JPS55135834A - Photosensitive peeling film - Google Patents
Photosensitive peeling filmInfo
- Publication number
- JPS55135834A JPS55135834A JP4351779A JP4351779A JPS55135834A JP S55135834 A JPS55135834 A JP S55135834A JP 4351779 A JP4351779 A JP 4351779A JP 4351779 A JP4351779 A JP 4351779A JP S55135834 A JPS55135834 A JP S55135834A
- Authority
- JP
- Japan
- Prior art keywords
- film
- group
- coat
- photoinsolubilizable
- side chain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 abstract 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 abstract 2
- 230000002209 hydrophobic effect Effects 0.000 abstract 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- YVXDRFYHWWPSOA-BQYQJAHWSA-N 1-methyl-4-[(e)-2-phenylethenyl]pyridin-1-ium Chemical class C1=C[N+](C)=CC=C1\C=C\C1=CC=CC=C1 YVXDRFYHWWPSOA-BQYQJAHWSA-N 0.000 abstract 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 abstract 1
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 1
- 125000003172 aldehyde group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 150000001450 anions Chemical class 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 229960002446 octanoic acid Drugs 0.000 abstract 1
- -1 polyethylene terephthalate Polymers 0.000 abstract 1
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract 1
- 239000005020 polyethylene terephthalate Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 238000007127 saponification reaction Methods 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
PURPOSE: To obtain the title film with superior shelf stability by forming a coat made of water soluble high molecular material having a photoinsolubilizable group as its side chain on a hydrophobic film support.
CONSTITUTION: An about 1.5W25μ thick coat containing 60wt% or more of a water soluble high molecular material having a photoinsolubilizable group as its side chain, e.g., a reaction product of a stilbazolium salt having an aldehyde group and polyvinyl alcohol having a polymerization degree of 300W2600 and a saponification degree of 71W100% is formed on a hydrophobic support such as a polyethylene terephthalate film to obtain a photosensitive peeling film. The above-mentioned material includes a polymer represented by the formula (where X- is an anion and n:m is about 1W10:100). By adding about 0.1W15wt% of carboxylic acid, caproic acid, caprylic acid or the like having an about 1W9C alkyl group to the coat handling of the film at a wet state can be facilitated.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4351779A JPS55135834A (en) | 1979-04-10 | 1979-04-10 | Photosensitive peeling film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4351779A JPS55135834A (en) | 1979-04-10 | 1979-04-10 | Photosensitive peeling film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55135834A true JPS55135834A (en) | 1980-10-23 |
Family
ID=12665928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4351779A Pending JPS55135834A (en) | 1979-04-10 | 1979-04-10 | Photosensitive peeling film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55135834A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5821736A (en) * | 1981-07-31 | 1983-02-08 | Kuraray Co Ltd | Photosensitive composition |
| JPS592039A (en) * | 1982-06-29 | 1984-01-07 | Toshiba Corp | Composition for forming dye receptive layer for color filter |
| EP0373537A1 (en) | 1988-12-14 | 1990-06-20 | THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY | Photosensitive poly(vinyl alcohol) derivative |
| US6140006A (en) * | 1998-06-15 | 2000-10-31 | The Chromaline Corporation | Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate |
| US6248498B1 (en) | 1998-12-08 | 2001-06-19 | The Chromaline Corporation | Photosensitive resin composition |
-
1979
- 1979-04-10 JP JP4351779A patent/JPS55135834A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5821736A (en) * | 1981-07-31 | 1983-02-08 | Kuraray Co Ltd | Photosensitive composition |
| JPS592039A (en) * | 1982-06-29 | 1984-01-07 | Toshiba Corp | Composition for forming dye receptive layer for color filter |
| EP0373537A1 (en) | 1988-12-14 | 1990-06-20 | THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY | Photosensitive poly(vinyl alcohol) derivative |
| US6140006A (en) * | 1998-06-15 | 2000-10-31 | The Chromaline Corporation | Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate |
| US6248498B1 (en) | 1998-12-08 | 2001-06-19 | The Chromaline Corporation | Photosensitive resin composition |
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