HK1168118A1 - Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates - Google Patents
Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing platesInfo
- Publication number
- HK1168118A1 HK1168118A1 HK12108752.7A HK12108752A HK1168118A1 HK 1168118 A1 HK1168118 A1 HK 1168118A1 HK 12108752 A HK12108752 A HK 12108752A HK 1168118 A1 HK1168118 A1 HK 1168118A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- copolymers
- radiation
- sensitive
- negative
- coating compositions
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/16—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms
- C07C233/17—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom
- C07C233/18—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom having the carbon atom of the carboxamide group bound to a hydrogen atom or to a carbon atom of an acyclic saturated carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
- C07C255/19—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms containing cyano groups and carboxyl groups, other than cyano groups, bound to the same saturated acyclic carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
- C07C255/32—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
- C07C255/33—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by saturated carbon chains
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
- C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/04—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms
- C07C275/06—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an acyclic and saturated carbon skeleton
- C07C275/10—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an acyclic and saturated carbon skeleton being further substituted by singly-bound oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/34—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/36—Oxygen or sulfur atoms
- C07D207/40—2,5-Pyrrolidine-diones
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/20—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
- C07D295/215—Radicals derived from nitrogen analogues of carbonic acid
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
- C07F9/02—Phosphorus compounds
- C07F9/06—Phosphorus compounds without P—C bonds
- C07F9/08—Esters of oxyacids of phosphorus
- C07F9/09—Esters of phosphoric acids
- C07F9/091—Esters of phosphoric acids with hydroxyalkyl compounds with further substituents on alkyl
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
- C08F212/10—Styrene with nitriles
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
- C08F220/50—Nitriles containing four or more carbon atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
- C08F220/70—Nitriles; Amides; Imides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/08—Developable by water or the fountain solution
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US24242109P | 2009-09-15 | 2009-09-15 | |
PCT/CA2010/001400 WO2010148520A2 (en) | 2009-09-15 | 2010-09-14 | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1168118A1 true HK1168118A1 (en) | 2012-12-21 |
Family
ID=43386936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK12108752.7A HK1168118A1 (en) | 2009-09-15 | 2012-09-06 | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
Country Status (15)
Country | Link |
---|---|
US (1) | US9482944B2 (xx) |
EP (1) | EP2478020A4 (xx) |
JP (1) | JP5749269B2 (xx) |
KR (1) | KR101390985B1 (xx) |
CN (1) | CN102510869B (xx) |
AU (1) | AU2010265775B2 (xx) |
BR (1) | BR112012001663B1 (xx) |
CA (1) | CA2768722C (xx) |
HK (1) | HK1168118A1 (xx) |
IN (1) | IN2012DN00777A (xx) |
MX (1) | MX351243B (xx) |
RU (1) | RU2571098C2 (xx) |
TW (1) | TWI447131B (xx) |
UA (1) | UA104323C2 (xx) |
WO (1) | WO2010148520A2 (xx) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2768722C (en) | 2009-09-15 | 2014-12-09 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
CN103038267B (zh) * | 2010-09-14 | 2015-09-30 | 米兰集团 | 用于正型热平版印版的近红外辐射敏感涂料组合物的共聚物 |
US20120141942A1 (en) * | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
JP6150072B2 (ja) * | 2012-01-19 | 2017-06-21 | 日産化学工業株式会社 | ネガ型感光性樹脂組成物 |
CN104641294B (zh) * | 2012-10-02 | 2019-08-23 | 日产化学工业株式会社 | 负型感光性树脂组合物 |
GB201609983D0 (en) * | 2016-06-08 | 2016-07-20 | Thermo Fisher Scient Geneart Gmbh And Life Technologies As | Solid support |
