ATE498605T1 - Isocyanatverbindung enthaltend eine ethylenisch ungesättigte gruppe und verfahren zu deren herstellung, sowie reaktives monomer, reaktives (meth)acrylatpolymer und anwendung davon - Google Patents
Isocyanatverbindung enthaltend eine ethylenisch ungesättigte gruppe und verfahren zu deren herstellung, sowie reaktives monomer, reaktives (meth)acrylatpolymer und anwendung davonInfo
- Publication number
- ATE498605T1 ATE498605T1 AT05800527T AT05800527T ATE498605T1 AT E498605 T1 ATE498605 T1 AT E498605T1 AT 05800527 T AT05800527 T AT 05800527T AT 05800527 T AT05800527 T AT 05800527T AT E498605 T1 ATE498605 T1 AT E498605T1
- Authority
- AT
- Austria
- Prior art keywords
- reactive
- isocyanate compound
- unsaturated group
- meth
- production
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C265/00—Derivatives of isocyanic acid
- C07C265/02—Derivatives of isocyanic acid having isocyanate groups bound to acyclic carbon atoms
- C07C265/04—Derivatives of isocyanic acid having isocyanate groups bound to acyclic carbon atoms of a saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/32—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings
- C07C271/34—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/04—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms
- C07C275/20—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an unsaturated carbon skeleton
- C07C275/22—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/04—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms
- C07C275/20—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an unsaturated carbon skeleton
- C07C275/24—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/28—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C275/30—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton being further substituted by halogen atoms, or by nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C333/00—Derivatives of thiocarbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C333/02—Monothiocarbamic acids; Derivatives thereof
- C07C333/04—Monothiocarbamic acids; Derivatives thereof having nitrogen atoms of thiocarbamic groups bound to hydrogen atoms or to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/106—Esters of polycondensation macromers
- C08F222/1065—Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/56—Ring systems containing bridged rings
- C07C2603/58—Ring systems containing bridged rings containing three rings
- C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
- C07C2603/74—Adamantanes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polyurethanes Or Polyureas (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyethers (AREA)
- Polyesters Or Polycarbonates (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004320710 | 2004-11-04 | ||
JP2005219249 | 2005-07-28 | ||
JP2005219247 | 2005-07-28 | ||
PCT/JP2005/020325 WO2006049264A1 (en) | 2004-11-04 | 2005-10-31 | Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth)acrylate polymer and its use |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE498605T1 true ATE498605T1 (de) | 2011-03-15 |
Family
ID=38190913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05800527T ATE498605T1 (de) | 2004-11-04 | 2005-10-31 | Isocyanatverbindung enthaltend eine ethylenisch ungesättigte gruppe und verfahren zu deren herstellung, sowie reaktives monomer, reaktives (meth)acrylatpolymer und anwendung davon |
Country Status (9)
Country | Link |
