CN103616799B - 一种固化后有机可溶的光敏树脂、制备方法及溶解方法 - Google Patents
一种固化后有机可溶的光敏树脂、制备方法及溶解方法 Download PDFInfo
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CN103616799B true CN103616799B (zh) | 2016-02-24 |
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CN103941543B (zh) * | 2014-03-27 | 2017-09-19 | 南京百川行远激光科技股份有限公司 | 一种基于聚丙交酯多元醇的光敏树脂组合物及其制备方法和光敏树脂 |
CN104181773A (zh) * | 2014-07-22 | 2014-12-03 | 北京金达雷科技有限公司 | 一种用于激光选择性金属化的光敏树脂、制备及活化方法 |
CN109971226A (zh) * | 2019-03-27 | 2019-07-05 | 德淮半导体有限公司 | 用于在半导体装置的制造过程中形成牺牲材料层的混合物以及半导体装置的制造方法 |
CN112778447A (zh) * | 2020-12-31 | 2021-05-11 | 西安交通大学 | 一种可溶性光敏树脂及其制备与固化层纹抑制方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0403170A2 (en) * | 1989-06-09 | 1990-12-19 | Morton International, Inc. | Photoimageable compositions |
EP0691802A1 (en) * | 1994-07-07 | 1996-01-10 | Morton International, Inc. | Method of forming a multilayer printed circuit board and product thereof |
CN1447814A (zh) * | 2000-08-14 | 2003-10-08 | 西巴特殊化学品控股有限公司 | 表面活性的光敏引发剂 |
CN101981507A (zh) * | 2008-03-25 | 2011-02-23 | 富士胶片株式会社 | 平版印刷版的制版方法 |
CN101981506A (zh) * | 2008-03-25 | 2011-02-23 | 富士胶片株式会社 | 制备平版印刷版的方法 |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0403170A2 (en) * | 1989-06-09 | 1990-12-19 | Morton International, Inc. | Photoimageable compositions |
EP0691802A1 (en) * | 1994-07-07 | 1996-01-10 | Morton International, Inc. | Method of forming a multilayer printed circuit board and product thereof |
CN1447814A (zh) * | 2000-08-14 | 2003-10-08 | 西巴特殊化学品控股有限公司 | 表面活性的光敏引发剂 |
CN101981507A (zh) * | 2008-03-25 | 2011-02-23 | 富士胶片株式会社 | 平版印刷版的制版方法 |
CN101981506A (zh) * | 2008-03-25 | 2011-02-23 | 富士胶片株式会社 | 制备平版印刷版的方法 |
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Effective date of registration: 20161013 Address after: 100081, Haidian District Zhongguancun South Avenue science and technology building, 2005, Beijing Patentee after: BEIJING JINDALEI TECHNOLOGY CO., LTD. Address before: 100101 No. 5, building 2, No. 4, South Beach hospital, 701, Beijing, Chaoyang District Patentee before: Li Houmin |
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Address after: 100081 Department of science and technology building 2008, No. 683, district 683, Zhongguancun South Street, Haidian District, Beijing Patentee after: Youyouzao Technology (Beijing) Co., Ltd Address before: 100081, Haidian District Zhongguancun South Avenue science and technology building, 2005, Beijing Patentee before: GOLD ARRAY TECHNOLOGY (BEIJING), LLC |
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Denomination of invention: The invention relates to a cured organic soluble photosensitive resin, a preparation method and a dissolution method Effective date of registration: 20210222 Granted publication date: 20160224 Pledgee: Tianjin Yuzhi Technology Center (L.P.) Pledgor: Youyouzao Technology (Beijing) Co., Ltd Registration number: Y2021110000003 |
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