ATE323569T1 - Ein laserbearbeitungssystem und -verfahren - Google Patents
Ein laserbearbeitungssystem und -verfahrenInfo
- Publication number
- ATE323569T1 ATE323569T1 AT02708601T AT02708601T ATE323569T1 AT E323569 T1 ATE323569 T1 AT E323569T1 AT 02708601 T AT02708601 T AT 02708601T AT 02708601 T AT02708601 T AT 02708601T AT E323569 T1 ATE323569 T1 AT E323569T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- controlled
- processing system
- desired effects
- laser processing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/123—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/123—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases
- B23K26/125—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases of mixed gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/127—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an enclosure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/1462—Nozzles; Features related to nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/16—Removal of by-products, e.g. particles or vapours produced during treatment of a workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/384—Removing material by boring or cutting by boring of specially shaped holes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/12—Copper or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/94—Laser ablative material removal
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- Laser Beam Processing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01650029 | 2001-03-22 | ||
IE20010298 | 2001-03-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE323569T1 true ATE323569T1 (de) | 2006-05-15 |
Family
ID=26077327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02708601T ATE323569T1 (de) | 2001-03-22 | 2002-03-22 | Ein laserbearbeitungssystem und -verfahren |
Country Status (10)
Country | Link |
---|---|
US (1) | US7887712B2 (de) |
EP (1) | EP1404481B1 (de) |
JP (1) | JP4643889B2 (de) |
KR (1) | KR100894088B1 (de) |
CN (1) | CN1287945C (de) |
AT (1) | ATE323569T1 (de) |
AU (1) | AU2002242927A1 (de) |
DE (1) | DE60210770T2 (de) |
IE (1) | IES20020202A2 (de) |
WO (1) | WO2002076666A2 (de) |
Families Citing this family (116)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10138866B4 (de) * | 2001-08-08 | 2007-05-16 | Bosch Gmbh Robert | Verfahren zum Bohren eines Lochs in ein Werkstück mittels Laserstrahls |
US7357486B2 (en) | 2001-12-20 | 2008-04-15 | Hewlett-Packard Development Company, L.P. | Method of laser machining a fluid slot |
US20030155328A1 (en) * | 2002-02-15 | 2003-08-21 | Huth Mark C. | Laser micromachining and methods and systems of same |
US6821472B2 (en) * | 2002-04-10 | 2004-11-23 | Siemens Dematic Electronics Assembly Systems, Inc. | Method of laser machining materials with minimal thermal loading |
JP2004090534A (ja) * | 2002-09-02 | 2004-03-25 | Tokyo Electron Ltd | 基板の加工装置および加工方法 |
US20070248307A1 (en) * | 2002-10-04 | 2007-10-25 | Page David J | Transparent light emitting members and method of manufacture |
TW577124B (en) * | 2002-12-03 | 2004-02-21 | Mosel Vitelic Inc | Method for estimating the forming thickness of the oxide layer and determining whether the pipes occur leakages |
US20040188401A1 (en) * | 2003-03-28 | 2004-09-30 | Sadao Mori | Laser processing apparatus |
