BRPI0910064A2 - método para preparação de chapa para impressão litográfica - Google Patents
método para preparação de chapa para impressão litográficaInfo
- Publication number
- BRPI0910064A2 BRPI0910064A2 BRPI0910064A BRPI0910064A BRPI0910064A2 BR PI0910064 A2 BRPI0910064 A2 BR PI0910064A2 BR PI0910064 A BRPI0910064 A BR PI0910064A BR PI0910064 A BRPI0910064 A BR PI0910064A BR PI0910064 A2 BRPI0910064 A2 BR PI0910064A2
- Authority
- BR
- Brazil
- Prior art keywords
- printing plate
- lithographic printing
- preparing lithographic
- preparing
- plate
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/266—Polyurethanes; Polyureas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008-079332 | 2008-03-25 | ||
JP2008079332 | 2008-03-25 | ||
JP2008290197A JP5264427B2 (ja) | 2008-03-25 | 2008-11-12 | 平版印刷版の作製方法 |
JP2008-290197 | 2008-11-12 | ||
PCT/JP2009/055863 WO2009119610A1 (ja) | 2008-03-25 | 2009-03-24 | 平版印刷版の作製方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
BRPI0910064A2 true BRPI0910064A2 (pt) | 2015-12-29 |
BRPI0910064B1 BRPI0910064B1 (pt) | 2019-04-30 |
BRPI0910064B8 BRPI0910064B8 (pt) | 2020-07-21 |
Family
ID=41113802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0910064A BRPI0910064B8 (pt) | 2008-03-25 | 2009-03-24 | método para preparação de chapa para impressão litográfica |
Country Status (7)
Country | Link |
---|---|
US (1) | US20110020757A1 (pt) |
EP (1) | EP2259141B1 (pt) |
JP (1) | JP5264427B2 (pt) |
CN (1) | CN101981506B (pt) |
AU (1) | AU2009230020B2 (pt) |
BR (1) | BRPI0910064B8 (pt) |
WO (1) | WO2009119610A1 (pt) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5541913B2 (ja) * | 2009-12-25 | 2014-07-09 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
JP5346845B2 (ja) * | 2010-02-26 | 2013-11-20 | 富士フイルム株式会社 | 平版印刷版の作製方法及び平版印刷版原版用現像液 |
JP2011221522A (ja) * | 2010-03-26 | 2011-11-04 | Fujifilm Corp | 平版印刷版の作製方法 |
JP5538197B2 (ja) * | 2010-03-26 | 2014-07-02 | 富士フイルム株式会社 | 平版印刷版用捨て版原版、平版印刷版用捨て版原版集積体、及び、平版印刷版用捨て版の製版方法 |
JP5612531B2 (ja) | 2010-04-30 | 2014-10-22 | 富士フイルム株式会社 | 平版印刷版用支持体、および平版印刷版原版 |
JP5860480B2 (ja) | 2011-01-11 | 2016-02-16 | キャプシュゲル・ベルジウム・エヌ・ヴィ | プルランを含む新しい硬カプセル |
JP5211187B2 (ja) * | 2011-02-28 | 2013-06-12 | 富士フイルム株式会社 | 平版印刷版原版及び製版方法 |
CN103562794B (zh) * | 2011-03-28 | 2016-07-13 | 富士胶片株式会社 | 平版印刷版的制版方法 |
JP5579217B2 (ja) * | 2012-03-27 | 2014-08-27 | 富士フイルム株式会社 | 平版印刷版原版 |
CN105392635A (zh) * | 2013-05-20 | 2016-03-09 | 太阳诱电化学科技株式会社 | 经过润湿性改善表面改性的结构体和模版印刷板以及制造它们的方法 |
CN103616799B (zh) * | 2013-11-07 | 2016-02-24 | 李厚民 | 一种固化后有机可溶的光敏树脂、制备方法及溶解方法 |
JP2017082172A (ja) * | 2015-10-30 | 2017-05-18 | 日本合成化学工業株式会社 | 成形品 |
CN105589303A (zh) * | 2015-12-23 | 2016-05-18 | 苏州瑞红电子化学品有限公司 | 一种用于厚膜光刻胶的高容量显影液组合物 |
BR112019021391A2 (pt) | 2017-04-14 | 2020-05-05 | Capsugel Belgium Nv | cápsulas de pululano |
WO2018189587A1 (en) | 2017-04-14 | 2018-10-18 | Capsugel Belgium Nv | Process for making pullulan |
Family Cites Families (106)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2850445A (en) | 1955-01-19 | 1958-09-02 | Oster Gerald | Photopolymerization |
DE1572136B1 (de) | 1965-06-03 | 1969-09-18 | Du Pont | Fotopolymerisierbares Gemisch |
JPS4420189B1 (pt) | 1965-06-03 | 1969-08-30 | ||
US3511661A (en) | 1966-07-01 | 1970-05-12 | Eastman Kodak Co | Lithographic printing plate |
JPS472528B1 (pt) | 1967-04-13 | 1972-01-24 | ||
DK125218B (da) | 1967-11-09 | 1973-01-15 | Kalle Ag | Lysfølsomt optegnelsesmateriale og lysfølsom blanding til anvendelse ved fremstilling af materialet. |
DE2033769B2 (de) | 1969-07-11 | 1980-02-21 | Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) | Bis-<2-acryloxyäthyl)hexahydrophthalat enthaltende Gemische und Herstellungsverfahren |
BE757124A (fr) | 1969-10-09 | 1971-04-06 | Kalle Ag | Plaques d'impression a plat composee de feuilles |
JPS4841708B1 (pt) | 1970-01-13 | 1973-12-07 | ||
JPS4828123B1 (pt) | 1970-06-16 | 1973-08-29 | ||
DE2064080C3 (de) | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
JPS5120922B2 (pt) | 1971-10-07 | 1976-06-29 | ||
JPS5324989B2 (pt) | 1971-12-09 | 1978-07-24 | ||
BE794482A (fr) | 1972-01-25 | 1973-07-24 | Du Pont | Compositions photopolymerisables contenant des composes cis- alpha -dicarbonyliques cycliques et des sensibilisateurs choisis |
JPS5230490B2 (pt) | 1972-03-21 | 1977-08-09 | ||
DE2361041C3 (de) | 1973-12-07 | 1980-08-14 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
DE2363806B2 (de) | 1973-12-21 | 1979-05-17 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
JPS5311314B2 (pt) | 1974-09-25 | 1978-04-20 | ||
BR7700555A (pt) | 1976-02-02 | 1977-10-04 | Eastman Kodak Co | Composicao fotossensivel e respectivo elemento fotografic |
JPS5312739A (en) | 1976-07-22 | 1978-02-04 | Nippon Keikinzoku Sougou Kenki | Desmutting method in electrolytic roughing treatment for aluminum |
JPS5492723A (en) | 1977-12-30 | 1979-07-23 | Somar Mfg | Photosensitive material and use |
US4162162A (en) | 1978-05-08 | 1979-07-24 | E. I. Du Pont De Nemours And Company | Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions |
JPS54151024A (en) | 1978-05-18 | 1979-11-27 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
DE2822190A1 (de) | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
DE2822189A1 (de) | 1978-05-20 | 1980-04-17 | Hoechst Ag | Photopolymerisierbares gemisch |
JPS5628893A (en) | 1979-08-16 | 1981-03-23 | Fuji Photo Film Co Ltd | Carrier for lithography plate and manufacture of said carrier |
US4252887A (en) | 1979-08-14 | 1981-02-24 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators |
DE2952697A1 (de) | 1979-12-29 | 1981-07-02 | Hoechst Ag, 6230 Frankfurt | Durch strahlung polymerisierbares gemisch und damit hergestelltes strahlungsempfindliches kopiermaterial |
DE2952698A1 (de) | 1979-12-29 | 1981-07-02 | Hoechst Ag, 6230 Frankfurt | Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial |
DE3036694A1 (de) | 1980-09-29 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch |
DE3048502A1 (de) | 1980-12-22 | 1982-07-22 | Hoechst Ag, 6000 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
US4459349A (en) | 1981-03-27 | 1984-07-10 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
US4410621A (en) | 1981-04-03 | 1983-10-18 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan |
JPS5815503A (ja) | 1981-07-20 | 1983-01-28 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS58159533A (ja) | 1982-02-01 | 1983-09-21 | Toray Ind Inc | 異形断面捲縮糸を植毛した現像用ブラシ |
JPS591504A (ja) | 1982-06-26 | 1984-01-06 | Nippon Oil & Fats Co Ltd | 光重合開始剤組成物 |
JPS5944615A (ja) | 1982-09-07 | 1984-03-13 | Furuno Electric Co Ltd | ジヤイロ装置 |
JPS5945303A (ja) | 1982-09-07 | 1984-03-14 | Nippon Oil & Fats Co Ltd | 高感度光開始剤組成物 |
JPS5953836A (ja) | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JPS5956403A (ja) | 1982-09-27 | 1984-03-31 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
JPS5971048A (ja) | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
JPS59140203A (ja) | 1983-02-01 | 1984-08-11 | Nippon Oil & Fats Co Ltd | 高感度光開始剤組成物 |
JPS59189340A (ja) | 1983-04-13 | 1984-10-26 | Nippon Oil & Fats Co Ltd | 高感度光重合開始剤組成物 |
JPS6059351A (ja) | 1983-09-12 | 1985-04-05 | Toray Ind Inc | 湿し水不要平版印刷版の現像方法 |
DE3421511A1 (de) | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Polymerisierbare, perfluoralkylgruppen aufweisende verbindungen, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck |
CA1270089A (en) | 1985-08-01 | 1990-06-05 | Masami Kawabata | Photopolymerizable composition |
US4622286A (en) | 1985-09-16 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer |
US4772541A (en) | 1985-11-20 | 1988-09-20 | The Mead Corporation | Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same |
CA1284740C (en) | 1985-11-20 | 1991-06-11 | Peter Gottschalk | Photosensitive materials containing ionic dye compounds as initiators |
JPH0611765B2 (ja) | 1986-01-28 | 1994-02-16 | 日本油脂株式会社 | 光重合開始剤組成物 |
JPS62167253U (pt) | 1986-04-14 | 1987-10-23 | ||
JPH0699496B2 (ja) | 1987-01-16 | 1994-12-07 | 富士写真フイルム株式会社 | 光重合性組成物 |
DE3710282A1 (de) | 1987-03-28 | 1988-10-13 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3710281A1 (de) | 1987-03-28 | 1988-10-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3710279A1 (de) | 1987-03-28 | 1988-10-06 | Hoechst Ag | Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch |
JPH0699497B2 (ja) | 1987-04-16 | 1994-12-07 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPH07120042B2 (ja) | 1987-05-21 | 1995-12-20 | 富士写真フイルム株式会社 | 感光性組成物 |
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-
2008
- 2008-11-12 JP JP2008290197A patent/JP5264427B2/ja not_active Expired - Fee Related
-
2009
- 2009-03-24 CN CN2009801105366A patent/CN101981506B/zh not_active Expired - Fee Related
- 2009-03-24 AU AU2009230020A patent/AU2009230020B2/en not_active Ceased
- 2009-03-24 EP EP09725680.4A patent/EP2259141B1/en not_active Not-in-force
- 2009-03-24 BR BRPI0910064A patent/BRPI0910064B8/pt active IP Right Grant
- 2009-03-24 US US12/934,668 patent/US20110020757A1/en not_active Abandoned
- 2009-03-24 WO PCT/JP2009/055863 patent/WO2009119610A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
BRPI0910064B1 (pt) | 2019-04-30 |
WO2009119610A1 (ja) | 2009-10-01 |
BRPI0910064B8 (pt) | 2020-07-21 |
JP5264427B2 (ja) | 2013-08-14 |
EP2259141A1 (en) | 2010-12-08 |
CN101981506A (zh) | 2011-02-23 |
US20110020757A1 (en) | 2011-01-27 |
EP2259141A4 (en) | 2012-10-24 |
JP2009258624A (ja) | 2009-11-05 |
AU2009230020B2 (en) | 2014-02-06 |
CN101981506B (zh) | 2013-02-06 |
EP2259141B1 (en) | 2016-11-23 |
AU2009230020A1 (en) | 2009-10-01 |
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