KR100597970B1 - 할로겐화 아크릴레이트 및 이로부터 유도된 중합체 - Google Patents
할로겐화 아크릴레이트 및 이로부터 유도된 중합체 Download PDFInfo
- Publication number
- KR100597970B1 KR100597970B1 KR1019997011592A KR19997011592A KR100597970B1 KR 100597970 B1 KR100597970 B1 KR 100597970B1 KR 1019997011592 A KR1019997011592 A KR 1019997011592A KR 19997011592 A KR19997011592 A KR 19997011592A KR 100597970 B1 KR100597970 B1 KR 100597970B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- groups
- halogenated
- acrylate
- aliphatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 CC1=C(*)C(*)NC(*)C1* Chemical compound CC1=C(*)C(*)NC(*)C1* 0.000 description 8
- GLFFWCMHBLZSEA-UHFFFAOYSA-N Cc([nH]c(C)c1O)c1O Chemical compound Cc([nH]c(C)c1O)c1O GLFFWCMHBLZSEA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/62—Oxygen or sulfur atoms
- C07D213/63—One oxygen atom
- C07D213/64—One oxygen atom attached in position 2 or 6
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
- C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/62—Halogen-containing esters
- C07C69/65—Halogen-containing esters of unsaturated acids
- C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/38—Esters containing sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pyridine Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/872,235 | 1997-06-10 | ||
| US08/872,235 US6005137A (en) | 1997-06-10 | 1997-06-10 | Halogenated acrylates and polymers derived therefrom |
| PCT/US1997/017437 WO1998056749A1 (en) | 1997-06-10 | 1997-09-29 | Halogenated acrylates and polymers derived therefrom |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20010013585A KR20010013585A (ko) | 2001-02-26 |
| KR100597970B1 true KR100597970B1 (ko) | 2006-07-13 |
Family
ID=25359127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019997011592A Expired - Fee Related KR100597970B1 (ko) | 1997-06-10 | 1997-09-29 | 할로겐화 아크릴레이트 및 이로부터 유도된 중합체 |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US6005137A (https=) |
| EP (1) | EP1009729B1 (https=) |
| JP (1) | JP4065932B2 (https=) |
| KR (1) | KR100597970B1 (https=) |
| CN (1) | CN1125030C (https=) |
| AU (1) | AU4739297A (https=) |
| DE (1) | DE69732310T2 (https=) |
| WO (1) | WO1998056749A1 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101004984B1 (ko) * | 2007-08-03 | 2011-01-04 | 도오꾜오까고오교 가부시끼가이샤 | 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법 |
| KR20240056091A (ko) * | 2022-10-21 | 2024-04-30 | 주식회사 트리엘 | 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물 |
Families Citing this family (67)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6005137A (en) * | 1997-06-10 | 1999-12-21 | 3M Innovative Properties Company | Halogenated acrylates and polymers derived therefrom |
| US6555288B1 (en) | 1999-06-21 | 2003-04-29 | Corning Incorporated | Optical devices made from radiation curable fluorinated compositions |
| US6306563B1 (en) | 1999-06-21 | 2001-10-23 | Corning Inc. | Optical devices made from radiation curable fluorinated compositions |
| ATE433129T1 (de) * | 2000-06-15 | 2009-06-15 | 3M Innovative Properties Co | Mikroherstellungsverfahren für organische optische bauteile |
| US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US7014988B2 (en) | 2000-06-15 | 2006-03-21 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
| AU2001270320A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
| WO2001096958A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Process for producing microfluidic articles |
| DE60139620D1 (de) | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
| JP2004503928A (ja) | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 多方向光反応吸収方法 |