CA2424442C (en) * | 2003-03-31 | 2011-09-20 | Institut National D'optique | Method for engraving materials using laser etched v-grooves |
DE10317579B4 (de) * | 2003-04-16 | 2016-04-14 | Lasertec Gmbh | Verfahren und Vorrichtung zur Herstellung eines Gesenks in einem Werkstück |
DE20306599U1 (de) * | 2003-04-29 | 2004-09-16 | Kuka Schweissanlagen Gmbh | Schutzgasvorrichtung |
US6969822B2 (en) * | 2003-05-13 | 2005-11-29 | Hewlett-Packard Development Company, L.P. | Laser micromachining systems |
US7754999B2 (en) | 2003-05-13 | 2010-07-13 | Hewlett-Packard Development Company, L.P. | Laser micromachining and methods of same |
US7330301B2 (en) * | 2003-05-14 | 2008-02-12 | Imra America, Inc. | Inexpensive variable rep-rate source for high-energy, ultrafast lasers |
US20050211680A1 (en) * | 2003-05-23 | 2005-09-29 | Mingwei Li | Systems and methods for laser texturing of surfaces of a substrate |
US9242312B2 (en) * | 2003-06-06 | 2016-01-26 | Electro Scientific Industries, Inc. | Laser machining using a surfactant film |
US20050088477A1 (en) * | 2003-10-27 | 2005-04-28 | Barbara Horn | Features in substrates and methods of forming |
US7893386B2 (en) | 2003-11-14 | 2011-02-22 | Hewlett-Packard Development Company, L.P. | Laser micromachining and methods of same |
US20050263497A1 (en) * | 2004-03-26 | 2005-12-01 | Lehane Christopher J | System for laser drilling of shaped holes |
US20050219327A1 (en) | 2004-03-31 | 2005-10-06 | Clarke Leo C | Features in substrates and methods of forming |
US7302309B2 (en) * | 2004-04-26 | 2007-11-27 | Hewlett-Packard Development Company, L.P. | Laser micromachining methods and systems |
US7223674B2 (en) * | 2004-05-06 | 2007-05-29 | Micron Technology, Inc. | Methods for forming backside alignment markers useable in semiconductor lithography |
US20050279453A1 (en) * | 2004-06-17 | 2005-12-22 | Uvtech Systems, Inc. | System and methods for surface cleaning |
DE102004039023A1 (de) * | 2004-08-11 | 2006-02-23 | Siemens Ag | Verfahren zur Bearbeitung eines Werkstücks mittels Laserstrahlung, Laserbearbeitungssystem |
US7390740B2 (en) * | 2004-09-02 | 2008-06-24 | Micron Technology, Inc. | Sloped vias in a substrate, spring-like contacts, and methods of making |
US7923658B2 (en) * | 2004-09-13 | 2011-04-12 | Hewlett-Packard Development Company, L.P. | Laser micromachining methods and systems |
US20080096367A1 (en) * | 2004-10-05 | 2008-04-24 | Koninklijke Philips Electronics, N.V. | Method for Laser Dicing of a Substrate |
US7508853B2 (en) | 2004-12-07 | 2009-03-24 | Imra, America, Inc. | Yb: and Nd: mode-locked oscillators and fiber systems incorporated in solid-state short pulse laser systems |
WO2006122429A1 (en) * | 2005-05-19 | 2006-11-23 | Corporation De L'École Polytechnique De Montréal | Process for direct laser micromachining of optical waveguides and optical waveguides produced thereby |
NL1030195C2 (nl) * | 2005-10-14 | 2007-04-17 | Fico Bv | Werkwijze en inrichting voor het met een scherpe hoek lasersnijden van dragers voor elektronische componenten. |
US20070131659A1 (en) * | 2005-12-09 | 2007-06-14 | Durocher Kevin M | Method of making an electronic device cooling system |
GB2434767A (en) * | 2006-02-02 | 2007-08-08 | Xsil Technology Ltd | Laser machining |
US7968820B2 (en) * | 2006-06-02 | 2011-06-28 | Electro Scientific Industries, Inc. | Method of producing a panel having an area with light transmissivity |
US8394301B2 (en) * | 2006-06-02 | 2013-03-12 | Electro Scientific Industries, Inc. | Process for forming panel with an optically transmissive portion and products related thereto |
JP5124568B2 (ja) * | 2006-06-02 | 2013-01-23 | エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド | 光透過性部分を有するパネルの製造方法及びその方法を用いて製造されたパネル |
US7862555B2 (en) * | 2006-07-13 | 2011-01-04 | Reliant Technologies | Apparatus and method for adjustable fractional optical dermatological treatment |
US20080029152A1 (en) * | 2006-08-04 | 2008-02-07 | Erel Milshtein | Laser scribing apparatus, systems, and methods |
WO2008033135A1 (en) * | 2006-09-14 | 2008-03-20 | Cencorp Usa, Inc. | System for and method of laser cutting of materials in a vacuum environment with a vacuum system |
US20080067160A1 (en) * | 2006-09-14 | 2008-03-20 | Jouni Suutarinen | Systems and methods for laser cutting of materials |
FR2909297B1 (fr) * | 2006-11-30 | 2010-03-05 | Snecma | Procede de percage laser d'une piece en materiau composite a matrice ceramique, trou obtenu par ce procede, piece en materiau composite a matrice ceramique le comportant, turboreacteur comportant une telle piece. |
US7705613B2 (en) * | 2007-01-03 | 2010-04-27 | Abhay Misra | Sensitivity capacitive sensor |
WO2008126742A1 (ja) * | 2007-04-05 | 2008-10-23 | Cyber Laser Inc. | レーザ加工方法及び切断方法並びに多層基板を有する構造体の分割方法 |
JP4947446B2 (ja) * | 2007-06-11 | 2012-06-06 | 日立金属株式会社 | I型オイルリング用線材およびその製造方法 |
JP4983918B2 (ja) * | 2007-06-11 | 2012-07-25 | 日立金属株式会社 | レーザ加工方法およびオイルリング用線材 |
US8288682B2 (en) * | 2007-09-28 | 2012-10-16 | Intel Corporation | Forming micro-vias using a two stage laser drilling process |
GB2458475B (en) * | 2008-03-18 | 2011-10-26 | Xsil Technology Ltd | Processing of multilayer semiconductor wafers |
US20110147351A1 (en) * | 2008-06-04 | 2011-06-23 | Mitsubishi Electric Corporation | Laser processing apparatus and laser processing method |
JP2010034413A (ja) * | 2008-07-30 | 2010-02-12 | Hamamatsu Photonics Kk | 固体レーザ装置 |
TWI367712B (en) * | 2008-09-16 | 2012-07-01 | Unimicron Technology Corp | Wiring board and process for fabricating the same |
WO2010032465A1 (ja) * | 2008-09-22 | 2010-03-25 | 株式会社アルバック | 太陽電池の製造方法 |
DK2165796T3 (da) * | 2008-09-22 | 2012-02-06 | Univ Nat Taiwan | Fremgangsmåde til boring af mikrohuller |
DE102008048502A1 (de) * | 2008-09-23 | 2010-04-01 | Precitec Kg | Optische Vorrichtung zur Fokussierung eines Laserstrahls in einen Arbeitsfokus, insbesondere zur Fokussierung eines Laserstrahls in einem Laserbearbeitungskopf zur Materialbearbeitung |
GB0900036D0 (en) * | 2009-01-03 | 2009-02-11 | M Solv Ltd | Method and apparatus for forming grooves with complex shape in the surface of apolymer |
TW201026849A (en) * | 2009-01-09 | 2010-07-16 | Univ Nat Taiwan | Cell pattern and method producing thereof |
KR20100107253A (ko) * | 2009-03-25 | 2010-10-05 | 삼성모바일디스플레이주식회사 | 기판 절단 장치 및 이를 이용한 기판 절단 방법 |
KR101041137B1 (ko) * | 2009-03-25 | 2011-06-13 | 삼성모바일디스플레이주식회사 | 기판 절단 장치 및 이를 이용한 기판 절단 방법 |
US20130256286A1 (en) * | 2009-12-07 | 2013-10-03 | Ipg Microsystems Llc | Laser processing using an astigmatic elongated beam spot and using ultrashort pulses and/or longer wavelengths |
KR20120098869A (ko) * | 2009-12-07 | 2012-09-05 | 제이피 서셀 어소시에트, 인코퍼레이티드 | 레이저 가공과 스크라이빙 시스템 및 방법 |
CN102917834B (zh) * | 2010-05-27 | 2016-08-03 | 三菱电机株式会社 | 激光加工方法及激光加工机 |
CN103262654A (zh) * | 2010-12-17 | 2013-08-21 | 龙云株式会社 | 图案化方法 |
US8878095B2 (en) * | 2010-12-17 | 2014-11-04 | Electro Scientific Industries, Inc. | Reducing back-reflection in laser micromachining systems |
JP5869259B2 (ja) * | 2011-08-24 | 2016-02-24 | 株式会社ディスコ | 穿孔方法およびレーザー加工装置 |
CH705662A1 (de) * | 2011-11-04 | 2013-05-15 | Alstom Technology Ltd | Prozess zur Herstellung von Gegenständen aus einer durch Gamma-Prime-Ausscheidung verfestigten Superlegierung auf Nickelbasis durch selektives Laserschmelzen (SLM). |
CN102489885B (zh) * | 2011-12-20 | 2015-12-09 | 深圳市木森科技有限公司 | 一种激光钻开锥孔的方法和装置 |
WO2013101240A1 (en) | 2011-12-31 | 2013-07-04 | Intel Corporation | Manufacturing advanced test probes |
JP5884614B2 (ja) * | 2012-04-11 | 2016-03-15 | セイコーエプソン株式会社 | セラミックス加工方法 |
US9515217B2 (en) * | 2012-11-05 | 2016-12-06 | Solexel, Inc. | Monolithically isled back contact back junction solar cells |
WO2014152898A2 (en) * | 2013-03-14 | 2014-09-25 | The University Of Massachusetts | Peltier-cooled cryogenic laser ablation cell |
WO2014145305A1 (en) * | 2013-03-15 | 2014-09-18 | Electro Scientific Industries, Inc. | Laser emission-based control of beam positioner |
CN103687337B (zh) * | 2013-12-11 | 2017-02-15 | 广州兴森快捷电路科技有限公司 | 封装基板通孔的激光加工方法 |
US9787345B2 (en) | 2014-03-31 | 2017-10-10 | Apple Inc. | Laser welding of transparent and opaque materials |
CN103921004A (zh) * | 2014-04-18 | 2014-07-16 | 安捷利(番禺)电子实业有限公司 | 一种uv激光钻孔制备多层结构通孔的方法 |
WO2015172786A1 (en) * | 2014-05-14 | 2015-11-19 | Hidden Led Aps | Process for manufacturing translucent holes in metal |
CN105436718A (zh) * | 2014-08-26 | 2016-03-30 | 安捷利电子科技(苏州)有限公司 | 一种uv激光钻孔制备具有可控锥度盲孔的方法 |
US10200516B2 (en) | 2014-08-28 | 2019-02-05 | Apple Inc. | Interlocking ceramic and optical members |
CN104353933B (zh) * | 2014-10-22 | 2017-05-31 | 信阳师范学院 | 光伏电池片的激光划片装置 |
US10357848B2 (en) * | 2015-01-19 | 2019-07-23 | General Electric Company | Laser machining systems and methods |
US10328529B2 (en) | 2015-08-26 | 2019-06-25 | Electro Scientific Industries, Inc | Laser scan sequencing and direction with respect to gas flow |
JP2017147296A (ja) * | 2016-02-16 | 2017-08-24 | 株式会社ディスコ | 加工装置 |
JP2018016525A (ja) * | 2016-07-29 | 2018-02-01 | 三星ダイヤモンド工業株式会社 | 脆性材料基板のレーザー加工方法およびレーザー加工装置 |
US10256144B2 (en) * | 2017-04-26 | 2019-04-09 | Applied Materials, Inc. | Process integration approach of selective tungsten via fill |
US11404313B2 (en) | 2017-04-26 | 2022-08-02 | Applied Materials, Inc. | Selective tungsten deposition at low temperatures |
PL3398709T3 (pl) * | 2017-05-03 | 2021-06-28 | Agathon AG, Maschinenfabrik | Układ do obróbki laserowej z koncepcją termiczną |
US10825692B2 (en) * | 2018-12-20 | 2020-11-03 | Advanced Micro Devices, Inc. | Semiconductor chip gettering |
US11342256B2 (en) | 2019-01-24 | 2022-05-24 | Applied Materials, Inc. | Method of fine redistribution interconnect formation for advanced packaging applications |
DE102019108131A1 (de) * | 2019-03-28 | 2020-10-01 | Pulsar Photonics Gmbh | Vorrichtung und Verfahren zur Ausbildung von VIA-Laserbohrungen |
WO2020225448A1 (de) * | 2019-05-08 | 2020-11-12 | Wsoptics Technologies Gmbh | Verfahren zur strahlbearbeitung eines werkstücks |
IT201900006740A1 (it) | 2019-05-10 | 2020-11-10 | Applied Materials Inc | Procedimenti di strutturazione di substrati |
