ATE309884T1 - Oberflächenbearbeitungsverfahren und oberflächenbearbeitungsvorrichtung für halbleiterscheiben - Google Patents
Oberflächenbearbeitungsverfahren und oberflächenbearbeitungsvorrichtung für halbleiterscheibenInfo
- Publication number
- ATE309884T1 ATE309884T1 AT99108151T AT99108151T ATE309884T1 AT E309884 T1 ATE309884 T1 AT E309884T1 AT 99108151 T AT99108151 T AT 99108151T AT 99108151 T AT99108151 T AT 99108151T AT E309884 T1 ATE309884 T1 AT E309884T1
- Authority
- AT
- Austria
- Prior art keywords
- surface processing
- wafer
- transfer device
- suction
- processing device
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11733398 | 1998-04-27 | ||
JP11733798 | 1998-04-27 | ||
JP11001318A JP3117132B2 (ja) | 1998-04-27 | 1999-01-06 | ウェーハの平面加工装置 |
JP325199A JP3259251B2 (ja) | 1998-04-27 | 1999-01-08 | ウェーハの平面加工装置及びその平面加工方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE309884T1 true ATE309884T1 (de) | 2005-12-15 |
Family
ID=27453377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99108151T ATE309884T1 (de) | 1998-04-27 | 1999-04-26 | Oberflächenbearbeitungsverfahren und oberflächenbearbeitungsvorrichtung für halbleiterscheiben |
Country Status (4)
Country | Link |
---|---|
US (2) | US6257966B1 (de) |
EP (1) | EP0953409B1 (de) |
AT (1) | ATE309884T1 (de) |
DE (1) | DE69928319T2 (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3702668B2 (ja) * | 1998-09-28 | 2005-10-05 | 株式会社村田製作所 | 電子部品チップ供給装置 |
US6406359B1 (en) * | 1999-06-01 | 2002-06-18 | Applied Materials, Inc. | Apparatus for transferring semiconductor substrates using an input module |
EP1080840A3 (de) * | 1999-08-30 | 2004-01-02 | Mitsubishi Materials Corporation | Polierverfahren und Vorrichtung und Verfahren zum Abrichten eines Polierkissen |
JP2001077057A (ja) * | 1999-09-06 | 2001-03-23 | Disco Abrasive Syst Ltd | Csp基板分割装置 |
JP2001213367A (ja) * | 2000-02-04 | 2001-08-07 | Fukashi Uragami | 負圧調整機構を備えた吸い込み装置 |
US6413145B1 (en) | 2000-04-05 | 2002-07-02 | Applied Materials, Inc. | System for polishing and cleaning substrates |
US6488565B1 (en) * | 2000-08-29 | 2002-12-03 | Applied Materials, Inc. | Apparatus for chemical mechanical planarization having nested load cups |
JP3433930B2 (ja) * | 2001-02-16 | 2003-08-04 | 株式会社東京精密 | ウェーハの平面加工装置及びその平面加工方法 |
JP4617028B2 (ja) * | 2001-08-17 | 2011-01-19 | 株式会社ディスコ | 加工歪除去装置 |
JP2003197581A (ja) * | 2001-10-18 | 2003-07-11 | Fujitsu Ltd | 板状物支持部材及びその使用方法 |
JP3892703B2 (ja) * | 2001-10-19 | 2007-03-14 | 富士通株式会社 | 半導体基板用治具及びこれを用いた半導体装置の製造方法 |
FR2831148B1 (fr) * | 2001-10-22 | 2004-01-02 | Gemplus Card Int | Procede et dispositif de manipulation d'un wafer |
US6752703B2 (en) * | 2001-12-21 | 2004-06-22 | Lam Research Corporation | Chemical mechanical polishing apparatus and methods with porous vacuum chuck and perforated carrier film |
