CN101584052A - 发光器件中的电流分配 - Google Patents

发光器件中的电流分配 Download PDF

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CN101584052A
CN101584052A CNA2007800410644A CN200780041064A CN101584052A CN 101584052 A CN101584052 A CN 101584052A CN A2007800410644 A CNA2007800410644 A CN A2007800410644A CN 200780041064 A CN200780041064 A CN 200780041064A CN 101584052 A CN101584052 A CN 101584052A
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light emission
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袁述
林世鸣
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Tinggi Technologies Pte Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0016Processes relating to electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate

Abstract

本发明公开了一种发光器件,包括:多个外延层,其包含有源层;反射层和欧姆接触中的至少一者,其处于所述外延层的第一侧;传导金属层,其处于所述外延层的第二侧,并具有光发射表面。端子处于所述光发射表面上。所述端子包含用于将电流分散开并且使得其对于光输出的影响最小化的阵列。所述阵列可以包含焊盘、外部部分以及连接所述焊盘和所述外部部分的接合部分;所述外部部分和所述接合部分用于电流分散。

Description

发光器件中的电流分配
技术领域
本发明涉及发光器件中的电流分配,具体而言(但非排他地)涉及用于分布电流以使得光输出最大化的设备。
相关申请的引用
参考我们早先的新加坡专利申请20506301-1(2005年9月29日递交),其内容通过引用被包含在本文中,并应视为其全部内容被在此公开。
背景技术
在例如发光二极管和激光二极管的大多数发光器件中,焊盘占据发光表面的表面积的大约15%。在焊盘所在位置,不能发光。
并且,因为电流从焊盘流到有源区域,并且将沿最小阻抗的路径(在均一材料中,通常是最短的路径)流动,所以最大电流量(因此最大光输出)处于焊盘下方。这导致光输出显著减小。
发明内容
根据第一优选的方面,提供了一种发光器件,包括:多个外延层,其包含有源层;反射层和欧姆接触中的至少一者,其处于所述外延层的第一侧;传导金属层,其处于所述外延层的第二侧,并具有光发射表面。端子处于所述光发射表面上。所述端子包含用于将电流分散开并且使得其对于光输出的影响最小化的阵列。
所述阵列可以包含焊盘、外部部分以及连接所述焊盘和所述外部部分的接合部分;所述外部部分和所述接合部分用于电流分散。所述外部部分可以处于所述光发射表面的周边或邻近所述光发射表面的周边。所述接合部分可以包括多个连接所述焊盘和所述外部部分的辐条。
在所述阵列和所述光发射表面之间可以存在第二反射层。或者,第二反射层可以处于所述光发射表面中的沟槽的底部。
根据第二优选的方面,提供了一种用于制作发光器件的方法。所述发光器件具有:包含有源层的多个外延层;处于所述外延层的第一侧的反射层;以及处于所述外延层的第二侧的传导金属。所述方法包括在所述传导金属的光发射表面上形成端子,所述端子包含用于使电流分散开并且使得其对于光输出的影响最小化的阵列。
形成阵列可以通过形成焊盘、外部部分以及电连接所述焊盘和所述外部部分的接合部分来进行;所述外部部分和所述接合部分用于电流分散。所述外部部分可以处于所述光发射表面的周边或邻近所述光发射表面的周边。所述接合部分可以包括多个连接所述焊盘和所述外部部分的辐条。
所述方法还可以包括在所述光发射表面上形成第二反射层,然后在所述第二反射层上形成所述阵列。
或者,所述方法还可以包括在所述光发射表面中形成沟槽,在所述沟槽的底部形成第二反射层,所述阵列被形成在所述第二反射层上。
附图说明
为了全面理解本发明并且容易将本发明投入实用,现在将通过非限制性示例描述本发明的仅优选实施例,该描述将参考说明性的附图进行。
在附图中:
图1是发光器件的示意性侧视图;
图2是发光器件的优选实施例的示意性侧视图;
图3是图2的器件的静止全景图;
图4是沿图3上的截线并沿箭头4-4的方向的垂直剖视图;
图5是图4的沟道的放大视图;
图6是图5的布置的替代方案;
图7-图13是示出了图2-图4的器件的制造过程并与图4相对应的一系列视图。
具体实施方式
首先参考图1,图1示出了发光器件101,其例如为发光二极管或激光二极管,并且在包括有源区域102在内的多个外延层的第一侧具有反射层和/或欧姆接触103。传导金属层104处于外延层的第二侧上。反射层103可以处于外延层上,而欧姆接触可以处于反射层上,或欧姆接触可以处于外延层上,而反射层103可以处于欧姆接触上。也可以仅仅存在反射层和欧姆接触中的一个。焊盘105设置在光输出表面107上。电流在金属层104中通过如图1上的虚线所示的路径流到有源层102。如可以看到的,最大的电流集中在焊盘105下方。这意味着由有源层102发出的最大的光(如实线所示)也将集中在焊盘105下方。这样的光将被焊盘105反射回金属层104中。这显著减小了光输出。
图2-4示出了优选实施例,其中相似的标号被用于相似的部件,但是前缀数字“1”被变为“2”。在此,焊盘105被端子层215代替。
端子层215包括导电材料(优选与焊盘205相同的材料)的阵列214,阵列214与焊盘205和光输出表面207两者电连接。阵列214被分布在整个表面207上,使得电流将以散布或分布方式从端子层215流向有源区域202。
阵列214优选具有焊盘205作为其中心,因此阵列214的分布在表面207上较均匀。并且,较之焊盘205,阵列214优选具有较小的高度。
如图所示,阵列214包含处于表面207的周边或在表面207的周边邻近的外部部分206。这提供了在有源区域202的周边和邻近有源区域202的周边的光发射。将外部部分206和焊盘205电学并物理连接的是接合部分208,即在此情况下,从焊盘205延伸到外部部分206的四个等间隔的径向“辐条”。所有辐条208优选是相同的,并且更优选具有与外部部分206相同的高度和宽度。虽然以十字形状示出了四个辐条208,但是可以具有任意数量的辐条,例如1、2、3、4、5、6等。
在辐条208和外部部分206之间是光发射开口209,用于从光输出表面207的光发射。
外部部分206和/或每个辐条208或阵列214可以位于形成在光输出表面207中的沟槽211中。沟槽211在其底部213可以具有反射层212,使得由在阵列214下方的有源区域202传播的光将被反射层212更有效地反射。反射层212可以具有漫射表面,使得光将被以非垂直的角度从其反射。反射层212是导电的,以使得电流可以从阵列214通到有源区域202。反射层212优选具有与阵列214相同的处于表面207上的形状和尺寸。
如图6所示,可以不使用沟槽211,并且反射层212可以被直接施加到阵列214下方的光输出表面207。
图7-13示出了工艺过程。这些是相关申请的图11-17,并且是在原蓝宝石衬底4被去除之后的工艺步骤。
如图8所示,在去除蓝宝石衬底4之后,器件由沟槽彼此隔离,所述沟槽利用在刻蚀过程中保护n型GaN层3的区域的光刻胶层6(d)如图8-10所示沿着平顶的边缘从新暴露的表面13进行刻蚀而成。
或者,n型层3的最下方的表面13可以在与光刻胶12对齐的位置处被劈开,并且将多个管芯分离。这对于激光二极管是有利的,因为n型层3的暴露侧表面是基本平行的,由此导致大量的总内反射。这充当光放大系统,用于提高和定向光输出。
在SiO2层8、n型GaN层3的侧面和n型GaN层3的中心的暴露表面上施加第五光刻胶层6(e)之后进行盘刻蚀,由此形成n型GaN层3的凸起部分14和凹入部分15(图9(a)和9(b))。
光刻胶6(e)被去除,并且在n型GaN层3和SiO2层8的外周的暴露表面上施加又一光刻胶6(f),由此留下用于管芯分离的间隙16。进行穿过间隙16、SiO2层8、晶种层11的刻蚀(图10),直至厚的光刻胶12的末端被暴露。去除光刻胶6(f)。
在从SiO2层8的边缘一直到n型GaN层3的中心附近的整个暴露的下表面上施加最后的光刻胶层6(g),但是在n型GaN层3的中心保留中心间隙17(图11)。
然后,将n型金属的一个或多个层18的阵列214施加到光刻胶层6(g)上,其中在n型GaN层3的中心的间隙17处的层18被直接施加到GaN层3(图12)。附着有层18的光刻胶层6(g)被去除,留下附着到n型GaN层3的中心17(间隙17先前所在位置)的层18。
这样,晶种层11、10、9以及铜层9(a)充当用于提高光输出的反射器,而铜层9(a)作为一个端子,由此不会干扰光输出。第二端子是处于n型GaN层3上的阵列214方式的层18,并且其是处于层3的中心和/或该中心周围的阵列,由此使得其对光输出的影响最小化并增加了电流的分散。
尽管在前面的描述中已经描述了本发明的优选实施例,但是本领域技术人员应当理解,可以对设计或构造的细节进行许多变化或修改,而不脱离本发明的范围。

Claims (12)

1.一种发光器件,包括:
(a)多个外延层,其包含有源层;
(b)反射层和欧姆接触中的至少一者,其处于所述外延层的第一侧;
(c)传导金属层,其处于所述外延层的第二侧,并具有光发射表面;以及
(d)处于所述光发射表面上的端子,所述端子包含用于将电流分散开并且使得其对于光输出的影响最小化的阵列。
2.根据权利要求1所述的发光器件,其中所述阵列包含焊盘、外部部分以及连接所述焊盘和所述外部部分的接合部分,所述外部部分和所述接合部分用于电流分散。
3.根据权利要求2所述的发光器件,其中所述外部部分处于所述光发射表面的周边或邻近所述光发射表面的周边。
4.根据权利要求2或3所述的发光器件,其中所述接合部分包括多个连接所述焊盘和所述外部部分的辐条。
5.根据权利要求1至4中任一项所述的发光器件,其中在所述阵列和所述光发射表面之间存在第二反射层。
6.根据权利要求2至4中任一项所述的发光器件,其中所述第二反射层处于所述光发射表面中的沟槽的底部。
7.一种用于制作发光器件的方法,所述发光器件包括:包含有源层的多个外延层;处于所述外延层的第一侧的反射层;处于所述外延层的第二侧的传导金属,所述传导金属具有光发射表面,所述方法包括:
在所述传导金属的所述光发射表面上,形成端子,所述端子包含用于将电流分散开并且使得其对于光输出的影响最小化的阵列。
8.根据权利要求7所述的方法,其中通过形成焊盘、外部部分以及电连接所述焊盘和所述外部部分的接合部分,来形成所述阵列;所述外部部分和所述接合部分用于电流分散。
9.根据权利要求8所述的方法,其中所述外部部分处于所述光发射表面的周边或邻近所述光发射表面的周边。
10.根据权利要求8或9所述的方法,其中所述接合部分包括多个连接所述焊盘和所述外部部分的辐条。
11.根据权利要求7至10中任一项所述的方法,还包括在所述光发射表面上形成第二反射层,然后在所述第二反射层上形成所述阵列。
12.根据权利要求8至10中任一项所述的方法,还包括在所述光发射表面中形成沟槽,在所述沟槽的底部形成第二反射层,所述阵列被形成在所述第二反射层上。
CNA2007800410644A 2006-09-04 2007-09-04 发光器件中的电流分配 Pending CN101584052A (zh)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111987587A (zh) * 2019-05-21 2020-11-24 台湾积体电路制造股份有限公司 半导体芯片与垂直腔表面发射激光器装置及其形成方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003263727A1 (en) 2003-09-19 2005-04-11 Tinggi Technologies Private Limited Fabrication of semiconductor devices
WO2005088743A1 (en) 2004-03-15 2005-09-22 Tinggi Technologies Private Limited Fabrication of semiconductor devices
EP1756875A4 (en) 2004-04-07 2010-12-29 Tinggi Technologies Private Ltd FABRICATION OF A RETROFLECTIVE LAYER ON SEMICONDUCTOR ELECTROLUMINESCENT DIODES
SG130975A1 (en) 2005-09-29 2007-04-26 Tinggi Tech Private Ltd Fabrication of semiconductor devices for light emission
SG131803A1 (en) 2005-10-19 2007-05-28 Tinggi Tech Private Ltd Fabrication of transistors
SG133432A1 (en) 2005-12-20 2007-07-30 Tinggi Tech Private Ltd Localized annealing during semiconductor device fabrication
SG140473A1 (en) 2006-08-16 2008-03-28 Tinggi Tech Private Ltd Improvements in external light efficiency of light emitting diodes
TW200926440A (en) * 2007-12-12 2009-06-16 Advanced Optoelectronic Tech Light emitting diode and manufacturing method thereof
TWI412161B (zh) * 2009-11-06 2013-10-11 Semileds Optoelectronics Co 發光二極體裝置
JP2015038957A (ja) * 2013-07-16 2015-02-26 株式会社東芝 半導体装置及びその製造方法

Family Cites Families (130)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3848490A (en) 1973-11-02 1974-11-19 Gerber Garment Technology Inc Method and apparatus for controlling a cutting tool
US3897627A (en) 1974-06-28 1975-08-05 Rca Corp Method for manufacturing semiconductor devices
CA1027257A (en) 1974-10-29 1978-02-28 James A. Benjamin Overlay metallization field effect transistor
JPS5831751B2 (ja) 1975-10-31 1983-07-08 松下電器産業株式会社 半導体レ−ザの製造方法
JPS59112667A (ja) 1982-12-17 1984-06-29 Fujitsu Ltd 発光ダイオ−ド
JPS6395661A (ja) 1986-10-13 1988-04-26 Toshiba Corp 半導体素子電極
US5192987A (en) 1991-05-17 1993-03-09 Apa Optics, Inc. High electron mobility transistor with GaN/Alx Ga1-x N heterojunctions
US5405804A (en) 1993-01-22 1995-04-11 Kabushiki Kaisha Toshiba Method of manufacturing a semiconductor device by laser annealing a metal layer through an insulator
US5376580A (en) 1993-03-19 1994-12-27 Hewlett-Packard Company Wafer bonding of light emitting diode layers
US5654228A (en) 1995-03-17 1997-08-05 Motorola VCSEL having a self-aligned heat sink and method of making
JP3511970B2 (ja) 1995-06-15 2004-03-29 日亜化学工業株式会社 窒化物半導体発光素子
FR2737342B1 (fr) 1995-07-25 1997-08-22 Thomson Csf Composant semiconducteur avec dissipateur thermique integre
KR0159388B1 (ko) 1995-09-30 1999-02-01 배순훈 평탄화 방법
JP2005260255A (ja) 1996-02-19 2005-09-22 Sharp Corp 化合物半導体装置及びその製造方法
US5811927A (en) 1996-06-21 1998-09-22 Motorola, Inc. Method for affixing spacers within a flat panel display
US6210479B1 (en) 1999-02-26 2001-04-03 International Business Machines Corporation Product and process for forming a semiconductor structure on a host substrate
US6784463B2 (en) 1997-06-03 2004-08-31 Lumileds Lighting U.S., Llc III-Phospide and III-Arsenide flip chip light-emitting devices
US6559038B2 (en) 1997-11-18 2003-05-06 Technologies And Devices International, Inc. Method for growing p-n heterojunction-based structures utilizing HVPE techniques
KR19990052640A (ko) 1997-12-23 1999-07-15 김효근 오믹접촉 형성을 이용한 다이오드용 금속박막및 그의 제조방법
US6071795A (en) 1998-01-23 2000-06-06 The Regents Of The University Of California Separation of thin films from transparent substrates by selective optical processing
US6091085A (en) 1998-02-19 2000-07-18 Agilent Technologies, Inc. GaN LEDs with improved output coupling efficiency
JP3144377B2 (ja) 1998-03-13 2001-03-12 日本電気株式会社 半導体装置の製造方法
DE19921987B4 (de) 1998-05-13 2007-05-16 Toyoda Gosei Kk Licht-Abstrahlende Halbleitervorrichtung mit Gruppe-III-Element-Nitrid-Verbindungen
JP3847477B2 (ja) 1998-12-17 2006-11-22 豊田合成株式会社 Iii族窒化物系化合物半導体発光素子
US6803243B2 (en) 2001-03-15 2004-10-12 Cree, Inc. Low temperature formation of backside ohmic contacts for vertical devices
JP3525061B2 (ja) 1998-09-25 2004-05-10 株式会社東芝 半導体発光素子の製造方法
US6307218B1 (en) * 1998-11-20 2001-10-23 Lumileds Lighting, U.S., Llc Electrode structures for light emitting devices
JP3739951B2 (ja) 1998-11-25 2006-01-25 東芝電子エンジニアリング株式会社 半導体発光素子およびその製造方法
JP3531722B2 (ja) 1998-12-28 2004-05-31 信越半導体株式会社 発光ダイオードの製造方法
US6744800B1 (en) 1998-12-30 2004-06-01 Xerox Corporation Method and structure for nitride based laser diode arrays on an insulating substrate
EP1039555A1 (en) 1999-03-05 2000-09-27 Toyoda Gosei Co., Ltd. Group III nitride compound semiconductor device
JP2000294837A (ja) 1999-04-05 2000-10-20 Stanley Electric Co Ltd 窒化ガリウム系化合物半導体発光素子
US6020261A (en) 1999-06-01 2000-02-01 Motorola, Inc. Process for forming high aspect ratio circuit features
GB9913950D0 (en) 1999-06-15 1999-08-18 Arima Optoelectronics Corp Unipolar light emitting devices based on iii-nitride semiconductor superlattices
JP4189710B2 (ja) 1999-07-16 2008-12-03 Dowaエレクトロニクス株式会社 発光ダイオードの製造方法
JP2001035974A (ja) 1999-07-19 2001-02-09 Nec Corp 半導体装置及びその製造方法
JP2001049491A (ja) 1999-08-04 2001-02-20 Fujitsu Ltd Cu電解めっき成膜方法
JP3633447B2 (ja) 1999-09-29 2005-03-30 豊田合成株式会社 Iii族窒化物系化合物半導体素子
US6492661B1 (en) 1999-11-04 2002-12-10 Fen-Ren Chien Light emitting semiconductor device having reflection layer structure
CA2393081C (en) 1999-12-03 2011-10-11 Cree Lighting Company Enhanced light extraction in leds through the use of internal and external optical elements
JP2001168094A (ja) 1999-12-06 2001-06-22 Murata Mfg Co Ltd 配線構造、配線形成方法及び半導体装置
US6514782B1 (en) 1999-12-22 2003-02-04 Lumileds Lighting, U.S., Llc Method of making a III-nitride light-emitting device with increased light generating capability
US6573537B1 (en) 1999-12-22 2003-06-03 Lumileds Lighting, U.S., Llc Highly reflective ohmic contacts to III-nitride flip-chip LEDs
JP4501225B2 (ja) 2000-02-21 2010-07-14 日亜化学工業株式会社 発光素子および発光素子の製造方法
JP2001237461A (ja) 2000-02-22 2001-08-31 Toshiba Corp 半導体発光素子
EP1139409A3 (en) 2000-02-29 2003-01-02 Agere Systems Guardian Corporation Selective laser anneal on semiconductor material
JP4060511B2 (ja) 2000-03-28 2008-03-12 パイオニア株式会社 窒化物半導体素子の分離方法
DE10051465A1 (de) 2000-10-17 2002-05-02 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Halbleiterbauelements auf GaN-Basis
US7319247B2 (en) 2000-04-26 2008-01-15 Osram Gmbh Light emitting-diode chip and a method for producing same
JP2002083999A (ja) 2000-06-21 2002-03-22 Sharp Corp 半導体発光素子
US6420732B1 (en) * 2000-06-26 2002-07-16 Luxnet Corporation Light emitting diode of improved current blocking and light extraction structure
US6661028B2 (en) 2000-08-01 2003-12-09 United Epitaxy Company, Ltd. Interface texturing for light-emitting device
TW456058B (en) 2000-08-10 2001-09-21 United Epitaxy Co Ltd Light emitting diode and the manufacturing method thereof
US6380564B1 (en) 2000-08-16 2002-04-30 United Epitaxy Company, Ltd. Semiconductor light emitting device
US6562648B1 (en) 2000-08-23 2003-05-13 Xerox Corporation Structure and method for separation and transfer of semiconductor thin films onto dissimilar substrate materials
TW466784B (en) 2000-09-19 2001-12-01 United Epitaxy Co Ltd Method to manufacture high luminescence LED by using glass pasting
TW475276B (en) 2000-11-07 2002-02-01 Ind Tech Res Inst GaN based III-V compound semiconductor light-emitting device
US6791119B2 (en) 2001-02-01 2004-09-14 Cree, Inc. Light emitting diodes including modifications for light extraction
JP3970530B2 (ja) 2001-02-19 2007-09-05 三菱電機株式会社 半導体装置およびその製造方法
US6956250B2 (en) 2001-02-23 2005-10-18 Nitronex Corporation Gallium nitride materials including thermally conductive regions
US6611002B2 (en) 2001-02-23 2003-08-26 Nitronex Corporation Gallium nitride material devices and methods including backside vias
CN1185720C (zh) 2001-03-05 2005-01-19 全新光电科技股份有限公司 一种镀有金属反射镜膜基板的发光二极管及其制造方法
US6468824B2 (en) 2001-03-22 2002-10-22 Uni Light Technology Inc. Method for forming a semiconductor device having a metallic substrate
EP1244139A2 (en) 2001-03-23 2002-09-25 Matsushita Electric Industrial Co., Ltd. Manufacturing method of semiconductor film
US6509270B1 (en) 2001-03-30 2003-01-21 Cypress Semiconductor Corp. Method for polishing a semiconductor topography
KR100482174B1 (ko) 2001-08-08 2005-04-13 삼성전기주식회사 기판제거 기술을 이용한 GaN계 LED 제작 방법
US20030064535A1 (en) 2001-09-28 2003-04-03 Kub Francis J. Method of manufacturing a semiconductor device having a thin GaN material directly bonded to an optimized substrate
JP4336071B2 (ja) 2001-11-08 2009-09-30 古河電気工業株式会社 放熱性に優れた半導体装置
US6784462B2 (en) * 2001-12-13 2004-08-31 Rensselaer Polytechnic Institute Light-emitting diode with planar omni-directional reflector
US6455340B1 (en) 2001-12-21 2002-09-24 Xerox Corporation Method of fabricating GaN semiconductor structures using laser-assisted epitaxial liftoff
JP3782357B2 (ja) 2002-01-18 2006-06-07 株式会社東芝 半導体発光素子の製造方法
JP2003243700A (ja) 2002-02-12 2003-08-29 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体発光素子
JP4242599B2 (ja) 2002-04-08 2009-03-25 パナソニック株式会社 窒化物半導体装置の製造方法及び窒化物半導体基板の製造方法
US8294172B2 (en) 2002-04-09 2012-10-23 Lg Electronics Inc. Method of fabricating vertical devices using a metal support film
US20030189215A1 (en) 2002-04-09 2003-10-09 Jong-Lam Lee Method of fabricating vertical structure leds
JP3896027B2 (ja) 2002-04-17 2007-03-22 シャープ株式会社 窒化物系半導体発光素子およびその製造方法
JP4233268B2 (ja) 2002-04-23 2009-03-04 シャープ株式会社 窒化物系半導体発光素子およびその製造方法
JP3962282B2 (ja) 2002-05-23 2007-08-22 松下電器産業株式会社 半導体装置の製造方法
JP3962283B2 (ja) 2002-05-29 2007-08-22 松下電器産業株式会社 半導体装置の製造方法
JP2004014938A (ja) 2002-06-10 2004-01-15 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
JP2004088083A (ja) 2002-06-25 2004-03-18 Matsushita Electric Ind Co Ltd 半導体発光素子、その製造方法及びその実装方法
TW540171B (en) 2002-07-18 2003-07-01 United Epitaxy Co Ltd Manufacturing method of high-power light emitting diode
JP2004072052A (ja) 2002-08-09 2004-03-04 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
US6649437B1 (en) 2002-08-20 2003-11-18 United Epitaxy Company, Ltd. Method of manufacturing high-power light emitting diodes
US20040104395A1 (en) 2002-11-28 2004-06-03 Shin-Etsu Handotai Co., Ltd. Light-emitting device, method of fabricating the same, and OHMIC electrode structure for semiconductor device
KR100495215B1 (ko) 2002-12-27 2005-06-14 삼성전기주식회사 수직구조 갈륨나이트라이드 발광다이오드 및 그 제조방법
US6825559B2 (en) 2003-01-02 2004-11-30 Cree, Inc. Group III nitride based flip-chip intergrated circuit and method for fabricating
JP4179539B2 (ja) 2003-01-15 2008-11-12 富士通株式会社 化合物半導体装置及びその製造方法
JP4492034B2 (ja) 2003-04-11 2010-06-30 日亜化学工業株式会社 Hemt及びその製造方法
JP5122817B2 (ja) 2003-05-09 2013-01-16 クリー インコーポレイテッド イオン・インプラント・アイソレーションによるled製作
US7244628B2 (en) 2003-05-22 2007-07-17 Matsushita Electric Industrial Co., Ltd. Method for fabricating semiconductor devices
JP4295669B2 (ja) 2003-05-22 2009-07-15 パナソニック株式会社 半導体素子の製造方法
KR100483049B1 (ko) 2003-06-03 2005-04-15 삼성전기주식회사 수직구조 질화갈륨계 발광다이오드의 제조방법
US6921924B2 (en) 2003-06-18 2005-07-26 United Epitaxy Company, Ltd Semiconductor light-emitting device
US6967346B2 (en) 2003-08-02 2005-11-22 Formosa Epitaxy Incorporation Light emitting diode structure and manufacture method thereof
US6958494B2 (en) 2003-08-14 2005-10-25 Dicon Fiberoptics, Inc. Light emitting diodes with current spreading layer
WO2005029572A1 (en) 2003-09-19 2005-03-31 Tinggi Technologies Private Limited Fabrication of conductive metal layer on semiconductor devices
AU2003263727A1 (en) 2003-09-19 2005-04-11 Tinggi Technologies Private Limited Fabrication of semiconductor devices
US6911376B2 (en) 2003-10-01 2005-06-28 Wafermasters Selective heating using flash anneal
WO2005062745A2 (en) 2003-10-10 2005-07-14 The Regents Of The University Of California GaN/AlGaN/GaN DISPERSION-FREE HIGH ELECTRON MOBILITY TRANSISTORS
TWI313071B (en) 2003-10-15 2009-08-01 Epistar Corporatio Light-emitting semiconductor device having enhanced brightness
US7119372B2 (en) * 2003-10-24 2006-10-10 Gelcore, Llc Flip-chip light emitting diode
US7012281B2 (en) * 2003-10-30 2006-03-14 Epistar Corporation Light emitting diode device and manufacturing method
WO2005064666A1 (en) 2003-12-09 2005-07-14 The Regents Of The University Of California Highly efficient gallium nitride based light emitting diodes via surface roughening
US7033912B2 (en) 2004-01-22 2006-04-25 Cree, Inc. Silicon carbide on diamond substrates and related devices and methods
JP4647216B2 (ja) 2004-02-19 2011-03-09 信越半導体株式会社 GaP発光素子の製造方法
WO2005088743A1 (en) 2004-03-15 2005-09-22 Tinggi Technologies Private Limited Fabrication of semiconductor devices
JP4955384B2 (ja) 2004-03-30 2012-06-20 日本電気株式会社 半導体装置
JP4356494B2 (ja) 2004-03-30 2009-11-04 株式会社デンソー 半導体装置