| US6514434B1 (en) | 2000-06-16 | 2003-02-04 | Corning Incorporated | Electro-optic chromophore bridge compounds and donor-bridge compounds for polymeric thin film waveguides |
| US6584266B1 (en) | 2000-06-16 | 2003-06-24 | Corning Incorporated | Chromophores for polymeric thin films and optical waveguides and devices comprising the same |
| US6444830B1 (en) | 2000-06-16 | 2002-09-03 | Corning Incorporated | Electron acceptors for polymeric thin film waveguide media |
| AU2001283381A1 (en) | 2000-08-18 | 2002-03-04 | 3M Innovative Properties Company | Fluoroalkyl (meth)acrylate copolymer coating compositions |
| CN1237395C (zh) * | 2000-12-27 | 2006-01-18 | 三井化学株式会社 | 薄膜和薄膜的制造方法以及薄膜用粘合剂 |
| US6929899B2 (en) | 2001-01-25 | 2005-08-16 | E. I. Du Pont De Nemours And Company | Fluorinated photopolymer composition and waveguide device |
| US7078445B2 (en) * | 2001-02-01 | 2006-07-18 | E. I. Du Pont De Nemours And Company | Photosensitive acrylate composition and waveguide device |
| US6689844B2 (en) * | 2001-05-29 | 2004-02-10 | Rohmax Additives Gmbh | Process for synthesis of polymer compositions with reduced halogen content, polymer composition with reduced halogen content as well as use of this composition |
| US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
| DE10257711B4 (de) * | 2001-12-27 | 2019-09-26 | Merck Patent Gmbh | Polymerisierbare monocyclische Verbindungen enthaltende Flüssigkristallmischungen |
| WO2003066693A1 (en) * | 2002-02-04 | 2003-08-14 | Ciba Specialty Chemicals Holding Inc. | Fluorinated photoinitiators in highly fluorinated monomers |
| JP4222120B2 (ja) * | 2002-10-07 | 2009-02-12 | Jsr株式会社 | 光導波路形成用感光性樹脂組成物および光導波路 |
| BR0315969B1 (pt) * | 2002-11-01 | 2013-03-19 | processo para preparaÇço de 1,3-propanodiol. | |
| JP2004240122A (ja) * | 2003-02-05 | 2004-08-26 | Fuji Photo Film Co Ltd | プラスチック光ファイバケーブルおよび製造方法 |
| US20060056031A1 (en) * | 2004-09-10 | 2006-03-16 | Capaldo Kevin P | Brightness enhancement film, and methods of making and using the same |
| US6833391B1 (en) | 2003-05-27 | 2004-12-21 | General Electric Company | Curable (meth)acrylate compositions |
| TWI254717B (en) * | 2003-08-06 | 2006-05-11 | Chung Shan Inst Of Science | Method for the preparation of pentafluorophenylacrylate polymer |
| US7271283B2 (en) * | 2003-08-29 | 2007-09-18 | General Electric Company | High refractive index, UV-curable monomers and coating compositions prepared therefrom |
| JP2005140909A (ja) * | 2003-11-05 | 2005-06-02 | Omron Corp | 光学部品 |
| KR101129883B1 (ko) * | 2004-05-26 | 2012-03-28 | 제이에스알 가부시끼가이샤 | 미세 패턴 형성용 수지 조성물 및 미세 패턴 형성 방법 |
| US7341784B2 (en) * | 2004-09-10 | 2008-03-11 | General Electric Company | Light management film and its preparation and use |
| WO2006032017A1 (en) * | 2004-09-14 | 2006-03-23 | E.I. Dupont De Nemours And Company | Polymeric optical waveguide |
| US20080287624A1 (en) * | 2004-09-14 | 2008-11-20 | Maria Petrucci-Samija | Process for Preparing an Optical Organic Polymer |
| US20080293903A1 (en) * | 2004-09-14 | 2008-11-27 | Maria Petrucci-Samija | Optical Organic Polymer |
| US7264872B2 (en) * | 2004-12-30 | 2007-09-04 | 3M Innovative Properties Company | Durable high index nanocomposites for AR coatings |
| US7491441B2 (en) * | 2004-12-30 | 2009-02-17 | 3M Innovative Properties Company | High refractive index, durable hard coats |
| US7297810B2 (en) * | 2004-12-30 | 2007-11-20 | 3M Innovative Properties Company | High refractive index monomers for optical applications |
| US7231127B2 (en) * | 2005-01-21 | 2007-06-12 | Lumera Corporation | Waveguide devices with low loss clads and tunable refractive indices |
