US7364072B1
(en)
|
1996-01-02 |
2008-04-29 |
Steven Jerome Moore |
Apparatus and method for security
|
JP4659300B2
(ja)
*
|
2000-09-13 |
2011-03-30 |
浜松ホトニクス株式会社 |
レーザ加工方法及び半導体チップの製造方法
|
US6676878B2
(en)
|
2001-01-31 |
2004-01-13 |
Electro Scientific Industries, Inc. |
Laser segmented cutting
|
KR100701013B1
(ko)
*
|
2001-05-21 |
2007-03-29 |
삼성전자주식회사 |
레이저 빔을 이용한 비금속 기판의 절단방법 및 장치
|
JP2003037085A
(ja)
*
|
2001-07-06 |
2003-02-07 |
Data Storage Inst |
レーザ照射を用いた基板切断方法および装置
|
US20030036249A1
(en)
*
|
2001-08-06 |
2003-02-20 |
Bauer Donald G. |
Chip alignment and placement apparatus for integrated circuit, MEMS, photonic or other devices
|
SG139508A1
(en)
*
|
2001-09-10 |
2008-02-29 |
Micron Technology Inc |
Wafer dicing device and method
|
SG102639A1
(en)
*
|
2001-10-08 |
2004-03-26 |
Micron Technology Inc |
Apparatus and method for packing circuits
|
JP2003200279A
(ja)
*
|
2001-10-24 |
2003-07-15 |
Seiko Epson Corp |
基板の電気配線切断方法及びその装置、並びに電子デバイスの製造方法及びその装置
|
JP4006994B2
(ja)
*
|
2001-12-18 |
2007-11-14 |
株式会社リコー |
立体構造体の加工方法、立体形状品の製造方法及び立体構造体
|
BRPI0308319B1
(pt)
|
2002-03-11 |
2015-06-09 |
Beaver Visitec Int Us Inc |
Método para fabricar um dispositivo de corte de material cristalino e método para fabricar uma lâmina cirúrgica de material cristalino
|
US7387742B2
(en)
*
|
2002-03-11 |
2008-06-17 |
Becton, Dickinson And Company |
Silicon blades for surgical and non-surgical use
|
DE60313900T2
(de)
|
2002-03-12 |
2008-01-17 |
Hamamatsu Photonics K.K., Hamamatsu |
Methode zur Trennung von Substraten
|
ES2356817T3
(es)
|
2002-03-12 |
2011-04-13 |
Hamamatsu Photonics K.K. |
Método de corte de un objeto procesado.
|
TWI326626B
(en)
*
|
2002-03-12 |
2010-07-01 |
Hamamatsu Photonics Kk |
Laser processing method
|
US6821472B2
(en)
*
|
2002-04-10 |
2004-11-23 |
Siemens Dematic Electronics Assembly Systems, Inc. |
Method of laser machining materials with minimal thermal loading
|
CN1276306C
(zh)
*
|
2002-05-14 |
2006-09-20 |
株式会社东芝 |
加工方法及半导体器件的制造方法
|
SG142115A1
(en)
*
|
2002-06-14 |
2008-05-28 |
Micron Technology Inc |
Wafer level packaging
|
JP2004160483A
(ja)
*
|
2002-11-12 |
2004-06-10 |
Disco Abrasive Syst Ltd |
レーザー加工方法およびレーザー加工装置
|
TWI520269B
(zh)
|
2002-12-03 |
2016-02-01 |
Hamamatsu Photonics Kk |
Cutting method of semiconductor substrate
|
TWI240965B
(en)
*
|
2003-02-28 |
2005-10-01 |
Toshiba Corp |
Semiconductor wafer dividing method and apparatus
|
US20090007436A1
(en)
*
|
2003-03-10 |
2009-01-08 |
Daskal Vadim M |
Silicon blades for surgical and non-surgical use
|
US20050155955A1
(en)
*
|
2003-03-10 |
2005-07-21 |
Daskal Vadim M. |
Method for reducing glare and creating matte finish of controlled density on a silicon surface
|
FR2852250B1
(fr)
*
|
2003-03-11 |
2009-07-24 |
