BRPI0910064B8 - método para preparação de chapa para impressão litográfica - Google Patents

método para preparação de chapa para impressão litográfica

Info

Publication number
BRPI0910064B8
BRPI0910064B8 BRPI0910064A BRPI0910064A BRPI0910064B8 BR PI0910064 B8 BRPI0910064 B8 BR PI0910064B8 BR PI0910064 A BRPI0910064 A BR PI0910064A BR PI0910064 A BRPI0910064 A BR PI0910064A BR PI0910064 B8 BRPI0910064 B8 BR PI0910064B8
Authority
BR
Brazil
Prior art keywords
lithographic printing
plate
preparing
processing
image
Prior art date
Application number
BRPI0910064A
Other languages
English (en)
Inventor
Kawauchi Ikuo
Adachi Keiichi
Kuramoto Mamoru
Inno Toshifumi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of BRPI0910064A2 publication Critical patent/BRPI0910064A2/pt
Publication of BRPI0910064B1 publication Critical patent/BRPI0910064B1/pt
Publication of BRPI0910064B8 publication Critical patent/BRPI0910064B8/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/266—Polyurethanes; Polyureas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

método para preparação de chapa para impressão litográfica para fornecer um método de preparação de uma chapa de impressão litográfica, que é seguro, apresenta excelente propriedade de revelação e capacidade de processamento, e permita o processamento com uma solução mediante o processamento após a exposicao da imagem, um precursor em negativo da chapa de impressão litográfica com uma camada de gravação de imagem contendo (i) um corante de sensibilização, (ii) um iniciador de fotopolimerização, (iii) uma adição de compostos polimerizáveis possuindo uma dupla ligação etilenicamente insaturada, e (iv) um aglutinante polímero hidrofílico em um suporte com uma solução aquosa contendo íons carbonato, um íon hidrogênio carbonato e um composto polimérico solúvel em água é apresentado.
BRPI0910064A 2008-03-25 2009-03-24 método para preparação de chapa para impressão litográfica BRPI0910064B8 (pt)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2008-079332 2008-03-25
JP2008079332 2008-03-25
JP2008-290197 2008-11-12
JP2008290197A JP5264427B2 (ja) 2008-03-25 2008-11-12 平版印刷版の作製方法
PCT/JP2009/055863 WO2009119610A1 (ja) 2008-03-25 2009-03-24 平版印刷版の作製方法

Publications (3)

Publication Number Publication Date
BRPI0910064A2 BRPI0910064A2 (pt) 2015-12-29
BRPI0910064B1 BRPI0910064B1 (pt) 2019-04-30
BRPI0910064B8 true BRPI0910064B8 (pt) 2020-07-21

Family

ID=41113802

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0910064A BRPI0910064B8 (pt) 2008-03-25 2009-03-24 método para preparação de chapa para impressão litográfica

Country Status (7)

Country Link
US (1) US20110020757A1 (pt)
EP (1) EP2259141B1 (pt)
JP (1) JP5264427B2 (pt)
CN (1) CN101981506B (pt)
AU (1) AU2009230020B2 (pt)
BR (1) BRPI0910064B8 (pt)
WO (1) WO2009119610A1 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5541913B2 (ja) * 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
JP5346845B2 (ja) * 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
JP5538197B2 (ja) * 2010-03-26 2014-07-02 富士フイルム株式会社 平版印刷版用捨て版原版、平版印刷版用捨て版原版集積体、及び、平版印刷版用捨て版の製版方法
JP2011221522A (ja) * 2010-03-26 2011-11-04 Fujifilm Corp 平版印刷版の作製方法
JP5612531B2 (ja) 2010-04-30 2014-10-22 富士フイルム株式会社 平版印刷版用支持体、および平版印刷版原版
JP5860480B2 (ja) 2011-01-11 2016-02-16 キャプシュゲル・ベルジウム・エヌ・ヴィ プルランを含む新しい硬カプセル
JP5211187B2 (ja) * 2011-02-28 2013-06-12 富士フイルム株式会社 平版印刷版原版及び製版方法
WO2012133382A1 (ja) * 2011-03-28 2012-10-04 富士フイルム株式会社 平版印刷版の製版方法
JP5579217B2 (ja) * 2012-03-27 2014-08-27 富士フイルム株式会社 平版印刷版原版
EP3000612A4 (en) * 2013-05-20 2017-03-08 Taiyo Yuden Chemical Technology Co., Ltd. Structure and stencil printing plate which have been subjected to wettability-improving surface modification, and processes for producing both
CN103616799B (zh) * 2013-11-07 2016-02-24 李厚民 一种固化后有机可溶的光敏树脂、制备方法及溶解方法
JP2017082172A (ja) * 2015-10-30 2017-05-18 日本合成化学工業株式会社 成形品
CN105589303A (zh) * 2015-12-23 2016-05-18 苏州瑞红电子化学品有限公司 一种用于厚膜光刻胶的高容量显影液组合物
WO2018189587A1 (en) 2017-04-14 2018-10-18 Capsugel Belgium Nv Process for making pullulan
BR112019021391A2 (pt) 2017-04-14 2020-05-05 Capsugel Belgium Nv cápsulas de pululano

