DE602006020229D1 - Mit Titandioxid dotiertes Quarzglas, Herstellungsverfahren, Bestandteil für EUV-Lithographie und Maskensubstrat - Google Patents

Mit Titandioxid dotiertes Quarzglas, Herstellungsverfahren, Bestandteil für EUV-Lithographie und Maskensubstrat

Info

Publication number
DE602006020229D1
DE602006020229D1 DE602006020229T DE602006020229T DE602006020229D1 DE 602006020229 D1 DE602006020229 D1 DE 602006020229D1 DE 602006020229 T DE602006020229 T DE 602006020229T DE 602006020229 T DE602006020229 T DE 602006020229T DE 602006020229 D1 DE602006020229 D1 DE 602006020229D1
Authority
DE
Germany
Prior art keywords
component
manufacturing process
titanium dioxide
quartz glass
mask substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006020229T
Other languages
English (en)
Inventor
Shigeru Maida
Motoyuki Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=37808000&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602006020229(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE602006020229D1 publication Critical patent/DE602006020229D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1407—Deposition reactors therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1446—Means for after-treatment or catching of worked reactant gases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Thermal Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
DE602006020229T 2005-12-08 2006-12-07 Mit Titandioxid dotiertes Quarzglas, Herstellungsverfahren, Bestandteil für EUV-Lithographie und Maskensubstrat Active DE602006020229D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005354488 2005-12-08
JP2006318172A JP5035516B2 (ja) 2005-12-08 2006-11-27 フォトマスク用チタニアドープ石英ガラスの製造方法

Publications (1)

Publication Number Publication Date
DE602006020229D1 true DE602006020229D1 (de) 2011-04-07

Family

ID=37808000

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006020229T Active DE602006020229D1 (de) 2005-12-08 2006-12-07 Mit Titandioxid dotiertes Quarzglas, Herstellungsverfahren, Bestandteil für EUV-Lithographie und Maskensubstrat

Country Status (6)

