HK1176368A1 - 用於正型熱平版印版的近紅外輻射敏感塗料組合物的共聚物 - Google Patents

用於正型熱平版印版的近紅外輻射敏感塗料組合物的共聚物

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Publication number
HK1176368A1
HK1176368A1 HK13103271.9A HK13103271A HK1176368A1 HK 1176368 A1 HK1176368 A1 HK 1176368A1 HK 13103271 A HK13103271 A HK 13103271A HK 1176368 A1 HK1176368 A1 HK 1176368A1
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HK
Hong Kong
Prior art keywords
copolymers
positive
infrared radiation
coating compositions
lithographic printing
Prior art date
Application number
HK13103271.9A
Other languages
English (en)
Inventor
My T Nguyen
Akha Phan
Viet-Thu Nguyen-Truong
Marc-Andr Locas
Original Assignee
Mylan Group
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Filing date
Publication date
Application filed by Mylan Group filed Critical Mylan Group
Publication of HK1176368A1 publication Critical patent/HK1176368A1/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
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    • B41C1/1016Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
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    • C08F220/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/343Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/343Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links
    • C08F220/346Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links and further oxygen
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/38Esters containing sulfur
    • C08F220/387Esters containing sulfur and containing nitrogen and oxygen
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    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52Amides or imides
    • C08F220/54Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/60Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
    • C08F220/603Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen and containing oxygen in addition to the carbonamido oxygen and nitrogen
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    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52Amides or imides
    • C08F220/54Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/60Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
    • C08F220/606Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen and containing other heteroatoms

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  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
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  • Printing Plates And Materials Therefor (AREA)
HK13103271.9A 2010-09-14 2013-03-15 用於正型熱平版印版的近紅外輻射敏感塗料組合物的共聚物 HK1176368A1 (zh)

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WO2016133072A1 (ja) * 2015-02-19 2016-08-25 富士フイルム株式会社 感光性樹脂組成物、平版印刷版原版、平版印刷版の作製方法、及び、高分子化合物
CN106886129B (zh) * 2017-03-28 2021-01-26 广东潮新科数字科技有限公司 阳性热敏感光组合物及其在免显影ctp版中的应用
AU2019304450A1 (en) 2018-07-17 2021-03-11 Evonik Operations Gmbh Method for preparing C-H acidic (meth)acrylates

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JP2013540845A (ja) 2013-11-07
CN103038267B (zh) 2015-09-30
KR20130043157A (ko) 2013-04-29
CN103038267A (zh) 2013-04-10
KR101471310B1 (ko) 2014-12-09
JP5593447B2 (ja) 2014-09-24
US20140221591A1 (en) 2014-08-07
AU2010273146A2 (en) 2013-01-31
CA2809726A1 (en) 2011-01-20
CA2809726C (en) 2015-12-15
WO2011006265A3 (en) 2011-07-21
WO2011006265A2 (en) 2011-01-20
EP2566900B1 (en) 2016-02-17
UA106533C2 (uk) 2014-09-10
RU2012153993A (ru) 2014-06-20
EP2566900A4 (en) 2014-02-19
BR112012030319A2 (pt) 2016-08-09
MX2012014326A (es) 2013-01-24
WO2011006265A4 (en) 2011-09-22
EP2566900A2 (en) 2013-03-13
MX336236B (es) 2016-01-11
AU2010273146A1 (en) 2012-12-13
ES2570379T3 (es) 2016-05-18
US9822206B2 (en) 2017-11-21
AU2010273146B2 (en) 2014-06-19

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