Family Cites Families (106)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2850445A (en) 1955-01-19 1958-09-02 Oster Gerald Photopolymerization
JPS4420189B1 (pt) 1965-06-03 1969-08-30
DE1572136B1 (de) 1965-06-03 1969-09-18 Du Pont Fotopolymerisierbares Gemisch
US3511661A (en) 1966-07-01 1970-05-12 Eastman Kodak Co Lithographic printing plate
JPS472528B1 (pt) 1967-04-13 1972-01-24
DK125218B (da) 1967-11-09 1973-01-15 Kalle Ag Lysfølsomt optegnelsesmateriale og lysfølsom blanding til anvendelse ved fremstilling af materialet.
DE2033769B2 (de) 1969-07-11 1980-02-21 Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) Bis-<2-acryloxyäthyl)hexahydrophthalat enthaltende Gemische und Herstellungsverfahren
BE757124A (fr) 1969-10-09 1971-04-06 Kalle Ag Plaques d'impression a plat composee de feuilles
JPS4841708B1 (pt) 1970-01-13 1973-12-07
JPS4828123B1 (pt) 1970-06-16 1973-08-29
DE2064080C3 (de) 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
JPS5120922B2 (pt) 1971-10-07 1976-06-29
JPS5324989B2 (pt) 1971-12-09 1978-07-24
BE794482A (fr) 1972-01-25 1973-07-24 Du Pont Compositions photopolymerisables contenant des composes cis- alpha -dicarbonyliques cycliques et des sensibilisateurs choisis
JPS5230490B2 (pt) 1972-03-21 1977-08-09
DE2361041C3 (de) 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2363806B2 (de) 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
JPS5311314B2 (pt) 1974-09-25 1978-04-20
BR7700555A (pt) 1976-02-02 1977-10-04 Eastman Kodak Co Composicao fotossensivel e respectivo elemento fotografic
JPS5312739A (en) 1976-07-22 1978-02-04 Nippon Keikinzoku Sougou Kenki Desmutting method in electrolytic roughing treatment for aluminum
JPS5492723A (en) 1977-12-30 1979-07-23 Somar Mfg Photosensitive material and use
US4162162A (en) 1978-05-08 1979-07-24 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
JPS54151024A (en) 1978-05-18 1979-11-27 Fuji Photo Film Co Ltd Photopolymerizable composition
DE2822189A1 (de) 1978-05-20 1980-04-17 Hoechst Ag Photopolymerisierbares gemisch
DE2822190A1 (de) 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
JPS5628893A (en) 1979-08-16 1981-03-23 Fuji Photo Film Co Ltd Carrier for lithography plate and manufacture of said carrier
US4252887A (en) 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
DE2952698A1 (de) 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
DE2952697A1 (de) 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes strahlungsempfindliches kopiermaterial
DE3036694A1 (de) 1980-09-29 1982-06-03 Hoechst Ag, 6000 Frankfurt Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch
DE3048502A1 (de) 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US4459349A (en) 1981-03-27 1984-07-10 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
US4410621A (en) 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
JPS5815503A (ja) 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS58159533A (ja) 1982-02-01 1983-09-21 Toray Ind Inc 異形断面捲縮糸を植毛した現像用ブラシ
JPS591504A (ja) 1982-06-26 1984-01-06 Nippon Oil & Fats Co Ltd 光重合開始剤組成物
JPS5945303A (ja) 1982-09-07 1984-03-14 Nippon Oil & Fats Co Ltd 高感度光開始剤組成物
JPS5944615A (ja) 1982-09-07 1984-03-13 Furuno Electric Co Ltd ジヤイロ装置
JPS5953836A (ja) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5956403A (ja) 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS5971048A (ja) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
JPS59140203A (ja) 1983-02-01 1984-08-11 Nippon Oil & Fats Co Ltd 高感度光開始剤組成物
JPS59189340A (ja) 1983-04-13 1984-10-26 Nippon Oil & Fats Co Ltd 高感度光重合開始剤組成物
JPS6059351A (ja) 1983-09-12 1985-04-05 Toray Ind Inc 湿し水不要平版印刷版の現像方法
DE3421511A1 (de) 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Polymerisierbare, perfluoralkylgruppen aufweisende verbindungen, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
CA1270089A (en) 1985-08-01 1990-06-05 Masami Kawabata Photopolymerizable composition
US4622286A (en) 1985-09-16 1986-11-11 E. I. Du Pont De Nemours And Company Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer
CA1284740C (en) 1985-11-20 1991-06-11 Peter Gottschalk Photosensitive materials containing ionic dye compounds as initiators
US4772541A (en) 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
JPH0611765B2 (ja) 1986-01-28 1994-02-16 日本油脂株式会社 光重合開始剤組成物
JPS62167253U (pt) 1986-04-14 1987-10-23
JPH0699496B2 (ja) 1987-01-16 1994-12-07 富士写真フイルム株式会社 光重合性組成物
DE3710279A1 (de) 1987-03-28 1988-10-06 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
DE3710281A1 (de) 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710282A1 (de) 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH0699497B2 (ja) 1987-04-16 1994-12-07 富士写真フイルム株式会社 光重合性組成物
JPH07120040B2 (ja) 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
JPS63287944A (ja) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd 感光性組成物
JPS63287947A (ja) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd 感光性組成物
JPH07120041B2 (ja) 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
JPH07120042B2 (ja) 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
JPH089643B2 (ja) 1987-07-06 1996-01-31 富士写真フイルム株式会社 光重合性組成物
JPS6413144A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6413141A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH07120036B2 (ja) 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
JPS6413143A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6413142A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6417048A (en) 1987-07-10 1989-01-20 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH0812424B2 (ja) 1987-11-19 1996-02-07 富士写真フイルム株式会社 感光性組成物
JPH01229003A (ja) 1988-03-09 1989-09-12 Fuji Photo Film Co Ltd 光重合性組成物
JPH01271741A (ja) 1988-04-25 1989-10-30 Fuji Photo Film Co Ltd 感光性組成物
US5262276A (en) 1988-05-11 1993-11-16 Fuji Photo Film Co., Ltd. Light-sensitive compositions
DE3817424A1 (de) 1988-05-21 1989-11-23 Hoechst Ag Alkenylphosphon- und -phosphinsaeureester, verfahren zu ihrer herstellung und durch strahlung polymerisierbares gemisch, das diese verbindungen enthaelt
JP2547613B2 (ja) 1988-05-27 1996-10-23 富士写真フイルム株式会社 光重合性組成物
US5148746A (en) 1988-08-19 1992-09-22 Presstek, Inc. Print-head and plate-cleaning assembly
JP2571113B2 (ja) 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
JP2610678B2 (ja) 1989-02-21 1997-05-14 富士写真フイルム株式会社 水なし平版印刷版の現像かす除去装置
JP2631143B2 (ja) 1989-03-16 1997-07-16 富士写真フイルム株式会社 光重合性組成物
JP2589578B2 (ja) 1989-09-13 1997-03-12 富士写真フイルム株式会社 現像用ブラシ
DE3938107A1 (de) * 1989-11-16 1991-05-23 Hoechst Ag Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen
JP2632069B2 (ja) 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
JP3123563B2 (ja) * 1991-09-27 2001-01-15 チッソ株式会社 感光性樹脂現像液
JP3223222B2 (ja) 1993-12-03 2001-10-29 富士写真フイルム株式会社 感光性印刷版
JPH08238758A (ja) 1995-02-11 1996-09-17 Heidelberger Druckmas Ag 輪転印刷機の印刷装置のためのクリーニング装置
US5568768A (en) 1995-05-04 1996-10-29 Presstek, Inc. Cleaning apparatus for offset plates
JP3784931B2 (ja) * 1997-08-13 2006-06-14 コダックポリクロームグラフィックス株式会社 感光性平版印刷版の現像方法およびそれに用いる現像液
JP3907144B2 (ja) 1998-04-09 2007-04-18 富士フイルム株式会社 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物
JP2000089478A (ja) 1998-09-14 2000-03-31 Fuji Photo Film Co Ltd 光重合性平版印刷版の製版方法
JP2002091014A (ja) * 2000-09-12 2002-03-27 Fuji Photo Film Co Ltd 平版印刷版の製版方法
JP2003270775A (ja) 2002-03-13 2003-09-25 Fuji Photo Film Co Ltd 平版印刷版用原版及び平版印刷版の製版方法
JP4123930B2 (ja) * 2002-12-24 2008-07-23 コニカミノルタホールディングス株式会社 現像液の濃縮物、及び現像補充液の濃縮物
EP1502941B1 (en) * 2003-07-30 2015-12-23 FUJIFILM Corporation Image-forming method and developer
JP2005049465A (ja) * 2003-07-30 2005-02-24 Fuji Photo Film Co Ltd 画像形成方法及び現像液
JP2005049466A (ja) * 2003-07-30 2005-02-24 Fuji Photo Film Co Ltd 画像形成方法及び現像液
US7115352B2 (en) * 2003-10-30 2006-10-03 Fuji Photo Film Co., Ltd. Method for forming images
JP4351933B2 (ja) * 2004-03-05 2009-10-28 富士フイルム株式会社 ネガ型平版印刷版原版およびこれを用いた平版印刷版の製版方法
PL1751625T3 (pl) 2004-05-19 2012-04-30 Agfa Nv Sposób wytwarzania fotopolimerowej płyty drukarskiej
DE602005005403T2 (de) * 2004-08-24 2009-04-23 Fujifilm Corp. Verfahren zur Herstellung einer lithographischen Druckplatte
CN101248393A (zh) * 2005-08-30 2008-08-20 柯尼卡美能达医疗印刷器材株式会社 光敏性平版印刷版的显影液及处理方法
EP1788444B1 (en) * 2005-11-18 2011-01-26 Agfa Graphics N.V. Method of making a lithographic printing plate
ES2346320T3 (es) * 2005-11-18 2010-10-14 Agfa Graphics N.V. Metodo de fabricacion de una plancha de impresion litografica.
JP2007254510A (ja) * 2006-03-20 2007-10-04 Fujifilm Corp 洗浄処理液
EP1865382A1 (en) * 2006-06-09 2007-12-12 FUJIFILM Corporation Method for preparation of lithographic printing plate and lithographic printing plate
DE602006017047D1 (de) * 2006-06-14 2010-11-04 Eastman Kodak Co Verfahren zur Verarbeitung von Fotopolymer-Druckplatten, die eine Deckschicht enthalten
JP2009091555A (ja) * 2007-09-18 2009-04-30 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
JP2009096991A (ja) * 2007-09-27 2009-05-07 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版

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EP2259141A1 (en) 2010-12-08
US20110020757A1 (en) 2011-01-27
BRPI0910064B1 (pt) 2019-04-30
WO2009119610A1 (ja) 2009-10-01
JP5264427B2 (ja) 2013-08-14
BRPI0910064A2 (pt) 2015-12-29
CN101981506A (zh) 2011-02-23
EP2259141A4 (en) 2012-10-24
AU2009230020A1 (en) 2009-10-01
AU2009230020B2 (en) 2014-02-06
EP2259141B1 (en) 2016-11-23
CN101981506B (zh) 2013-02-06

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