Country Link
US (2) US7585598B2 (de)
EP (1) EP1795506B2 (de)
JP (1) JP5035516B2 (de)
KR (1) KR101076491B1 (de)
DE (1) DE602006020229D1 (de)
TW (1) TWI389866B (de)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070137252A1 (en) * 2005-12-21 2007-06-21 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
US9399000B2 (en) 2006-06-20 2016-07-26 Momentive Performance Materials, Inc. Fused quartz tubing for pharmaceutical packaging
WO2009034954A1 (ja) * 2007-09-13 2009-03-19 Asahi Glass Co., Ltd. ＴｉＯ2含有石英ガラス基板
JP2011505318A (ja) * 2007-11-30 2011-02-24 コーニング インコーポレイテッド 低い膨張係数勾配を有する低膨張性ガラス材料
JP5470703B2 (ja) * 2007-12-27 2014-04-16 旭硝子株式会社 Ｅｕｖｌ用光学部材およびその表面処理方法
JP5417884B2 (ja) * 2008-02-27 2014-02-19 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP2009274947A (ja) * 2008-04-16 2009-11-26 Asahi Glass Co Ltd ＴｉＯ２を含有するＥＵＶリソグラフィ光学部材用シリカガラス
JP2011162359A (ja) * 2008-05-29 2011-08-25 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP5202141B2 (ja) * 2008-07-07 2013-06-05 信越化学工業株式会社 チタニアドープ石英ガラス部材及びその製造方法
JP2010135732A (ja) * 2008-08-01 2010-06-17 Asahi Glass Co Ltd Ｅｕｖマスクブランクス用基板
KR101740067B1 (ko) 2009-01-13 2017-05-25 아사히 가라스 가부시키가이샤 ＴｉＯ₂를 함유하는 실리카 유리를 포함하는 광학 부재
JPWO2010131662A1 (ja) 2009-05-13 2012-11-01 旭硝子株式会社 ＴｉＯ２−ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２−ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材
JPWO2010134449A1 (ja) * 2009-05-18 2012-11-12 旭硝子株式会社 ＴｉＯ２−ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２−ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材
US8021755B2 (en) * 2009-08-28 2011-09-20 Corning Incorporated Low thermal expansion glass for EUVL applications
WO2011068064A1 (ja) * 2009-12-01 2011-06-09 旭硝子株式会社 ＴｉＯ2を含有するシリカガラス
WO2011068100A1 (ja) * 2009-12-04 2011-06-09 旭硝子株式会社 インプリントモールド用石英系ガラス基材の製造方法およびインプリントモールドの製造方法
JP5476982B2 (ja) * 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
JP5510308B2 (ja) * 2009-12-25 2014-06-04 旭硝子株式会社 Ｅｕｖｌ光学部材用基材
WO2011105517A1 (ja) * 2010-02-24 2011-09-01 国立大学法人東北大学 超低膨張ガラスの製造方法
US20110207593A1 (en) * 2010-02-25 2011-08-25 Carlos Duran Expansivity in Low Expansion Silica-Titania Glasses
JP5504054B2 (ja) * 2010-05-27 2014-05-28 株式会社東芝 インプリントマスク、その製造方法、及び半導体装置の製造方法
JP2012031052A (ja) * 2010-06-28 2012-02-16 Asahi Glass Co Ltd ガラス体を製造する方法及びｅｕｖリソグラフィ用の光学部材を製造する方法
JP5664470B2 (ja) * 2010-06-28 2015-02-04 信越化学工業株式会社 ナノインプリント用合成石英ガラス基板の製造方法
JP5737070B2 (ja) * 2010-09-02 2015-06-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
JP5736900B2 (ja) * 2011-03-30 2015-06-17 凸版印刷株式会社 反射型露光用マスク
JP5768452B2 (ja) 2011-04-11 2015-08-26 信越化学工業株式会社 チアニアドープ石英ガラスの製造方法
RU2477711C1 (ru) * 2011-08-12 2013-03-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Уральский федеральный университет имени первого Президента России Б.Н. Ельцина" Легированное кварцевое стекло с тетраэдрической координацией атомов титана
JP5640920B2 (ja) * 2011-08-18 2014-12-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
CN102320724A (zh) * 2011-09-08 2012-01-18 北京金格兰石英玻璃有限公司 光掩膜版用方形石英玻璃基片的制备方法
JP5397456B2 (ja) * 2011-11-22 2014-01-22 ウシオ電機株式会社 放電ランプ
JP5538638B2 (ja) * 2012-03-28 2014-07-02 Ｈｏｙａ株式会社 マスクブランク用基板、多層反射膜付き基板、透過型マスクブランク、反射型マスクブランク、透過型マスク、反射型マスク及び半導体装置の製造方法
US8987155B2 (en) 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
JP6252098B2 (ja) * 2012-11-01 2017-12-27 信越化学工業株式会社 角形金型用基板
WO2014073389A1 (ja) * 2012-11-08 2014-05-15 Hoya株式会社 マスクブランクの製造方法および転写用マスクの製造方法
JP5992842B2 (ja) 2013-01-24 2016-09-14 信越石英株式会社 シリカチタニアガラスの製造方法及びシリカチタニアガラスの選別方法
DE102013219808A1 (de) * 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
JP6536185B2 (ja) * 2014-06-13 2019-07-03 信越化学工業株式会社 合成石英ガラス基板の製造方法
JP6308039B2 (ja) * 2014-06-13 2018-04-11 旭硝子株式会社 マスクブランク用ガラス基板の製造方法
JP2017536323A (ja) 2014-11-26 2017-12-07 コーニング インコーポレイテッド 低膨張率を有するドープされたシリカ−チタニアガラスおよびその製造方法
US20170363952A1 (en) * 2014-12-19 2017-12-21 Hoya Corporation Mask blank substrate, mask blank, and methods for manufacturing them, method for manufacturing transfer mask, and method for manufacturing semiconductor device
US9822030B2 (en) 2015-02-13 2017-11-21 Corning Incorporated Ultralow expansion titania-silica glass
US10948814B2 (en) * 2016-03-23 2021-03-16 AGC Inc. Substrate for use as mask blank, and mask blank
DE102018211234A1 (de) 2018-07-06 2020-01-09 Carl Zeiss Smt Gmbh Substrat für ein reflektives optisches Element
JP7136151B2 (ja) * 2020-03-18 2022-09-13 信越化学工業株式会社 反射防止膜付き合成石英ガラス基板、窓材、光学素子パッケージ用リッド、光学素子パッケージおよび光照射装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0959034A (ja) 1995-08-22 1997-03-04 Sumitomo Metal Ind Ltd 合成石英ガラス材及びその製造方法
DE69635662T2 (de) 1995-09-12 2006-08-10 Corning Inc. Verfahren und Ofen zur Herstellung von Quarzglas mit reduziertem Gehalt an Schlieren
JP2001010833A (ja) 1999-06-21 2001-01-16 Nikon Corp 石英ガラス部材
US6479195B1 (en) * 2000-09-15 2002-11-12 Intel Corporation Mask absorber for extreme ultraviolet lithography
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
US20030226377A1 (en) 2002-03-05 2003-12-11 Barrett W. Tim Method of making silica-titania extreme ultraviolet elements
US7053017B2 (en) 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
JP2004131373A (ja) * 2002-09-09 2004-04-30 Corning Inc シリカ・チタニア極端紫外線光学素子の製造方法
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
DE102004024808B4 (de) * 2004-05-17 2006-11-09 Heraeus Quarzglas Gmbh & Co. Kg Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung
JP4487783B2 (ja) * 2005-01-25 2010-06-23 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材

