CN1638008A - 场发射器件、采用该器件的显示器及其制造方法 - Google Patents
场发射器件、采用该器件的显示器及其制造方法 Download PDFInfo
- Publication number
- CN1638008A CN1638008A CNA2004100982497A CN200410098249A CN1638008A CN 1638008 A CN1638008 A CN 1638008A CN A2004100982497 A CNA2004100982497 A CN A2004100982497A CN 200410098249 A CN200410098249 A CN 200410098249A CN 1638008 A CN1638008 A CN 1638008A
- Authority
- CN
- China
- Prior art keywords
- photoresist layer
- electrode
- cnt
- gate insulator
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
- H01J3/022—Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/481—Electron guns using field-emission, photo-emission, or secondary-emission electron source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
- H01J2201/30453—Carbon types
- H01J2201/30469—Carbon nanotubes (CNTs)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2329/00—Electron emission display panels, e.g. field emission display panels
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/939—Electron emitter, e.g. spindt emitter tip coated with nanoparticles
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Cold Cathode And The Manufacture (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR94415/2003 | 2003-12-22 | ||
KR1020030094415A KR20050062742A (ko) | 2003-12-22 | 2003-12-22 | 전계방출소자와, 이를 적용한 표시소자 및 그 제조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN1638008A true CN1638008A (zh) | 2005-07-13 |
Family
ID=34675895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2004100982497A Pending CN1638008A (zh) | 2003-12-22 | 2004-11-30 | 场发射器件、采用该器件的显示器及其制造方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7132304B2 (ko) |
JP (1) | JP2005183388A (ko) |
KR (1) | KR20050062742A (ko) |
CN (1) | CN1638008A (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1975976B (zh) * | 2006-10-17 | 2010-08-25 | 中原工学院 | 多方型阴极栅控结构的平板显示器及其制作工艺 |
CN101071725B (zh) * | 2007-06-19 | 2011-12-07 | 中原工学院 | 多柱型阴极发射结构的平板显示器及其制作工艺 |
CN106158551A (zh) * | 2016-07-08 | 2016-11-23 | 中山大学 | 自对准聚焦结构的纳米线冷阴极电子源阵列及其制作方法 |
CN107026064A (zh) * | 2017-04-10 | 2017-08-08 | 金华职业技术学院 | 一种发射电流可控的小型化非放射性电子源 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100862655B1 (ko) * | 2003-08-12 | 2008-10-10 | 삼성에스디아이 주식회사 | 탄소나노튜브 에미터를 구비하는 전계 방출 디스플레이 및그 제조 방법 |
KR20050058617A (ko) * | 2003-12-12 | 2005-06-17 | 삼성에스디아이 주식회사 | 전계방출소자와, 이를 적용한 표시소자 및 그 제조방법 |
KR101107134B1 (ko) * | 2005-08-26 | 2012-01-31 | 삼성에스디아이 주식회사 | 전자 방출 소자, 전자 방출 디바이스 및 그 제조 방법 |
US7662648B2 (en) * | 2005-08-31 | 2010-02-16 | Micron Technology, Inc. | Integrated circuit inspection system |
KR20070046670A (ko) * | 2005-10-31 | 2007-05-03 | 삼성에스디아이 주식회사 | 전자 방출 디바이스 및 이를 구비한 전자 방출 표시디바이스 |
KR20070083112A (ko) * | 2006-02-20 | 2007-08-23 | 삼성에스디아이 주식회사 | 전자 방출 디바이스와 이를 이용한 전자 방출 표시디바이스 |
CN101093771A (zh) * | 2006-06-23 | 2007-12-26 | 清华大学 | 碳纳米管场发射体及其制造方法 |
KR100837407B1 (ko) * | 2006-11-15 | 2008-06-12 | 삼성전자주식회사 | 전계방출소자의 제조방법 |
KR100858814B1 (ko) * | 2007-01-30 | 2008-09-17 | 삼성에스디아이 주식회사 | 표시장치 및 그 제조방법 |
US7847273B2 (en) * | 2007-03-30 | 2010-12-07 | Eloret Corporation | Carbon nanotube electron gun |
US20080292979A1 (en) * | 2007-05-22 | 2008-11-27 | Zhe Ding | Transparent conductive materials and coatings, methods of production and uses thereof |
CN101071738B (zh) * | 2007-06-19 | 2011-08-24 | 中原工学院 | 尖角下栅控型阴极结构的平板显示器及其制作工艺 |
US20090035707A1 (en) * | 2007-08-01 | 2009-02-05 | Yubing Wang | Rheology-controlled conductive materials, methods of production and uses thereof |
US20090056589A1 (en) * | 2007-08-29 | 2009-03-05 | Honeywell International, Inc. | Transparent conductors having stretched transparent conductive coatings and methods for fabricating the same |
KR100913132B1 (ko) * | 2007-12-17 | 2009-08-19 | 한국전자통신연구원 | 전계 방출형 백라이트 유닛과 이에 이용되는 캐소드 구조물및 이의 제조 방법 |
US7727578B2 (en) * | 2007-12-27 | 2010-06-01 | Honeywell International Inc. | Transparent conductors and methods for fabricating transparent conductors |
US7960027B2 (en) * | 2008-01-28 | 2011-06-14 | Honeywell International Inc. | Transparent conductors and methods for fabricating transparent conductors |
US7642463B2 (en) * | 2008-01-28 | 2010-01-05 | Honeywell International Inc. | Transparent conductors and methods for fabricating transparent conductors |
JP4390847B1 (ja) * | 2008-07-31 | 2009-12-24 | 株式会社ライフ技術研究所 | 電子放出体および電子放出体を備えた電界放射装置 |
FR2946456A1 (fr) * | 2009-06-05 | 2010-12-10 | Thales Sa | Source de faisceau electronique collimate a cathode froide |
JP5605754B2 (ja) * | 2010-09-01 | 2014-10-15 | 富士ゼロックス株式会社 | 帯電装置及び画像形成装置 |
RU2455724C1 (ru) * | 2010-11-13 | 2012-07-10 | Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" | Структура и способ изготовления интегральных автоэмиссионных элементов с эмиттерами на основе наноалмазных покрытий |
US9053890B2 (en) | 2013-08-02 | 2015-06-09 | University Health Network | Nanostructure field emission cathode structure and method for making |
Family Cites Families (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04206123A (ja) * | 1990-11-28 | 1992-07-28 | Matsushita Electric Ind Co Ltd | 電子放出素子およびその製造方法 |
US5872422A (en) * | 1995-12-20 | 1999-02-16 | Advanced Technology Materials, Inc. | Carbon fiber-based field emission devices |
US6599847B1 (en) * | 1996-08-27 | 2003-07-29 | Taiwan Semiconductor Manufacturing Company | Sandwich composite dielectric layer yielding improved integrated circuit device reliability |
JP3171121B2 (ja) * | 1996-08-29 | 2001-05-28 | 双葉電子工業株式会社 | 電界放出型表示装置 |
US5920151A (en) * | 1997-05-30 | 1999-07-06 | Candescent Technologies Corporation | Structure and fabrication of electron-emitting device having focus coating contacted through underlying access conductor |
US6326725B1 (en) * | 1998-05-26 | 2001-12-04 | Micron Technology, Inc. | Focusing electrode for field emission displays and method |
JP2000215792A (ja) * | 1999-01-20 | 2000-08-04 | Sony Corp | 平面型表示装置の製造方法 |
JP2001035350A (ja) * | 1999-07-19 | 2001-02-09 | Ricoh Co Ltd | 電界放出型電子放出素子及びその作製方法 |
JP2001185018A (ja) * | 1999-12-24 | 2001-07-06 | Toshiba Corp | 電子放出素子およびその製造方法 |
JP2001351512A (ja) * | 2000-06-05 | 2001-12-21 | Fujitsu Ltd | 電界放出陰極の製造方法 |
KR20020003709A (ko) * | 2000-06-28 | 2002-01-15 | 김 성 아이 | 전계 방출 표시 소자 및 그의 제조 방법 |
KR100378597B1 (ko) * | 2000-12-22 | 2003-04-03 | 한국전자통신연구원 | 고해상도 전계 방출 디스플레이 |
US6699642B2 (en) * | 2001-01-05 | 2004-03-02 | Samsung Sdi Co., Ltd. | Method of manufacturing triode carbon nanotube field emitter array |
JP2002260524A (ja) * | 2001-03-06 | 2002-09-13 | Nippon Hoso Kyokai <Nhk> | 冷陰極電子源とそれを用いて構成した撮像装置、表示装置 |
US7057586B2 (en) * | 2001-03-20 | 2006-06-06 | Lg Electronics Inc. | Flat panel display and operation method thereof |
US6541906B2 (en) * | 2001-05-23 | 2003-04-01 | Industrial Technology Research Institute | Field emission display panel equipped with a dual-layer cathode and an anode on the same substrate and method for fabrication |
JP2003016913A (ja) * | 2001-07-02 | 2003-01-17 | Canon Inc | 電子放出素子,電子源及び画像形成装置並びに電子放出素子の製造方法 |
TW511108B (en) * | 2001-08-13 | 2002-11-21 | Delta Optoelectronics Inc | Carbon nanotube field emission display technology |
JP3864857B2 (ja) * | 2001-09-26 | 2007-01-10 | 株式会社日立製作所 | 画像表示装置 |
DE60221951T2 (de) * | 2001-11-23 | 2008-05-15 | Samsung SDI Co., Ltd., Suwon | Zusammensetzung für Paste mit Kohlenstoffnanoröhren, diese Zusammensetzung verwendende Elektronen-emittierende Vorrichtung und deren Herstellungsverfahren |
KR100438835B1 (ko) * | 2001-12-18 | 2004-07-05 | 삼성에스디아이 주식회사 | 기판에서 들뜬 구조물의 형성 방법 및 이를 적용한 들뜬구조의 게이트 전극 및 fed 제조방법 |
TW533391B (en) * | 2001-12-27 | 2003-05-21 | Ind Tech Res Inst | Improved field emitting display driving method |
WO2003063120A1 (en) * | 2002-01-15 | 2003-07-31 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Method and apparatus for regulating electron emission in field emitter devices |
KR100413815B1 (ko) * | 2002-01-22 | 2004-01-03 | 삼성에스디아이 주식회사 | 삼극구조를 가지는 탄소나노튜브 전계방출소자 및 그제조방법 |
JP4543604B2 (ja) * | 2002-05-20 | 2010-09-15 | ソニー株式会社 | 電子放出領域の製造方法 |
KR20040034251A (ko) * | 2002-10-21 | 2004-04-28 | 삼성에스디아이 주식회사 | 전계방출소자 |
JP2004171968A (ja) * | 2002-11-21 | 2004-06-17 | Hitachi Ltd | 平面型表示装置 |
TW594824B (en) * | 2002-12-03 | 2004-06-21 | Ind Tech Res Inst | Triode structure of field-emission display and manufacturing method thereof |
JP2004246317A (ja) * | 2002-12-20 | 2004-09-02 | Hitachi Ltd | 冷陰極型フラットパネルディスプレイ |
CN100419943C (zh) * | 2003-04-03 | 2008-09-17 | 清华大学 | 一种场发射显示装置 |
KR100480040B1 (ko) * | 2003-04-18 | 2005-03-31 | 엘지전자 주식회사 | 전계방출 소자의 스페이서 방전 장치 및 방법 |
KR100560244B1 (ko) * | 2003-06-13 | 2006-03-10 | 삼성코닝 주식회사 | 탄소나노구조체 또는 나노와이어를 이용한 전계 방출어레이 및 그 제조 방법 |
KR100862655B1 (ko) * | 2003-08-12 | 2008-10-10 | 삼성에스디아이 주식회사 | 탄소나노튜브 에미터를 구비하는 전계 방출 디스플레이 및그 제조 방법 |
KR100523840B1 (ko) * | 2003-08-27 | 2005-10-27 | 한국전자통신연구원 | 전계 방출 소자 |
KR100537512B1 (ko) * | 2003-09-01 | 2005-12-19 | 삼성에스디아이 주식회사 | 카본나노튜브구조체 및 이의 제조방법 그리고 이를 응용한전계방출소자 및 표시장치 |
TWI231521B (en) * | 2003-09-25 | 2005-04-21 | Ind Tech Res Inst | A carbon nanotubes field emission display and the fabricating method of which |
JP2005123133A (ja) * | 2003-10-20 | 2005-05-12 | Noritake Co Ltd | ゲート電極構造体の製造方法 |
US6885010B1 (en) * | 2003-11-12 | 2005-04-26 | Thermo Electron Corporation | Carbon nanotube electron ionization sources |
KR20050049868A (ko) * | 2003-11-24 | 2005-05-27 | 삼성에스디아이 주식회사 | 카본나노튜브 에미터 형성방법 및 이를 이용한 전계방출표시소자의 제조방법 |
KR100557338B1 (ko) * | 2003-11-27 | 2006-03-06 | 한국과학기술원 | 자기조립 물질로 랩핑된 탄소나노튜브의 제조방법 |
KR100568501B1 (ko) * | 2003-12-10 | 2006-04-07 | 한국전자통신연구원 | 전계 방출 디스플레이 |
KR20050058617A (ko) * | 2003-12-12 | 2005-06-17 | 삼성에스디아이 주식회사 | 전계방출소자와, 이를 적용한 표시소자 및 그 제조방법 |
US20050236963A1 (en) * | 2004-04-15 | 2005-10-27 | Kang Sung G | Emitter structure with a protected gate electrode for an electron-emitting device |
KR100591242B1 (ko) * | 2004-05-04 | 2006-06-19 | 한국전자통신연구원 | 전계 방출 디스플레이 |
KR20050111706A (ko) * | 2004-05-22 | 2005-11-28 | 삼성에스디아이 주식회사 | 전계방출 표시소자 및 그 제조방법 |
US20060066217A1 (en) * | 2004-09-27 | 2006-03-30 | Son Jong W | Cathode structure for field emission device |
KR20060081109A (ko) * | 2005-01-07 | 2006-07-12 | 삼성에스디아이 주식회사 | 전계방출 표시장치 |
-
2003
- 2003-12-22 KR KR1020030094415A patent/KR20050062742A/ko not_active Application Discontinuation
-
2004
- 2004-11-30 CN CNA2004100982497A patent/CN1638008A/zh active Pending
- 2004-12-03 US US11/002,073 patent/US7132304B2/en not_active Expired - Fee Related
- 2004-12-16 JP JP2004364141A patent/JP2005183388A/ja active Pending
-
2006
- 2006-06-19 US US11/455,193 patent/US7508124B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1975976B (zh) * | 2006-10-17 | 2010-08-25 | 中原工学院 | 多方型阴极栅控结构的平板显示器及其制作工艺 |
CN101071725B (zh) * | 2007-06-19 | 2011-12-07 | 中原工学院 | 多柱型阴极发射结构的平板显示器及其制作工艺 |
CN106158551A (zh) * | 2016-07-08 | 2016-11-23 | 中山大学 | 自对准聚焦结构的纳米线冷阴极电子源阵列及其制作方法 |
CN106158551B (zh) * | 2016-07-08 | 2017-11-21 | 中山大学 | 自对准聚焦结构的纳米线冷阴极电子源阵列及其制作方法 |
CN107026064A (zh) * | 2017-04-10 | 2017-08-08 | 金华职业技术学院 | 一种发射电流可控的小型化非放射性电子源 |
CN107026064B (zh) * | 2017-04-10 | 2018-12-14 | 金华职业技术学院 | 一种发射电流可控的小型化非放射性电子源 |
Also Published As
Publication number | Publication date |
---|---|
US20060255344A1 (en) | 2006-11-16 |
US7508124B2 (en) | 2009-03-24 |
US20050133779A1 (en) | 2005-06-23 |
JP2005183388A (ja) | 2005-07-07 |
US7132304B2 (en) | 2006-11-07 |
KR20050062742A (ko) | 2005-06-27 |
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