BRPI0917509A2 - método de preparação de chapa de impressão litográfica - Google Patents

método de preparação de chapa de impressão litográfica

Info

Publication number
BRPI0917509A2
BRPI0917509A2 BRPI0917509A BRPI0917509A BRPI0917509A2 BR PI0917509 A2 BRPI0917509 A2 BR PI0917509A2 BR PI0917509 A BRPI0917509 A BR PI0917509A BR PI0917509 A BRPI0917509 A BR PI0917509A BR PI0917509 A2 BRPI0917509 A2 BR PI0917509A2
Authority
BR
Brazil
Prior art keywords
printing plate
lithographic printing
plate preparation
preparation
lithographic
Prior art date
Application number
BRPI0917509A
Other languages
English (en)
Inventor
Ikuo Kawauchi
Keiichi Adachi
Mamoru Kuramoto
Toshifumi Inno
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of BRPI0917509A2 publication Critical patent/BRPI0917509A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
BRPI0917509A 2008-08-22 2009-08-20 método de preparação de chapa de impressão litográfica BRPI0917509A2 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008214507 2008-08-22
JP2008309666 2008-12-04
PCT/JP2009/064586 WO2010021364A1 (ja) 2008-08-22 2009-08-20 平版印刷版の作製方法

Publications (1)

Publication Number Publication Date
BRPI0917509A2 true BRPI0917509A2 (pt) 2015-11-17

Family

ID=41707238

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0917509A BRPI0917509A2 (pt) 2008-08-22 2009-08-20 método de preparação de chapa de impressão litográfica

Country Status (7)

Country Link
US (1) US20110146516A1 (pt)
EP (1) EP2320274A4 (pt)
JP (1) JP2010156945A (pt)
CN (1) CN102132218A (pt)
AU (1) AU2009283446B2 (pt)
BR (1) BRPI0917509A2 (pt)
WO (1) WO2010021364A1 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2366546B1 (en) * 2010-03-18 2013-11-06 FUJIFILM Corporation Process for making lithographic printing plate and lithographic printing plate
JP2011221522A (ja) * 2010-03-26 2011-11-04 Fujifilm Corp 平版印刷版の作製方法
JP5612531B2 (ja) 2010-04-30 2014-10-22 富士フイルム株式会社 平版印刷版用支持体、および平版印刷版原版
JP5579217B2 (ja) * 2012-03-27 2014-08-27 富士フイルム株式会社 平版印刷版原版
JP5356616B1 (ja) * 2012-11-27 2013-12-04 日新製鋼株式会社 溶融Ｚｎ合金めっき鋼板の製造方法
JP6117072B2 (ja) * 2013-09-30 2017-04-19 富士フイルム株式会社 顔料分散組成物、インクジェット記録方法、及び化合物の製造方法
JP6681750B2 (ja) * 2016-03-04 2020-04-15 東京応化工業株式会社 洗浄液及び洗浄方法

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Also Published As

Publication number Publication date
CN102132218A (zh) 2011-07-20
WO2010021364A1 (ja) 2010-02-25
EP2320274A1 (en) 2011-05-11
US20110146516A1 (en) 2011-06-23
EP2320274A4 (en) 2011-12-14
JP2010156945A (ja) 2010-07-15
AU2009283446A1 (en) 2010-02-25
AU2009283446B2 (en) 2014-12-04

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B15K Others concerning applications: alteration of classification

Free format text: AS CLASSIFICACOES ANTERIORES ERAM: G03F 7/32 , G03F 7/00 , G03F 7/028 , G03F 7/032 , G03F 7/11

Ipc: G03F 7/027 (1990.01), G03F 7/031 (1990.01), G03F 7

B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]

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