Also Published As

Publication number Publication date
KR101076491B1 (ko) 2011-10-24
TW200736183A (en) 2007-10-01
JP2007182367A (ja) 2007-07-19
US7849711B2 (en) 2010-12-14
US7585598B2 (en) 2009-09-08
EP1795506A1 (de) 2007-06-13
TWI389866B (zh) 2013-03-21
JP5035516B2 (ja) 2012-09-26
EP1795506B1 (de) 2011-02-23
US20090288448A1 (en) 2009-11-26
KR20070061414A (ko) 2007-06-13
US20070134566A1 (en) 2007-06-14
EP1795506B2 (de) 2014-12-03

Similar Documents

Publication Publication Date Title
DE602006020229D1 (de) Mit Titandioxid dotiertes Quarzglas, Herstellungsverfahren, Bestandteil für EUV-Lithographie und Maskensubstrat
DE602006021102D1 (de) Photomaskenrohling, Photomaske und deren Herstellungsverfahren
EP2146244A4 (de) Fotomaskensubstrat, element zur formung eines fotomaskensubstrats, verfahren zur herstellung einer fotomaske, fotomaske und belichtungsverfahren mit der fotomaske
DE602007010473D1 (de) Quarzglaskomponente für halbleiterfabrikation und herstellungsverfahren dafür
HK1127971A1 (en) Exposure method, exposure apparatus, photomask and photomask manufacturing method
DE602006012746D1 (de) Lithografische Vorrichtung und Herstellungsverfahren
DE602007001105D1 (de) Hartstofffilm und Herstellungsverfahren dafür
EP2003498A4 (de) Photomaske, verfahren zur herstellung einer derartigen photomaske, verfahren zur formung eines musters mit der photomaske und verfahren zum erstellen von maskendaten
DE602004009553D1 (de) Tio2 enthaltendes siliciumdioxid-glas und optisches material für die euv-lithographie
EP2333816A4 (de) Reflektierender maskenrohling für euv-lithographie und herstellungsverfahren dafür
HK1123627A1 (en) Substrate holding device, exposure device, exposure method, and device fabrication method
GB0714732D0 (en) Extreme ultraviolet mask with leaky absorber and method for its fabrication
DE602006010208D1 (de) Glaskeramik aus quarz und/oder spodumen, vorläuferglas, aus dieser glaskeramik hergestellte artikel, herstellung dieser glaskeramik und artikel
DE602006001193D1 (de) Herstellungsverfahren für eine Fotomaske und Herstellungsverfahren für eine Vorrichtung
EP1925020A4 (de) Systeme, masken und verfahren für die photolithografie
DE602005023570D1 (de) Flachbildschirm und Herstellungsverfahren dafür
DE602006017579D1 (de) Klebstoff für optischen film sowie von dem klebstoff gebrauch machendes klebevlies und optisches glied
EP1865381A4 (de) Belichtungsgerät, verfahren zur herstellung eines belichtungsgeräts und verfahren zur herstellung eines mikrobauelements
SG130985A1 (en) Photomask blank, phtomask and fabrication method thereof
DE602007004641D1 (de) Blaue beta-quarzglaskeramikmaterialien, daraus hergestellte artikel sowie herstellungsverfahren dafür
DE602005011961D1 (de) Linse und zugehöriges Herstellungsverfahren
DK1731227T3 (da) Ridsemaskeringscoating til glasbeholdere
DE602006016542D1 (de) Entwicklerrolle und Entwicklungsverfahren dafür
DE602006017779D1 (de) Lithografische Masken und Verfahren
FI20055666A0 (fi) Prosessi hiilivetykomponentin valmistamiseksi