US7235139B2 (en) * | 2003-10-28 | 2007-06-26 | Veeco Instruments Inc. | Wafer carrier for growing GaN wafers |
US6953393B2 (en) * | 2003-12-19 | 2005-10-11 | Optodisc Technology Corporation | Apparatus for removing burrs from a compact disc |
US6910956B1 (en) * | 2003-12-22 | 2005-06-28 | Powerchip Semiconductor Corp. | Wafer grinding apparatus |
CN100351040C (zh) * | 2004-03-25 | 2007-11-28 | 力晶半导体股份有限公司 | 晶片研磨机台 |
KR100753302B1 (ko) * | 2004-03-25 | 2007-08-29 | 이비덴 가부시키가이샤 | 진공 척, 흡착판, 연마 장치 및 반도체 웨이퍼의 제조 방법 |
CN101115862A (zh) * | 2005-02-16 | 2008-01-30 | 维高仪器股份有限公司 | 用于生长GaN晶片的晶片承载器 |
US7258599B2 (en) * | 2005-09-15 | 2007-08-21 | Fujitsu Limited | Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device |
JP4580327B2 (ja) * | 2005-11-21 | 2010-11-10 | 東京エレクトロン株式会社 | 被処理体の取り出し方法及びプログラム記憶媒体並びに載置機構 |
DE102007022603A1 (de) * | 2007-05-12 | 2008-11-13 | Kapp Gmbh | Hartfeinbearbeitungsmaschine |
DE102007041332A1 (de) * | 2007-08-31 | 2009-03-05 | Siemens Ag | Transferchuck zur Übertragung, insbesondere von Wafern |
JP4985513B2 (ja) * | 2008-03-26 | 2012-07-25 | 富士通セミコンダクター株式会社 | 電子部品の剥離方法及び剥離装置 |
US8545290B2 (en) * | 2010-12-08 | 2013-10-01 | Edmond Arzuman Abrahamians | Wafer polishing apparatus and method |
US8535118B2 (en) * | 2011-09-20 | 2013-09-17 | International Business Machines Corporation | Multi-spindle chemical mechanical planarization tool |
JP5687647B2 (ja) * | 2012-03-14 | 2015-03-18 | 株式会社東芝 | 半導体装置の製造方法、半導体製造装置 |
KR101409752B1 (ko) * | 2012-04-26 | 2014-07-08 | 주식회사 탑 엔지니어링 | 기판 이송 로봇을 이용한 멀티 챔버 기판 처리 장치 |
US9142916B2 (en) | 2013-03-15 | 2015-09-22 | Tyco Electronics Corporation | Connector assembly with receptacle carriers |
CN104227704A (zh) * | 2014-08-20 | 2014-12-24 | 苏州昌飞自动化设备厂 | 一种带三坐标微调的升降吸盘机械手的y轴微调座 |
CN104227705A (zh) * | 2014-08-20 | 2014-12-24 | 苏州昌飞自动化设备厂 | 一种带三坐标微调的升降吸盘机械手 |
US9748090B2 (en) | 2015-01-22 | 2017-08-29 | Toshiba Memory Corporation | Semiconductor manufacturing apparatus and manufacturing method of semiconductor device |
JP6503194B2 (ja) * | 2015-02-16 | 2019-04-17 | 株式会社Screenホールディングス | 基板処理装置 |
KR102541489B1 (ko) * | 2016-02-26 | 2023-06-08 | 삼성전자주식회사 | 기판 세정 장치 및 이를 이용한 기판 세정 설비 |
WO2018068854A1 (en) * | 2016-10-13 | 2018-04-19 | Osram Opto Semiconductors Gmbh | Pick-up tool |
CN109352492A (zh) * | 2018-12-12 | 2019-02-19 | 徐锐 | 一种多工位3d海绵打磨机 |
CN110919526A (zh) * | 2019-11-24 | 2020-03-27 | 湖南凯通电子有限公司 | 陶瓷基板研磨机 |
US20210323117A1 (en) * | 2020-04-16 | 2021-10-21 | Applied Materials, Inc. | High throughput polishing modules and modular polishing systems |
KR20220116312A (ko) * | 2020-11-05 | 2022-08-22 | 어플라이드 머티어리얼스, 인코포레이티드 | 수평 버핑 모듈 |
WO2022132310A1 (en) * | 2020-12-18 | 2022-06-23 | Applied Materials, Inc. | Pad carrier for horizontal pre-clean module |
EP4377047A1 (de) * | 2021-07-28 | 2024-06-05 | Applied Materials, Inc. | Poliermodule mit hohem durchsatz und modulare poliersysteme |