Jean Luc Jouvin |
Fourreau de protection pour canule, un ensemble d'injection comportant un tel fourreau et aiguille equipee d'un tel fourreau
|
DE60315515T2
(de)
*
|
2003-03-12 |
2007-12-13 |
Hamamatsu Photonics K.K., Hamamatsu |
Laserstrahlbearbeitungsverfahren
|
SG119185A1
(en)
*
|
2003-05-06 |
2006-02-28 |
Micron Technology Inc |
Method for packaging circuits and packaged circuits
|
JP2005019667A
(ja)
*
|
2003-06-26 |
2005-01-20 |
Disco Abrasive Syst Ltd |
レーザ光線を利用した半導体ウエーハの分割方法
|
JP2005032903A
(ja)
*
|
2003-07-10 |
2005-02-03 |
Oki Electric Ind Co Ltd |
半導体装置及びその製造方法
|
US9022037B2
(en)
|
2003-08-11 |
2015-05-05 |
Raydiance, Inc. |
Laser ablation method and apparatus having a feedback loop and control unit
|
US8173929B1
(en)
|
2003-08-11 |
2012-05-08 |
Raydiance, Inc. |
Methods and systems for trimming circuits
|
US8921733B2
(en)
|
2003-08-11 |
2014-12-30 |
Raydiance, Inc. |
Methods and systems for trimming circuits
|
JP4590174B2
(ja)
*
|
2003-09-11 |
2010-12-01 |
株式会社ディスコ |
ウエーハの加工方法
|
JP4398686B2
(ja)
*
|
2003-09-11 |
2010-01-13 |
株式会社ディスコ |
ウエーハの加工方法
|
US7785485B2
(en)
*
|
2003-09-17 |
2010-08-31 |
Becton, Dickinson And Company |
System and method for creating linear and non-linear trenches in silicon and other crystalline materials with a router
|
JP2005142303A
(ja)
*
|
2003-11-05 |
2005-06-02 |
Disco Abrasive Syst Ltd |
シリコンウエーハの分割方法および分割装置
|
JP4422463B2
(ja)
*
|
2003-11-07 |
2010-02-24 |
株式会社ディスコ |
半導体ウエーハの分割方法
|
DE10352402B4
(de)
*
|
2003-11-10 |
2015-12-17 |
Lasertec Gmbh |
Laserbearbeitungsmaschine und Laserbearbeitungsverfahren
|
EP1550527A1
(de)
*
|
2003-12-30 |
2005-07-06 |
Advanced Laser Separation International (ALSI) B.V. |
Verfahren und Vorrichtung zum Trennen in einem aus einem halbleitenden Material erzeugten Wafer hergestellte Halbleiterkomponente - ein mit diesem Verfahren getrenntes Halbleiterelement
|
EP1550528A1
(de)
*
|
2003-12-30 |
2005-07-06 |
Advanced Laser Separation International (ALSI) B.V. |
Verfahren, Vorrichtung und Beugungsgitter zum Trennen eines auf einem Substrat hergestellten Halbleiterelementes durch Veränderung dieses Beugungsgitters
|
JP4439990B2
(ja)
*
|
2004-04-28 |
2010-03-24 |
株式会社ディスコ |
レーザー加工方法
|
US7396484B2
(en)
*
|
2004-04-30 |
2008-07-08 |
Becton, Dickinson And Company |
Methods of fabricating complex blade geometries from silicon wafers and strengthening blade geometries
|
DE102004024475A1
(de)
*
|
2004-05-14 |
2005-12-01 |
Lzh Laserzentrum Hannover E.V. |
Verfahren und Vorrichtung zum Trennen von Halbleitermaterialien
|
US20080286943A1
(en)
*
|
2004-05-20 |
2008-11-20 |
Mitsuboshi Diamond Industrial Co., Ltd. |
Motherboard Cutting Method, Motherboard Scribing Apparatus, Program and Recording Medium
|
US8383982B2
(en)
*
|
