KR100597970B1 - 할로겐화 아크릴레이트 및 이로부터 유도된 중합체 - Google Patents

할로겐화 아크릴레이트 및 이로부터 유도된 중합체 Download PDF

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KR100597970B1
KR100597970B1 KR1019997011592A KR19997011592A KR100597970B1 KR 100597970 B1 KR100597970 B1 KR 100597970B1 KR 1019997011592 A KR1019997011592 A KR 1019997011592A KR 19997011592 A KR19997011592 A KR 19997011592A KR 100597970 B1 KR100597970 B1 KR 100597970B1
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groups
halogenated
acrylate
aliphatic
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Korean (ko)
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KR20010013585A (ko
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무어조지쥐아이
맥코믹프레드비
채토라지미타
크로스엘리사엠
리우전강야콥
로버츠랄프알
슐츠제이에프
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미네소타 마이닝 앤드 매뉴팩춰링 캄파니
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62Oxygen or sulfur atoms
    • C07D213/63One oxygen atom
    • C07D213/64One oxygen atom attached in position 2 or 6
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/455Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62Halogen-containing esters
    • C07C69/65Halogen-containing esters of unsaturated acids
    • C07C69/653Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/22Esters containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/38Esters containing sulfur

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)
KR1019997011592A 1997-06-10 1997-09-29 할로겐화 아크릴레이트 및 이로부터 유도된 중합체 Expired - Fee Related KR100597970B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/872,235 1997-06-10
US08/872,235 US6005137A (en) 1997-06-10 1997-06-10 Halogenated acrylates and polymers derived therefrom
PCT/US1997/017437 WO1998056749A1 (en) 1997-06-10 1997-09-29 Halogenated acrylates and polymers derived therefrom

Publications (2)

Publication Number Publication Date
KR20010013585A KR20010013585A (ko) 2001-02-26
KR100597970B1 true KR100597970B1 (ko) 2006-07-13

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KR1019997011592A Expired - Fee Related KR100597970B1 (ko) 1997-06-10 1997-09-29 할로겐화 아크릴레이트 및 이로부터 유도된 중합체

Country Status (8)

Country Link
US (4) US6005137A (https=)
EP (1) EP1009729B1 (https=)
JP (1) JP4065932B2 (https=)
KR (1) KR100597970B1 (https=)
CN (1) CN1125030C (https=)
AU (1) AU4739297A (https=)
DE (1) DE69732310T2 (https=)
WO (1) WO1998056749A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
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KR101004984B1 (ko) * 2007-08-03 2011-01-04 도오꾜오까고오교 가부시끼가이샤 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법
KR20240056091A (ko) * 2022-10-21 2024-04-30 주식회사 트리엘 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
US6555288B1 (en) 1999-06-21 2003-04-29 Corning Incorporated Optical devices made from radiation curable fluorinated compositions
US6306563B1 (en) 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
ATE433129T1 (de) * 2000-06-15 2009-06-15 3M Innovative Properties Co Mikroherstellungsverfahren für organische optische bauteile
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
US7014988B2 (en) 2000-06-15 2006-03-21 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
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DE60139620D1 (de) 2000-06-15 2009-10-01 3M Innovative Properties Co Methode und gerät zur erzielung wiederholter multiphotonabsorption
JP2004503928A (ja) 2000-06-15 2004-02-05 スリーエム イノベイティブ プロパティズ カンパニー 多方向光反応吸収方法
US6514434B1 (en) 2000-06-16 2003-02-04 Corning Incorporated Electro-optic chromophore bridge compounds and donor-bridge compounds for polymeric thin film waveguides
US6584266B1 (en) 2000-06-16 2003-06-24 Corning Incorporated Chromophores for polymeric thin films and optical waveguides and devices comprising the same
US6444830B1 (en) 2000-06-16 2002-09-03 Corning Incorporated Electron acceptors for polymeric thin film waveguide media
AU2001283381A1 (en) 2000-08-18 2002-03-04 3M Innovative Properties Company Fluoroalkyl (meth)acrylate copolymer coating compositions
CN1237395C (zh) * 2000-12-27 2006-01-18 三井化学株式会社 薄膜和薄膜的制造方法以及薄膜用粘合剂
US6929899B2 (en) 2001-01-25 2005-08-16 E. I. Du Pont De Nemours And Company Fluorinated photopolymer composition and waveguide device
US7078445B2 (en) * 2001-02-01 2006-07-18 E. I. Du Pont De Nemours And Company Photosensitive acrylate composition and waveguide device
US6689844B2 (en) * 2001-05-29 2004-02-10 Rohmax Additives Gmbh Process for synthesis of polymer compositions with reduced halogen content, polymer composition with reduced halogen content as well as use of this composition
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
DE10257711B4 (de) * 2001-12-27 2019-09-26 Merck Patent Gmbh Polymerisierbare monocyclische Verbindungen enthaltende Flüssigkristallmischungen
WO2003066693A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4222120B2 (ja) * 2002-10-07 2009-02-12 Jsr株式会社 光導波路形成用感光性樹脂組成物および光導波路
BR0315969B1 (pt) * 2002-11-01 2013-03-19 processo para preparaÇço de 1,3-propanodiol.
JP2004240122A (ja) * 2003-02-05 2004-08-26 Fuji Photo Film Co Ltd プラスチック光ファイバケーブルおよび製造方法
US20060056031A1 (en) * 2004-09-10 2006-03-16 Capaldo Kevin P Brightness enhancement film, and methods of making and using the same
US6833391B1 (en) 2003-05-27 2004-12-21 General Electric Company Curable (meth)acrylate compositions
TWI254717B (en) * 2003-08-06 2006-05-11 Chung Shan Inst Of Science Method for the preparation of pentafluorophenylacrylate polymer
US7271283B2 (en) * 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom
JP2005140909A (ja) * 2003-11-05 2005-06-02 Omron Corp 光学部品
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US20080287624A1 (en) * 2004-09-14 2008-11-20 Maria Petrucci-Samija Process for Preparing an Optical Organic Polymer
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KR102784676B1 (ko) * 2024-01-17 2025-03-21 주식회사 트리엘 대면적 코팅을 위한 잉크젯용 포토레지스트 조성물 및 이의 제조방법

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL283387A (https=) * 1961-09-20
US3981928A (en) * 1962-10-30 1976-09-21 Minnesota Mining And Manufacturing Company Perfluorotertiaryalkyl ethers
US3321515A (en) * 1963-04-24 1967-05-23 Du Pont Method of making fluorinated carbonyl compounds
US3520863A (en) * 1965-06-24 1970-07-21 Allied Chem Novel acrylic monomers,polymers and intermediates
US3723507A (en) * 1965-06-24 1973-03-27 Allied Chem Perfluoro cycloalkyl acrylates
US3544535A (en) * 1965-07-26 1970-12-01 Allied Chem Novel carbinol and derivatives thereof
US3513203A (en) * 1966-07-11 1970-05-19 Montedison Spa Fluorinated ketones and process for their preparation
FR1547223A (fr) * 1966-12-17 1968-11-22 Dynamit Nobel Ag Procédé de préparation d'esters phényliques
US4010212A (en) * 1970-04-13 1977-03-01 Minnesota Mining And Manufacturing Company Perfluorotertiaryalkyl ethers
US3668223A (en) * 1970-08-19 1972-06-06 Merck & Co Inc 2-oxo-3-benzoxepins
JPS5023019B1 (https=) * 1970-12-14 1975-08-05
US5132455A (en) * 1982-03-31 1992-07-21 Exfluor Research Corporation Method for synthesizing perfluorinated ether compounds via polyesters
DE3678146D1 (de) * 1985-12-25 1991-04-18 Tosoh Corp Halogen enthaltende polyacrylat-derivate.
DE3620050A1 (de) * 1986-06-14 1987-12-17 Hoechst Ag Substituierte (alpha)-fluoracrylsaeurephenylester
US5045397A (en) * 1987-02-13 1991-09-03 Hughes Aircraft Company Optical adhesive system having low refractive index
DE3707923A1 (de) * 1987-03-12 1988-09-22 Hoechst Ag Transparente thermoplastische formmasse
FR2623510B1 (fr) * 1987-11-20 1992-10-23 Ecole Nale Superieure Chimie Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques
US5236919A (en) 1989-02-28 1993-08-17 Imperial Chemical Industries Plc Quinoxalinyl derivatives suitable for use in leukotriene mediated disease
JP2854669B2 (ja) * 1990-04-27 1999-02-03 株式会社 日立製作所 光伝送体とそれを用いた光伝送システムおよびエンジンの制御システム
US5136117A (en) 1990-08-23 1992-08-04 Battelle Memorial Institute Monomeric recovery from polymeric materials
US5384374A (en) * 1991-01-11 1995-01-24 Minnesota Mining And Manufacturing Company Curing fluorocarbon elastomers
US5223593A (en) * 1991-08-08 1993-06-29 Minnesota Mining And Manufacturing Company Fluorine containing plastic optical fiber cores
DE59306756D1 (de) * 1992-03-07 1997-07-24 Minnesota Mining & Mfg Verfahren zum Herstellen von Bauelementen für Lichtwellenleiternetze und nach diesem Verfahren hergestellte Bauelemente
US5420359A (en) * 1992-12-11 1995-05-30 Minnesota Mining And Manufacturing Company Chlorofluoroether compositions and preparation thereof
US5350497A (en) * 1993-05-21 1994-09-27 E. I. Du Pont De Nemours And Company Production of perfluoro(alkyl vinyl ethers)
US5343544A (en) * 1993-07-02 1994-08-30 Minnesota Mining And Manufacturing Company Integrated optical fiber coupler and method of making same
US5466877A (en) * 1994-03-15 1995-11-14 Minnesota Mining And Manufacturing Company Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101004984B1 (ko) * 2007-08-03 2011-01-04 도오꾜오까고오교 가부시끼가이샤 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법
KR20240056091A (ko) * 2022-10-21 2024-04-30 주식회사 트리엘 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물
KR102898751B1 (ko) * 2022-10-21 2025-12-11 주식회사 트리엘 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물

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WO1998056749A1 (en) 1998-12-17
CN1125030C (zh) 2003-10-22
CN1259932A (zh) 2000-07-12
US6005137A (en) 1999-12-21
JP2002514259A (ja) 2002-05-14
US6288266B1 (en) 2001-09-11
AU4739297A (en) 1998-12-30
US6313245B1 (en) 2001-11-06
US20010037028A1 (en) 2001-11-01
US6362379B2 (en) 2002-03-26
EP1009729A1 (en) 2000-06-21
JP4065932B2 (ja) 2008-03-26
DE69732310T2 (de) 2005-12-22
EP1009729B1 (en) 2005-01-19
KR20010013585A (ko) 2001-02-26
DE69732310D1 (de) 2005-02-24

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