CN114260217A (zh) * | 2021-12-13 | 2022-04-01 | 上海提牛机电设备有限公司 | 晶圆清洗系统 |
CN114850113B (zh) * | 2022-04-26 | 2024-01-09 | 中环领先半导体材料有限公司 | 一种减薄载台的清洗方法 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4141180A (en) * | 1977-09-21 | 1979-02-27 | Kayex Corporation | Polishing apparatus |
JPS58182234A (ja) * | 1982-04-17 | 1983-10-25 | Dainippon Screen Mfg Co Ltd | 複数種のブラシ使用可能な洗浄装置 |
JPS60155358A (ja) * | 1984-01-23 | 1985-08-15 | Disco Abrasive Sys Ltd | 半導体ウエ−ハの表面を研削する方法及び装置 |
US4680893A (en) * | 1985-09-23 | 1987-07-21 | Motorola, Inc. | Apparatus for polishing semiconductor wafers |
US4638601A (en) * | 1985-11-04 | 1987-01-27 | Silicon Technology Corporation | Automatic edge grinder |
JPS63106139A (ja) | 1986-06-23 | 1988-05-11 | Toyoda Mach Works Ltd | 4輪駆動車 |
JP2511994B2 (ja) | 1987-08-04 | 1996-07-03 | 曙ブレーキ工業株式会社 | デイスクブレ−キ用間隙自動調整装置 |
JPH02131892A (ja) | 1988-11-05 | 1990-05-21 | Sharp Corp | 部品保持装置 |
US5189843A (en) * | 1990-08-30 | 1993-03-02 | Silicon Technology Corporation | Wafer slicing and grinding machine and a method of slicing and grinding wafers |
JP3121886B2 (ja) | 1991-11-29 | 2001-01-09 | 京セラ株式会社 | 真空吸着装置 |
JPH0615565A (ja) * | 1991-12-18 | 1994-01-25 | Shin Etsu Handotai Co Ltd | ウエーハ自動ラッピング装置 |
DE4213492C1 (de) * | 1992-04-24 | 1993-11-11 | Deutsche Aerospace Airbus | Spannvorrichtung für Werkstücke |
JP2513426B2 (ja) * | 1993-09-20 | 1996-07-03 | 日本電気株式会社 | ウェ―ハ研磨装置 |
JPH07211677A (ja) * | 1993-11-30 | 1995-08-11 | M Setetsuku Kk | 基板のスクラビング方法とその装置 |
US5421595A (en) * | 1994-03-28 | 1995-06-06 | Motorola, Inc. | Vacuum chuck with venturi jet for converting positive pressure to a vacuum |
US5649854A (en) * | 1994-05-04 | 1997-07-22 | Gill, Jr.; Gerald L. | Polishing apparatus with indexing wafer processing stations |
KR0132274B1 (ko) | 1994-05-16 | 1998-04-11 | 김광호 | 웨이퍼 연마 설비 |
US5674115A (en) * | 1994-07-06 | 1997-10-07 | Sony Corporation | Apparatus for grinding a master disc |
US5679060A (en) * | 1994-07-14 | 1997-10-21 | Silicon Technology Corporation | Wafer grinding machine |
JPH0855896A (ja) | 1994-08-11 | 1996-02-27 | Disco Abrasive Syst Ltd | ウェーハ搬送手段 |
JPH08148450A (ja) | 1994-11-21 | 1996-06-07 | Shibayama Kikai Kk | 半導体ウエハのシリコンスラッジ洗浄方法 |
JP2616735B2 (ja) * | 1995-01-25 | 1997-06-04 | 日本電気株式会社 | ウェハの研磨方法およびその装置 |
JP3111892B2 (ja) * | 1996-03-19 | 2000-11-27 | ヤマハ株式会社 | 研磨装置 |
JPH09254027A (ja) * | 1996-03-25 | 1997-09-30 | Chiyoda Kk | 研磨用マウンテン材 |
JPH10193260A (ja) * | 1996-12-27 | 1998-07-28 | Shin Etsu Handotai Co Ltd | ウエーハ保持治具 |
US6074288A (en) * | 1997-10-30 | 2000-06-13 | Lsi Logic Corporation | Modified carrier films to produce more uniformly polished substrate surfaces |
US5944588A (en) * | 1998-06-25 | 1999-08-31 | International Business Machines Corporation | Chemical mechanical polisher |
-