---|---|
US (1) | US7579066B2 (de) |
EP (1) | EP1812381B1 (de) |
JP (1) | JP4879560B2 (de) |
KR (1) | KR100863397B1 (de) |
CN (1) | CN101084186B (de) |
AT (1) | ATE498605T1 (de) |
DE (1) | DE602005026430D1 (de) |
TW (1) | TW200630325A (de) |
WO (1) | WO2006049264A1 (de) |
Families Citing this family (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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KR20080078645A (ko) * | 2005-12-15 | 2008-08-27 | 아사히 가라스 가부시키가이샤 | 함불소 중합체, 네거티브형 감광성 조성물 및 격벽 |
JP5000940B2 (ja) * | 2006-01-13 | 2012-08-15 | リンテック株式会社 | 偏光板用粘着剤、粘着シート、粘着剤付き偏光板及びその製造方法、並びに光学フィルム及びその製造方法 |
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JPWO2010087318A1 (ja) * | 2009-01-29 | 2012-08-02 | 昭和電工株式会社 | 転写材料用硬化性組成物および(メタ)アクリロイル基含有ウレア化合物 |
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US9340697B2 (en) | 2009-08-14 | 2016-05-17 | Nano-C, Inc. | Solvent-based and water-based carbon nanotube inks with removable additives |
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US20140227498A1 (en) * | 2011-09-20 | 2014-08-14 | 3M Innovative Properties Company | Method, system for manufacturing a circuit board, and the circuit board thereof |
JP2013109236A (ja) * | 2011-11-22 | 2013-06-06 | Hitachi Chemical Co Ltd | 感光性樹脂組成物、感光性フィルム及び電子部品 |
JP6357734B2 (ja) * | 2013-06-25 | 2018-07-18 | 日立化成株式会社 | 光硬化性樹脂組成物並びにそれを用いた光硬化性遮光塗料、光漏洩防止材、液晶表示パネル及び液晶表示装置、並びに光硬化方法 |
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US9244221B1 (en) * | 2013-12-10 | 2016-01-26 | Corning Incorporated | Low modulus primary coatings for optical fibers |
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KR101893558B1 (ko) * | 2017-02-03 | 2018-08-30 | 에스케이씨 주식회사 | 플라스틱 렌즈용 중합성 조성물 |
US11904614B2 (en) | 2017-02-27 | 2024-02-20 | Kornit Digital Technologies Ltd. | Multi-input print heads for three-dimensionally printing and associated systems and methods |
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US11701813B2 (en) | 2017-02-27 | 2023-07-18 | Kornit Digital Technologies Ltd. | Methods for three-dimensionally printing and associated multi-input print heads and systems |
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JP6468315B2 (ja) * | 2017-06-16 | 2019-02-13 | 日立化成株式会社 | 光硬化性樹脂組成物並びにそれを用いた光硬化性遮光塗料、光漏洩防止材、液晶表示パネル及び液晶表示装置、並びに光硬化方法 |
WO2019051637A1 (en) * | 2017-09-12 | 2019-03-21 | Covestro Deutschland Ag | COMPOSITE MATERIAL COMPRISING A POLYURETHANE-POLYACRYLATE RESIN MATRIX |
JP6926939B2 (ja) * | 2017-10-23 | 2021-08-25 | 東京エレクトロン株式会社 | 半導体装置の製造方法 |
KR102210938B1 (ko) * | 2017-11-28 | 2021-02-01 | 주식회사 엘지화학 | 부착력이 우수한 도파관 엣지 차광용 조성물 |
US11304492B2 (en) * | 2018-03-08 | 2022-04-19 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
US11793289B2 (en) | 2018-03-08 | 2023-10-24 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
JP7205538B2 (ja) * | 2018-04-06 | 2023-01-17 | Jnc株式会社 | ウレア結合型四官能(メタ)アクリレート化合物およびこれを含む組成物 |
TWI736952B (zh) * | 2018-08-20 | 2021-08-21 | 日商昭和電工股份有限公司 | 組成物、組成物之製造方法,以及不飽和化合物之製造方法 |
WO2020040048A1 (ja) * | 2018-08-20 | 2020-02-27 | 昭和電工株式会社 | 組成物、組成物の製造方法および不飽和化合物の製造方法 |
CN111100261B (zh) * | 2018-10-26 | 2022-01-28 | 乐凯华光印刷科技有限公司 | 一种高支化聚氨酯丙烯酸酯单体及其制备方法和应用 |
WO2020129381A1 (ja) * | 2018-12-19 | 2020-06-25 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、ドライフィルム、硬化物および電子部品 |
PL3798205T3 (pl) * | 2019-09-26 | 2022-07-11 | Henkel Ag & Co. Kgaa | Monomer akrylowy pochodzenia biologicznego |