| US7262230B2 (en) * | 2005-01-21 | 2007-08-28 | Lumera Corporation | Process of preparing crosslinked, low loss polymers with tunable refractive indices |
| US8435610B2 (en) * | 2006-05-05 | 2013-05-07 | Japan Science And Technology Agency | Copolymer of (meth)acrylic ester, composition, optical element and electric member |
| US8791254B2 (en) * | 2006-05-19 | 2014-07-29 | 3M Innovative Properties Company | Cyclic hydrofluoroether compounds and processes for their preparation and use |
| US8193397B2 (en) * | 2006-12-06 | 2012-06-05 | 3M Innovative Properties Company | Hydrofluoroether compounds and processes for their preparation and use |
| US20080145545A1 (en) * | 2006-12-15 | 2008-06-19 | Bret Ja Chisholm | Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom |
| US20090015142A1 (en) | 2007-07-13 | 2009-01-15 | 3M Innovative Properties Company | Light extraction film for organic light emitting diode display devices |
| US8179034B2 (en) | 2007-07-13 | 2012-05-15 | 3M Innovative Properties Company | Light extraction film for organic light emitting diode display and lighting devices |
| JP5150327B2 (ja) * | 2007-08-03 | 2013-02-20 | 東京応化工業株式会社 | 液浸露光用レジスト組成物およびレジストパターン形成方法 |
| JP2009098658A (ja) * | 2007-09-25 | 2009-05-07 | Fujifilm Corp | 光学フィルム、偏光板、及び画像表示装置 |
| JP5303142B2 (ja) * | 2007-11-30 | 2013-10-02 | 東京応化工業株式会社 | 含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法 |
| US7981986B2 (en) * | 2008-04-29 | 2011-07-19 | 3M Innovative Properties Company | Optical films comprising fluorenol (meth)acrylate monomer |
| US20090275720A1 (en) * | 2008-04-30 | 2009-11-05 | 3M Innovative Properties Company | Ortho-benzylphenol mono(meth)acrylate monomers suitable for microstructured optical films |
| US7957621B2 (en) | 2008-12-17 | 2011-06-07 | 3M Innovative Properties Company | Light extraction film with nanoparticle coatings |
| TWI503334B (zh) * | 2009-02-19 | 2015-10-11 | Jsr Corp | 聚合物及敏輻射線性組成物、及單體 |
| EP2596082B1 (de) * | 2010-07-22 | 2015-11-04 | Merck Patent GmbH | Polymerstabilisierte flüssigkristallmedien und anzeigen |
| US9182662B2 (en) * | 2012-02-15 | 2015-11-10 | Rohm And Haas Electronic Materials Llc | Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom |
| US20160109625A1 (en) * | 2014-10-21 | 2016-04-21 | Saint-Gobain Performance Plastics Corporation | Support for a flexible oled |
| CN107250097B (zh) * | 2015-02-16 | 2020-08-07 | 中央硝子株式会社 | 含氟α-酮羧酸酯类的实用制造方法 |
| KR102330028B1 (ko) | 2016-05-27 | 2021-11-24 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 개선된 색 균일도를 갖는 oled 디스플레이 |
| US10756306B2 (en) | 2016-10-28 | 2020-08-25 | 3M Innovative Properties Company | Nanostructured article |
| KR101965194B1 (ko) * | 2017-07-12 | 2019-04-03 | 이화여자대학교 산학협력단 | 불소계 모노머 및 올리고머 화합물, 광중합형 조성물, 및 이들을 이용한 소수성 필름 |
| KR20200133803A (ko) | 2018-04-18 | 2020-11-30 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 색보정 구성요소를 갖는 유기 발광 다이오드 디스플레이 및 이의 제조 방법 |
| CN109534968B (zh) * | 2018-11-15 | 2022-07-08 | 广东广山新材料股份有限公司 | 一种不饱和氟碳化合物及其制备方法和应用 |
| WO2020212777A1 (en) | 2019-04-18 | 2020-10-22 | 3M Innovative Properties Company | Organic light emitting diode display with color-correction component |
| CN114391188A (zh) | 2019-09-18 | 2022-04-22 | 3M创新有限公司 | 包括纳米结构化表面和封闭空隙的制品及其制备方法 |
| CN115956405A (zh) | 2020-08-28 | 2023-04-11 | 3M创新有限公司 | 包括纳米结构化表面和封闭空隙的制品、其制备方法和光学元件 |
| JP7829336B2 (ja) * | 2022-01-27 | 2026-03-13 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、及び、化合物 |
| CN117233999B (zh) * | 2023-09-12 | 2026-04-03 | 北京科技大学 | 一种低驱动电压的电控调光膜及其制备方法 |
| KR102784676B1 (ko) * | 2024-01-17 | 2025-03-21 | 주식회사 트리엘 | 대면적 코팅을 위한 잉크젯용 포토레지스트 조성물 및 이의 제조방법 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL283387A (https=) * | 1961-09-20 | |||
