MX351243B - Copolimeros, particulas polimericas que comprenden los copolimeros y aglutinantes copolimericos para composiciones de revestimiento sensibles a radiacion para placas de impresion litografica sensibles a radiacion de trabajo negativo. - Google Patents

Copolimeros, particulas polimericas que comprenden los copolimeros y aglutinantes copolimericos para composiciones de revestimiento sensibles a radiacion para placas de impresion litografica sensibles a radiacion de trabajo negativo.

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Publication number
MX351243B
MX351243B MX2012002015A MX2012002015A MX351243B MX 351243 B MX351243 B MX 351243B MX 2012002015 A MX2012002015 A MX 2012002015A MX 2012002015 A MX2012002015 A MX 2012002015A MX 351243 B MX351243 B MX 351243B
Authority
MX
Mexico
Prior art keywords
copolymers
radiation
sensitive
negative
coating compositions
Prior art date
Application number
MX2012002015A
Other languages
English (en)
Other versions
MX2012002015A (es
Inventor
T Nguyen My
Locas Marc-André
Original Assignee
Mylan Group
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mylan Group filed Critical Mylan Group
Publication of MX2012002015A publication Critical patent/MX2012002015A/es
Publication of MX351243B publication Critical patent/MX351243B/es

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C233/00—Carboxylic acid amides
    • C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C233/16—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms
    • C07C233/17—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom
    • C07C233/18—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom having the carbon atom of the carboxamide group bound to a hydrogen atom or to a carbon atom of an acyclic saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/19—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms containing cyano groups and carboxyl groups, other than cyano groups, bound to the same saturated acyclic carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/32—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
    • C07C255/33—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by saturated carbon chains
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
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    • C07—ORGANIC CHEMISTRY
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    • C07C275/10—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an acyclic and saturated carbon skeleton being further substituted by singly-bound oxygen atoms
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    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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    • C—CHEMISTRY; METALLURGY
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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    • C—CHEMISTRY; METALLURGY
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    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

Se proporciona un copolímero y partícula polimérica que comprende el copolímero, un método para producir una partícula polimérica, un aglutinante copolimérico, un método para producir un aglutinante copolimérico, una composición de revestimiento sensible a radiación casi infrarroja, una placa de impresión litográfica de trabajo negativo, un método para producir una placa de impresión litográfica de trabajo negativo y métodos para formar con imágenes la placa e imprimir con la placa con imágenes.
MX2012002015A 2009-09-15 2010-09-14 Copolimeros, particulas polimericas que comprenden los copolimeros y aglutinantes copolimericos para composiciones de revestimiento sensibles a radiacion para placas de impresion litografica sensibles a radiacion de trabajo negativo. MX351243B (es)

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US24242109P 2009-09-15 2009-09-15
PCT/CA2010/001400 WO2010148520A2 (en) 2009-09-15 2010-09-14 Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates

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MX2012002015A MX2012002015A (es) 2012-05-29
MX351243B true MX351243B (es) 2017-10-05

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CN (1) CN102510869B (es)
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HK (1) HK1168118A1 (es)
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US9482944B2 (en) 2016-11-01
JP5749269B2 (ja) 2015-07-15
EP2478020A4 (en) 2015-04-15
RU2012102774A (ru) 2013-09-27
HK1168118A1 (en) 2012-12-21
KR101390985B1 (ko) 2014-05-02
UA104323C2 (ru) 2014-01-27
AU2010265775A1 (en) 2012-02-16
CN102510869B (zh) 2014-12-24
BR112012001663B1 (pt) 2020-02-11
KR20120089478A (ko) 2012-08-10
AU2010265775A2 (en) 2012-03-15
WO2010148520A3 (en) 2011-02-17
MX2012002015A (es) 2012-05-29
US20120190810A1 (en) 2012-07-26
WO2010148520A4 (en) 2011-04-07
RU2571098C2 (ru) 2015-12-20
IN2012DN00777A (es) 2015-06-26
TW201114785A (en) 2011-05-01
WO2010148520A2 (en) 2010-12-29
BR112012001663A2 (pt) 2018-03-13
EP2478020A2 (en) 2012-07-25
CN102510869A (zh) 2012-06-20
TWI447131B (zh) 2014-08-01
JP2013504632A (ja) 2013-02-07
CA2768722C (en) 2014-12-09
CA2768722A1 (en) 2010-12-29
AU2010265775B2 (en) 2013-09-12

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