BRPI1010588A2 - Compostos galotânicos para composições de revestimentos de placa de impressão litográfica - Google Patents

Compostos galotânicos para composições de revestimentos de placa de impressão litográfica

Info

Publication number
BRPI1010588A2
BRPI1010588A2 BRPI1010588-3A BRPI1010588A BRPI1010588A2 BR PI1010588 A2 BRPI1010588 A2 BR PI1010588A2 BR PI1010588 A BRPI1010588 A BR PI1010588A BR PI1010588 A2 BRPI1010588 A2 BR PI1010588A2
Authority
BR
Brazil
Prior art keywords
galotanic
compounds
printing plate
coating compositions
lithographic printing
Prior art date
Application number
BRPI1010588-3A
Other languages
English (en)
Inventor
My T Nguyen
A Kha Phan
Marc-André Locas
Quoc Khoi Nguyen
Original Assignee
Mylan Group
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=43921186&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BRPI1010588(A2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Mylan Group filed Critical Mylan Group
Publication of BRPI1010588A2 publication Critical patent/BRPI1010588A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
    • C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D309/10—Oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07G—COMPOUNDS OF UNKNOWN CONSTITUTION
    • C07G3/00—Glycosides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07H—SUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H13/00—Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids
    • C07H13/02—Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by carboxylic acids
    • C07H13/08—Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by carboxylic acids having the esterifying carboxyl radicals directly attached to carbocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Biochemistry (AREA)
  • Biotechnology (AREA)
  • Genetics & Genomics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Saccharide Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BRPI1010588-3A 2009-10-29 2010-06-11 Compostos galotânicos para composições de revestimentos de placa de impressão litográfica BRPI1010588A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25591809P 2009-10-29 2009-10-29
PCT/CA2010/000862 WO2011050442A1 (en) 2009-10-29 2010-06-11 Gallotannic compounds for lithographic printing plate coating compositions

Publications (1)

Publication Number Publication Date
BRPI1010588A2 true BRPI1010588A2 (pt) 2015-08-25

Family

ID=43921186

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI1010588-3A BRPI1010588A2 (pt) 2009-10-29 2010-06-11 Compostos galotânicos para composições de revestimentos de placa de impressão litográfica

Country Status (15)

Country Link
US (1) US8932398B2 (pt)
EP (1) EP2451821B1 (pt)
JP (1) JP5696155B2 (pt)
KR (1) KR101430576B1 (pt)
CN (1) CN102482310B (pt)
AU (1) AU2010312263B2 (pt)
BR (1) BRPI1010588A2 (pt)
CA (1) CA2763435C (pt)
HK (1) HK1164322A1 (pt)
HU (1) HUE031461T2 (pt)
MX (1) MX2011013975A (pt)
RU (1) RU2487882C1 (pt)
TW (1) TWI540124B (pt)
UA (1) UA105045C2 (pt)
WO (1) WO2011050442A1 (pt)

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MX351243B (es) 2009-09-15 2017-10-05 Mylan Group Copolimeros, particulas polimericas que comprenden los copolimeros y aglutinantes copolimericos para composiciones de revestimiento sensibles a radiacion para placas de impresion litografica sensibles a radiacion de trabajo negativo.
US9822206B2 (en) 2010-09-14 2017-11-21 Mylan Group Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates
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WO2014127236A1 (en) * 2013-02-14 2014-08-21 Kemet Electronics Corporation One-sided capacitor foils and methods of making one-sided capacitor foils
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KR20190129901A (ko) * 2017-03-31 2019-11-20 더 스쿨 코포레이션 칸사이 유니버시티 화합물, 화합물을 포함하는 레지스트 조성물 및 이를 이용하는 패턴형성방법
TW201900667A (zh) * 2017-03-31 2019-01-01 學校法人關西大學 阻劑組成物及使用其之圖型形成方法，以及化合物及樹脂
US20230203560A1 (en) * 2020-05-27 2023-06-29 Board Of Regents, The University Of Texas System Glucosyl esters for infection screening
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Also Published As

Publication number Publication date
CA2763435C (en) 2017-07-11
AU2010312263B2 (en) 2013-10-03
HK1164322A1 (zh) 2012-09-21
EP2451821A1 (en) 2012-05-16
EP2451821B1 (en) 2016-07-20
WO2011050442A9 (en) 2011-09-22
JP2013508429A (ja) 2013-03-07
JP5696155B2 (ja) 2015-04-08
TWI540124B (zh) 2016-07-01
KR20120064090A (ko) 2012-06-18
KR101430576B1 (ko) 2014-08-14
AU2010312263A1 (en) 2012-01-12
RU2011151989A (ru) 2013-06-27
CN102482310A (zh) 2012-05-30
UA105045C2 (uk) 2014-04-10
WO2011050442A1 (en) 2011-05-05
US8932398B2 (en) 2015-01-13
US20120137929A1 (en) 2012-06-07
CN102482310B (zh) 2015-08-19
EP2451821A4 (en) 2012-12-19
CA2763435A1 (en) 2011-05-05
RU2487882C1 (ru) 2013-07-20
TW201114752A (en) 2011-05-01
AU2010312263A2 (en) 2012-02-02
MX2011013975A (es) 2012-04-30
HUE031461T2 (en) 2017-07-28

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