2004-06-18 |
2013-02-26 |
Electro Scientific Industries, Inc. |
Methods and systems for semiconductor structure processing using multiple laser beam spots
|
US7935941B2
(en)
*
|
2004-06-18 |
2011-05-03 |
Electro Scientific Industries, Inc. |
Semiconductor structure processing using multiple laser beam spots spaced on-axis on non-adjacent structures
|
US8148211B2
(en)
*
|
2004-06-18 |
2012-04-03 |
Electro Scientific Industries, Inc. |
Semiconductor structure processing using multiple laser beam spots spaced on-axis delivered simultaneously
|
US7923306B2
(en)
*
|
2004-06-18 |
2011-04-12 |
Electro Scientific Industries, Inc. |
Semiconductor structure processing using multiple laser beam spots
|
EP1614499A1
(de)
*
|
2004-07-09 |
2006-01-11 |
Advanced Laser Separation International (ALSI) B.V. |
Laserschneidverfahren und Vorrichtung zur Durchführung des Verfahrens
|
JP2006059839A
(ja)
*
|
2004-08-17 |
2006-03-02 |
Oki Electric Ind Co Ltd |
半導体装置およびその製造方法
|
US7550367B2
(en)
*
|
2004-08-17 |
2009-06-23 |
Denso Corporation |
Method for separating semiconductor substrate
|
US7586059B2
(en)
*
|
2004-08-27 |
2009-09-08 |
Infineon Technologies Ag |
Lithography mask substrate labeling system
|
JP2006073690A
(ja)
*
|
2004-09-01 |
2006-03-16 |
Disco Abrasive Syst Ltd |
ウエーハの分割方法
|
JP4571850B2
(ja)
*
|
2004-11-12 |
2010-10-27 |
東京応化工業株式会社 |
レーザーダイシング用保護膜剤及び該保護膜剤を用いたウエーハの加工方法
|
JP4750427B2
(ja)
*
|
2005-01-13 |
2011-08-17 |
株式会社ディスコ |
ウエーハのレーザー加工方法
|
US9034731B2
(en)
*
|
2005-02-03 |
2015-05-19 |
Stats Chippac Ltd. |
Integrated, integrated circuit singulation system
|
KR100645772B1
(ko)
|
2005-02-16 |
2006-11-14 |
토파즈엘시디 주식회사 |
도광판 가공용 co2 레이저장치
|
US7265034B2
(en)
*
|
2005-02-18 |
2007-09-04 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Method of cutting integrated circuit chips from wafer by ablating with laser and cutting with saw blade
|
DE502005005876D1
(de)
*
|
2005-02-24 |
2008-12-18 |
Trumpf Laser Gmbh & Co Kg |
Halbleiterdiodenlaser und Verfahren zu seiner Herstellung
|
JP2006269897A
(ja)
*
|
2005-03-25 |
2006-10-05 |
Disco Abrasive Syst Ltd |
ウエーハのレーザー加工方法
|
US7611966B2
(en)
*
|
2005-05-05 |
2009-11-03 |
Intel Corporation |
Dual pulsed beam laser micromachining method
|
KR100648898B1
(ko)
*
|
2005-08-18 |
2006-11-27 |
주식회사 젯텍 |
2개의 레이저를 이용한 웨이퍼의 분할방법 및 장치
|
US9138913B2
(en)
*
|
2005-09-08 |
2015-09-22 |
Imra America, Inc. |
Transparent material processing with an ultrashort pulse laser
|
DE102006042280A1
(de)
|
2005-09-08 |
2007-06-06 |
IMRA America, Inc., Ann Arbor |
Bearbeitung von transparentem Material mit einem Ultrakurzpuls-Laser
|
NL1030004C2
(nl)
*
|
2005-09-21 |
2007-03-22 |
Fico Singulation B V |
Inrichting en werkwijze voor het separeren van elektronische componenten.
|
US9130344B2
(en)
|
2006-01-23 |
2015-09-08 |
Raydiance, Inc. |
Automated laser tuning
|
US8232687B2
(en)
|
2006-04-26 |
2012-07-31 |
Raydiance, Inc. |
Intelligent laser interlock system
|
KR20070097189A
(ko)
*
|
2006-03-28 |
2007-10-04 |
삼성전자주식회사 |
기판 절단 방법 및 이에 사용되는 기판 절단 장치
|
US8624157B2
(en)
*
|
2006-05-25 |
2014-01-07 |
Electro Scientific Industries, Inc. |
Ultrashort laser pulse wafer scribing
|
US20070272666A1
(en)
*
|
2006-05-25 |
2007-11-29 |
O'brien James N |
Infrared laser wafer scribing using short pulses
|
US8557715B2
(en)
*
|
2006-07-07 |
2013-10-15 |
National Cheng Kung University |
Marking CO2 laser-transparent materials by using absorption-material-assisted laser processing
|
TWI296735B
(en)
*
|
2006-07-07 |
2008-05-11 |
Univ Nat Cheng Kung |
Silicon material having a mark on the surface thereof and the method for making the same
|
US20080070378A1
(en)
*
|
2006-09-19 |
2008-03-20 |
Jong-Souk Yeo |
Dual laser separation of bonded wafers
|
GB0622232D0
(en)
*
|
2006-11-08 |
2006-12-20 |
Rumsby Philip T |
Method and apparatus for laser beam alignment for solar panel scribing
|
TWI308880B
(en)
*
|
2006-11-17 |
2009-04-21 |
Chunghwa Picture Tubes Ltd |
Laser cutting apparatus and laser cutting method
|
JP4851918B2
(ja)
*
|
2006-11-24 |
2012-01-11 |
株式会社ディスコ |
ウエーハのレーザー加工方法およびレーザー加工装置
|
KR100838077B1
(ko)
|
2007-01-12 |
2008-06-16 |
삼성에스디아이 주식회사 |
평판 표시장치의 제조방법
|
EP2135297A2
(de)
*
|
2007-03-22 |
2009-12-23 |
United Solar Ovonic LLC |
Verfahren und vorrichtung zur laserbeschriftung ultraleichtgewichtiger halbleitervorrichtungen
|
JP2009021476A
(ja)
*
|
2007-07-13 |
2009-01-29 |
Disco Abrasive Syst Ltd |
ウエーハの分割方法
|
US10016876B2
(en)
|
2007-11-05 |
2018-07-10 |
Baker Hughes, A Ge Company, Llc |
Methods of forming polycrystalline compacts and earth-boring tools including polycrystalline compacts
|
WO2009061766A2
(en)
*
|
2007-11-05 |
2009-05-14 |
Baker Hughes Incorporated |
Methods and apparatuses for forming cutting elements having a chamfered edge for earth-boring tools
|
US7903326B2
(en)
|
2007-11-30 |
2011-03-08 |
Radiance, Inc. |
Static phase mask for high-order spectral phase control in a hybrid chirped pulse amplifier system
|
JP5054496B2
(ja)
*
|
2007-11-30 |
2012-10-24 |
浜松ホトニクス株式会社 |
加工対象物切断方法
|
JP2009176983A
(ja)
*
|
2008-01-25 |
2009-08-06 |
Disco Abrasive Syst Ltd |
ウエーハの加工方法
|
JP5284651B2
(ja)
*
|
2008-01-29 |
2013-09-11 |
株式会社ディスコ |
ウエーハの加工方法
|
GB2458475B
(en)
*
|
2008-03-18 |
2011-10-26 |
Xsil Technology Ltd |
Processing of multilayer semiconductor wafers
|
WO2009117451A1
(en)
|
2008-03-21 |
2009-09-24 |
Imra America, Inc. |
Laser-based material processing methods and systems
|
WO2009148022A1
(ja)
*
|
2008-06-04 |
2009-12-10 |
三菱電機株式会社 |
レーザ加工装置およびレーザ加工方法
|
WO2010022286A2
(en)
|
2008-08-22 |
2010-02-25 |
Pioneer Hi-Bred International, Inc. |
Apparatus for removal of specific seed tissue or structure for seed analysis
|
KR101107859B1
(ko)
|
2008-09-12 |
2012-01-31 |
오므론 가부시키가이샤 |
할단용 스크라이브선의 형성 방법 및 장치
|
TW201017863A
(en)
*
|
2008-10-03 |
2010-05-01 |
Versitech Ltd |
