NL1031119A1 - Blootstellingswerkwijze van een patroon en inrichting. - Google Patents

Blootstellingswerkwijze van een patroon en inrichting.

Info

Publication number
NL1031119A1
NL1031119A1 NL1031119A NL1031119A NL1031119A1 NL 1031119 A1 NL1031119 A1 NL 1031119A1 NL 1031119 A NL1031119 A NL 1031119A NL 1031119 A NL1031119 A NL 1031119A NL 1031119 A1 NL1031119 A1 NL 1031119A1
Authority
NL
Netherlands
Prior art keywords
pattern
exposure method
exposure
Prior art date
Application number
NL1031119A
Other languages
English (en)
Other versions
NL1031119C2 (nl
Inventor
Yoshitada Oshida
Yoshitatsu Naito
Mituhiro Suzuki
Tsuyoshi Yamaguchi
Shigenobu Maruyama
Original Assignee
Hitachi Via Mechanics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Via Mechanics Ltd filed Critical Hitachi Via Mechanics Ltd
Publication of NL1031119A1 publication Critical patent/NL1031119A1/nl
Application granted granted Critical
Publication of NL1031119C2 publication Critical patent/NL1031119C2/nl

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C5/00—Constructions of non-optical parts
    • G02C5/14—Side-members
    • G02C5/16—Side-members resilient or with resilient parts
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/123—Multibeam scanners, e.g. using multiple light sources or beam splitters
    • G—PHYSICS
    • G02—OPTICS
    • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C5/00—Constructions of non-optical parts
    • G02C5/008—Spectacles frames characterized by their material, material structure and material properties
    • G—PHYSICS
    • G02—OPTICS
    • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C5/00—Constructions of non-optical parts
    • G02C5/14—Side-members
    • G02C5/143—Side-members having special ear pieces
    • G—PHYSICS
    • G02—OPTICS
    • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C5/00—Constructions of non-optical parts
    • G02C5/14—Side-members
    • G02C5/20—Side-members adjustable, e.g. telescopic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
NL1031119A 2005-03-24 2006-02-10 Blootstellingswerkwijze van een patroon en inrichting. NL1031119C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005087240 2005-03-24
JP2005087240A JP4410134B2 (ja) 2005-03-24 2005-03-24 パターン露光方法及び装置

Publications (2)

Publication Number Publication Date
NL1031119A1 true NL1031119A1 (nl) 2006-09-27
NL1031119C2 NL1031119C2 (nl) 2008-02-12

Family

ID=36973787

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1031119A NL1031119C2 (nl) 2005-03-24 2006-02-10 Blootstellingswerkwijze van een patroon en inrichting.

Country Status (7)

Country Link
US (1) US20060215139A1 (nl)
JP (1) JP4410134B2 (nl)
KR (1) KR20060103099A (nl)
CN (1) CN1837962A (nl)
DE (1) DE102006006797A1 (nl)
NL (1) NL1031119C2 (nl)
TW (1) TW200634442A (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112534351A (zh) * 2018-08-09 2021-03-19 旭化成株式会社 感光性树脂组合物及抗蚀图案的形成方法

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* Cited by examiner, † Cited by third party
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JP5080009B2 (ja) * 2005-03-22 2012-11-21 日立ビアメカニクス株式会社 露光方法
KR100816494B1 (ko) * 2006-10-09 2008-03-24 엘지전자 주식회사 마스크리스 노광기 및 이를 이용한 표시장치용 기판의 제조방법
KR20080044193A (ko) * 2006-11-15 2008-05-20 다이요 잉키 세이조 가부시키가이샤 솔더 레지스트막 형성 방법 및 감광성 조성물
JP2009210726A (ja) * 2008-03-03 2009-09-17 Hitachi Via Mechanics Ltd マスクレス露光装置
JP5687013B2 (ja) * 2010-09-14 2015-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および光源装置
DE202010014718U1 (de) * 2010-09-24 2011-01-20 Printprocess Ag Belichtungsanordnung
US8531751B2 (en) * 2011-08-19 2013-09-10 Orbotech Ltd. System and method for direct imaging
CN102378494B (zh) * 2011-10-31 2014-03-26 深南电路有限公司 一种电路板阻焊加工方法
EP2602662A1 (de) * 2011-12-09 2013-06-12 AKK GmbH Beleuchtungssystem zur Herstellung von Drucksieben mit einem Richtstrahl-Kombinator
EP3096186A3 (de) * 2013-11-08 2017-04-12 Limata GmbH Lithografiebelichtungseinrichtung zur lithographischen belichtung durch ein- oder mehrstufige laserprojektionseinheiten mit einer oder mehreren wellenlängen
KR102145934B1 (ko) * 2014-05-20 2020-08-19 동우 화인켐 주식회사 광경화 패턴의 형성 방법
KR102192956B1 (ko) * 2014-06-23 2020-12-18 삼성전자주식회사 디스플레이 장치 및 그 제어 방법
JP6480680B2 (ja) 2014-08-02 2019-03-13 株式会社アドテックエンジニアリング 照度割合変更方法及び露光方法
JP6503235B2 (ja) 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法
EP3197249B1 (de) * 2016-01-20 2022-09-21 Limata GmbH Direktbelichtungseinrichtung zur direktbelichtung von lötstopplacken in 2-dimensionaler, kurzzeittemperierter umgebung
KR102496906B1 (ko) * 2016-05-06 2023-02-08 가부시키가이샤 니콘 빔 주사 장치 및 묘화 장치
CN106054538A (zh) * 2016-06-13 2016-10-26 马颖鏖 紫外曝光机光学混光照明系统
DE102017103624A1 (de) * 2017-02-22 2018-08-23 Manz Ag Belichtungsanlage
CN106707700B (zh) * 2017-03-24 2018-04-06 上海誉刻智能装备有限公司 一种阻焊曝光方法
WO2022107116A1 (en) * 2020-11-17 2022-05-27 Orbotech Ltd. Multi pattern maskless lithography method and system

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US20030206337A1 (en) * 2002-05-06 2003-11-06 Eastman Kodak Company Exposure apparatus for irradiating a sensitized substrate
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US7830945B2 (en) * 2002-07-10 2010-11-09 Fujifilm Corporation Laser apparatus in which laser diodes and corresponding collimator lenses are fixed to block, and fiber module in which laser apparatus is coupled to optical fiber
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JP4226482B2 (ja) * 2003-02-03 2009-02-18 富士フイルム株式会社 レーザ光合波装置
JP2004354659A (ja) * 2003-05-29 2004-12-16 Dainippon Screen Mfg Co Ltd パターン描画装置
JP4508743B2 (ja) * 2004-03-31 2010-07-21 日立ビアメカニクス株式会社 パターン露光方法およびパターン露光装置
JP5080009B2 (ja) * 2005-03-22 2012-11-21 日立ビアメカニクス株式会社 露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112534351A (zh) * 2018-08-09 2021-03-19 旭化成株式会社 感光性树脂组合物及抗蚀图案的形成方法

Also Published As

Publication number Publication date
US20060215139A1 (en) 2006-09-28
JP2006267719A (ja) 2006-10-05
NL1031119C2 (nl) 2008-02-12
CN1837962A (zh) 2006-09-27
JP4410134B2 (ja) 2010-02-03
TW200634442A (en) 2006-10-01
DE102006006797A1 (de) 2006-09-28
KR20060103099A (ko) 2006-09-28

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AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20071010

PD2B A search report has been drawn up
V1 Lapsed because of non-payment of the annual fee

Effective date: 20120901