AU4739297A - Halogenated acrylates and polymers derived therefrom - Google Patents

Halogenated acrylates and polymers derived therefrom

Info

Publication number
AU4739297A
AU4739297A AU47392/97A AU4739297A AU4739297A AU 4739297 A AU4739297 A AU 4739297A AU 47392/97 A AU47392/97 A AU 47392/97A AU 4739297 A AU4739297 A AU 4739297A AU 4739297 A AU4739297 A AU 4739297A
Authority
AU
Australia
Prior art keywords
derived therefrom
polymers derived
halogenated acrylates
acrylates
halogenated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU47392/97A
Other languages
English (en)
Inventor
Mita Chattoraj
Elisa M Cross
Junkang Jacob Liu
Fred B Mccormick
George G.I. Moore
Ralph R. Roberts
Jay F. Schulz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of AU4739297A publication Critical patent/AU4739297A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/63—One oxygen atom
    • C07D213/64—One oxygen atom attached in position 2 or 6
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/65—Halogen-containing esters of unsaturated acids
    • C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)
AU47392/97A 1997-06-10 1997-09-29 Halogenated acrylates and polymers derived therefrom Abandoned AU4739297A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/872,235 US6005137A (en) 1997-06-10 1997-06-10 Halogenated acrylates and polymers derived therefrom
US08872235 1997-06-10
PCT/US1997/017437 WO1998056749A1 (en) 1997-06-10 1997-09-29 Halogenated acrylates and polymers derived therefrom

Publications (1)

Publication Number Publication Date
AU4739297A true AU4739297A (en) 1998-12-30

Family

ID=25359127

Family Applications (1)

Application Number Title Priority Date Filing Date
AU47392/97A Abandoned AU4739297A (en) 1997-06-10 1997-09-29 Halogenated acrylates and polymers derived therefrom

Country Status (8)

Country Link
US (4) US6005137A (https=)
EP (1) EP1009729B1 (https=)
JP (1) JP4065932B2 (https=)
KR (1) KR100597970B1 (https=)
CN (1) CN1125030C (https=)
AU (1) AU4739297A (https=)
DE (1) DE69732310T2 (https=)
WO (1) WO1998056749A1 (https=)