Semiconductor color-tunable broadband light sources and full-color microdisplays
|
WO2010048733A1
(en)
*
|
2008-10-29 |
2010-05-06 |
Oerlikon Solar Ip Ag, Trübbach |
Method for dividing a semiconductor film formed on a substrate into plural regions by multiple laser beam irradiation
|
US8498538B2
(en)
|
2008-11-14 |
2013-07-30 |
Raydiance, Inc. |
Compact monolithic dispersion compensator
|
KR101041137B1
(ko)
|
2009-03-25 |
2011-06-13 |
삼성모바일디스플레이주식회사 |
기판 절단 장치 및 이를 이용한 기판 절단 방법
|
KR20100107253A
(ko)
*
|
2009-03-25 |
2010-10-05 |
삼성모바일디스플레이주식회사 |
기판 절단 장치 및 이를 이용한 기판 절단 방법
|
US8609512B2
(en)
*
|
2009-03-27 |
2013-12-17 |
Electro Scientific Industries, Inc. |
Method for laser singulation of chip scale packages on glass substrates
|
JP5473414B2
(ja)
*
|
2009-06-10 |
2014-04-16 |
株式会社ディスコ |
レーザ加工装置
|
JP5384284B2
(ja)
*
|
2009-10-09 |
2014-01-08 |
株式会社ディスコ |
レーザー加工装置
|
WO2011056900A2
(en)
*
|
2009-11-03 |
2011-05-12 |
Applied Materials, Inc. |
Multi-wavelength laser-scribing tool
|
US8450638B2
(en)
*
|
2010-01-28 |
2013-05-28 |
Seishin Trading Co., Ltd. |
Laser scribing method and apparatus
|
CN102139484B
(zh)
*
|
2010-01-29 |
2015-05-20 |
西进商事股份有限公司 |
激光划线方法以及装置
|
US8519298B2
(en)
*
|
2010-03-25 |
2013-08-27 |
Veeco Instruments, Inc. |
Split laser scribe
|
JP5693705B2
(ja)
|
2010-03-30 |
2015-04-01 |
イムラ アメリカ インコーポレイテッド |
レーザベースの材料加工装置及び方法
|
US20110287607A1
(en)
*
|
2010-04-02 |
2011-11-24 |
Electro Scientific Industries, Inc. |
Method and apparatus for improved wafer singulation
|
US20120160818A1
(en)
*
|
2010-06-14 |
2012-06-28 |
Mitsubishi Electric Corporation |
Laser machining apparatus and laser machining method
|
US8884184B2
(en)
|
2010-08-12 |
2014-11-11 |
Raydiance, Inc. |
Polymer tubing laser micromachining
|
KR20140018183A
(ko)
|
2010-09-16 |
2014-02-12 |
레이디안스, 아이엔씨. |
적층 재료의 레이저 기반 처리
|
US8554037B2
(en)
|
2010-09-30 |
2013-10-08 |
Raydiance, Inc. |
Hybrid waveguide device in powerful laser systems
|
DE102010063407A1
(de)
|
2010-12-17 |
2012-06-21 |
Wacker Chemie Ag |
Verfahren und Vorrichtung zur Herstellung von Silicium-Dünnstäben
|
DE102011000768B4
(de)
|
2011-02-16 |
2016-08-18 |
Ewag Ag |
Laserbearbeitungsverfahren und Laserbearbeitungsvorrichtung mit umschaltbarer Laseranordnung
|
US8735772B2
(en)
*
|
2011-02-20 |
2014-05-27 |
Electro Scientific Industries, Inc. |
Method and apparatus for improved laser scribing of opto-electric devices
|
DE102011075328A1
(de)
*
|
2011-05-05 |
2012-11-08 |
Interpane Entwicklungs-Und Beratungsgesellschaft Mbh |
Vorrichtung und Verfahren zum Randentschichten und Kerben beschichteter Substrate
|
US9302348B2
(en)
|
2011-06-07 |
2016-04-05 |
Ultratech Inc. |
Ultrafast laser annealing with reduced pattern density effects in integrated circuit fabrication
|
US8703581B2
(en)
|
2011-06-15 |
2014-04-22 |
Applied Materials, Inc. |
Water soluble mask for substrate dicing by laser and plasma etch
|
US8759197B2
(en)
|
2011-06-15 |
2014-06-24 |
Applied Materials, Inc. |
Multi-step and asymmetrically shaped laser beam scribing
|
US8598016B2
(en)
|
2011-06-15 |
2013-12-03 |
Applied Materials, Inc. |