JPWO2018221134A1 (ja) * | 2017-05-31 | 2020-03-26 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版原版作製用樹脂組成物、及び、平版印刷版の作製方法 |
CN110809521B (zh) * | 2017-06-30 | 2022-01-07 | 富士胶片株式会社 | 平版印刷版原版及平版印刷版的制作方法 |
WO2019039074A1 (ja) * | 2017-08-25 | 2019-02-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版、及び、平版印刷版の製版方法 |
JPWO2020158139A1 (ja) * | 2019-01-31 | 2021-10-14 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
Family Cites Families (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB780284A (en) | 1954-06-29 | 1957-07-31 | Bayer Ag | New methylol ethers and their production |
US2839511A (en) * | 1956-04-05 | 1958-06-17 | Monsanto Chemicals | Cyano ether-ester copolymers |
BE795565A (fr) | 1972-02-16 | 1973-08-16 | Hoechst Ag | Agents de conservation pour dispersions aqueses, notamment pour peintures |
US4297431A (en) * | 1978-09-15 | 1981-10-27 | Polaroid Corporation | Diffusion control layers in diffusion transfer photographic products |
US4345017A (en) | 1980-10-06 | 1982-08-17 | Polaroid Corporation | Photographic products and processes with a pH sensitive xanthene light screening dye |
JPS58134631A (ja) | 1982-01-08 | 1983-08-10 | Konishiroku Photo Ind Co Ltd | 感光性組成物 |
JPS6263595A (ja) | 1985-09-14 | 1987-03-20 | Toagosei Chem Ind Co Ltd | ビニルフエニルケテンメチルトリメチルシリルアセタ−ル |
JP3196361B2 (ja) * | 1991-12-25 | 2001-08-06 | 日立化成工業株式会社 | 塗料用樹脂組成物及び海中構造物用防汚塗料 |
EP0591820A1 (en) | 1992-10-05 | 1994-04-13 | E.I. Du Pont De Nemours And Company | Near-infrared absorbing dyes prepared from Stenhouse salts |
CN1077048C (zh) | 1993-04-20 | 2002-01-02 | 旭化成株式会社 | 平版印刷原版及用其制版的方法 |
JP4143983B2 (ja) | 1994-10-14 | 2008-09-03 | チバ ホールディング インコーポレーテッド | 重縮合物の分子量増加 |
EP0770495B1 (en) | 1995-10-24 | 2002-06-19 | Agfa-Gevaert | A method for making a lithographic printing plate involving on press development |
FR2741346B1 (fr) | 1995-11-16 | 1997-12-19 | Roussel Uclaf | Nouveau procede de preparation de derives phenylimidazolidine |
JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
JP3474724B2 (ja) * | 1997-01-24 | 2003-12-08 | サンスター技研株式会社 | シアノエチル基含有グラフトポリマー |
JPH10287823A (ja) | 1997-04-15 | 1998-10-27 | Kansai Paint Co Ltd | 活性エネルギー線硬化型樹脂組成物及びそれを使用した被覆形成方法 |
US6261740B1 (en) | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
US6132929A (en) | 1997-10-08 | 2000-10-17 | Fuji Photo Film Co., Ltd. | Positive type photosensitive composition for infrared lasers |
JPH11119427A (ja) * | 1997-10-15 | 1999-04-30 | Konica Corp | 感光性組成物及び感光性平版印刷版 |
EP1258369B1 (en) | 1997-10-17 | 2005-03-30 | Fuji Photo Film Co., Ltd. | A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
JP3917318B2 (ja) | 1999-02-24 | 2007-05-23 | 富士フイルム株式会社 | ポジ型平版印刷用材料 |
US6124425A (en) | 1999-03-18 | 2000-09-26 | American Dye Source, Inc. | Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use |
JP2000275828A (ja) | 1999-03-25 | 2000-10-06 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
JP2001264979A (ja) | 2000-03-22 | 2001-09-28 | Fuji Photo Film Co Ltd | ポジ型感光性平版印刷版 |
US6884568B2 (en) | 2000-10-17 | 2005-04-26 | Kodak Polychrome Graphics, Llc | Stabilized infrared-sensitive polymerizable systems |
EP1219416B1 (en) | 2000-12-20 | 2004-08-04 | Agfa-Gevaert | On-press development printing method using a negative working thermally sensitive lithographic printing plate |
JP2002202606A (ja) | 2000-12-28 | 2002-07-19 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
US6506536B2 (en) | 2000-12-29 | 2003-01-14 | Kodak Polychrome Graphics, Llc | Imageable element and composition comprising thermally reversible polymers |
US6899994B2 (en) | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
US6582882B2 (en) | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
US7261998B2 (en) * | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
US6846614B2 (en) | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
US7341815B2 (en) | 2001-06-27 | 2008-03-11 | Fujifilm Corporation | Planographic printing plate precursor |
US7659046B2 (en) * | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
US6983694B2 (en) | 2002-04-26 | 2006-01-10 | Agfa Gevaert | Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support |
JP2004012706A (ja) | 2002-06-05 | 2004-01-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