EP4089070A4 (de) * | 2020-01-06 | 2024-04-17 | Resonac Corp | (meth)acrylsäureesterverbindung mit isocyanatgruppe und verfahren zu ihrer herstellung |
EP4251117A1 (de) | 2020-11-25 | 2023-10-04 | 3M Innovative Properties Company | Härtbare dentalzusammensetzungen und verwendungen davon |
CN114672007B (zh) * | 2022-05-26 | 2022-07-29 | 苏州易昇光学材料有限公司 | 一种太阳能背板用高耐溶剂性氟碳树脂及氟碳涂料 |
CN115770623B (zh) * | 2022-12-09 | 2024-03-29 | 梧州黄埔化工药业有限公司 | 一种樟脑酯化反应用离子交换膜的制备方法 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2718516A (en) * | 1952-11-08 | 1955-09-20 | Rohm & Haas | Isocyanato esters of acrylic, methacrylic, and crotonic acids |
US2821544A (en) | 1954-04-26 | 1958-01-28 | Bayer Ag | Production of alkylisocyanate esters of 2-alkenoic acids |
US3468934A (en) * | 1966-01-06 | 1969-09-23 | Rohm & Haas | Acyloxyalkylamine hydrochlorides |
GB1252099A (de) | 1969-05-14 | 1971-11-03 | ||
US4654233A (en) | 1984-11-21 | 1987-03-31 | Minnesota Mining And Manufacturing Company | Radiation-curable thermoplastic coating |
EP0240094A3 (de) | 1986-01-06 | 1987-12-02 | The Dow Chemical Company | Verfahren zur Herstellung von Isocyanatalkylestern |
JPH0755935B2 (ja) | 1986-07-01 | 1995-06-14 | 昭和電工株式会社 | 2−アルケニル−2−オキサゾリンの製造法 |
JPH0755936B2 (ja) | 1986-07-01 | 1995-06-14 | 昭和電工株式会社 | 2−置換−2−オキサゾリンの製造法 |
JPH0742263B2 (ja) | 1986-07-01 | 1995-05-10 | 昭和電工株式会社 | 不飽和脂肪酸イソシアナトエチルエステルの製造法 |
JPH0755934B2 (ja) | 1986-07-01 | 1995-06-14 | 昭和電工株式会社 | アルケニル−2−オキサゾリンの製造法 |
JPS6310772A (ja) | 1986-07-01 | 1988-01-18 | Showa Roodeia Kagaku Kk | 2−アルケニル−2−オキサゾリンの製造方法 |
JPH0526090Y2 (de) | 1987-07-17 | 1993-07-01 | ||
JP2632977B2 (ja) | 1988-11-10 | 1997-07-23 | 昭和電工株式会社 | 不飽和カルボン酸−2−イソシアナトアルキルエステルの製造方法 |
JP3667446B2 (ja) | 1995-05-31 | 2005-07-06 | 日本ポリオレフィン株式会社 | オレフィン類重合用触媒及びオレフィンポリマーの製造方法 |
JPH09296152A (ja) | 1996-03-06 | 1997-11-18 | Nippon Steel Chem Co Ltd | 多官能ウレタンアクリレート系ハードコート剤 |
US6620857B2 (en) * | 1996-07-02 | 2003-09-16 | Ciba Specialty Chemicals Corporation | Process for curing a polymerizable composition |
JPH10104401A (ja) | 1996-08-05 | 1998-04-24 | Kureha Chem Ind Co Ltd | 合成樹脂レンズ材料 |
JPH10287718A (ja) | 1997-02-13 | 1998-10-27 | Jsr Corp | 光硬化型樹脂組成物 |
JP3998304B2 (ja) | 1997-02-28 | 2007-10-24 | 三菱化学株式会社 | カラーフィルター |
JP3874525B2 (ja) | 1998-02-10 | 2007-01-31 | 昭和高分子株式会社 | アルカリ可溶な硬化性樹脂、その製造方法、硬化性樹脂組成物及びそのフィルム成形物 |
JP2001048856A (ja) | 1999-08-12 | 2001-02-20 | Jsr Corp | 含フッ素ビニル化合物、その重合体、その硬化性樹脂組成物、その硬化物、およびその製造方法 |
JP2001200007A (ja) | 2000-01-19 | 2001-07-24 | Shin Etsu Chem Co Ltd | 光硬化性樹脂組成物及び光ファイバー用被覆材 |
JP4611554B2 (ja) | 2000-12-01 | 2011-01-12 | 昭和電工株式会社 | 感光性組成物およびその硬化物ならびにそれを用いたプリント配線基板 |
JP3942446B2 (ja) | 2002-02-01 | 2007-07-11 | Hoya株式会社 | 透明成形体及びその製造方法 |
JP2004043671A (ja) | 2002-07-12 | 2004-02-12 | Nippon Kayaku Co Ltd | 低屈折率樹脂組成物およびその硬化物 |
JP2004333902A (ja) | 2003-05-08 | 2004-11-25 | Jsr Corp | 光学部材用放射線硬化性樹脂組成物及び光学部材 |
JP4063746B2 (ja) | 2003-09-26 | 2008-03-19 | 三井化学株式会社 | 新規なチオウレタン骨格を有する(メタ)アクリレート |
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KR20070085683A (ko) | 2007-08-27 |
WO2006049264A1 (en) | 2006-05-11 |
TWI306848B (de) | 2009-03-01 |
TW200630325A (en) | 2006-09-01 |
JP2007055993A (ja) | 2007-03-08 |
DE602005026430D1 (de) | 2011-03-31 |
US20080132597A1 (en) | 2008-06-05 |
EP1812381B1 (de) | 2011-02-16 |
KR100863397B1 (ko) | 2008-10-14 |
EP1812381A1 (de) | 2007-08-01 |
US7579066B2 (en) | 2009-08-25 |
CN101084186B (zh) | 2011-05-11 |
CN101084186A (zh) | 2007-12-05 |
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