CN100481505C - 半导体器件及其制造方法 - Google Patents
半导体器件及其制造方法 Download PDFInfo
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- CN100481505C CN100481505C CNB2006100930152A CN200610093015A CN100481505C CN 100481505 C CN100481505 C CN 100481505C CN B2006100930152 A CNB2006100930152 A CN B2006100930152A CN 200610093015 A CN200610093015 A CN 200610093015A CN 100481505 C CN100481505 C CN 100481505C
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 238000000034 method Methods 0.000 title claims description 18
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 32
- 229920005591 polysilicon Polymers 0.000 claims description 29
- 239000003870 refractory metal Substances 0.000 claims description 10
- 229910021332 silicide Inorganic materials 0.000 claims description 7
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 7
- 239000007772 electrode material Substances 0.000 claims description 4
- 238000011049 filling Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 73
- 239000012535 impurity Substances 0.000 description 53
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 42
- 229910052710 silicon Inorganic materials 0.000 description 42
- 239000010703 silicon Substances 0.000 description 42
- 229910052581 Si3N4 Inorganic materials 0.000 description 30
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 30
- 238000000407 epitaxy Methods 0.000 description 19
- 238000005516 engineering process Methods 0.000 description 16
- 238000009792 diffusion process Methods 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 229910052814 silicon oxide Inorganic materials 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 229910052785 arsenic Inorganic materials 0.000 description 8
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 8
- 230000007812 deficiency Effects 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 229910052698 phosphorus Inorganic materials 0.000 description 7
- 239000011574 phosphorus Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7833—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
- H01L29/7834—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with a non-planar structure, e.g. the gate or the source or the drain being non-planar
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
- H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
- H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
- H01L21/28052—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a silicide layer formed by the silicidation reaction of silicon with a metal layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66613—Lateral single gate silicon transistors with a gate recessing step, e.g. using local oxidation
- H01L29/66621—Lateral single gate silicon transistors with a gate recessing step, e.g. using local oxidation using etching to form a recess at the gate location
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66613—Lateral single gate silicon transistors with a gate recessing step, e.g. using local oxidation
- H01L29/66628—Lateral single gate silicon transistors with a gate recessing step, e.g. using local oxidation recessing the gate by forming single crystalline semiconductor material at the source or drain location
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/05—Making the transistor
- H10B12/053—Making the transistor the transistor being at least partially in a trench in the substrate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Semiconductor Memories (AREA)
Abstract
Description
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005163575A JP2006339476A (ja) | 2005-06-03 | 2005-06-03 | 半導体装置及びその製造方法 |
JP2005163575 | 2005-06-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1874003A CN1874003A (zh) | 2006-12-06 |
CN100481505C true CN100481505C (zh) | 2009-04-22 |
Family
ID=37484359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100930152A Expired - Fee Related CN100481505C (zh) | 2005-06-03 | 2006-06-02 | 半导体器件及其制造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7659571B2 (zh) |
JP (1) | JP2006339476A (zh) |
CN (1) | CN100481505C (zh) |
TW (1) | TWI324386B (zh) |
Families Citing this family (41)
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KR100791342B1 (ko) * | 2006-08-09 | 2008-01-03 | 삼성전자주식회사 | 반도체 소자 및 그 제조 방법 |
US20080042208A1 (en) * | 2006-08-16 | 2008-02-21 | Force Mos Technology Co., Ltd. | Trench mosfet with esd trench capacitor |
US20080042222A1 (en) * | 2006-08-16 | 2008-02-21 | Force Mos Technology Co., Ltd. | Trench mosfet with copper metal connections |
US7629646B2 (en) * | 2006-08-16 | 2009-12-08 | Force Mos Technology Co., Ltd. | Trench MOSFET with terraced gate and manufacturing method thereof |
KR100823176B1 (ko) | 2007-04-27 | 2008-04-18 | 삼성전자주식회사 | 반도체 장치 및 그 형성 방법 |
US20080296674A1 (en) * | 2007-05-30 | 2008-12-04 | Qimonda Ag | Transistor, integrated circuit and method of forming an integrated circuit |
JP2009170857A (ja) * | 2007-09-28 | 2009-07-30 | Elpida Memory Inc | 半導体装置及びその製造方法 |
JP5628471B2 (ja) * | 2007-12-10 | 2014-11-19 | ピーエスフォー ルクスコ エスエイアールエルPS4 Luxco S.a.r.l. | 半導体装置及び半導体装置の製造方法 |
KR101535222B1 (ko) | 2008-04-17 | 2015-07-08 | 삼성전자주식회사 | 반도체 소자 및 그의 제조 방법 |
KR101414076B1 (ko) * | 2008-09-10 | 2014-07-02 | 삼성전자주식회사 | 반도체 소자 및 이의 제조 방법 |
JP2010147392A (ja) * | 2008-12-22 | 2010-07-01 | Elpida Memory Inc | 半導体装置およびその製造方法 |
KR101576576B1 (ko) * | 2009-02-13 | 2015-12-10 | 삼성전자 주식회사 | 반도체 장치 및 이의 제조 방법 |
US20110303293A1 (en) * | 2009-03-17 | 2011-12-15 | Sumitomo Chemical Company, Limited | Composition and device using same |
TWI396259B (zh) * | 2009-08-28 | 2013-05-11 | Inotera Memories Inc | 動態隨機存取記憶體之凹溝渠通道之自我對準方法 |
JP2011129566A (ja) | 2009-12-15 | 2011-06-30 | Elpida Memory Inc | 半導体装置の製造方法 |
JP2011129771A (ja) | 2009-12-18 | 2011-06-30 | Elpida Memory Inc | 半導体装置及びその製造方法 |
JP2011129761A (ja) | 2009-12-18 | 2011-06-30 | Elpida Memory Inc | 半導体装置の製造方法 |
KR101662282B1 (ko) * | 2010-01-14 | 2016-10-05 | 삼성전자주식회사 | 고유전율의 보호막 패턴을 포함하는 매립 게이트 패턴을 갖는 반도체 장치 및 이의 제조 방법 |
JP5738094B2 (ja) * | 2010-09-14 | 2015-06-17 | セイコーインスツル株式会社 | 半導体装置の製造方法 |
JP2012089566A (ja) * | 2010-10-15 | 2012-05-10 | Elpida Memory Inc | 半導体装置及びその製造方法、並びにデータ処理システム |
JP2012134439A (ja) | 2010-11-30 | 2012-07-12 | Elpida Memory Inc | 半導体装置及びその製造方法 |
KR20120060029A (ko) * | 2010-12-01 | 2012-06-11 | 삼성전자주식회사 | 반도체 기억 소자 및 반도체 기억 소자의 형성 방법 |
JP2012156451A (ja) * | 2011-01-28 | 2012-08-16 | Elpida Memory Inc | 半導体装置及びその製造方法 |
JP2012164776A (ja) * | 2011-02-04 | 2012-08-30 | Toshiba Corp | 不揮発性半導体記憶装置 |
JP5731858B2 (ja) | 2011-03-09 | 2015-06-10 | ピーエスフォー ルクスコ エスエイアールエルPS4 Luxco S.a.r.l. | 半導体装置及び半導体装置の製造方法 |
US20120235228A1 (en) * | 2011-03-16 | 2012-09-20 | Nanya Technology Corp. | Transistor structure and method for preparing the same |
CN102737997A (zh) * | 2011-04-07 | 2012-10-17 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件的制作方法 |
JP2012234964A (ja) | 2011-04-28 | 2012-11-29 | Elpida Memory Inc | 半導体装置及びその製造方法 |
JP2012238642A (ja) | 2011-05-10 | 2012-12-06 | Elpida Memory Inc | 半導体装置及びその製造方法 |
JP2012248686A (ja) | 2011-05-27 | 2012-12-13 | Elpida Memory Inc | 半導体装置及びその製造方法 |
JP2013058676A (ja) | 2011-09-09 | 2013-03-28 | Elpida Memory Inc | 半導体装置及びその製造方法、並びにデータ処理システム |
JP2013149686A (ja) | 2012-01-17 | 2013-08-01 | Elpida Memory Inc | 半導体装置 |
TWI493724B (zh) | 2012-03-01 | 2015-07-21 | E Ink Holdings Inc | 半導體元件 |
JP2014022388A (ja) | 2012-07-12 | 2014-02-03 | Ps4 Luxco S A R L | 半導体装置及びその製造方法 |
US8987796B2 (en) | 2012-08-17 | 2015-03-24 | Ps4 Luxco S.A.R.L. | Semiconductor device having semiconductor pillar |
KR101920247B1 (ko) * | 2012-09-17 | 2018-11-20 | 삼성전자 주식회사 | 반도체 장치 및 그 제조 방법 |
TW201423869A (zh) * | 2012-12-13 | 2014-06-16 | Anpec Electronics Corp | 溝渠式電晶體的製作方法 |
KR20180063947A (ko) | 2016-12-02 | 2018-06-14 | 삼성전자주식회사 | 반도체 메모리 소자 |
JP7282485B2 (ja) * | 2018-05-14 | 2023-05-29 | キオクシア株式会社 | 半導体装置およびその製造方法 |
TWI823410B (zh) * | 2021-06-02 | 2023-11-21 | 新加坡商發明與合作實驗室有限公司 | 在閘極-汲極重疊區之間有增厚閘極介電層的電晶體結構 |
CN115954383B (zh) * | 2023-03-14 | 2023-06-02 | 长鑫存储技术有限公司 | 一种半导体结构及其形成方法 |
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JPH03219677A (ja) * | 1990-01-24 | 1991-09-27 | Fujitsu Ltd | 半導体装置 |
KR940002400B1 (ko) * | 1991-05-15 | 1994-03-24 | 금성일렉트론 주식회사 | 리세스 게이트를 갖는 반도체장치의 제조방법 |
JP3123140B2 (ja) * | 1991-09-20 | 2001-01-09 | 日本電気株式会社 | 電界効果トランジスタ |
JPH07142712A (ja) * | 1993-06-25 | 1995-06-02 | Toshiba Corp | 半導体装置 |
JPH07131007A (ja) * | 1993-11-02 | 1995-05-19 | Tadahiro Omi | 半導体装置 |
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JPH10200106A (ja) * | 1997-01-13 | 1998-07-31 | Sony Corp | 半導体装置及びその製造方法 |
US6180978B1 (en) * | 1997-12-30 | 2001-01-30 | Texas Instruments Incorporated | Disposable gate/replacement gate MOSFETs for sub-0.1 micron gate length and ultra-shallow junctions |
JP3209731B2 (ja) * | 1998-09-10 | 2001-09-17 | 松下電器産業株式会社 | 半導体装置及びその製造方法 |
TW428231B (en) | 1999-01-16 | 2001-04-01 | United Microelectronics Corp | Manufacturing method of self-aligned silicide |
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US6498062B2 (en) * | 2001-04-27 | 2002-12-24 | Micron Technology, Inc. | DRAM access transistor |
JP3640945B2 (ja) | 2002-09-02 | 2005-04-20 | 株式会社東芝 | トレンチゲート型半導体装置及びその製造方法 |
KR100641495B1 (ko) | 2002-12-30 | 2006-10-31 | 동부일렉트로닉스 주식회사 | 반도체 소자 제조방법 |
KR100499159B1 (ko) * | 2003-02-28 | 2005-07-01 | 삼성전자주식회사 | 리세스 채널을 갖는 반도체장치 및 그 제조방법 |
KR100511045B1 (ko) | 2003-07-14 | 2005-08-30 | 삼성전자주식회사 | 리세스된 게이트 전극을 갖는 반도체 소자의 집적방법 |
US20060094194A1 (en) * | 2004-11-04 | 2006-05-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Advanced disposable spacer process by low-temperature high-stress nitride film for sub-90NM CMOS technology |
-
2005
- 2005-06-03 JP JP2005163575A patent/JP2006339476A/ja active Pending
-
2006
- 2006-06-02 CN CNB2006100930152A patent/CN100481505C/zh not_active Expired - Fee Related
- 2006-06-02 US US11/445,236 patent/US7659571B2/en active Active
- 2006-06-02 TW TW095119540A patent/TWI324386B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW200644224A (en) | 2006-12-16 |
US7659571B2 (en) | 2010-02-09 |
CN1874003A (zh) | 2006-12-06 |
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US20060273388A1 (en) | 2006-12-07 |
JP2006339476A (ja) | 2006-12-14 |
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