DE602004002735D1 - Mesoporöse Kieselsäureteilchen und deren Herstellungsprozess - Google Patents

Mesoporöse Kieselsäureteilchen und deren Herstellungsprozess

Info

Publication number
DE602004002735D1
DE602004002735D1 DE602004002735T DE602004002735T DE602004002735D1 DE 602004002735 D1 DE602004002735 D1 DE 602004002735D1 DE 602004002735 T DE602004002735 T DE 602004002735T DE 602004002735 T DE602004002735 T DE 602004002735T DE 602004002735 D1 DE602004002735 D1 DE 602004002735D1
Authority
DE
Germany
Prior art keywords
production process
silica particles
mesoporous silica
mesoporous
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004002735T
Other languages
English (en)
Other versions
DE602004002735T2 (de
Inventor
Kentaro Fukuda
Kenji Fukunaga
Hiroya Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2003203206A external-priority patent/JP4737922B2/ja
Priority claimed from JP2003324750A external-priority patent/JP4519433B2/ja
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of DE602004002735D1 publication Critical patent/DE602004002735D1/de
Application granted granted Critical
Publication of DE602004002735T2 publication Critical patent/DE602004002735T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/52—Macromolecular coatings
    • B41M5/5218—Macromolecular coatings characterised by inorganic additives, e.g. pigments, clays
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Silicon Compounds (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
DE602004002735T 2003-07-29 2004-07-29 Mesoporöse Kieselsäureteilchen und deren Herstellungsprozess Active DE602004002735T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003203206 2003-07-29
JP2003203206A JP4737922B2 (ja) 2003-07-29 2003-07-29 微粒子状メソポーラスシリカの製造方法
JP2003324750 2003-09-17
JP2003324750A JP4519433B2 (ja) 2003-09-17 2003-09-17 微粒子状メソポーラスシリカ

Publications (2)

Publication Number Publication Date
DE602004002735D1 true DE602004002735D1 (de) 2006-11-23
DE602004002735T2 DE602004002735T2 (de) 2007-08-16

Family

ID=33543567

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004002735T Active DE602004002735T2 (de) 2003-07-29 2004-07-29 Mesoporöse Kieselsäureteilchen und deren Herstellungsprozess

Country Status (6)

Country Link
US (2) US20050025690A1 (de)
EP (1) EP1502898B1 (de)
KR (1) KR100715296B1 (de)
CN (1) CN100366533C (de)
DE (1) DE602004002735T2 (de)
TW (1) TWI307331B (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100715296B1 (ko) * 2003-07-29 2007-05-08 가부시끼가이샤 도꾸야마 중세공성 실리카 미립자 및 그 제조 방법
TWI261046B (en) * 2004-10-08 2006-09-01 Ind Tech Res Inst Resin composition with low dielectric constant filler for high frequency substrate
US20060120955A1 (en) * 2004-12-08 2006-06-08 Canon Kabushiki Kaisha Particles, sensor using particles and method for producing porous structure unit
WO2006112505A1 (ja) * 2005-04-20 2006-10-26 National Institute Of Advanced Industrial Science And Technology メソポーラスシリカ厚膜及びその製造方法、吸着装置並びに吸着用膜
CN1315724C (zh) * 2005-11-22 2007-05-16 南开大学 一种介孔二氧化硅材料的制备方法
US7520994B2 (en) 2006-07-12 2009-04-21 Xing Dong Method to remove agent from liquid phase
WO2008045948A2 (en) * 2006-10-10 2008-04-17 Steward Environmental Solutions, Llc Adsorbent composition and method of making same
JP5196773B2 (ja) * 2006-12-04 2013-05-15 キヤノン株式会社 タンパク質固定化担体
CN101062839B (zh) * 2007-04-19 2010-05-19 上海交通大学 规整性的宏观取向介孔薄膜的制备方法
JP5555225B2 (ja) 2009-03-12 2014-07-23 三井化学株式会社 金属酸化物多孔質体の製造方法
WO2010137711A1 (ja) 2009-05-29 2010-12-02 三井化学株式会社 半導体用シール組成物、半導体装置および半導体装置の製造方法
CN102574693B (zh) 2009-08-07 2016-01-20 松下电器产业株式会社 中孔二氧化硅细颗粒的制备方法、中孔二氧化硅细颗粒、中孔二氧化硅细颗粒的液体分散体、含中孔二氧化硅细颗粒的组合物和含中孔二氧化硅细颗粒的模制品
US8889044B2 (en) 2009-12-18 2014-11-18 Kao Corporation Method for producing mesoporous silica particles
PL2571808T3 (pl) * 2010-05-21 2019-12-31 Grace Gmbh Porowate cząstki krzemionki oraz sposoby ich wytwarzania i zastosowania
GB201212866D0 (en) * 2012-07-20 2012-09-05 Formac Pharmaceuticals Nv Dry granulates of mesoporous silica powders
US10525448B2 (en) 2015-07-22 2020-01-07 Basf Corporation High geometric surface area catalysts for vinyl acetate monomer production
US10239022B2 (en) * 2016-06-02 2019-03-26 C-Crete Technologies, Llc Porous calcium-silicates and method of synthesis
EP3636282A4 (de) 2017-05-19 2020-11-04 Tokuyama Corporation Träger eines pharmazeutischen inhaltsstoffes und verfahren zur herstellung davon
CN109403138B (zh) * 2017-06-06 2021-02-02 福建远翔新材料股份有限公司 一种彩喷纸用高分散二氧化硅吸墨剂的生产方法
US11414658B2 (en) 2018-12-25 2022-08-16 Industrial Technology Research Institute Tracer particle and method of using the same and method of manufacturing the same
CN112320806B (zh) * 2020-10-22 2022-02-18 辽宁科技学院 一种介孔二氧化硅复合体用热解法制备设备
CN112592092A (zh) * 2020-12-29 2021-04-02 成都典弥霖建筑科技有限公司 一种混凝土用防冻剂的制备方法
CN114314600A (zh) * 2021-10-09 2022-04-12 武昌理工学院 一种水玻璃制备介孔二氧化硅药物载体的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5030286A (en) * 1988-09-22 1991-07-09 Ppg Industries, Inc. High solids aqueous silica slurry
DE19639016A1 (de) * 1996-09-23 1998-03-26 Basf Ag Mesoporöses Siliciumdioxid, Verfahren zu seiner Herstellung und seiner Verwendung
EP1035073A1 (de) * 1997-11-21 2000-09-13 Asahi Kasei Kogyo Kabushiki Kaisha Mesoporöses siliciumdioxid, herstellungsverfahren dafür und verwendung davon
JP2000044227A (ja) * 1998-07-28 2000-02-15 Asahi Chem Ind Co Ltd メソポーラスシリカの粉砕方法
US6607705B2 (en) * 2000-04-13 2003-08-19 Board Of Trustees Of Michigan State University Process for the preparation of molecular sieve silicas
JP2002356621A (ja) * 2001-05-30 2002-12-13 Tokuyama Corp メソポーラスシリカ分散液及びその製造方法
CN1113811C (zh) * 2001-08-14 2003-07-09 复旦大学 一种介孔分子筛载体材料的制备方法
CN1227157C (zh) * 2001-09-25 2005-11-16 三菱化学株式会社 硅石
CN1173885C (zh) * 2001-09-26 2004-11-03 复旦大学 纳米尺寸的均匀介孔氧化硅球分离剂的合成方法
CN1247455C (zh) * 2002-12-30 2006-03-29 新加坡纳米材料科技有限公司 一种二氧化硅介孔材料及其制备方法
KR100715296B1 (ko) * 2003-07-29 2007-05-08 가부시끼가이샤 도꾸야마 중세공성 실리카 미립자 및 그 제조 방법

Also Published As

Publication number Publication date
DE602004002735T2 (de) 2007-08-16
CN100366533C (zh) 2008-02-06
US7959728B2 (en) 2011-06-14
US20090060816A1 (en) 2009-03-05
TW200512160A (en) 2005-04-01
CN1603232A (zh) 2005-04-06
KR100715296B1 (ko) 2007-05-08
TWI307331B (en) 2009-03-11
EP1502898A1 (de) 2005-02-02
EP1502898B1 (de) 2006-10-11
US20050025690A1 (en) 2005-02-03
KR20050013966A (ko) 2005-02-05

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