DE68917880D1 - Lichtempfindliches Polyvinylalkoholderivat. - Google Patents

Lichtempfindliches Polyvinylalkoholderivat.

Info

Publication number
DE68917880D1
DE68917880D1 DE68917880T DE68917880T DE68917880D1 DE 68917880 D1 DE68917880 D1 DE 68917880D1 DE 68917880 T DE68917880 T DE 68917880T DE 68917880 T DE68917880 T DE 68917880T DE 68917880 D1 DE68917880 D1 DE 68917880D1
Authority
DE
Germany
Prior art keywords
polyvinyl alcohol
alcohol derivative
photosensitive polyvinyl
photosensitive
derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68917880T
Other languages
English (en)
Other versions
DE68917880T2 (de
Inventor
Kunihiro Ichimura
Noriaki Photosensiti Tochizawa
Hideo Photosensitive M Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Toyo Gosei Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Toyo Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toyo Gosei Co Ltd filed Critical Agency of Industrial Science and Technology
Publication of DE68917880D1 publication Critical patent/DE68917880D1/de
Application granted granted Critical
Publication of DE68917880T2 publication Critical patent/DE68917880T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/44—Preparation of metal salts or ammonium salts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Pyridine Compounds (AREA)
DE68917880T 1988-12-14 1989-12-08 Lichtempfindliches Polyvinylalkoholderivat. Expired - Fee Related DE68917880T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63313680A JPH0713099B2 (ja) 1988-12-14 1988-12-14 感光性ポリビニルアルコール誘導体

Publications (2)

Publication Number Publication Date
DE68917880D1 true DE68917880D1 (de) 1994-10-06
DE68917880T2 DE68917880T2 (de) 1995-01-05

Family

ID=18044218

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68917880T Expired - Fee Related DE68917880T2 (de) 1988-12-14 1989-12-08 Lichtempfindliches Polyvinylalkoholderivat.

Country Status (5)

Country Link
US (1) US5021505A (de)
EP (1) EP0373537B1 (de)
JP (1) JPH0713099B2 (de)
KR (1) KR0132711B1 (de)
DE (1) DE68917880T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2263699B (en) * 1992-02-03 1995-11-29 Sericol Ltd Photopolymerizable alcohols and compositions containing them
US5360864A (en) * 1992-05-04 1994-11-01 Ulano Corporation Process for preparation of photosensitive composition
US5358999A (en) * 1992-05-29 1994-10-25 Ulano Corporation Process for preparation of photosensitive compositions of stilbazolium quaternary
US5330877A (en) * 1992-05-29 1994-07-19 Ulano Corporation Photosensitive compositions containing stilbazolium groups
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
FR2747838B1 (fr) * 1996-04-18 1999-09-03 Futaba Denshi Kogyo Kk Composition formant un film fluorescent destine a un affichage et procede de formation d'un film fluorescent destine a un affichage
KR100263860B1 (ko) * 1998-04-14 2000-08-16 김순택 적색 필터막 형성방법
TWI224715B (en) * 1998-08-05 2004-12-01 Toyo Gosei Kogyo Kk Photosensitive resin derived from saponified poly(vinyl acetate)
JP4100535B2 (ja) * 1999-06-04 2008-06-11 東洋合成工業株式会社 ポリ酢酸ビニル鹸化物系感光性組成物並びにパターン形成方法
EP1058154A1 (de) * 1999-06-04 2000-12-06 Toyo Gosei Kogyo Co., Ltd. Lichtempfindliches verseiftes Polyvinylacetat enthaltende Zusammensetzung und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung
ITTO20020362A1 (it) * 2002-04-30 2003-10-30 Metlac S P A Sistema multirivestimento con proprieta' di barriera ai gas, fotoreticolabile mediante radiazione uv particolarmente idoneo per la protezion
US7544381B2 (en) * 2003-09-09 2009-06-09 Boston Scientific Scimed, Inc. Lubricious coatings for medical device
US20070129748A1 (en) * 2005-12-07 2007-06-07 Tracee Eidenschink Selectively coated medical balloons

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE27922E (en) * 1972-06-30 1974-02-19 Image-forming elements containing cross- linkable polymer compositions and processes for their use
JPS5523163A (en) 1978-08-09 1980-02-19 Agency Of Ind Science & Technol Polyvinyl alcohol type photosensitive resin and its preparation
US4272620A (en) * 1978-08-09 1981-06-09 Agency Of Industrial Science And Technology Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
JPS565761A (en) 1979-06-29 1981-01-21 Asahi Chemical Ind Novel laminate
JPS55135834A (en) 1979-04-10 1980-10-23 Oriental Shashin Kogyo Kk Photosensitive peeling film
JPS565762A (en) 1979-06-28 1981-01-21 Uchida Yoko:Kk Automatic adjusting circuit for background density in stencil paper making machine
JPS5611906A (en) 1979-07-11 1981-02-05 Agency Of Ind Science & Technol Photo-insolubilizable polyvinyl alcohol derivative and its preparation
JPS5640814A (en) 1979-09-11 1981-04-17 Minolta Camera Co Ltd Electronic flash device
JPS5654155A (en) 1979-10-11 1981-05-14 Fujitsu Ltd Transmission restriction release system at abnormal congestion
JPS56147804A (en) 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS5846591B2 (ja) 1981-02-10 1983-10-17 工業技術院長 布はく用のり付剤及びそれを用いた布はく処理方法
JPS5830035A (ja) 1981-08-18 1983-02-22 New Japan Radio Co Ltd 点状陰極
JPS58129976A (ja) 1982-01-27 1983-08-03 Agency Of Ind Science & Technol 微生物菌体の固定化法
JPS58164677A (ja) 1982-03-25 1983-09-29 Toshiba Corp 受像管螢光面形成用組成物及び受像管螢光面形成方法
JPS592039A (ja) 1982-06-29 1984-01-07 Toshiba Corp 色フィルタ染色受容層形成用組成物
JPS5911388A (ja) 1982-07-09 1984-01-20 Toshiba Corp 受像管螢光膜形成用組成物及び受像管螢光膜形成方法
JPS60129738A (ja) 1983-12-16 1985-07-11 Agency Of Ind Science & Technol 透明な着色画像
JPS60129742A (ja) 1983-12-16 1985-07-11 Agency Of Ind Science & Technol 着色画像
JPS61175639A (ja) 1985-01-31 1986-08-07 Sanyo Kokusaku Pulp Co Ltd 感光性ホワイトフイルム
JPS61186954A (ja) 1985-02-15 1986-08-20 Sanyo Kokusaku Pulp Co Ltd 着色画像形成用感光材料
JPH0677150B2 (ja) 1985-02-15 1994-09-28 日本製紙株式会社 多色画像形成用材料
JPS6225750A (ja) 1985-07-26 1987-02-03 Agency Of Ind Science & Technol 平凹版用感光性印刷版材
JPS62257382A (ja) 1986-05-01 1987-11-09 Yakult Honsha Co Ltd 新規なストレプトコツカス・ズ−エピデミカス
JPH089262B2 (ja) 1986-05-02 1996-01-31 工業技術院長 感熱記録材料
JPH0762048B2 (ja) * 1986-09-25 1995-07-05 工業技術院長 感光性樹脂

Also Published As

Publication number Publication date
EP0373537B1 (de) 1994-08-31
US5021505A (en) 1991-06-04
JPH0713099B2 (ja) 1995-02-15
KR900010462A (ko) 1990-07-07
KR0132711B1 (ko) 1998-04-14
DE68917880T2 (de) 1995-01-05
JPH02160807A (ja) 1990-06-20
EP0373537A1 (de) 1990-06-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee