JPS55135834A - Photosensitive peeling film - Google Patents

Photosensitive peeling film

Info

Publication number
JPS55135834A
JPS55135834A JP4351779A JP4351779A JPS55135834A JP S55135834 A JPS55135834 A JP S55135834A JP 4351779 A JP4351779 A JP 4351779A JP 4351779 A JP4351779 A JP 4351779A JP S55135834 A JPS55135834 A JP S55135834A
Authority
JP
Japan
Prior art keywords
film
group
coat
photoinsolubilizable
side chain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4351779A
Other languages
Japanese (ja)
Inventor
Hajime Yanagi
Yukio Takegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ORIENTAL SHASHIN KOGYO KK
Oriental Photo Industrial Co Ltd
Original Assignee
ORIENTAL SHASHIN KOGYO KK
Oriental Photo Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ORIENTAL SHASHIN KOGYO KK, Oriental Photo Industrial Co Ltd filed Critical ORIENTAL SHASHIN KOGYO KK
Priority to JP4351779A priority Critical patent/JPS55135834A/en
Publication of JPS55135834A publication Critical patent/JPS55135834A/en
Pending legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To obtain the title film with superior shelf stability by forming a coat made of water soluble high molecular material having a photoinsolubilizable group as its side chain on a hydrophobic film support.
CONSTITUTION: An about 1.5W25μ thick coat containing 60wt% or more of a water soluble high molecular material having a photoinsolubilizable group as its side chain, e.g., a reaction product of a stilbazolium salt having an aldehyde group and polyvinyl alcohol having a polymerization degree of 300W2600 and a saponification degree of 71W100% is formed on a hydrophobic support such as a polyethylene terephthalate film to obtain a photosensitive peeling film. The above-mentioned material includes a polymer represented by the formula (where X- is an anion and n:m is about 1W10:100). By adding about 0.1W15wt% of carboxylic acid, caproic acid, caprylic acid or the like having an about 1W9C alkyl group to the coat handling of the film at a wet state can be facilitated.
COPYRIGHT: (C)1980,JPO&Japio
JP4351779A 1979-04-10 1979-04-10 Photosensitive peeling film Pending JPS55135834A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4351779A JPS55135834A (en) 1979-04-10 1979-04-10 Photosensitive peeling film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4351779A JPS55135834A (en) 1979-04-10 1979-04-10 Photosensitive peeling film

Publications (1)

Publication Number Publication Date
JPS55135834A true JPS55135834A (en) 1980-10-23

Family

ID=12665928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4351779A Pending JPS55135834A (en) 1979-04-10 1979-04-10 Photosensitive peeling film

Country Status (1)

Country Link
JP (1) JPS55135834A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821736A (en) * 1981-07-31 1983-02-08 Kuraray Co Ltd Photosensitive composition
JPS592039A (en) * 1982-06-29 1984-01-07 Toshiba Corp Composition for forming dye receptive layer for color filter
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
US6140006A (en) * 1998-06-15 2000-10-31 The Chromaline Corporation Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate
US6248498B1 (en) 1998-12-08 2001-06-19 The Chromaline Corporation Photosensitive resin composition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821736A (en) * 1981-07-31 1983-02-08 Kuraray Co Ltd Photosensitive composition
JPH0153449B2 (en) * 1981-07-31 1989-11-14 Kuraray Co
JPS592039A (en) * 1982-06-29 1984-01-07 Toshiba Corp Composition for forming dye receptive layer for color filter
JPH0412465B2 (en) * 1982-06-29 1992-03-04 Tokyo Shibaura Electric Co
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
US6140006A (en) * 1998-06-15 2000-10-31 The Chromaline Corporation Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate
US6248498B1 (en) 1998-12-08 2001-06-19 The Chromaline Corporation Photosensitive resin composition

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