DE602004009553D1 - Tio2 enthaltendes siliciumdioxid-glas und optisches material für die euv-lithographie - Google Patents

Tio2 enthaltendes siliciumdioxid-glas und optisches material für die euv-lithographie

Info

Publication number
DE602004009553D1
DE602004009553D1 DE602004009553T DE602004009553T DE602004009553D1 DE 602004009553 D1 DE602004009553 D1 DE 602004009553D1 DE 602004009553 T DE602004009553 T DE 602004009553T DE 602004009553 T DE602004009553 T DE 602004009553T DE 602004009553 D1 DE602004009553 D1 DE 602004009553D1
Authority
DE
Germany
Prior art keywords
tio2
silicon dioxide
containing silicon
optical material
euv lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004009553T
Other languages
English (en)
Other versions
DE602004009553T3 (de
DE602004009553T2 (de
Inventor
Yasutomi Iwahashi
Akio Koike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=33162776&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602004009553(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of DE602004009553D1 publication Critical patent/DE602004009553D1/de
Application granted granted Critical
Publication of DE602004009553T2 publication Critical patent/DE602004009553T2/de
Publication of DE602004009553T3 publication Critical patent/DE602004009553T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE602004009553.2T 2003-04-03 2004-04-02 Kieselglas, enthaltend Ti02, und optisches Material für EUV-Lithographie Expired - Lifetime DE602004009553T3 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2003100799 2003-04-03
JP2003100799 2003-04-03
JP2003100798 2003-04-03
JP2003100798 2003-04-03
JP2004076312A JP5367204B2 (ja) 2003-04-03 2004-03-17 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP2004076312 2004-03-17
EP04725542.7A EP1608599B2 (de) 2003-04-03 2004-04-02 Tio2 enthaltendes siliciumdioxid-glas und optisches material für die euv-lithographie
PCT/JP2004/004829 WO2004089838A1 (en) 2003-04-03 2004-04-02 Silica glass containing tio2 and optical material for euv lithography

Publications (3)

Publication Number Publication Date
DE602004009553D1 true DE602004009553D1 (de) 2007-11-29
DE602004009553T2 DE602004009553T2 (de) 2008-07-31
DE602004009553T3 DE602004009553T3 (de) 2014-10-09

Family

ID=33162776

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004009553.2T Expired - Lifetime DE602004009553T3 (de) 2003-04-03 2004-04-02 Kieselglas, enthaltend Ti02, und optisches Material für EUV-Lithographie

Country Status (5)

Country Link
US (1) US7462574B2 (de)
EP (1) EP1608599B2 (de)
JP (1) JP5367204B2 (de)
DE (1) DE602004009553T3 (de)
WO (1) WO2004089838A1 (de)

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JP4492123B2 (ja) * 2004-01-05 2010-06-30 旭硝子株式会社 シリカガラス
KR101211448B1 (ko) 2004-05-13 2012-12-12 아사히 파이바 그라스 가부시끼가이샤 폴리카보네이트 수지 강화용 유리 섬유 및 폴리카보네이트수지 성형품
EP1761469B1 (de) * 2004-07-01 2013-05-22 Asahi Glass Company, Limited Tio2 enthaltendes quarzglas und verfahren zu dessen herstellung
JP2008505841A (ja) 2004-07-12 2008-02-28 日本板硝子株式会社 低保守コーティング
JP4568225B2 (ja) * 2004-12-24 2010-10-27 信越石英株式会社 脈理のないシリカ・チタニアガラスの製造方法
JP4487783B2 (ja) * 2005-01-25 2010-06-23 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材
JP4646314B2 (ja) * 2005-02-01 2011-03-09 信越石英株式会社 均質なシリカ・チタニアガラスの製造方法
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EP2250133A1 (de) * 2008-02-29 2010-11-17 Asahi Glass Company, Limited TiO2-HALTIGES QUARZGLAS UND OPTISCHES ELEMENT FÜR LITHOGRAFIE DAMIT
JP2009274947A (ja) * 2008-04-16 2009-11-26 Asahi Glass Co Ltd ＴｉＯ２を含有するＥＵＶリソグラフィ光学部材用シリカガラス
JP5202141B2 (ja) * 2008-07-07 2013-06-05 信越化学工業株式会社 チタニアドープ石英ガラス部材及びその製造方法
JP2010135732A (ja) 2008-08-01 2010-06-17 Asahi Glass Co Ltd Ｅｕｖマスクブランクス用基板
JP5287271B2 (ja) * 2009-01-13 2013-09-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスの成型方法およびそれによって成型されたＥＵＶリソグラフィ用光学部材
US8735308B2 (en) 2009-01-13 2014-05-27 Asahi Glass Company, Limited Optical member comprising TiO2-containing silica glass
EP2377826B2 (de) * 2009-01-13 2020-05-27 AGC Inc. OPTISCHES ELEMENT MIT TiO2-HALTIGEM QUARZGLAS
CN102421713A (zh) 2009-05-13 2012-04-18 旭硝子株式会社 TiO2-SiO2玻璃体的制造方法及热处理方法、TiO2-SiO2玻璃体、EUVL用光学基材
JP2012181220A (ja) * 2009-07-02 2012-09-20 Asahi Glass Co Ltd ＡｒＦリソグラフィ用ミラー、およびＡｒＦリソグラフィ用光学部材
EP2468692A1 (de) * 2009-08-19 2012-06-27 Asahi Glass Company, Limited Tio2-haltiges quarzglas und optisches element für die euv-lithografie damit
US8713969B2 (en) * 2009-08-31 2014-05-06 Corning Incorporated Tuning Tzc by the annealing of ultra low expansion glass
WO2011068064A1 (ja) * 2009-12-01 2011-06-09 旭硝子株式会社 ＴｉＯ2を含有するシリカガラス
JP2011132065A (ja) * 2009-12-24 2011-07-07 Asahi Glass Co Ltd 多孔質石英ガラス体の製造方法
JP5476982B2 (ja) 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
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JP5737070B2 (ja) 2010-09-02 2015-06-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
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US8987155B2 (en) 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
JP6241276B2 (ja) 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
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Also Published As

Publication number Publication date
JP2004315351A (ja) 2004-11-11
US20050245383A1 (en) 2005-11-03
EP1608599B1 (de) 2007-10-17
JP5367204B2 (ja) 2013-12-11
EP1608599A1 (de) 2005-12-28
WO2004089838A1 (en) 2004-10-21
DE602004009553T3 (de) 2014-10-09
DE602004009553T2 (de) 2008-07-31
US7462574B2 (en) 2008-12-09
EP1608599B2 (de) 2014-08-06

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