CN1125030C - 卤化丙烯酸酯及由其制得的聚合物 - Google Patents

卤化丙烯酸酯及由其制得的聚合物 Download PDF

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Publication number
CN1125030C
CN1125030C CN97182296A CN97182296A CN1125030C CN 1125030 C CN1125030 C CN 1125030C CN 97182296 A CN97182296 A CN 97182296A CN 97182296 A CN97182296 A CN 97182296A CN 1125030 C CN1125030 C CN 1125030C
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CN
China
Prior art keywords
group
acrylate
acrylic ester
ether
halogenated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN97182296A
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English (en)
Chinese (zh)
Other versions
CN1259932A (zh
Inventor
G·G·I·穆尔
F·B·麦克考密克
M·查托拉
E·M·克罗斯
J·J·刘
R·R·罗伯特
J·F·舒尔茨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of CN1259932A publication Critical patent/CN1259932A/zh
Application granted granted Critical
Publication of CN1125030C publication Critical patent/CN1125030C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/63—One oxygen atom
    • C07D213/64—One oxygen atom attached in position 2 or 6
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/65—Halogen-containing esters of unsaturated acids
    • C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)
CN97182296A 1997-06-10 1997-09-29 卤化丙烯酸酯及由其制得的聚合物 Expired - Fee Related CN1125030C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/872,235 1997-06-10
US08/872,235 US6005137A (en) 1997-06-10 1997-06-10 Halogenated acrylates and polymers derived therefrom

Publications (2)

Publication Number Publication Date
CN1259932A CN1259932A (zh) 2000-07-12
CN1125030C true CN1125030C (zh) 2003-10-22

Family

ID=25359127

Family Applications (1)

Application Number Title Priority Date Filing Date
CN97182296A Expired - Fee Related CN1125030C (zh) 1997-06-10 1997-09-29 卤化丙烯酸酯及由其制得的聚合物

Country Status (8)

Country Link
US (4) US6005137A (https=)
EP (1) EP1009729B1 (https=)
JP (1) JP4065932B2 (https=)
KR (1) KR100597970B1 (https=)
CN (1) CN1125030C (https=)
AU (1) AU4739297A (https=)
DE (1) DE69732310T2 (https=)
WO (1) WO1998056749A1 (https=)

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US6306563B1 (en) 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
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US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
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US7271283B2 (en) * 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom
JP2005140909A (ja) * 2003-11-05 2005-06-02 Omron Corp 光学部品
KR101129883B1 (ko) * 2004-05-26 2012-03-28 제이에스알 가부시끼가이샤 미세 패턴 형성용 수지 조성물 및 미세 패턴 형성 방법
US7341784B2 (en) * 2004-09-10 2008-03-11 General Electric Company Light management film and its preparation and use
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US7297810B2 (en) * 2004-12-30 2007-11-20 3M Innovative Properties Company High refractive index monomers for optical applications
US7231127B2 (en) * 2005-01-21 2007-06-12 Lumera Corporation Waveguide devices with low loss clads and tunable refractive indices
US7262230B2 (en) * 2005-01-21 2007-08-28 Lumera Corporation Process of preparing crosslinked, low loss polymers with tunable refractive indices
US8435610B2 (en) * 2006-05-05 2013-05-07 Japan Science And Technology Agency Copolymer of (meth)acrylic ester, composition, optical element and electric member
US8791254B2 (en) * 2006-05-19 2014-07-29 3M Innovative Properties Company Cyclic hydrofluoroether compounds and processes for their preparation and use
US8193397B2 (en) * 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
US20080145545A1 (en) * 2006-12-15 2008-06-19 Bret Ja Chisholm Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom
US20090015142A1 (en) 2007-07-13 2009-01-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display devices
US8179034B2 (en) 2007-07-13 2012-05-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display and lighting devices
JP5150327B2 (ja) * 2007-08-03 2013-02-20 東京応化工業株式会社 液浸露光用レジスト組成物およびレジストパターン形成方法
KR101004984B1 (ko) * 2007-08-03 2011-01-04 도오꾜오까고오교 가부시끼가이샤 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법
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JP5303142B2 (ja) * 2007-11-30 2013-10-02 東京応化工業株式会社 含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法
US7981986B2 (en) * 2008-04-29 2011-07-19 3M Innovative Properties Company Optical films comprising fluorenol (meth)acrylate monomer
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KR102898751B1 (ko) * 2022-10-21 2025-12-11 주식회사 트리엘 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물
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Also Published As

Publication number Publication date
WO1998056749A1 (en) 1998-12-17
CN1259932A (zh) 2000-07-12
US6005137A (en) 1999-12-21
JP2002514259A (ja) 2002-05-14
US6288266B1 (en) 2001-09-11
AU4739297A (en) 1998-12-30
US6313245B1 (en) 2001-11-06
US20010037028A1 (en) 2001-11-01
US6362379B2 (en) 2002-03-26
EP1009729A1 (en) 2000-06-21
KR100597970B1 (ko) 2006-07-13
JP4065932B2 (ja) 2008-03-26
DE69732310T2 (de) 2005-12-22
EP1009729B1 (en) 2005-01-19
KR20010013585A (ko) 2001-02-26
DE69732310D1 (de) 2005-02-24

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