CN105758203B - 热处理装置 - Google Patents

热处理装置 Download PDF

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Publication number
CN105758203B
CN105758203B CN201610228229.XA CN201610228229A CN105758203B CN 105758203 B CN105758203 B CN 105758203B CN 201610228229 A CN201610228229 A CN 201610228229A CN 105758203 B CN105758203 B CN 105758203B
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CN
China
Prior art keywords
control device
thermoelectric conversion
heat treatment
heat
power supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610228229.XA
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English (en)
Chinese (zh)
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CN105758203A (zh
Inventor
向井正行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JTEKT Thermo Systems Corp
Original Assignee
Koyo Thermo Systems Co Ltd
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Filing date
Publication date
Application filed by Koyo Thermo Systems Co Ltd filed Critical Koyo Thermo Systems Co Ltd
Publication of CN105758203A publication Critical patent/CN105758203A/zh
Application granted granted Critical
Publication of CN105758203B publication Critical patent/CN105758203B/zh
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D17/00—Arrangements for using waste heat; Arrangements for using, or disposing of, waste gases
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
    • H10N10/13—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects characterised by the heat-exchanging means at the junction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Furnace Details (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201610228229.XA 2012-10-05 2013-02-28 热处理装置 Active CN105758203B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP2012-222863 2012-10-05
JP2012222863A JP5951438B2 (ja) 2012-10-05 2012-10-05 熱処理装置
CN201310064393.8A CN103712465B (zh) 2012-10-05 2013-02-28 热处理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201310064393.8A Division CN103712465B (zh) 2012-10-05 2013-02-28 热处理装置

Publications (2)

Publication Number Publication Date
CN105758203A CN105758203A (zh) 2016-07-13
CN105758203B true CN105758203B (zh) 2019-01-01

Family

ID=50405637

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201610228229.XA Active CN105758203B (zh) 2012-10-05 2013-02-28 热处理装置
CN201310064393.8A Active CN103712465B (zh) 2012-10-05 2013-02-28 热处理装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201310064393.8A Active CN103712465B (zh) 2012-10-05 2013-02-28 热处理装置

Country Status (4)

Country Link
JP (1) JP5951438B2 (enExample)
KR (1) KR101429387B1 (enExample)
CN (2) CN105758203B (enExample)
TW (1) TWI492309B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6442339B2 (ja) * 2015-03-26 2018-12-19 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法
JP6498060B2 (ja) * 2015-07-01 2019-04-10 中外炉工業株式会社 工業炉の制御方法
KR102295852B1 (ko) * 2018-06-21 2021-08-31 한국전기연구원 다기능 축열 열전하이브리드 발전장치
JP6925377B2 (ja) * 2019-03-12 2021-08-25 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法およびプログラム
CN111706843B (zh) * 2020-07-01 2021-01-15 海南鸣川智能科技有限公司 一种可将热能进行多级回收利用的船舶用尾气处理装置
JP2022049287A (ja) * 2020-09-16 2022-03-29 高砂工業株式会社 熱処理炉および熱処理設備

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102593936A (zh) * 2012-02-20 2012-07-18 海尔集团公司 一种太阳能与市电互补式制冷供电系统

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0545067A (ja) * 1991-08-08 1993-02-23 Toshiba Corp 溶解炉装置
JPH06154589A (ja) * 1992-11-20 1994-06-03 Kubota Corp エネルギー回収型の断熱容器
JP2000068183A (ja) * 1998-08-19 2000-03-03 Dainippon Screen Mfg Co Ltd 基板加熱処理装置ならびに基板加熱処理装置の熱エネルギー変換方法および熱エネルギー回収方法
JP4178746B2 (ja) * 2000-12-04 2008-11-12 株式会社Ｉｈｉ 工業炉用熱電発電装置
JP4742431B2 (ja) 2001-02-27 2011-08-10 東京エレクトロン株式会社 熱処理装置
JP3856293B2 (ja) * 2001-10-17 2006-12-13 日本碍子株式会社 加熱装置
JP2004350479A (ja) * 2003-05-26 2004-12-09 Hitachi Powdered Metals Co Ltd 熱電変換発電ユニットおよびこの熱電変換発電ユニットを備えるトンネル型炉
JP4661235B2 (ja) * 2005-01-27 2011-03-30 株式会社Ihi 熱電変換装置
JP4808425B2 (ja) 2005-03-22 2011-11-02 光洋サーモシステム株式会社 熱処理装置
JP5087875B2 (ja) * 2006-07-31 2012-12-05 株式会社Ｉｈｉ 熱処理装置
JP5040213B2 (ja) * 2006-08-15 2012-10-03 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
US8260166B2 (en) * 2007-05-24 2012-09-04 Ricoh Company, Limited Image forming apparatus and electric appliance including a thermoelectric element
CN101650068B (zh) * 2008-08-12 2012-05-02 广东万和新电气股份有限公司 带有热电转换装置自供电的强排燃气热水器
CN201561547U (zh) * 2009-05-04 2010-08-25 广州市红日燃具有限公司 一种带自供电装置的燃气热水器
JP2011129827A (ja) 2009-12-21 2011-06-30 Sharp Corp 太陽電池システム
US20130048045A1 (en) * 2010-03-10 2013-02-28 Bhp Billiton Aluminium Technologies Limited Heat recovery system for pyrometallurgical vessel using thermoelectric/thermomagnetic devices
JP3160926U (ja) * 2010-03-30 2010-07-15 東京エレクトロン株式会社 熱処理装置
JP2013201830A (ja) * 2012-03-26 2013-10-03 Toshiba Corp プラントの非常用電力供給装置及び方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102593936A (zh) * 2012-02-20 2012-07-18 海尔集团公司 一种太阳能与市电互补式制冷供电系统

Also Published As

Publication number Publication date
CN105758203A (zh) 2016-07-13
KR20140044723A (ko) 2014-04-15
CN103712465B (zh) 2016-04-20
KR101429387B1 (ko) 2014-08-11
TW201415556A (zh) 2014-04-16
CN103712465A (zh) 2014-04-09
JP5951438B2 (ja) 2016-07-13
TWI492309B (zh) 2015-07-11
JP2014074559A (ja) 2014-04-24

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