1999
- 1999-04-26 US US09/298,998 patent/US6257966B1/en not_active Expired - Lifetime
- 1999-04-26 EP EP99108151A patent/EP0953409B1/de not_active Expired - Lifetime
- 1999-04-26 AT AT99108151T patent/ATE309884T1/de not_active IP Right Cessation
- 1999-04-26 DE DE69928319T patent/DE69928319T2/de not_active Expired - Lifetime
-
2001
- 2001-05-24 US US09/863,362 patent/US6517420B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0953409B1 (de) | 2005-11-16 |
EP0953409A3 (de) | 2002-01-09 |
DE69928319D1 (de) | 2005-12-22 |
EP0953409A2 (de) | 1999-11-03 |
US20010024936A1 (en) | 2001-09-27 |
US6257966B1 (en) | 2001-07-10 |
DE69928319T2 (de) | 2006-04-20 |
US6517420B2 (en) | 2003-02-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE309884T1 (de) | Oberflächenbearbeitungsverfahren und oberflächenbearbeitungsvorrichtung für halbleiterscheiben | |
TW338015B (en) | Improved method and apparatus for chemical mechanical polishing | |
DE69512971D1 (de) | Linear Poliergerät und Wafer Planarisierungsverfahren | |
EP1055486A3 (de) | Abrichtvorrichtung und Poliervorrichtung | |
EP0958889A3 (de) | Verfahren und Vorrichtung zum Abfasen einer Halbleiterplatte | |
EP1389505A3 (de) | Poliergerät. | |
EP0776030A3 (de) | Vorrichtung und Verfahren zur beidseitigen Polierung einer Halbleiterscheibe | |
ATE228915T1 (de) | Halbleiterscheiben-polierkopf | |
WO2001069660A3 (en) | Method and apparatus for supporting a substrate | |
WO2002001613A8 (en) | Method and apparatus for wafer cleaning | |
ATE392709T1 (de) | Verfahren und vorrichtung zur reinigung von einem einzigem substrat | |
GB0027626D0 (en) | Treatment of substrates | |
MY140551A (en) | System for processing electronic devices | |
SG73498A1 (en) | Wafer processing apparatus and method wafer convey robot semiconductor substrate fabrication method and semiconductor fabrication apparatus | |
JP3325650B2 (ja) | ウェーハの研磨方法 | |
WO2003022523A1 (fr) | Outil, dispositif et procede de finissage, dispositif de traitement et procede de production de dispositif a semiconducteurs | |
SG100709A1 (en) | Semiconductor wafer assembly and machining apparatus having chuck tables for holding the same | |
SG148017A1 (en) | Transport method and transport apparatus for semiconductor wafer | |
TW376352B (en) | Wafer polishing apparatus having measurement device and polishing method thereby | |
TW375551B (en) | Polishing apparatus for semiconductor wafer | |
GB2375883A (en) | A method and apparatus for implanting semiconductor wafer substrates | |
EP1050369A3 (de) | Verfahren und Vorrichtung zum Polieren von Werkstücken | |
SG97161A1 (en) | Polishing method and polishing apparatus | |
TW200420380A (en) | Polishing method | |
ATE228651T1 (de) | Verfahren und einrichtung zur zerstörungsfreien oberflächen-inspektion |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |