ATE429036T1 - Verfahren zur herstellung eines dünnfilmtransistors - Google Patents

Verfahren zur herstellung eines dünnfilmtransistors

Info

Publication number
ATE429036T1
ATE429036T1 AT01932269T AT01932269T ATE429036T1 AT E429036 T1 ATE429036 T1 AT E429036T1 AT 01932269 T AT01932269 T AT 01932269T AT 01932269 T AT01932269 T AT 01932269T AT E429036 T1 ATE429036 T1 AT E429036T1
Authority
AT
Austria
Prior art keywords
film transistor
producing
thin film
thin
gate electrode
Prior art date
Application number
AT01932269T
Other languages
English (en)
Inventor
Hiroshi Tanabe
Original Assignee
Nec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Corp filed Critical Nec Corp
Application granted granted Critical
Publication of ATE429036T1 publication Critical patent/ATE429036T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742—Thin film unipolar transistors
    • H01L29/6675—Amorphous silicon or polysilicon transistors
    • H01L29/66757—Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742—Thin film unipolar transistors
    • H01L29/6675—Amorphous silicon or polysilicon transistors
    • H01L29/66765—Lateral single gate single channel transistors with inverted structure, i.e. the channel layer is formed after the gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78609—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device for preventing leakage current

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
  • Recrystallisation Techniques (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
AT01932269T 2000-06-23 2001-05-25 Verfahren zur herstellung eines dünnfilmtransistors ATE429036T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000188727A JP4389359B2 (ja) 2000-06-23 2000-06-23 薄膜トランジスタ及びその製造方法
PCT/JP2001/004402 WO2001099199A1 (fr) 2000-06-23 2001-05-25 Transistor a couches minces et procede de production

Publications (1)

Publication Number Publication Date
ATE429036T1 true ATE429036T1 (de) 2009-05-15

Family

ID=18688467

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01932269T ATE429036T1 (de) 2000-06-23 2001-05-25 Verfahren zur herstellung eines dünnfilmtransistors

Country Status (8)

Country Link
US (1) US7052944B2 (de)
EP (1) EP1304746B1 (de)
JP (1) JP4389359B2 (de)
KR (1) KR100517037B1 (de)
AT (1) ATE429036T1 (de)
DE (1) DE60138387D1 (de)
TW (1) TWI283069B (de)
WO (1) WO2001099199A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050224799A1 (en) * 2002-02-07 2005-10-13 Matsushita Electric Industrial Co., Ltd. Semiconductor device and method for fabricating the same
US7300829B2 (en) * 2003-06-02 2007-11-27 Applied Materials, Inc. Low temperature process for TFT fabrication
US6756643B1 (en) * 2003-06-12 2004-06-29 Advanced Micro Devices, Inc. Dual silicon layer for chemical mechanical polishing planarization
JP4219838B2 (ja) * 2004-03-24 2009-02-04 シャープ株式会社 半導体基板の製造方法、並びに半導体装置の製造方法
TWI247930B (en) * 2004-08-10 2006-01-21 Ind Tech Res Inst Mask reduction of LTPS-TFT array by use of photo-sensitive low-k dielectrics
KR100719555B1 (ko) * 2005-07-20 2007-05-17 삼성에스디아이 주식회사 박막 트랜지스터, 그 박막 트랜지스터를 포함한 유기 발광표시장치 및 그 박막 트랜지스터에 이용되는 다결정 반도체결정화 방법
KR101299604B1 (ko) * 2005-10-18 2013-08-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제조 방법
US7968884B2 (en) * 2006-12-05 2011-06-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US8067772B2 (en) * 2006-12-05 2011-11-29 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP5337380B2 (ja) * 2007-01-26 2013-11-06 株式会社半導体エネルギー研究所 半導体装置及びその作製方法
US7972943B2 (en) * 2007-03-02 2011-07-05 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of semiconductor device
JP5384088B2 (ja) * 2008-11-28 2014-01-08 株式会社ジャパンディスプレイ 表示装置
TWI463658B (zh) * 2009-03-20 2014-12-01 Unimicron Technology Corp 電晶體裝置
JP7233639B2 (ja) * 2019-04-19 2023-03-07 日新電機株式会社 シリコン膜の成膜方法

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4339285A (en) * 1980-07-28 1982-07-13 Rca Corporation Method for fabricating adjacent conducting and insulating regions in a film by laser irradiation
US4467519A (en) * 1982-04-01 1984-08-28 International Business Machines Corporation Process for fabricating polycrystalline silicon film resistors
US4579600A (en) * 1983-06-17 1986-04-01 Texas Instruments Incorporated Method of making zero temperature coefficient of resistance resistors
JPS60109282A (ja) * 1983-11-17 1985-06-14 Seiko Epson Corp 半導体装置
JP2633541B2 (ja) * 1987-01-07 1997-07-23 株式会社東芝 半導体メモリ装置の製造方法
JPH0616556B2 (ja) * 1987-04-14 1994-03-02 株式会社東芝 半導体装置
JPH0225072A (ja) * 1988-07-13 1990-01-26 Mitsubishi Electric Corp 半導体装置の製造方法
JP2822394B2 (ja) 1988-09-07 1998-11-11 セイコーエプソン株式会社 半導体装置の製造方法
JPH02130912A (ja) 1988-11-11 1990-05-18 Seiko Epson Corp 薄膜半導体装置
JPH02277244A (ja) * 1989-04-19 1990-11-13 Hitachi Ltd 半導体装置の製造方法
JPH0334434A (ja) * 1989-06-30 1991-02-14 Hitachi Ltd 薄膜半導体装置及びその製造方法
JPH0333434A (ja) 1989-06-30 1991-02-13 Mazda Motor Corp エンジンの振動低減装置
JPH0355850A (ja) * 1989-07-25 1991-03-11 Sony Corp 半導体装置の製造方法
US5254208A (en) * 1990-07-24 1993-10-19 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device
JPH0824104B2 (ja) * 1991-03-18 1996-03-06 株式会社半導体エネルギー研究所 半導体材料およびその作製方法
US5242530A (en) * 1991-08-05 1993-09-07 International Business Machines Corporation Pulsed gas plasma-enhanced chemical vapor deposition of silicon
JPH06163401A (ja) 1992-09-11 1994-06-10 A G Technol Kk 多結晶シリコン層の形成方法およびそれを用いた多結晶シリコン薄膜トランジスタ
JPH06177372A (ja) * 1992-12-03 1994-06-24 Fujitsu Ltd 半導体装置の製造方法
US5444302A (en) * 1992-12-25 1995-08-22 Hitachi, Ltd. Semiconductor device including multi-layer conductive thin film of polycrystalline material
JP3318384B2 (ja) * 1993-02-05 2002-08-26 株式会社半導体エネルギー研究所 薄膜トランジスタ及びその作製方法
JP3369244B2 (ja) 1993-03-12 2003-01-20 株式会社半導体エネルギー研究所 薄膜トランジスタ
JP3347803B2 (ja) 1993-03-22 2002-11-20 株式会社半導体エネルギー研究所 半導体回路およびその作製方法
EP0661731B1 (de) * 1993-12-28 2000-05-31 Applied Materials, Inc. Gasphasenabscheidungsverfahren in einer einzigen Kammer für Dünnfilmtransistoren
JP3599290B2 (ja) * 1994-09-19 2004-12-08 株式会社ルネサステクノロジ 半導体装置
US5773309A (en) * 1994-10-14 1998-06-30 The Regents Of The University Of California Method for producing silicon thin-film transistors with enhanced forward current drive
JPH08248441A (ja) * 1995-03-09 1996-09-27 Toshiba Corp 液晶表示装置
US5652156A (en) * 1995-04-10 1997-07-29 Taiwan Semiconductor Manufacturing Company Ltd. Layered polysilicon deposition method
US5691228A (en) * 1996-01-18 1997-11-25 Micron Technology, Inc. Semiconductor processing method of making a hemispherical grain (HSG) polysilicon layer
US5869389A (en) * 1996-01-18 1999-02-09 Micron Technology, Inc. Semiconductor processing method of providing a doped polysilicon layer
US6063654A (en) * 1996-02-20 2000-05-16 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a thin film transistor involving laser treatment
US5767004A (en) * 1996-04-22 1998-06-16 Chartered Semiconductor Manufacturing, Ltd. Method for forming a low impurity diffusion polysilicon layer
KR19980016818A (ko) 1996-08-29 1998-06-05 김광호 반도체 장치 제조방법
JPH10172919A (ja) 1996-12-11 1998-06-26 Sony Corp レーザーアニール方法及び装置
JP3282582B2 (ja) 1998-04-21 2002-05-13 日本電気株式会社 トップゲート型薄膜トランジスタ及びその製造方法
US5956603A (en) * 1998-08-27 1999-09-21 Ultratech Stepper, Inc. Gas immersion laser annealing method suitable for use in the fabrication of reduced-dimension integrated circuits
US6096626A (en) * 1998-09-03 2000-08-01 Micron Technology, Inc. Semiconductor structures and semiconductor processing methods of forming silicon layers
US6150251A (en) * 1999-01-22 2000-11-21 United Microelectronics Corp Method of fabricating gate
US6162716A (en) * 1999-03-26 2000-12-19 Taiwan Semiconductor Manufacturing Company Amorphous silicon gate with mismatched grain-boundary microstructure
US6743680B1 (en) * 2000-06-22 2004-06-01 Advanced Micro Devices, Inc. Process for manufacturing transistors having silicon/germanium channel regions
US6392280B1 (en) * 2000-10-19 2002-05-21 Advanced Micro Devices, Inc. Metal gate with PVD amorphous silicon layer for CMOS devices and method of making with a replacement gate process
US6573193B2 (en) * 2001-08-13 2003-06-03 Taiwan Semiconductor Manufacturing Co., Ltd Ozone-enhanced oxidation for high-k dielectric semiconductor devices
US6790791B2 (en) * 2002-08-15 2004-09-14 Micron Technology, Inc. Lanthanide doped TiOx dielectric films
US6689675B1 (en) * 2002-10-31 2004-02-10 Intel Corporation Method for making a semiconductor device having a high-k gate dielectric

Also Published As

Publication number Publication date
JP4389359B2 (ja) 2009-12-24
EP1304746B1 (de) 2009-04-15
KR100517037B1 (ko) 2005-09-26
KR20030028489A (ko) 2003-04-08
DE60138387D1 (de) 2009-05-28
EP1304746A1 (de) 2003-04-23
US20030096462A1 (en) 2003-05-22
US7052944B2 (en) 2006-05-30
JP2002009295A (ja) 2002-01-11
EP1304746A4 (de) 2006-01-11
TWI283069B (en) 2007-06-21
WO2001099199A1 (fr) 2001-12-27

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