KR900010462A - 감광성 폴리비닐알코올 유도체 - Google Patents

감광성 폴리비닐알코올 유도체 Download PDF

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Publication number
KR900010462A
KR900010462A KR1019890016486A KR890016486A KR900010462A KR 900010462 A KR900010462 A KR 900010462A KR 1019890016486 A KR1019890016486 A KR 1019890016486A KR 890016486 A KR890016486 A KR 890016486A KR 900010462 A KR900010462 A KR 900010462A
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KR
South Korea
Prior art keywords
polyvinyl alcohol
alcohol derivatives
photosensitive polyvinyl
photosensitive
group
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Application number
KR1019890016486A
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English (en)
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KR0132711B1 (ko
Inventor
구니히로 이찌무라
노리아끼 도찌자와
히데오 기꾸찌
Original Assignee
스기우라 마사루
고오교오 기쮸쓰인
기무라 마사데루
도오요오 고오세이 고오교오 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 스기우라 마사루, 고오교오 기쮸쓰인, 기무라 마사데루, 도오요오 고오세이 고오교오 가부시끼가이샤 filed Critical 스기우라 마사루
Publication of KR900010462A publication Critical patent/KR900010462A/ko
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Publication of KR0132711B1 publication Critical patent/KR0132711B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/44—Preparation of metal salts or ammonium salts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Pyridine Compounds (AREA)

Abstract

내용 없음

Description

감광성 폴리비닐알코올 유도체
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본실시예의 합성물(1)의 적외선 흡수 스펙트럼, 제2도는 본실시예의 폴리비닐알코올 유도체(A)의 적외선 흡수스펙트럼. 제3도는 본실시예의 감광성 폴리비닐알코올 유도체의 가열후의 흡수스펙트럼(a)는 180℃로 1시간 30분가열, (b)는 200℃로 1시간 가열.

Claims (1)

  1. 하기 일반식으로 표시되는 구성단위를 가진 것을 특징으로 하는 감광성 폴리비닐 알코올 유도체.
    상기식에서 R1은 알킬렌기를 표시하고, R2는 수소원자 또는 저급알콕시기를 표시하며,
    는 4급화된 방향족성 질소함유 복소환기를 표시하고, X-는 SO3 -또는 CO2 -를 표시하며, m은 0또는 1, n은 1∼6의 정수를 표시한다.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890016486A 1988-12-14 1989-11-14 감광성 폴리비닐알코올 유도체 KR0132711B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP88-313680 1988-12-14
JP63313680A JPH0713099B2 (ja) 1988-12-14 1988-12-14 感光性ポリビニルアルコール誘導体

Publications (2)

Publication Number Publication Date
KR900010462A true KR900010462A (ko) 1990-07-07
KR0132711B1 KR0132711B1 (ko) 1998-04-14

Family

ID=18044218

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890016486A KR0132711B1 (ko) 1988-12-14 1989-11-14 감광성 폴리비닐알코올 유도체

Country Status (5)

Country Link
US (1) US5021505A (ko)
EP (1) EP0373537B1 (ko)
JP (1) JPH0713099B2 (ko)
KR (1) KR0132711B1 (ko)
DE (1) DE68917880T2 (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2263699B (en) * 1992-02-03 1995-11-29 Sericol Ltd Photopolymerizable alcohols and compositions containing them
US5360864A (en) * 1992-05-04 1994-11-01 Ulano Corporation Process for preparation of photosensitive composition
US5358999A (en) * 1992-05-29 1994-10-25 Ulano Corporation Process for preparation of photosensitive compositions of stilbazolium quaternary
US5330877A (en) * 1992-05-29 1994-07-19 Ulano Corporation Photosensitive compositions containing stilbazolium groups
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
TW460561B (en) * 1996-04-18 2001-10-21 Futaba Denshi Kogyo Kk Composition for forming fluorescent film for display and method of forming thereof
KR100263860B1 (ko) * 1998-04-14 2000-08-16 김순택 적색 필터막 형성방법
TWI224715B (en) * 1998-08-05 2004-12-01 Toyo Gosei Kogyo Kk Photosensitive resin derived from saponified poly(vinyl acetate)
EP1058154A1 (en) * 1999-06-04 2000-12-06 Toyo Gosei Kogyo Co., Ltd. Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition
JP4100535B2 (ja) * 1999-06-04 2008-06-11 東洋合成工業株式会社 ポリ酢酸ビニル鹸化物系感光性組成物並びにパターン形成方法
ITTO20020362A1 (it) * 2002-04-30 2003-10-30 Metlac S P A Sistema multirivestimento con proprieta' di barriera ai gas, fotoreticolabile mediante radiazione uv particolarmente idoneo per la protezion
US7544381B2 (en) * 2003-09-09 2009-06-09 Boston Scientific Scimed, Inc. Lubricious coatings for medical device
US20070129748A1 (en) * 2005-12-07 2007-06-07 Tracee Eidenschink Selectively coated medical balloons

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* Cited by examiner, † Cited by third party
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USRE27922E (en) * 1972-06-30 1974-02-19 Image-forming elements containing cross- linkable polymer compositions and processes for their use
JPS5523163A (en) 1978-08-09 1980-02-19 Agency Of Ind Science & Technol Polyvinyl alcohol type photosensitive resin and its preparation
US4272620A (en) * 1978-08-09 1981-06-09 Agency Of Industrial Science And Technology Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
JPS565761A (en) 1979-06-29 1981-01-21 Asahi Chemical Ind Novel laminate
JPS55135834A (en) 1979-04-10 1980-10-23 Oriental Shashin Kogyo Kk Photosensitive peeling film
JPS565762A (en) 1979-06-28 1981-01-21 Uchida Yoko:Kk Automatic adjusting circuit for background density in stencil paper making machine
JPS5611906A (en) 1979-07-11 1981-02-05 Agency Of Ind Science & Technol Photo-insolubilizable polyvinyl alcohol derivative and its preparation
JPS5640814A (en) 1979-09-11 1981-04-17 Minolta Camera Co Ltd Electronic flash device
JPS5654155A (en) 1979-10-11 1981-05-14 Fujitsu Ltd Transmission restriction release system at abnormal congestion
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JPS592039A (ja) 1982-06-29 1984-01-07 Toshiba Corp 色フィルタ染色受容層形成用組成物
JPS5911388A (ja) 1982-07-09 1984-01-20 Toshiba Corp 受像管螢光膜形成用組成物及び受像管螢光膜形成方法
JPS60129742A (ja) 1983-12-16 1985-07-11 Agency Of Ind Science & Technol 着色画像
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JPH0762048B2 (ja) * 1986-09-25 1995-07-05 工業技術院長 感光性樹脂

Also Published As

Publication number Publication date
DE68917880D1 (de) 1994-10-06
JPH0713099B2 (ja) 1995-02-15
KR0132711B1 (ko) 1998-04-14
US5021505A (en) 1991-06-04
DE68917880T2 (de) 1995-01-05
EP0373537A1 (en) 1990-06-20
EP0373537B1 (en) 1994-08-31
JPH02160807A (ja) 1990-06-20

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