자 형성방법 |
GB9815819D0 (en) * | 1998-07-22 | 1998-09-16 | Secr Defence | Transferring materials into cells and a microneedle array |
US7048723B1 (en) * | 1998-09-18 | 2006-05-23 | The University Of Utah Research Foundation | Surface micromachined microneedles |
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US6313015B1 (en) * | 1999-06-08 | 2001-11-06 | City University Of Hong Kong | Growth method for silicon nanowires and nanoparticle chains from silicon monoxide |
US6465782B1 (en) * | 1999-09-10 | 2002-10-15 | Starmega Corporation | Strongly textured atomic ridges and tip arrays |
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WO2002064193A2 (en) | 2000-12-14 | 2002-08-22 | Georgia Tech Research Corporation | Microneedle devices and production thereof |
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DE10064448A1 (de) * | 2000-12-22 | 2002-07-04 | Osram Opto Semiconductors Gmbh | Verfahren zum Aufrauhen eines Halbleiterchips für die Optoelektronik |
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1994
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