DE602006017779D1 - Lithografische Masken und Verfahren - Google Patents
Lithografische Masken und VerfahrenInfo
- Publication number
- DE602006017779D1 DE602006017779D1 DE602006017779T DE602006017779T DE602006017779D1 DE 602006017779 D1 DE602006017779 D1 DE 602006017779D1 DE 602006017779 T DE602006017779 T DE 602006017779T DE 602006017779 T DE602006017779 T DE 602006017779T DE 602006017779 D1 DE602006017779 D1 DE 602006017779D1
- Authority
- DE
- Germany
- Prior art keywords
- methods
- lithographic masks
- lithographic
- masks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
- G03F7/70441—Optical proximity correction [OPC]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/199,012 US7846616B2 (en) | 2005-08-08 | 2005-08-08 | Lithography masks and methods |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006017779D1 true DE602006017779D1 (de) | 2010-12-09 |
Family
ID=36922238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006017779T Active DE602006017779D1 (de) | 2005-08-08 | 2006-07-24 | Lithografische Masken und Verfahren |
Country Status (3)
Country | Link |
---|---|
US (1) | US7846616B2 (de) |
EP (1) | EP1752825B1 (de) |
DE (1) | DE602006017779D1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100934855B1 (ko) * | 2008-03-11 | 2010-01-06 | 주식회사 하이닉스반도체 | 노광마스크 및 이를 이용한 반도체소자 형성방법 |
KR101073293B1 (ko) * | 2009-06-25 | 2011-10-12 | 삼성모바일디스플레이주식회사 | 하프톤 마스크와 그 제조방법 및 하프톤 마스크를 이용한 막 형성 방법 |
US8399157B2 (en) | 2010-12-23 | 2013-03-19 | Intel Corporation | Lithography mask having sub-resolution phased assist features |
WO2013101103A1 (en) * | 2011-12-29 | 2013-07-04 | Intel Corporation | Lithography mask having sub-resolution phased assist features |
US9046761B2 (en) | 2010-12-23 | 2015-06-02 | Intel Corporation | Lithography mask having sub-resolution phased assist features |
US8739078B2 (en) | 2012-01-18 | 2014-05-27 | International Business Machines Corporation | Near-neighbor trimming of dummy fill shapes with built-in optical proximity corrections for semiconductor applications |
US9436081B2 (en) * | 2014-03-12 | 2016-09-06 | Globalfoundries Inc. | Methods of modifying masking reticles to remove forbidden pitch regions thereof |
KR102305092B1 (ko) | 2014-07-16 | 2021-09-24 | 삼성전자주식회사 | 포토리소그래피용 마스크와 그 제조 방법 |
CN108776421B (zh) * | 2018-06-25 | 2021-08-10 | 上海华力集成电路制造有限公司 | 测试掩模版制造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5256505A (en) * | 1992-08-21 | 1993-10-26 | Microunity Systems Engineering | Lithographical mask for controlling the dimensions of resist patterns |
US6433878B1 (en) * | 2001-01-29 | 2002-08-13 | Timbre Technology, Inc. | Method and apparatus for the determination of mask rules using scatterometry |
US6519760B2 (en) | 2001-02-28 | 2003-02-11 | Asml Masktools, B.V. | Method and apparatus for minimizing optical proximity effects |
US6792591B2 (en) | 2001-02-28 | 2004-09-14 | Asml Masktools B.V. | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs |
DE10230532B4 (de) | 2002-07-05 | 2007-03-08 | Infineon Technologies Ag | Verfahren zum Bestimmen des Aufbaus einer Maske zum Mikrostrukturieren von Halbleitersubstraten mittels Fotolithographie |
US6711732B1 (en) * | 2002-07-26 | 2004-03-23 | Taiwan Semiconductor Manufacturing Company | Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
US7251377B2 (en) | 2003-04-29 | 2007-07-31 | Synopsys, Inc. | Cell library that can automatically avoid forbidden pitches |
US6973636B2 (en) * | 2003-10-17 | 2005-12-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of defining forbidden pitches for a lithography exposure tool |
SG111289A1 (en) * | 2003-11-05 | 2005-05-30 | Asml Masktools Bv | A method for performing transmission tuning of a mask pattern to improve process latitude |
US6977715B2 (en) * | 2004-05-19 | 2005-12-20 | Nanya Technology Corp. | Method for optimizing NILS of exposed lines |
US7632610B2 (en) * | 2004-09-02 | 2009-12-15 | Intel Corporation | Sub-resolution assist features |
US7129181B2 (en) * | 2004-09-17 | 2006-10-31 | Palo Alto Research Center Incorporated | Sub-resolution gaps generated by controlled over-etching |
US7332812B2 (en) * | 2005-04-14 | 2008-02-19 | Infineon Technologies Ag | Memory card with connecting portions for connection to an adapter |
-
2005
- 2005-08-08 US US11/199,012 patent/US7846616B2/en not_active Expired - Fee Related
-
2006
- 2006-07-24 DE DE602006017779T patent/DE602006017779D1/de active Active
- 2006-07-24 EP EP06117707A patent/EP1752825B1/de not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
EP1752825B1 (de) | 2010-10-27 |
US20070031737A1 (en) | 2007-02-08 |
US7846616B2 (en) | 2010-12-07 |
EP1752825A2 (de) | 2007-02-14 |
EP1752825A3 (de) | 2009-07-22 |
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