| US3981928A (en) * | 1962-10-30 | 1976-09-21 | Minnesota Mining And Manufacturing Company | Perfluorotertiaryalkyl ethers |
| US3321515A (en) * | 1963-04-24 | 1967-05-23 | Du Pont | Method of making fluorinated carbonyl compounds |
| US3520863A (en) * | 1965-06-24 | 1970-07-21 | Allied Chem | Novel acrylic monomers,polymers and intermediates |
| US3723507A (en) * | 1965-06-24 | 1973-03-27 | Allied Chem | Perfluoro cycloalkyl acrylates |
| US3544535A (en) * | 1965-07-26 | 1970-12-01 | Allied Chem | Novel carbinol and derivatives thereof |
| US3513203A (en) * | 1966-07-11 | 1970-05-19 | Montedison Spa | Fluorinated ketones and process for their preparation |
| FR1547223A (fr) * | 1966-12-17 | 1968-11-22 | Dynamit Nobel Ag | Procédé de préparation d'esters phényliques |
| US4010212A (en) * | 1970-04-13 | 1977-03-01 | Minnesota Mining And Manufacturing Company | Perfluorotertiaryalkyl ethers |
| US3668223A (en) * | 1970-08-19 | 1972-06-06 | Merck & Co Inc | 2-oxo-3-benzoxepins |
| JPS5023019B1 (https=) * | 1970-12-14 | 1975-08-05 | ||
| US5132455A (en) * | 1982-03-31 | 1992-07-21 | Exfluor Research Corporation | Method for synthesizing perfluorinated ether compounds via polyesters |
| DE3678146D1 (de) * | 1985-12-25 | 1991-04-18 | Tosoh Corp | Halogen enthaltende polyacrylat-derivate. |
| DE3620050A1 (de) * | 1986-06-14 | 1987-12-17 | Hoechst Ag | Substituierte (alpha)-fluoracrylsaeurephenylester |
| US5045397A (en) * | 1987-02-13 | 1991-09-03 | Hughes Aircraft Company | Optical adhesive system having low refractive index |
| DE3707923A1 (de) * | 1987-03-12 | 1988-09-22 | Hoechst Ag | Transparente thermoplastische formmasse |
| FR2623510B1 (fr) * | 1987-11-20 | 1992-10-23 | Ecole Nale Superieure Chimie | Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques |
| US5236919A (en) | 1989-02-28 | 1993-08-17 | Imperial Chemical Industries Plc | Quinoxalinyl derivatives suitable for use in leukotriene mediated disease |
| JP2854669B2 (ja) * | 1990-04-27 | 1999-02-03 | 株式会社 日立製作所 | 光伝送体とそれを用いた光伝送システムおよびエンジンの制御システム |
| US5136117A (en) | 1990-08-23 | 1992-08-04 | Battelle Memorial Institute | Monomeric recovery from polymeric materials |
| US5384374A (en) * | 1991-01-11 | 1995-01-24 | Minnesota Mining And Manufacturing Company | Curing fluorocarbon elastomers |
| US5223593A (en) * | 1991-08-08 | 1993-06-29 | Minnesota Mining And Manufacturing Company | Fluorine containing plastic optical fiber cores |
| DE59306756D1 (de) * | 1992-03-07 | 1997-07-24 | Minnesota Mining & Mfg | Verfahren zum Herstellen von Bauelementen für Lichtwellenleiternetze und nach diesem Verfahren hergestellte Bauelemente |
| US5420359A (en) * | 1992-12-11 | 1995-05-30 | Minnesota Mining And Manufacturing Company | Chlorofluoroether compositions and preparation thereof |
| US5350497A (en) * | 1993-05-21 | 1994-09-27 | E. I. Du Pont De Nemours And Company | Production of perfluoro(alkyl vinyl ethers) |
| US5343544A (en) * | 1993-07-02 | 1994-08-30 | Minnesota Mining And Manufacturing Company | Integrated optical fiber coupler and method of making same |
| US5466877A (en) * | 1994-03-15 | 1995-11-14 | Minnesota Mining And Manufacturing Company | Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones |
| US6005137A (en) * | 1997-06-10 | 1999-12-21 | 3M Innovative Properties Company | Halogenated acrylates and polymers derived therefrom |
-
1997
- 1997-06-10 US US08/872,235 patent/US6005137A/en not_active Expired - Fee Related
- 1997-09-29 AU AU47392/97A patent/AU4739297A/en not_active Abandoned
- 1997-09-29 CN CN97182296A patent/CN1125030C/zh not_active Expired - Fee Related
- 1997-09-29 DE DE69732310T patent/DE69732310T2/de not_active Expired - Lifetime