US6969575B2 (en) | 2002-08-29 | 2005-11-29 | Fuji Photo Film Co., Ltd. | On-press developable lithographic printing plate precursor |
JP2004225040A (ja) * | 2002-12-12 | 2004-08-12 | Rohm & Haas Electronic Materials Llc | 官能化されたポリマー |
JP4085006B2 (ja) | 2003-01-14 | 2008-04-30 | 富士フイルム株式会社 | 平版印刷版用原版 |
DE602004005904T2 (de) | 2003-01-29 | 2008-01-17 | Fujifilm Corp. | Vorsensibilisierte Flachdruckplatte mit Mikrokapseln |
US6893783B2 (en) | 2003-10-08 | 2005-05-17 | Kodak Polychrome Graphics Lld | Multilayer imageable elements |
US7060416B2 (en) | 2004-04-08 | 2006-06-13 | Eastman Kodak Company | Positive-working, thermally sensitive imageable element |
CA2610282C (en) | 2005-06-03 | 2011-03-15 | American Dye Source Inc. | Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
JP4881687B2 (ja) * | 2005-12-09 | 2012-02-22 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
AU2006246467B2 (en) * | 2005-12-13 | 2011-11-10 | Rohm And Haas Company | Polymer composition |
US7795343B2 (en) | 2005-12-13 | 2010-09-14 | Rohm And Haas Company | Polymer composition |
CN101454277B (zh) | 2006-05-17 | 2014-02-19 | 美洲染料资源公司 | 用于平版印刷版涂料的材料、含这些材料的平版印刷版和涂料以及制备方法和用途 |
US20080008957A1 (en) | 2006-06-27 | 2008-01-10 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable elements |
UA93261C2 (ru) | 2006-08-24 | 2011-01-25 | Американ Дай Copc Инк. | Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная форма |
WO2008048749A2 (en) | 2006-09-07 | 2008-04-24 | The Regents Of The University Of California | Biocidal fibers |
JP4834505B2 (ja) | 2006-09-26 | 2011-12-14 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
US20100003533A1 (en) | 2006-10-23 | 2010-01-07 | Fujifilm Corporation | Metal-film-coated material and process for producing the same, metallic-pattern-bearing material and process for producing the same, composition for polymer layer formation, nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate |
TWI409280B (zh) | 2007-07-31 | 2013-09-21 | American Dye Source Inc | 聚合物染料、塗覆層組合物及熱微影印刷板 |
JP5194638B2 (ja) | 2007-08-22 | 2013-05-08 | 株式会社豊田中央研究所 | 微小物体を固定化する固相材料、微小物体が固定化された固相体及びその製造方法 |
US7604924B2 (en) | 2007-10-24 | 2009-10-20 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
US20090186299A1 (en) | 2008-01-17 | 2009-07-23 | Ting Tao | Methods for imaging and processing negative-working imageable elements |
JP5268384B2 (ja) * | 2008-02-12 | 2013-08-21 | 富士フイルム株式会社 | ナノインプリント用硬化性組成物およびパターン形成方法 |
JP5314944B2 (ja) | 2008-06-20 | 2013-10-16 | 富士フイルム株式会社 | 液浸露光用レジスト組成物及びそれを用いたパターン形成方法 |
US20100021844A1 (en) * | 2008-07-22 | 2010-01-28 | Jianfei Yu | Negative-working imageable elements and method of use |
CA2768722C (en) | 2009-09-15 | 2014-12-09 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
CA2763435C (en) | 2009-10-29 | 2017-07-11 | Mylan Group | Gallotannic compounds for lithographic printing plate coating compositions |
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2010
- 2010-09-14 CA CA2768722A patent/CA2768722C/en not_active Expired - Fee Related
- 2010-09-14 AU AU2010265775A patent/AU2010265775B2/en not_active Ceased
- 2010-09-14 IN IN777DEN2012 patent/IN2012DN00777A/en unknown
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JP5749269B2 (ja) | 2015-07-15 |
US20120190810A1 (en) | 2012-07-26 |
MX2012002015A (es) | 2012-05-29 |
CN102510869A (zh) | 2012-06-20 |
CA2768722A1 (en) | 2010-12-29 |
TWI447131B (zh) | 2014-08-01 |
RU2012102774A (ru) | 2013-09-27 |
US9482944B2 (en) | 2016-11-01 |
BR112012001663B1 (pt) | 2020-02-11 |
KR20120089478A (ko) | 2012-08-10 |
WO2010148520A2 (en) | 2010-12-29 |
KR101390985B1 (ko) | 2014-05-02 |
AU2010265775A1 (en) | 2012-02-16 |
MX351243B (es) | 2017-10-05 |
JP2013504632A (ja) | 2013-02-07 |
AU2010265775A2 (en) | 2012-03-15 |
WO2010148520A4 (en) | 2011-04-07 |
WO2010148520A3 (en) | 2011-02-17 |
CA2768722C (en) | 2014-12-09 |
EP2478020A4 (en) | 2015-04-15 |
TW201114785A (en) | 2011-05-01 |
IN2012DN00777A (xx) | 2015-06-26 |
EP2478020A2 (en) | 2012-07-25 |
CN102510869B (zh) | 2014-12-24 |
BR112012001663A2 (pt) | 2018-03-13 |
RU2571098C2 (ru) | 2015-12-20 |
UA104323C2 (ru) | 2014-01-27 |
AU2010265775B2 (en) | 2013-09-12 |
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