In-situ deposited mask layer for device singulation by laser scribing and plasma etch
|
US8557682B2
(en)
|
2011-06-15 |
2013-10-15 |
Applied Materials, Inc. |
Multi-layer mask for substrate dicing by laser and plasma etch
|
US9029242B2
(en)
|
2011-06-15 |
2015-05-12 |
Applied Materials, Inc. |
Damage isolation by shaped beam delivery in laser scribing process
|
US8557683B2
(en)
|
2011-06-15 |
2013-10-15 |
Applied Materials, Inc. |
Multi-step and asymmetrically shaped laser beam scribing
|
US8673741B2
(en)
|
2011-06-24 |
2014-03-18 |
Electro Scientific Industries, Inc |
Etching a laser-cut semiconductor before dicing a die attach film (DAF) or other material layer
|
US8951819B2
(en)
*
|
2011-07-11 |
2015-02-10 |
Applied Materials, Inc. |
Wafer dicing using hybrid split-beam laser scribing process with plasma etch
|
WO2013043173A1
(en)
*
|
2011-09-21 |
2013-03-28 |
Raydiance, Inc. |
Systems and processes that singulate materials
|
US10239160B2
(en)
*
|
2011-09-21 |
2019-03-26 |
Coherent, Inc. |
Systems and processes that singulate materials
|
JP5839923B2
(ja)
*
|
2011-10-06 |
2016-01-06 |
株式会社ディスコ |
パシベーション膜が積層された基板のアブレーション加工方法
|
JP5926527B2
(ja)
*
|
2011-10-17 |
2016-05-25 |
信越化学工業株式会社 |
透明soiウェーハの製造方法
|
DE102011054891B4
(de)
*
|
2011-10-28 |
2017-10-19 |
Osram Opto Semiconductors Gmbh |
Verfahren zum Durchtrennen eines Halbleiterbauelementverbunds
|
JP2013102039A
(ja)
*
|
2011-11-08 |
2013-05-23 |
Disco Abrasive Syst Ltd |
半導体ウエーハの加工方法
|
JP5970209B2
(ja)
*
|
2012-03-13 |
2016-08-17 |
Towa株式会社 |
積層基板の切断方法および電子部品の製造方法
|
CN102699538B
(zh)
*
|
2012-06-04 |
2016-03-16 |
北京志恒达科技有限公司 |
多点出光和独立调焦的激光灼刻装置及方法
|
US8993414B2
(en)
|
2012-07-13 |
2015-03-31 |
Applied Materials, Inc. |
Laser scribing and plasma etch for high die break strength and clean sidewall
|
US9120179B2
(en)
*
|
2012-09-20 |
2015-09-01 |
Apple Inc. |
Multi-step cutting process
|
US20140235033A1
(en)
*
|
2013-02-18 |
2014-08-21 |
Microchip Technology Incorporated |
Non-conventional method of silicon wafer sawing using a plurality of wafer saw rotational angles
|
US10286487B2
(en)
|
2013-02-28 |
2019-05-14 |
Ipg Photonics Corporation |
Laser system and method for processing sapphire
|
JP6276947B2
(ja)
*
|
2013-09-02 |
2018-02-07 |
株式会社ディスコ |
加工方法
|
JP6162018B2
(ja)
*
|
2013-10-15 |
2017-07-12 |
株式会社ディスコ |
ウエーハの加工方法
|
JP2015142015A
(ja)
*
|
2014-01-29 |
2015-08-03 |
株式会社ディスコ |
半導体ウェーハの加工方法
|
US9844833B2
(en)
|
2014-01-30 |
2017-12-19 |
Apple Inc. |
System and method for laser cutting sapphire using multiple gas media
|
EP3110592B1
(de)
|
2014-02-28 |
2020-01-15 |
IPG Photonics Corporation |
Unterschiedliche wellenlängen und pulsdauerverarbeitung einer vielzahl von lasern
|
US10343237B2
(en)
|
2014-02-28 |
2019-07-09 |
Ipg Photonics Corporation |
System and method for laser beveling and/or polishing
|
US9764427B2
(en)
|
2014-02-28 |
2017-09-19 |
Ipg Photonics Corporation |
Multi-laser system and method for cutting and post-cut processing hard dielectric materials
|
US9636783B2
(en)
*
|
2014-04-30 |
2017-05-02 |
International Business Machines Corporation |
Method and apparatus for laser dicing of wafers
|
US10639746B1
(en)
|
2014-06-20 |
2020-05-05 |
Apple Inc. |
Ceramic-based components having laser-etched markings
|
PT2974822T
(pt)
*
|
2014-07-14 |
2017-11-14 |
Asm Tech Singapore Pte Ltd |
Método de divisão de substratos semicondutores finos
|
JP2016030277A
(ja)
*
|
2014-07-29 |
2016-03-07 |
株式会社ディスコ |
パッケージ基板の加工方法
|
WO2016033494A1
(en)
|
2014-08-28 |
2016-03-03 |
Ipg Photonics Corporation |
System and method for laser beveling and/or polishing
|
WO2016033477A1
(en)
|
2014-08-28 |
2016-03-03 |
Ipg Photonics Corporation |
Multi-laser system and method for cutting and post-cut processing hard dielectric materials
|
US10307867B2
(en)
|
2014-11-05 |
2019-06-04 |
Asm Technology Singapore Pte Ltd |
Laser fiber array for singulating semiconductor wafers
|
JP6377514B2
(ja)
*
|
2014-12-17 |
2018-08-22 |
株式会社ディスコ |
パッケージ基板の加工方法
|
KR20160126175A
(ko)
*
|
2015-04-22 |
2016-11-02 |
삼성디스플레이 주식회사 |
기판 절단 방법 및 표시 장치 제조 방법
|
LT3302866T
(lt)
|
2015-06-01 |
2019-09-10 |
Evana Technologies, Uab |
Puslaidininkinio ruošinio raižymo lazeriu būdas naudojant padalintus lazerio pluoštus
|
DE102016215473B4
(de)
*
|
2015-09-10 |
2023-10-26 |
Disco Corporation |
Verfahren zum Bearbeiten eines Substrats
|
US9931714B2
(en)
|
2015-09-11 |
2018-04-03 |
Baker Hughes, A Ge Company, Llc |
Methods and systems for removing interstitial material from superabrasive materials of cutting elements using energy beams
|
JP2017056465A
(ja)
*
|
2015-09-14 |
2017-03-23 |
株式会社ディスコ |
パッケージ基板の加工方法
|
US10144107B2
(en)
|
2015-09-30 |
2018-12-04 |
Apple Inc. |
Ultrasonic polishing systems and methods of polishing brittle components for electronic devices
|
JP6260601B2
(ja)
*
|
2015-10-02 |
2018-01-17 |
日亜化学工業株式会社 |
半導体素子の製造方法
|
JP6666173B2
(ja)
*
|
2016-03-09 |
2020-03-13 |
株式会社ディスコ |
レーザー加工装置
|
JP2018042208A
(ja)
*
|
2016-09-09 |
2018-03-15 |
株式会社ディスコ |
表面弾性波デバイスチップの製造方法
|
CN107379292B
(zh)
*
|
2017-09-15 |
2019-07-02 |
京东方科技集团股份有限公司 |
显示面板的切割方法、系统和存储介质
|
US10403506B2
(en)
|
2018-01-07 |
2019-09-03 |
Infineon Technologies Ag |
Separation of workpiece with three material removal stages
|
GB2572608A
(en)
|
2018-04-03 |
2019-10-09 |
Ilika Tech Ltd |
Laser processing method for thin film structures
|
CN113474116B
(zh)
|
2018-12-21 |
2023-10-24 |
奇跃公司 |
用于将晶片切割成形状的装置及从晶片切割目镜的方法
|
US11701739B2
(en)
*
|
2019-04-12 |
2023-07-18 |
Skyworks Solutions, Inc. |
Method of optimizing laser cutting of wafers for producing integrated circuit dies
|
KR20200127078A
(ko)
|
2019-04-30 |
2020-11-10 |
세메스 주식회사 |
기판 처리 방법, 기판 처리 장치 및 기판 처리 설비
|
NL2026427B1
(en)
*
|
2019-09-10 |
2021-10-13 |
Tokyo Seimitsu Co Ltd |
Laser machining apparatus
|
US11113494B2
(en)
|
2019-11-11 |
2021-09-07 |
Apple Inc. |
Biometric key including a textured ceramic cover
|
CN112783264A
(zh)
|
2019-11-11 |
2021-05-11 |
苹果公司 |
包括纹理化陶瓷盖的生物识别按键
|
US11964343B2
(en)
*
|
2020-03-09 |
2024-04-23 |
Applied Materials, Inc. |
Laser dicing system for filamenting and singulating optical devices
|
DE102021102387A1
(de)
|
2021-02-02 |
2022-08-04 |
Trumpf Laser- Und Systemtechnik Gmbh |
Vorrichtung und Verfahren zur Laserbearbeitung eines Werkstücks
|