- 1997-09-29 WO PCT/US1997/017437 patent/WO1998056749A1/en not_active Ceased
- 1997-09-29 KR KR1019997011592A patent/KR100597970B1/ko not_active Expired - Fee Related
- 1997-09-29 JP JP50235299A patent/JP4065932B2/ja not_active Expired - Fee Related
- 1997-09-29 EP EP97909884A patent/EP1009729B1/en not_active Expired - Lifetime
-
1999
- 1999-08-23 US US09/379,156 patent/US6313245B1/en not_active Expired - Fee Related
- 1999-08-24 US US09/382,300 patent/US6288266B1/en not_active Expired - Fee Related
-
2001
- 2001-05-01 US US09/846,739 patent/US6362379B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101004984B1 (ko) * | 2007-08-03 | 2011-01-04 | 도오꾜오까고오교 가부시끼가이샤 | 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법 |
| KR20240056091A (ko) * | 2022-10-21 | 2024-04-30 | 주식회사 트리엘 | 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물 |
| KR102898751B1 (ko) * | 2022-10-21 | 2025-12-11 | 주식회사 트리엘 | 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1998056749A1 (en) | 1998-12-17 |
| CN1125030C (zh) | 2003-10-22 |
| CN1259932A (zh) | 2000-07-12 |
| US6005137A (en) | 1999-12-21 |
| JP2002514259A (ja) | 2002-05-14 |
| US6288266B1 (en) | 2001-09-11 |
| AU4739297A (en) | 1998-12-30 |
| US6313245B1 (en) | 2001-11-06 |
| US20010037028A1 (en) | 2001-11-01 |
| US6362379B2 (en) | 2002-03-26 |
| EP1009729A1 (en) | 2000-06-21 |
| JP4065932B2 (ja) | 2008-03-26 |
| DE69732310T2 (de) | 2005-12-22 |
| EP1009729B1 (en) | 2005-01-19 |
| KR20010013585A (ko) | 2001-02-26 |
| DE69732310D1 (de) | 2005-02-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100597970B1 (ko) | 할로겐화 아크릴레이트 및 이로부터 유도된 중합체 | |
| EP0975577A1 (en) | Photocurable halofluorinated acrylates | |
| US6533959B2 (en) | Brominated materials | |
| US6133472A (en) | Fluorinated oxyvinyl compounds and methods of preparing and using same | |
| FI70701C (fi) | Acetylacetoxyalkyl-allyl-etrar foer anvaendning vid polymerisation eller kopolymerisation foerfarande foer framstaellning av dessa och anvaendning av dessa | |
| US6466730B2 (en) | Radiation curable fluorinated vinyl ethers derived from hexafluoropene | |
| EP1440961B1 (en) | Fluorine-containing diene compounds, fluoropolymers and processes for production of both | |
| KR100590637B1 (ko) | 브롬화 재료 | |
| EP1081145A1 (en) | Polymerizable sulfur-containing (meth)acrylate, polymerizable composition and optical lens | |
| KR20010012342A (ko) | 굴절율이 높은 단량체 | |
| US3632641A (en) | Process for making perfluoroalkylacetic acid | |
| WO2006082845A1 (ja) | 硬化性組成物およびそれを硬化してなる光学部材 | |
| KR100665760B1 (ko) | 불소함유 노르보넨에스테르의 제조방법 및 상기제조방법에 의해 제조된 불소함유 노르보넨에스테르 | |
| Guo et al. | Preparation and characterization of acrylates and polyacrylates having variable fluorine contents and distributions | |
| US4594458A (en) | Vinyl ether monomers derived from alkyl perfluoro-ω-(2-iodoethoxy) compounds | |
| WO2006032020A1 (en) | Optical organic polymer | |
| US6891071B2 (en) | Halogenated styrene compounds and very low-loss polymers made therefrom | |
| KR100644237B1 (ko) | 신규 불소치환 폴리(아릴렌에테르포스핀옥사이드) 중합체 및 그 제조방법 | |
| KR19980018494A (ko) | (메트)아크릴산 에스테르로부터 얻어진 폴리(메트)아크릴레이트 및 할로겐화 (메트)아크릴산 에스테르의 제조방법 | |
| US4531011A (en) | Alkyl perfluoro-omega-(2-iodoethoxy) compounds and vinyl ethers therefrom | |
| US20080287624A1 (en) | Process for Preparing an Optical Organic Polymer | |
| JPH07179384A (ja) | 新規含フッ素フェノール誘導体及びその製造法 | |
| JP2001233815A (ja) | 含フッ素ビニルエーテル化合物、含フッ素ビニルエーテル化合物重合体、および含フッ素ビニルエーテル化合物の製造方法 | |
| JPH0251415B2 (https=) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20090701 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20090701 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |