CN107868946B - 气体导入机构和处理装置 - Google Patents
气体导入机构和处理装置 Download PDFInfo
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Abstract
提供一种能够控制对基板实施的处理的面内分布的气体导入机构和处理装置。气体导入机构是为了在处理容器内使用预定的气体对基板实施预定的处理而设于所述处理容器的,具有:歧管,其配置于所述处理容器的下端部,具有:喷射器支承部,其沿着所述处理容器的内壁面上下延伸,并且具有喷射器能够插入且能够外嵌支承该喷射器的插入孔;气体导入部,其从所述喷射器支承部向外侧伸出,在内部具有将所述插入孔和所述处理容器的外部连通而气体可流通的气体流路;喷射器,其插入所述插入孔,沿着所述内壁面整体呈直线状延伸,并且,在插入到所述插入孔的部位具有与所述气体流路连通的开口;旋转机构,其与所述喷射器的下端部连接,使所述喷射器旋转。
Description
技术领域
本发明涉及气体导入机构和处理装置。
背景技术
公知有一种批量式的基板处理装置,能够在处理容器内以将多个基板呈多层保持于基板保持器具的状态下对多个基板进行成膜处理等(参照例如专利文献1)。
在该批量式的基板处理装置中,在处理容器的侧壁形成有气体流路,通过在气体流路的处理容器侧插入具有L字形状的喷射器的水平部分,成为喷射器固定于处理容器的构造。另外,在喷射器的垂直部分,沿着基板所层叠的方向(铅垂方向)设有多个气体喷出口。
现有技术文献
专利文献
专利文献1:日本特许第5284182号公报
发明内容
发明要解决的问题
然而,在上述的基板处理装置中,喷射器固定于处理容器,因此,喷出气体的方向恒定,存在无法充分地控制在基板成膜的膜的特性的面内分布的情况。
因此,在本发明的一形态中,其目的在于提供一种能够对在基板实施的处理的面内分布进行控制的气体导入机构。
用于解决问题的方案
为了达成上述目的,本发明的一形态的气体导入机构是为了在处理容器内使用预定的气体来对基板实施预定的处理而设于所述处理容器的气体导入机构,其具有:歧管,其配置于所述处理容器的下端部,其具有:喷射器支承部,其沿着所述处理容器的内壁面上下延伸,并且,具有喷射器能够插入且能够外嵌支承该喷射器的插入孔;气体导入部,其从所述喷射器支承部向外侧伸出,在内部具有将所述插入孔和所述处理容器的外部连通而气体能够流通的气体流路;喷射器,其插入所述插入孔,沿着所述内壁面整体呈直线状延伸,并且,在插入到所述插入孔的部位具有与所述气体流路连通的开口;旋转机构,其与所述喷射器的下端部连接,使所述喷射器旋转。
发明的效果
根据公开的基板处理装置,能够控制对基板实施的处理的面内分布。
附图说明
图1是一实施方式的处理装置的概略图。
图2是用于说明图1的处理装置的喷射器的横剖视图。
图3是例示图1的处理装置的气体导入机构的图(1)。
图4是用于说明图3的气体导入机构的内部构造的图。
图5是例示图1的处理装置的气体导入机构的图(2)。
图6是例示图1的处理装置的气体导入机构的图(3)。
图7是例示图1的处理装置的气体导入机构的图(4)。
图8是用于说明从喷射器的气孔喷出的气体的朝向的图。
图9是用于说明在晶圆形成的膜的膜厚的面内分布的图。
附图标记说明
10、处理容器;80、晶圆舟皿;90、歧管;91、喷射器支承部;95、气体导入部;96、气体流路;110、喷射器;111、气孔;112、开口;121、气体配管;200、旋转机构;210、气缸;220、连杆机构;300、旋转机构;310、马达;320、蜗轮蜗杆机构;400、旋转机构;410、气缸;420、齿轮齿条机构;500、旋转机构;510、马达;520、旋转轴。
具体实施方式
以下,参照附图对用于实施本发明的方式进行说明。此外,在本说明书和附图中,通过对实质上相同的结构标注相同的附图标记,省略重复的说明。
(处理装置)
对本发明的一实施方式的处理装置进行说明。在一实施方式中,举例说明对基板进行热处理的处理装置,但处理对象、处理内容并没有特别限定,可适用于将气体向处理容器内供给而进行处理的各种处理装置。
图1是一实施方式的处理装置的概略图。
如图1所示,处理装置具有能收容半导体晶圆(以下称为“晶圆W”。)的处理容器10。处理容器10由耐热性较高的石英成形为大致圆筒体状,在顶部具有排气口11。处理容器10构成为沿着铅垂(上下)方向延伸的立式的形状。在例如要处理的晶圆W的直径是300mm的情况下,处理容器10的直径设定为350mm~450mm程度的范围。
在处理容器10的顶部的排气口11连接有气体排气口20。气体排气口20由从例如排气口11延伸而呈直角弯曲成L字形状的石英管构成。
在气体排气口20连接有对处理容器10内的气氛进行排气的真空排气系统30。具体而言,真空排气系统30具有与气体排气口20连结的由例如不锈钢形成的金属制的气体排气管31。另外,在气体排气管31的中途依次夹设有开闭阀32、碟形阀等压力调整阀33和真空泵34,一边对处理容器10内的压力进行调整,一边能够抽真空。此外,气体排气口20的内径设定成与气体排气管31的内径相同。
在处理容器10的侧部以包围处理容器10的方式设有加热部件40,能对收容于处理容器10的晶圆W进行加热。加热部件40被分割成例如多个区域,由可从铅垂方向上侧朝向下侧独立地控制发热量的多个加热器(未图示)构成。此外,也可以是,加热部件40未被分割成多个区域,而由1个加热器构成。另外,在加热部件40的外周设有绝热材料50,确保热的稳定性。
处理容器10的下端部开口,能够输入、输出晶圆W。成为处理容器10的下端部的开口被盖体60进行开闭的结构。
在比盖体60靠上方的位置设有晶圆舟皿80。晶圆舟皿80是用于保持晶圆W的基板保持器具,构成为能沿着铅垂方向以使多个晶圆W分开的状态进行保持。晶圆舟皿80所保持的晶圆W的张数并没有特别限定,能够设为例如50张~150张。
晶圆舟皿80隔着由石英形成的保温筒75载置于台74上。台74支承于贯通对处理容器10的下端开口部进行开闭的盖体60的旋转轴72的上端部。旋转轴72的贯通部夹设有例如磁性流体密封73,以气密地密封了的状态将旋转轴72支承成可旋转。另外,在盖体60的周边部与处理容器10的下端部夹设有例如O形密封圈等密封构件61,保持处理容器10内的密封性。
旋转轴72安装于支承到例如舟皿升降机等升降机构70的臂71的顶端,能够使晶圆舟皿80和盖体60等一体地升降。此外,也可以是,将台74向盖体60侧固定地设置,不使晶圆舟皿80旋转,而进行晶圆W的处理。
在处理容器10的下端部配置有歧管90,该歧管90具有沿着处理容器10的内周壁延伸的部分,并且具有朝向半径方向的外方延伸的凸缘状的部分。并且,借助歧管90从处理容器10的下端部向处理容器10内导入需要的气体。歧管90由与处理容器10独立的零部件构成,但也可以设置成,与处理容器10的侧壁一体地设置,构成处理容器10的侧壁的一部分。此外,随后叙述歧管90的详细的结构。
歧管90支承喷射器110。喷射器110是用于向处理容器10内供给气体的管状构件,由例如石英形成。喷射器110被设置成在处理容器10的内部沿着铅垂方向延伸。在喷射器110沿着长度方向以预定间隔形成有多个气孔111,能够从气孔111朝向水平方向喷出气体。
图2是用于说明图1的处理装置的喷射器的横剖视图。图2的(a)表示原点位置处的喷射器110的状态。另外,图2的(b)表示从原点位置向左旋转了预定的角度θ1的位置处的喷射器110的状态,图2的(c)表示从原点位置向右旋转了预定的角度θ2的位置处的喷射器110的状态。
喷射器110与随后叙述的旋转机构连接,能够利用旋转机构的动作向左旋转和向右旋转。具体而言,也可以是,喷射器110能够从如图2的(a)所示气孔111朝向处理容器10的中心的位置向如图2的(b)所示向左旋转到角度θ1的位置。另外,也可以是,如图2的(c)所示,喷射器110能够向右旋转到角度θ2的位置。并且,通过以从喷射器110的气孔111朝向水平方向喷出气体的状态使喷射器110旋转,能够控制对晶圆W实施的处理的面内分布。
再次参照图1,喷射器110与气体供给系统120连接,以便向喷射器110供给气体。气体供给系统120具有与喷射器110连通的由金属、例如不锈钢形成的气体配管121。另外,在气体配管121的中途依次夹设有质量流量控制器等流量控制器123和开闭阀122,能够一边对处理气体的流量进行控制一边供给处理气体。晶圆W的处理所需要的其他需要的处理气体也经由同样地构成的气体供给系统120和歧管90供给。
处理容器10的下端部的歧管90的周边部被由例如不锈钢形成的底座130支承,利用底座130支承处理容器10的载荷。底座130的下方成为具有未图示的晶圆移载机构的晶圆移载室,成为大致大气压的氮气气氛。另外,底座130的上方成为洁净室的清洁的空气的气氛。
(气体导入机构)
接着,对本发明的一实施方式的处理装置的气体导入机构进行说明。图3是例示图1的处理装置的气体导入机构的图。图4是用于说明图3的气体导入机构的内部构造的分解立体图。
如图3和图4所示,气体导入机构具有歧管90、喷射器110、旋转机构200、以及气体配管121。
歧管90具有喷射器支承部91和气体导入部95。
喷射器支承部91是沿着处理容器10的内壁面在铅垂方向上延伸的部分,支承喷射器110。喷射器支承部91具有供喷射器110的下端插入、且能外嵌支承喷射器110的下端的插入孔92。
气体导入部95是从喷射器支承部91向半径方向的外侧伸出而暴露于处理容器10的外侧的部分,具有将插入孔92和处理容器10的外部连通而供气体流通的气体流路96。气体配管121与气体流路96的外侧端部连接,构成为能供给来自外部的气体。
喷射器110插入喷射器支承部91的插入孔92,沿着处理容器10的内壁面整体呈直线状延伸,并且在插入到插入孔92的部位具有与气体流路96连通的开口112。开口112形成为例如以水平方向为长轴、以铅垂方向为短轴的大致椭圆形状。由此,即使是喷射器110旋转了的情况下,也可以从气体流路96向喷射器110高效地供给气体。
歧管90由例如金属形成。出于防止金属污染的观点考虑,优选处理容器10和构成处理容器10的零部件基本上由石英形成,但存在复杂的形状、与螺钉等之间的螺纹连接的部位不得不由金属形成。本发明的一实施方式的处理装置的歧管90也由金属形成,但喷射器110不设为L字形状,设为棒形状。并且,通过在歧管90的气体导入部95内形成水平地延伸的气体流路96,在喷射器110形成与气体流路96连通的开口112,从而在喷射器110没有厚壁的水平部分。由此,歧管90的气体导入部95无需收容喷射器110的厚壁的水平部分,因此,能够减薄歧管90的气体导入部95的壁厚,降低高度而使金属污染减少。此外,形成歧管90的金属也可以是不锈钢、铝、哈斯特洛伊合金等耐蚀性金属材料。
旋转机构200与喷射器110的下端部连接,使喷射器110以其长度方向为中心轴线旋转。具体而言,旋转机构200具有气缸210和连杆机构220,利用连杆机构220将由气缸210产生的直线运动(往复运动)转换成旋转运动而向喷射器110传递。
气缸210具有缸部211、杆部212、以及电磁阀213。杆部212的一部分收容于缸部211。通过由电磁阀213控制的空气向缸部211供给,杆部212沿着缸部211和杆部212的轴向(图3中的左右方向)往复运动。此外,也可以使用液压缸来替代气缸210。
连杆机构220具有连接杆221、波纹管222、保持架223、连杆部224、垫圈225、以及保持螺栓226。
连接杆221具有棒形状,在被波纹管222维持了气密性的状态下插入歧管90内。连接杆221的一端与气缸210的杆部212连接。由此,通过杆部212沿着缸部211和杆部212的轴向往复运动,连接杆221与杆部212一起沿着缸部211和杆部212的轴向(连接杆221的轴向)往复运动。此外,也可以使用磁性流体密封来替代波纹管222。
保持架223借助连杆部224与连接杆221连接。由此,若连接杆221沿着其轴向往复运动,则保持架223向左旋转或向右旋转(图3(b)中的以箭头表示的方向)。具体而言,通过连接杆221向右方向运动,保持架223向左旋转,通过连接杆221向左方向运动,保持架223向右旋转。如图4所示,在保持架223形成有开口部223a。开口部223a以开口径从保持架223的上表面侧朝向下表面侧逐级变小的方式在整个周向上形成有台阶部223b。在台阶部223b的上表面形成有突起部223c,在喷射器110的下端部形成的未图示的凹部能与突起部223c嵌合。由此,保持架223以喷射器110不相对于保持架223沿着周向旋转的方式保持喷射器110。并且,若保持架223旋转运动,则喷射器110与保持架223成为一体而旋转运动。另外,保持架223隔着垫圈225被保持螺栓226保持成旋转自由。
接着,基于图5对气体导入机构的另一个例子进行说明。图5是例示图1的处理装置的气体导入机构的图。
图5所示的气体导入机构在利用具有马达310和蜗轮蜗杆机构320的旋转机构300使喷射器110旋转这点与图4所示的气体导入机构不同。此外,对于其他结构,是与图4所示的气体导入机构同样的结构。以下,存在对与图4所示的气体导入机构同样的结构省略说明的情况。
如图5所示,旋转机构300与喷射器110的下端部连接,使喷射器110以其长度方向为中心轴线旋转。具体而言,旋转机构300具有马达310和蜗轮蜗杆机构320,利用蜗轮蜗杆机构320将由马达310产生的旋转运动的旋转方向和旋转速度进行转换而向喷射器110传递。
马达310是例如直流(DC)马达。
蜗轮蜗杆机构320具有旋转轴321、磁性流体密封部322、蜗杆323、蜗轮324、垫圈325、以及保持螺栓326。
旋转轴321具有棒形状,在被磁性流体密封部322维持了气密性的状态下插入歧管90内。旋转轴321的一端与马达310连接。由此,通过马达310动作而旋转轴321旋转。此外,也可以使用波纹管来替代磁性流体密封部322。
蜗杆323固定于旋转轴321的顶端。由此,若旋转轴321旋转,则蜗杆323与旋转轴321成为一体而旋转。
蜗轮324与蜗杆323啮合,且能正反旋转。由此,若蜗杆323旋转,则蜗轮324与蜗杆323的旋转方向相对应向左旋转或向右旋转(图5(b)中的以箭头所示的方向)。蜗轮324以喷射器110不相对于蜗轮324沿着周向旋转的方式保持喷射器110。由此,若蜗轮324旋转运动,则喷射器110与蜗轮324成为一体而旋转运动。另外,蜗轮324隔着垫圈325被保持螺栓326保持成旋转自由。
接着,基于图6对气体导入机构的另一个例子进行说明。图6是例示图1的处理装置的气体导入机构的图。
图6所示的气体导入机构在利用具有气缸410和齿轮齿条机构420的旋转机构400使喷射器110旋转这点与图4所示的气体导入机构不同。此外,对于其他结构,是与图4所示的气体导入机构同样的结构。以下,存在对与图4所示的气体导入机构同样的结构省略说明的情况。
如图6所示,旋转机构400与喷射器110的下端部连接,使喷射器110以其长度方向为中心轴线旋转。具体而言,旋转机构400具有气缸410和齿轮齿条机构420,利用齿轮齿条机构420将由气缸410产生的直线运动转换成旋转运动而向喷射器110传递。
气缸410具有缸部411、杆部412、以及电磁阀413。杆部412的一部分收容于缸部411。通过由电磁阀413控制的空气向缸部411供给,杆部412沿着缸部411和杆部412的轴向(图6中的左右方向)往复运动。此外,也可以使用液压缸来替代气缸410。
齿轮齿条机构420具有驱动轴421、波纹管422、齿条423、小齿轮424、垫圈425、以及保持螺栓426。
驱动轴421具有棒形状,在被波纹管422维持了气密性的状态下插入歧管90内。驱动轴421的一端与气缸410的杆部412连接。由此,通过杆部412沿着缸部411和杆部412的轴向往复运动,驱动轴421与杆部412一起沿着缸部411和杆部412的轴向(驱动轴421的轴向)往复运动。此外,也可以使用磁性流体密封来替代波纹管422。
齿条423固定于驱动轴421的顶端。由此,若驱动轴421往复运动,则齿条423与旋转轴321成为一体而往复运动。此外,齿条423也可以与驱动轴421形成为一体。
小齿轮424与齿条423啮合,且能正反旋转。由此,若齿条423往复运动,则小齿轮424与齿条423的往复运动相对应地向左旋转或向右旋转(图6的(b)中的以箭头所示的方向)。小齿轮424以喷射器110不相对于小齿轮424沿着周向旋转的方式保持喷射器110。由此,若小齿轮424旋转运动,则喷射器110与小齿轮424成为一体而旋转运动。另外,小齿轮424隔着垫圈425被保持螺栓426保持成旋转自由。
接着,基于图7对气体导入机构的另一个例子进行说明。图7是例示图1的处理装置的气体导入机构的图。
图7所示的气体导入机构在利用具有马达510和旋转轴520的旋转机构500使喷射器110旋转这点与图4所示的气体导入机构不同。此外,对于其他结构,是与图4所示的气体导入机构同样的结构。以下,存在对与图4所示的气体导入机构同样的结构省略说明的情况。
如图7所示,旋转机构500与喷射器110的下端部连接,使喷射器110以其长度方向为中心轴线旋转。具体而言,旋转机构500具有马达510和旋转轴520,利用旋转轴520将由马达510产生的旋转运动向喷射器110传递。
马达510是例如DC马达。
旋转轴520具有棒形状,在被磁性流体密封部521维持了气密性的状态下从盖体60的下方贯通盖体60而借助连接构件522与喷射器110的下端部连接。由此,通过马达510动作而旋转轴520旋转。此外,也可以使用波纹管来替代磁性流体密封部521。另外,连接构件522隔着垫圈523被保持螺栓524保持成旋转自由。
(实施例)
接着,对使从喷射器110的气孔111喷出的气体的朝向(喷出角度)变化了时的、在晶圆W的表面形成的膜的膜厚的面内分布进行说明。
图8是用于说明从喷射器的气孔喷出的气体的朝向的图。图9是用于说明在晶圆形成的膜的膜厚的面内分布的图。在图9中,横轴表示通过晶圆W的中心的径向的位置(mm),纵轴表示晶圆W的径向上的与最小膜厚之差(以下称为“膜厚差值”。)另外,圆标记表示喷出角度是0°的情况,四方标记表示喷出角度是15°的情况,三角标记表示喷出角度是30°的情况。
如图9所示,可知:通过使在第2喷射器110b形成的气孔111b的角度变化,在晶圆W形成的膜的膜厚分布变化。具体而言,在喷出角度是0°和15°的情况下,晶圆W的中心位置(0mm)处的膜厚差值是而在喷出角度是30°的情况下,晶圆W的中心位置处的膜厚差值是左右。即、可知:在喷出角度是30°的情况下,与喷出角度是0°和15°的情况相比较,晶圆W的面内的膜厚分布变小。
此外,如图8的(a)所示,“喷出角度是0°”是指如下条件:在将从第1喷射器110a的气孔111a喷出的气体的喷出角度设为朝向晶圆W的旋转中心C的角度的状态下喷出二氯甲硅烷(DCS)气体。此时,未从第2喷射器110b的气孔111b供给气体。
另外,如图8的(b)所示,“喷出角度是15°”是指如下条件:在将从第1喷射器110a的气孔111a喷出的气体的喷出角度设为朝向晶圆W的旋转中心C的角度的状态下喷出DCS气体,在将从第2喷射器110b的气孔111b喷出的气体的喷出角度从朝向晶圆W的旋转中心C的角度向右旋转了15°的状态下喷出DCS气体。
而且,如图8的(c)所示,“喷出角度是30°”是指如下条件:在将从第1喷射器110a的气孔111a喷出的气体的喷出角度设为朝向晶圆W的旋转中心C的角度的状态下喷出DCS气体,在将从第2喷射器110b的气孔111b喷出的气体的喷出角度从朝向晶圆W的旋转中心C的角度向右旋转了30°的状态下喷出DCS气体。
如此,通过使气体的喷出角度变化,能够对在晶圆W的表面形成的膜的膜厚的面内分布进行控制。
以上,对用于实施本发明的方式进行了说明,但上述内容不是用于限定发明的内容,能够在本发明的范围内进行各种变形和改良。
在上述的实施方式中,列举喷射器110是一个或两个的情况为例进行了说明,但并不限定于此,也可以设有三个以上的喷射器110。另外,在喷射器110是多个的情况下,至少多个喷射器110中的一个设置成可旋转即可,其他喷射器110也可以固定于歧管。另外,也可以是,多个喷射器110的全部设置成可旋转。另外,也可以是,不是限定喷射器110相对于晶圆W的装载方向的喷出范围,利用多个喷射器110在每个区域改变气体的喷出角度。
Claims (8)
1.一种气体导入机构,其是为了在处理容器内使用预定的气体来对基板实施预定的处理而设于所述处理容器的,该气体导入机构具有:
歧管,其配置于所述处理容器的下端部,具有:喷射器支承部,其沿着所述处理容器的内壁面上下延伸,并且,具有喷射器能够插入且能够外嵌支承该喷射器的插入孔;气体导入部,其从所述喷射器支承部向外侧伸出,在内部具有将所述插入孔和所述处理容器的外部连通而气体能够流通的气体流路;
所述喷射器,其插入所述插入孔,沿着所述内壁面整体呈直线状延伸,并且,在插入到所述插入孔的部位具有与所述气体流路连通的开口;
旋转机构,其与所述喷射器的下端部连接,使所述喷射器旋转,
其中,所述开口形成为以水平方向为长轴、以铅垂方向为短轴的椭圆形状,
在所述喷射器沿着长度方向形成有多个气孔,
所述旋转机构被配置为能够将所述多个气孔从朝向所述处理容器的中心的位置向左旋转第1规定角度,并且能够将所述多个气孔从朝向所述处理容器的中心的位置向右旋转第2规定角度。
2.根据权利要求1所述的气体导入机构,其中,
所述旋转机构具有:
连杆机构,其与所述喷射器的下端部连接;
缸,其与所述连杆机构连接,驱动所述连杆机构。
3.根据权利要求1所述的气体导入机构,其中,
所述旋转机构具有:
蜗轮蜗杆机构,其与所述喷射器的下端部连接;
马达,其与所述蜗轮蜗杆机构连接,驱动所述蜗轮蜗杆机构。
4.根据权利要求1所述的气体导入机构,其中,
所述旋转机构具有:
齿轮齿条,其与所述喷射器的下端部连接,
缸,其与所述齿轮齿条连接,驱动所述齿轮齿条。
5.根据权利要求1所述的气体导入机构,其中,
所述旋转机构具有:
旋转轴,其与所述喷射器的下端部连接;
马达,其与所述旋转轴连接,使所述旋转轴旋转。
6.根据权利要求1~5中任一项所述的气体导入机构,其中,
所述处理容器和所述喷射器由石英形成,
所述歧管由金属形成。
7.一种处理装置,其具有:
处理容器;
歧管,其配置于所述处理容器的下端部,具有:喷射器支承部,其沿着所述处理容器的内壁面上下延伸,并且具有喷射器能够插入且能够外嵌支承该喷射器的插入孔;气体导入部,其从所述喷射器支承部向外侧伸出,在内部具有将所述插入孔和所述处理容器的外部连通而气体能够流通的气体流路;
所述喷射器,其插入所述插入孔,沿着所述内壁面整体呈直线状延伸,并且在插入到所述插入孔的部位具有与所述气体流路连通的开口;
旋转机构,其与所述喷射器的下端部连接,使所述喷射器旋转,
所述开口形成为以水平方向为长轴、以铅垂方向为短轴的椭圆形状,
在所述喷射器沿着长度方向形成有多个气孔,
所述旋转机构被配置为能够将所述多个气孔从朝向所述处理容器的中心的位置向左旋转第1规定角度,并且能够将所述多个气孔从朝向所述处理容器的中心的位置向右旋转第2规定角度。
8.根据权利要求7所述的处理装置,其中,
所述处理容器具有能够收容基板保持器具的大致圆筒体状,该基板保持器具能够沿着铅垂方向以使多个基板分开的状态保持该多个基板。
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CN107868946A (zh) | 2018-04-03 |
US20180087156A1 (en) | 2018-03-29 |
TWI697956B (zh) | 2020-07-01 |
TW201818469A (zh) | 2018-05-16 |
KR102228321B1 (ko) | 2021-03-15 |
KR20180034253A (ko) | 2018-04-04 |
JP2018056232A (ja) | 2018-04-05 |
JP6710134B2 (ja) | 2020-06-17 |
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