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US6306563B1 (en) 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
ATE433129T1 (de) * 2000-06-15 2009-06-15 3M Innovative Properties Co Mikroherstellungsverfahren für organische optische bauteile
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
US7014988B2 (en) 2000-06-15 2006-03-21 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
AU2001270320A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
WO2001096958A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Process for producing microfluidic articles
DE60139620D1 (de) 2000-06-15 2009-10-01 3M Innovative Properties Co Methode und gerät zur erzielung wiederholter multiphotonabsorption
JP2004503928A (ja) 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー 多方向光反応吸収方法
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US6584266B1 (en) 2000-06-16 2003-06-24 Corning Incorporated Chromophores for polymeric thin films and optical waveguides and devices comprising the same
US6444830B1 (en) 2000-06-16 2002-09-03 Corning Incorporated Electron acceptors for polymeric thin film waveguide media
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DE10257711B4 (de) * 2001-12-27 2019-09-26 Merck Patent Gmbh Polymerisierbare monocyclische Verbindungen enthaltende Flüssigkristallmischungen
WO2003066693A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4222120B2 (ja) * 2002-10-07 2009-02-12 Ｊｓｒ株式会社 光導波路形成用感光性樹脂組成物および光導波路
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JP2004240122A (ja) * 2003-02-05 2004-08-26 Fuji Photo Film Co Ltd プラスチック光ファイバケーブルおよび製造方法
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TWI254717B (en) * 2003-08-06 2006-05-11 Chung Shan Inst Of Science Method for the preparation of pentafluorophenylacrylate polymer
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JP2005140909A (ja) * 2003-11-05 2005-06-02 Omron Corp 光学部品
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US20080293903A1 (en) * 2004-09-14 2008-11-27 Maria Petrucci-Samija Optical Organic Polymer
US7264872B2 (en) * 2004-12-30 2007-09-04 3M Innovative Properties Company Durable high index nanocomposites for AR coatings
US7491441B2 (en) * 2004-12-30 2009-02-17 3M Innovative Properties Company High refractive index, durable hard coats
US7297810B2 (en) * 2004-12-30 2007-11-20 3M Innovative Properties Company High refractive index monomers for optical applications
US7231127B2 (en) * 2005-01-21 2007-06-12 Lumera Corporation Waveguide devices with low loss clads and tunable refractive indices
US7262230B2 (en) * 2005-01-21 2007-08-28 Lumera Corporation Process of preparing crosslinked, low loss polymers with tunable refractive indices
US8435610B2 (en) * 2006-05-05 2013-05-07 Japan Science And Technology Agency Copolymer of (meth)acrylic ester, composition, optical element and electric member
US8791254B2 (en) * 2006-05-19 2014-07-29 3M Innovative Properties Company Cyclic hydrofluoroether compounds and processes for their preparation and use
US8193397B2 (en) * 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
US20080145545A1 (en) * 2006-12-15 2008-06-19 Bret Ja Chisholm Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom
US20090015142A1 (en) 2007-07-13 2009-01-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display devices
US8179034B2 (en) 2007-07-13 2012-05-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display and lighting devices
JP5150327B2 (ja) * 2007-08-03 2013-02-20 東京応化工業株式会社 液浸露光用レジスト組成物およびレジストパターン形成方法
KR101004984B1 (ko) * 2007-08-03 2011-01-04 도오꾜오까고오교 가부시끼가이샤 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법
JP2009098658A (ja) * 2007-09-25 2009-05-07 Fujifilm Corp 光学フィルム、偏光板、及び画像表示装置
JP5303142B2 (ja) * 2007-11-30 2013-10-02 東京応化工業株式会社 含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法
US7981986B2 (en) * 2008-04-29 2011-07-19 3M Innovative Properties Company Optical films comprising fluorenol (meth)acrylate monomer
US20090275720A1 (en) * 2008-04-30 2009-11-05 3M Innovative Properties Company Ortho-benzylphenol mono(meth)acrylate monomers suitable for microstructured optical films
US7957621B2 (en) 2008-12-17 2011-06-07 3M Innovative Properties Company Light extraction film with nanoparticle coatings
TWI503334B (zh) * 2009-02-19 2015-10-11 Jsr Corp 聚合物及敏輻射線性組成物、及單體
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US9182662B2 (en) * 2012-02-15 2015-11-10 Rohm And Haas Electronic Materials Llc Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom
US20160109625A1 (en) * 2014-10-21 2016-04-21 Saint-Gobain Performance Plastics Corporation Support for a flexible oled
CN107250097B (zh) * 2015-02-16 2020-08-07 中央硝子株式会社 含氟α-酮羧酸酯类的实用制造方法
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KR101965194B1 (ko) * 2017-07-12 2019-04-03 이화여자대학교 산학협력단 불소계 모노머 및 올리고머 화합물, 광중합형 조성물, 및 이들을 이용한 소수성 필름
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CN109534968B (zh) * 2018-11-15 2022-07-08 广东广山新材料股份有限公司 一种不饱和氟碳化合物及其制备方法和应用
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JP7829336B2 (ja) * 2022-01-27 2026-03-13 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、及び、化合物
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Also Published As

Publication number Publication date
WO1998056749A1 (en) 1998-12-17
CN1125030C (zh) 2003-10-22
CN1259932A (zh) 2000-07-12
US6005137A (en) 1999-12-21
JP2002514259A (ja) 2002-05-14
US6288266B1 (en) 2001-09-11
US6313245B1 (en) 2001-11-06
US20010037028A1 (en) 2001-11-01
US6362379B2 (en) 2002-03-26
EP1009729A1 (en) 2000-06-21
KR100597970B1 (ko) 2006-07-13
JP4065932B2 (ja) 2008-03-26
DE69732310T2 (de) 2005-12-22
EP1009729B1 (en) 2005-01-19
KR20010013585A (ko) 2001-02-26
DE69732310D1 (de) 2005-02-24

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