IT201900006736A1 (it) | 2019-05-10 | 2020-11-10 | Applied Materials Inc | Procedimenti di fabbricazione di package |
US11164780B2 (en) | 2019-06-07 | 2021-11-02 | Applied Materials, Inc. | Process integration approach for selective metal via fill |
US11931855B2 (en) | 2019-06-17 | 2024-03-19 | Applied Materials, Inc. | Planarization methods for packaging substrates |
US20210035767A1 (en) * | 2019-07-29 | 2021-02-04 | Applied Materials, Inc. | Methods for repairing a recess of a chamber component |
KR102374612B1 (ko) * | 2019-08-22 | 2022-03-15 | 삼성디스플레이 주식회사 | 레이저 장치 및 레이저 가공 방법 |
US11094588B2 (en) | 2019-09-05 | 2021-08-17 | Applied Materials, Inc. | Interconnection structure of selective deposition process |
US11862546B2 (en) | 2019-11-27 | 2024-01-02 | Applied Materials, Inc. | Package core assembly and fabrication methods |
US11523491B2 (en) * | 2019-12-04 | 2022-12-06 | The Esab Group Inc. | Methods of making and assembling together components of plasma torch electrode |
CN113146054A (zh) * | 2020-01-23 | 2021-07-23 | 上海新微技术研发中心有限公司 | 激光加工装置及激光加工方法 |
TW202132035A (zh) * | 2020-02-28 | 2021-09-01 | 美商伊雷克托科學工業股份有限公司 | 雷射處理設備、操作其的方法以及使用其來處理工件的方法 |
US11257790B2 (en) | 2020-03-10 | 2022-02-22 | Applied Materials, Inc. | High connectivity device stacking |
US11454884B2 (en) | 2020-04-15 | 2022-09-27 | Applied Materials, Inc. | Fluoropolymer stamp fabrication method |
US11400545B2 (en) | 2020-05-11 | 2022-08-02 | Applied Materials, Inc. | Laser ablation for package fabrication |
US11232951B1 (en) * | 2020-07-14 | 2022-01-25 | Applied Materials, Inc. | Method and apparatus for laser drilling blind vias |
CN111816557A (zh) * | 2020-07-20 | 2020-10-23 | 浙江晶科能源有限公司 | 太阳能电池片的切割方法、切割设备和光伏组件 |
US11676832B2 (en) * | 2020-07-24 | 2023-06-13 | Applied Materials, Inc. | Laser ablation system for package fabrication |
US20220032402A1 (en) * | 2020-08-01 | 2022-02-03 | Avonisys Ag | Methods and systems for machining precision micro holes into thick ceramic substrates |
DE102020123789A1 (de) | 2020-09-11 | 2022-03-17 | Trumpf Laser- Und Systemtechnik Gmbh | Verfahren zum Trennen eines Werkstücks |
CN112188740B (zh) * | 2020-10-13 | 2021-12-07 | 安捷利(番禺)电子实业有限公司 | 一种5g高频mpi材料钻孔方法 |
US12030135B2 (en) | 2020-10-14 | 2024-07-09 | Applied Materials, Inc. | Methods to fabricate chamber component holes using laser drilling |
US11819948B2 (en) | 2020-10-14 | 2023-11-21 | Applied Materials, Inc. | Methods to fabricate chamber component holes using laser drilling |
US11521937B2 (en) | 2020-11-16 | 2022-12-06 | Applied Materials, Inc. | Package structures with built-in EMI shielding |
US11404318B2 (en) | 2020-11-20 | 2022-08-02 | Applied Materials, Inc. | Methods of forming through-silicon vias in substrates for advanced packaging |
KR20220072012A (ko) * | 2020-11-23 | 2022-06-02 | 삼성디스플레이 주식회사 | 글라스 및 그 제조 방법 |
CN112756819B (zh) * | 2020-12-24 | 2022-02-08 | 清华大学 | 一种交变电场辅助飞秒激光加工微通道的系统及方法 |
CN114951967A (zh) * | 2021-02-19 | 2022-08-30 | 深圳市大族数控科技股份有限公司 | 基于超快激光的微通孔加工方法和系统 |
US11705365B2 (en) | 2021-05-18 | 2023-07-18 | Applied Materials, Inc. | Methods of micro-via formation for advanced packaging |
WO2024004111A1 (ja) * | 2022-06-29 | 2024-01-04 | ファナック株式会社 | レーザ加工方法、加工プログラム及び制御装置 |
Family Cites Families (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1621355A1 (de) | 1967-06-09 | 1971-05-13 | Steigerwald Strahltech | Verfahren zur Behandlung der Innenflaechen von Bohrungen in Werkstuecken |
US3773404A (en) * | 1972-06-30 | 1973-11-20 | Western Electric Co | Telecentric lens |
US4341942A (en) | 1978-10-31 | 1982-07-27 | International Business Machines Corporation | Method of bonding wires to passivated chip microcircuit conductors |
US4260649A (en) * | 1979-05-07 | 1981-04-07 | The Perkin-Elmer Corporation | Laser induced dissociative chemical gas phase processing of workpieces |
JPS58125677A (ja) * | 1982-01-14 | 1983-07-26 | 株式会社豊田中央研究所 | セラミツクスのレ−ザ加工方法 |
KR920004171B1 (ko) * | 1984-07-11 | 1992-05-30 | 가부시기가이샤 히다찌세이사꾸쇼 | 드라이에칭장치 |
US4624736A (en) * | 1984-07-24 | 1986-11-25 | The United States Of America As Represented By The United States Department Of Energy | Laser/plasma chemical processing of substrates |
JPS6183617A (ja) * | 1984-09-26 | 1986-04-28 | Nec Corp | 多重レ−ザ−ビ−ム照射によるSi酸化法 |
GB8516984D0 (en) * | 1985-07-04 | 1985-08-07 | British Telecomm | Etching method |
US4639572A (en) | 1985-11-25 | 1987-01-27 | Ibm Corporation | Laser cutting of composite materials |
US4972061A (en) * | 1987-12-17 | 1990-11-20 | Duley Walter W | Laser surface treatment |
JPH0262039A (ja) * | 1988-08-29 | 1990-03-01 | Hitachi Ltd | 多層素子の微細加工方法およびその装置 |
JPH0292486A (ja) * | 1988-09-30 | 1990-04-03 | Toshiba Corp | ハイブリッドモジュール用回路基板の製造方法 |
US5322988A (en) * | 1990-03-29 | 1994-06-21 | The United States Of America As Represented By The Secretary Of The Navy | Laser texturing |
US5059763A (en) | 1990-06-06 | 1991-10-22 | Massachusetts Institute Of Technology | Formation of optical quality surfaces in optical material |
GB9015820D0 (en) * | 1990-07-18 | 1990-09-05 | Raychem Ltd | Processing microchips |
US5292686A (en) * | 1991-08-21 | 1994-03-08 | Triquint Semiconductor, Inc. | Method of forming substrate vias in a GaAs wafer |
JPH0631478A (ja) * | 1992-07-20 | 1994-02-08 | Fujitsu Ltd | レーザアブレーション加工法および多層配線構造体の製造法 |
DE4309279A1 (de) | 1993-03-23 | 1994-09-29 | Sel Alcatel Ag | Verfahren zur Herstellung einer Lichtwellenleiterkopplung |
US5562838A (en) | 1993-03-29 | 1996-10-08 | Martin Marietta Corporation | Optical light pipe and microwave waveguide interconnects in multichip modules formed using adaptive lithography |
JP3082013B2 (ja) * | 1993-05-31 | 2000-08-28 | 住友重機械工業株式会社 | レーザ加工方法および装置 |
IT1261304B (it) * | 1993-06-21 | 1996-05-14 | Lara Consultants Srl | Processo di taglio mediante un fascio laser |
US5431774A (en) * | 1993-11-30 | 1995-07-11 | Texas Instruments Incorporated | Copper etching |
US5883005A (en) * | 1994-03-25 | 1999-03-16 | California Institute Of Technology | Semiconductor etching by hyperthermal neutral beams |
JP3534820B2 (ja) * | 1994-05-18 | 2004-06-07 | 三菱電機株式会社 | レーザ加工方法及び該方法を実施するためのレーザ加工装置 |
JPH0862827A (ja) * | 1994-08-19 | 1996-03-08 | Fujitsu Ltd | 位相シフトマスクおよびその修正方法 |
KR970008386A (ko) | 1995-07-07 | 1997-02-24 | 하라 세이지 | 기판의 할단(割斷)방법 및 그 할단장치 |
US6373026B1 (en) * | 1996-07-31 | 2002-04-16 | Mitsubishi Denki Kabushiki Kaisha | Laser beam machining method for wiring board, laser beam machining apparatus for wiring board, and carbonic acid gas laser oscillator for machining wiring board |
US5747769A (en) * | 1995-11-13 | 1998-05-05 | General Electric Company | Method of laser forming a slot |
US6043453A (en) * | 1996-02-23 | 2000-03-28 | Hitachi Via Mechanics Ltd. | Apparatus for laser processing with a mechanical cutter |
US5656535A (en) * | 1996-03-04 | 1997-08-12 | Siemens Aktiengesellschaft | Storage node process for deep trench-based DRAM |
US5874011A (en) * | 1996-08-01 | 1999-02-23 | Revise, Inc. | Laser-induced etching of multilayer materials |
IL119246A (en) * | 1996-09-12 | 2000-10-31 | Oramir Semiconductor Ltd | Laser removal of foreign materials from surfaces |
US6103992A (en) * | 1996-11-08 | 2000-08-15 | W. L. Gore & Associates, Inc. | Multiple frequency processing to minimize manufacturing variability of high aspect ratio micro through-vias |
US6668454B2 (en) * | 1997-12-10 | 2003-12-30 | Canon Kabushiki Kaisha | Method for manufacturing a liquid-discharging recording head |
US6331208B1 (en) * | 1998-05-15 | 2001-12-18 | Canon Kabushiki Kaisha | Process for producing solar cell, process for producing thin-film semiconductor, process for separating thin-film semiconductor, and process for forming semiconductor |
JP4162772B2 (ja) | 1998-09-09 | 2008-10-08 | 日酸Tanaka株式会社 | レーザピアシング方法およびレーザ切断装置 |
US6563079B1 (en) | 1999-02-25 | 2003-05-13 | Seiko Epson Corporation | Method for machining work by laser beam |
US6552301B2 (en) * | 2000-01-25 | 2003-04-22 | Peter R. Herman | Burst-ultrafast laser machining method |
JP2002009435A (ja) | 2000-06-20 | 2002-01-11 | Sumitomo Heavy Ind Ltd | 有機物基板におけるビア処理方法及びビア形成方法 |
JP2002050849A (ja) * | 2000-08-07 | 2002-02-15 | Matsushita Electric Ind Co Ltd | レーザ加工方法およびレーザ加工装置 |
WO2002034455A1 (en) * | 2000-10-26 | 2002-05-02 | Xsil Technology Limited | Control of laser machining |
US6456173B1 (en) * | 2001-02-15 | 2002-09-24 | Nokia Mobile Phones Ltd. | Method and system for wafer-level tuning of bulk acoustic wave resonators and filters |
US6806440B2 (en) * | 2001-03-12 | 2004-10-19 | Electro Scientific Industries, Inc. | Quasi-CW diode pumped, solid-state UV laser system and method employing same |
-
2002
- 2002-03-22 DE DE60210770T patent/DE60210770T2/de not_active Expired - Lifetime
- 2002-03-22 KR KR1020037012330A patent/KR100894088B1/ko not_active IP Right Cessation
- 2002-03-22 AT AT02708601T patent/ATE323569T1/de not_active IP Right Cessation
- 2002-03-22 JP JP2002575169A patent/JP4643889B2/ja not_active Expired - Fee Related
- 2002-03-22 US US10/102,702 patent/US7887712B2/en not_active Expired - Fee Related
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- 2002-03-22 EP EP02708601A patent/EP1404481B1/de not_active Expired - Lifetime
- 2002-03-22 CN CNB028088913A patent/CN1287945C/zh not_active Expired - Fee Related
- 2002-03-22 AU AU2002242927A patent/AU2002242927A1/en not_active Abandoned
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KR20030088463A (ko) | 2003-11-19 |
US20020170891A1 (en) | 2002-11-21 |
IE20020203A1 (en) | 2002-10-02 |
CN1561277A (zh) | 2005-01-05 |
DE60210770D1 (de) | 2006-05-24 |
US7887712B2 (en) | 2011-02-15 |
CN1287945C (zh) | 2006-12-06 |
AU2002242927A1 (en) | 2002-10-08 |
DE60210770T2 (de) | 2006-08-31 |
WO2002076666A2 (en) | 2002-10-03 |
JP2005507318A (ja) | 2005-03-17 |
KR100894088B1 (ko) | 2009-04-20 |
EP1404481A2 (de) | 2004-04-07 |
WO2002076666A3 (en) | 2004-02-12 |
JP4643889B2 (ja) | 2011-03-02 |
EP1404481B1 (de) | 2006-04-19 |
IES20020202A2 (en) | 2002-10-02 |
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