KR900010462A - 감광성 폴리비닐알코올 유도체 - Google Patents
감광성 폴리비닐알코올 유도체 Download PDFInfo
- Publication number
- KR900010462A KR900010462A KR1019890016486A KR890016486A KR900010462A KR 900010462 A KR900010462 A KR 900010462A KR 1019890016486 A KR1019890016486 A KR 1019890016486A KR 890016486 A KR890016486 A KR 890016486A KR 900010462 A KR900010462 A KR 900010462A
- Authority
- KR
- South Korea
- Prior art keywords
- polyvinyl alcohol
- alcohol derivatives
- photosensitive polyvinyl
- photosensitive
- group
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Pyridine Compounds (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본실시예의 합성물(1)의 적외선 흡수 스펙트럼, 제2도는 본실시예의 폴리비닐알코올 유도체(A)의 적외선 흡수스펙트럼. 제3도는 본실시예의 감광성 폴리비닐알코올 유도체의 가열후의 흡수스펙트럼(a)는 180℃로 1시간 30분가열, (b)는 200℃로 1시간 가열.
Claims (1)
- 하기 일반식으로 표시되는 구성단위를 가진 것을 특징으로 하는 감광성 폴리비닐 알코올 유도체.상기식에서 R1은 알킬렌기를 표시하고, R2는 수소원자 또는 저급알콕시기를 표시하며,는 4급화된 방향족성 질소함유 복소환기를 표시하고, X-는 SO3 -또는 CO2 -를 표시하며, m은 0또는 1, n은 1∼6의 정수를 표시한다.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63313680A JPH0713099B2 (ja) | 1988-12-14 | 1988-12-14 | 感光性ポリビニルアルコール誘導体 |
JP88-313680 | 1988-12-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900010462A true KR900010462A (ko) | 1990-07-07 |
KR0132711B1 KR0132711B1 (ko) | 1998-04-14 |
Family
ID=18044218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890016486A KR0132711B1 (ko) | 1988-12-14 | 1989-11-14 | 감광성 폴리비닐알코올 유도체 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5021505A (ko) |
EP (1) | EP0373537B1 (ko) |
JP (1) | JPH0713099B2 (ko) |
KR (1) | KR0132711B1 (ko) |
DE (1) | DE68917880T2 (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2263699B (en) * | 1992-02-03 | 1995-11-29 | Sericol Ltd | Photopolymerizable alcohols and compositions containing them |
US5360864A (en) * | 1992-05-04 | 1994-11-01 | Ulano Corporation | Process for preparation of photosensitive composition |
US5330877A (en) * | 1992-05-29 | 1994-07-19 | Ulano Corporation | Photosensitive compositions containing stilbazolium groups |
US5358999A (en) * | 1992-05-29 | 1994-10-25 | Ulano Corporation | Process for preparation of photosensitive compositions of stilbazolium quaternary |
JP3561061B2 (ja) * | 1995-12-11 | 2004-09-02 | 東洋合成工業株式会社 | ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法 |
US5994008A (en) * | 1996-04-18 | 1999-11-30 | Futaba Denshi Kogyo K.K. | Composition for forming fluorescent film for display and method of forming fluorescent film for display |
KR100263860B1 (ko) * | 1998-04-14 | 2000-08-16 | 김순택 | 적색 필터막 형성방법 |
TWI224715B (en) * | 1998-08-05 | 2004-12-01 | Toyo Gosei Kogyo Kk | Photosensitive resin derived from saponified poly(vinyl acetate) |
JP4100535B2 (ja) * | 1999-06-04 | 2008-06-11 | 東洋合成工業株式会社 | ポリ酢酸ビニル鹸化物系感光性組成物並びにパターン形成方法 |
EP1058154A1 (en) * | 1999-06-04 | 2000-12-06 | Toyo Gosei Kogyo Co., Ltd. | Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition |
ITTO20020362A1 (it) | 2002-04-30 | 2003-10-30 | Metlac S P A | Sistema multirivestimento con proprieta' di barriera ai gas, fotoreticolabile mediante radiazione uv particolarmente idoneo per la protezion |
US7544381B2 (en) * | 2003-09-09 | 2009-06-09 | Boston Scientific Scimed, Inc. | Lubricious coatings for medical device |
US20070129748A1 (en) * | 2005-12-07 | 2007-06-07 | Tracee Eidenschink | Selectively coated medical balloons |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE27922E (en) * | 1972-06-30 | 1974-02-19 | Image-forming elements containing cross- linkable polymer compositions and processes for their use | |
JPS5523163A (en) | 1978-08-09 | 1980-02-19 | Agency Of Ind Science & Technol | Polyvinyl alcohol type photosensitive resin and its preparation |
US4272620A (en) * | 1978-08-09 | 1981-06-09 | Agency Of Industrial Science And Technology | Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof |
JPS565761A (en) | 1979-06-29 | 1981-01-21 | Asahi Chemical Ind | Novel laminate |
JPS55135834A (en) | 1979-04-10 | 1980-10-23 | Oriental Shashin Kogyo Kk | Photosensitive peeling film |
JPS565762A (en) | 1979-06-28 | 1981-01-21 | Uchida Yoko:Kk | Automatic adjusting circuit for background density in stencil paper making machine |
JPS5611906A (en) | 1979-07-11 | 1981-02-05 | Agency Of Ind Science & Technol | Photo-insolubilizable polyvinyl alcohol derivative and its preparation |
JPS5640814A (en) | 1979-09-11 | 1981-04-17 | Minolta Camera Co Ltd | Electronic flash device |
JPS5654155A (en) | 1979-10-11 | 1981-05-14 | Fujitsu Ltd | Transmission restriction release system at abnormal congestion |
JPS56147804A (en) | 1980-04-17 | 1981-11-17 | Agency Of Ind Science & Technol | Photosensitive resin material for forming fluorescent surface of cathode ray tube |
JPS5846591B2 (ja) | 1981-02-10 | 1983-10-17 | 工業技術院長 | 布はく用のり付剤及びそれを用いた布はく処理方法 |
JPS5830035A (ja) | 1981-08-18 | 1983-02-22 | New Japan Radio Co Ltd | 点状陰極 |
JPS58129976A (ja) | 1982-01-27 | 1983-08-03 | Agency Of Ind Science & Technol | 微生物菌体の固定化法 |
JPS58164677A (ja) | 1982-03-25 | 1983-09-29 | Toshiba Corp | 受像管螢光面形成用組成物及び受像管螢光面形成方法 |
JPS592039A (ja) | 1982-06-29 | 1984-01-07 | Toshiba Corp | 色フィルタ染色受容層形成用組成物 |
JPS5911388A (ja) | 1982-07-09 | 1984-01-20 | Toshiba Corp | 受像管螢光膜形成用組成物及び受像管螢光膜形成方法 |
JPS60129742A (ja) | 1983-12-16 | 1985-07-11 | Agency Of Ind Science & Technol | 着色画像 |
JPS60129738A (ja) | 1983-12-16 | 1985-07-11 | Agency Of Ind Science & Technol | 透明な着色画像 |
JPS61175639A (ja) | 1985-01-31 | 1986-08-07 | Sanyo Kokusaku Pulp Co Ltd | 感光性ホワイトフイルム |
JPH0677150B2 (ja) | 1985-02-15 | 1994-09-28 | 日本製紙株式会社 | 多色画像形成用材料 |
JPS61186954A (ja) | 1985-02-15 | 1986-08-20 | Sanyo Kokusaku Pulp Co Ltd | 着色画像形成用感光材料 |
JPS6225750A (ja) | 1985-07-26 | 1987-02-03 | Agency Of Ind Science & Technol | 平凹版用感光性印刷版材 |
JPS62257382A (ja) | 1986-05-01 | 1987-11-09 | Yakult Honsha Co Ltd | 新規なストレプトコツカス・ズ−エピデミカス |
JPH089262B2 (ja) | 1986-05-02 | 1996-01-31 | 工業技術院長 | 感熱記録材料 |
JPH0762048B2 (ja) * | 1986-09-25 | 1995-07-05 | 工業技術院長 | 感光性樹脂 |
-
1988
- 1988-12-14 JP JP63313680A patent/JPH0713099B2/ja not_active Expired - Lifetime
-
1989
- 1989-11-14 KR KR1019890016486A patent/KR0132711B1/ko not_active IP Right Cessation
- 1989-12-01 US US07/444,626 patent/US5021505A/en not_active Expired - Lifetime
- 1989-12-08 DE DE68917880T patent/DE68917880T2/de not_active Expired - Fee Related
- 1989-12-08 EP EP89122714A patent/EP0373537B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0713099B2 (ja) | 1995-02-15 |
EP0373537A1 (en) | 1990-06-20 |
US5021505A (en) | 1991-06-04 |
EP0373537B1 (en) | 1994-08-31 |
JPH02160807A (ja) | 1990-06-20 |
KR0132711B1 (ko) | 1998-04-14 |
DE68917880D1 (de) | 1994-10-06 |
DE68917880T2 (de) | 1995-01-05 |
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20001201 Year of fee payment: 4 |
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LAPS | Lapse due to unpaid annual fee |