EP1756875A4 (en) 2004-04-07 2010-12-29 Tinggi Technologies Private Ltd FABRICATION OF A RETROFLECTIVE LAYER ON SEMICONDUCTOR ELECTROLUMINESCENT DIODES
KR101254539B1 (ko) 2004-04-28 2013-04-19 버티클 인코퍼레이티드 수직 구조 반도체 장치
US7791061B2 (en) 2004-05-18 2010-09-07 Cree, Inc. External extraction light emitting diode based upon crystallographic faceted surfaces
TWI433343B (zh) 2004-06-22 2014-04-01 Verticle Inc 具有改良光輸出的垂直構造半導體裝置
WO2006065010A1 (en) 2004-12-13 2006-06-22 Lg Chem, Ltd. METHOD FOR MANUFACTURING G a N-BASED LIGHT EMITTING DIODE USING LASER LIFT-OFF TECHNIQUE AND LIGHT EMITTING DIODE MANUFACTURED THEREBY
US7378288B2 (en) 2005-01-11 2008-05-27 Semileds Corporation Systems and methods for producing light emitting diode array
US20060154393A1 (en) 2005-01-11 2006-07-13 Doan Trung T Systems and methods for removing operating heat from a light emitting diode
US7195944B2 (en) 2005-01-11 2007-03-27 Semileds Corporation Systems and methods for producing white-light emitting diodes
US20060151801A1 (en) 2005-01-11 2006-07-13 Doan Trung T Light emitting diode with thermo-electric cooler
US7413918B2 (en) 2005-01-11 2008-08-19 Semileds Corporation Method of making a light emitting diode
US7186580B2 (en) 2005-01-11 2007-03-06 Semileds Corporation Light emitting diodes (LEDs) with improved light extraction by roughening
US7335920B2 (en) 2005-01-24 2008-02-26 Cree, Inc. LED with current confinement structure and surface roughening
EP1693891B1 (en) 2005-01-31 2019-07-31 IMEC vzw Method of manufacturing a semiconductor device
JP4980615B2 (ja) 2005-02-08 2012-07-18 ローム株式会社 半導体発光素子およびその製法
US7348212B2 (en) 2005-09-13 2008-03-25 Philips Lumileds Lighting Company Llc Interconnects for semiconductor light emitting devices
US20070029541A1 (en) 2005-08-04 2007-02-08 Huoping Xin High efficiency light emitting device
SG130975A1 (en) 2005-09-29 2007-04-26 Tinggi Tech Private Ltd Fabrication of semiconductor devices for light emission
SG131803A1 (en) 2005-10-19 2007-05-28 Tinggi Tech Private Ltd Fabrication of transistors
SG133432A1 (en) 2005-12-20 2007-07-30 Tinggi Tech Private Ltd Localized annealing during semiconductor device fabrication
US7413980B2 (en) 2006-04-25 2008-08-19 Texas Instruments Incorporated Semiconductor device with improved contact fuse
SG140473A1 (en) 2006-08-16 2008-03-28 Tinggi Tech Private Ltd Improvements in external light efficiency of light emitting diodes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111987587A (zh) * 2019-05-21 2020-11-24 台湾积体电路制造股份有限公司 半导体芯片与垂直腔表面发射激光器装置及其形成方法

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