Classifications

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  • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
  • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
  • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
  • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
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  • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
  • B32B7/04—Interconnection of layers
  • B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
  • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
  • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
  • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
  • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
  • C09K11/56—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing sulfur
  • C09K11/562—Chalcogenides
  • C09K11/565—Chalcogenides with zinc cadmium
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
  • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
  • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
  • C09K11/88—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
  • C09K11/881—Chalcogenides
  • C09K11/883—Chalcogenides with zinc or cadmium
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
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  • H10H20/8511—Wavelength conversion means characterised by their material, e.g. binder
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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• • B—PERFORMING OPERATIONS; TRANSPORTING
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  • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
  • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
• • B—PERFORMING OPERATIONS; TRANSPORTING
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  • B82Y40/00—Manufacture or treatment of nanostructures
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
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• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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  • Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
  • Y10S977/783—Organic host/matrix, e.g. lipid
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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  • Y10T428/31511—Of epoxy ether
  • Y10T428/31515—As intermediate layer

Definitions

• the disclosure relates to quantum dot films and methods of forming quantum dot films having reduced defects.
• Quantum dot films and elements are utilized in display and other optical constructions.
• the quantum dots need to be sealed from oxygen and water.
• these quantum dots have been dispersed in a polymer such as an epoxy and sandwiched between two barrier films.
• the epoxy polymer is formed from a 2-part epoxy amine resin. Increasing the cure temperature is utilized to shorten the cure time of these epoxy polymers.
• the disclosure relates to quantum dot films and method of forming quantum dot films having reduced defects.
• An interpenetrating polymer network is formed by the addition of a radiation curable methacrylate to an epoxy amine laminating adhesive forming a matrix for quantum dots.
• the radiation curable methacrylate increases viscosity of the epoxy amine laminating adhesive to a point that defect generation is eliminated or greatly reduced during high temperature cure of the epoxy amine.
• a quantum dot film article in a first aspect of the disclosure, includes a first barrier film, a second barrier film, and a quantum dot layer separating the first barrier from the second barrier film.
• the quantum dot layer includes quantum dots dispersed in a polymer material.
• the polymer material includes a methacrylate polymer, an epoxy polymer and a photoinitiator.
• the methacrylate polymer comprises 5 to 25 wt% or 10 to 20 wt% of the quantum dot layer. In one or more embodiments, the epoxy polymer comprises 70 to 90 wt% of the quantum dot layer.
• the epoxy polymer comprises an epoxy amine polymer.
• the methacrylate polymer is formed by radiation polymerization of di- or tri- functional methacrylate polymer precursors.
• the epoxy polymer is formed by thermal polymerization of difunctional amine and diepoxide.
• a method of forming a quantum dot film article includes coating a quantum dot material on a first barrier layer and disposing a second barrier layer on the quantum dot material.
• the quantum dot material includes quantum dots, photoinitiator, 5 to 25 %wt methacrylate polymer precursors and 70 to 90 wt% epoxy polymer precursors.
• the quantum dot material having a first viscosity at a first temperature.
• the method of forming a quantum dot film article includes polymerizing the methacrylate polymer precursors to form a partially cured quantum dot material. In one or more embodiments the method of forming a quantum dot film article includes polymerizing the epoxy polymer precursors of the partially cured quantum dot material to form a cured quantum dot material.
• the method of forming a quantum dot film article includes radiation polymerizing the methacrylate polymer precursors. In one or more embodiments the method of forming a quantum dot film article includes thermal polymerizing the epoxy polymer precursors. In one or more embodiments the method of forming a quantum dot film article includes forming a partially cured quantum dot material having a second viscosity at the first temperature being at least 10 times greater than the first viscosity. In one or more embodiments the method of forming a quantum dot film article includes forming a partially cured quantum dot material having a second viscosity at the first temperature being at least 20 times greater than the first viscosity.
• the method of forming a quantum dot film article includes the first viscosity being less than 10000 centipoise. In one or more embodiments the method of forming a quantum dot film article includes the second viscosity being greater than 100000 centipoise.
• the method of forming a quantum dot film article includes epoxy polymer precursors being a difunctional amine and diepoxide. In one or more embodiments the method of forming a quantum dot film article includes methacrylate polymer precursors being di- or tri- functional methacrylate polymer precursors.
• a quantum dot material includes quantum dots, photoinitiator, 5 to 25 %wt methacrylate polymer precursors, and 70 to 90 wt% epoxy polymer precursors.
• the quantum dot material includes UV curable methacrylate polymer precursors and thermally curable epoxy polymer precursors.
• FIG. 1 is a schematic side elevation view of an illustrative quantum dot film
• FIG. 2 is a flow diagram of an illustrative method of forming a quantum dot film.
• spatially related terms including but not limited to, “lower,” “upper,” “beneath,” “below,” “above,” and “on top,” if used herein, are utilized for ease of description to describe spatial relationships of an element(s) to another.
• Such spatially related terms encompass different orientations of the device in use or operation in addition to the particular orientations depicted in the figures and described herein. For example, if an object depicted in the figures is turned over or flipped over, portions previously described as below or beneath other elements would then be above those other elements.
• an element, component or layer for example when an element, component or layer for example is described as forming a "coincident interface" with, or being “on” “connected to,” “coupled with” or “in contact with” another element, component or layer, it can be directly on, directly connected to, directly coupled with, in direct contact with, or intervening elements, components or layers may be on, connected, coupled or in contact with the particular element, component or layer, for example.
• an element, component or layer for example is referred to as being “directly on,” “directly connected to,” “directly coupled with,” or “directly in contact with” another element, there are no intervening elements, components or layers for example.
• the disclosure relates to quantum dot films and methods of forming quantum dot films having reduced defects, among other aspects.
• An interpenetrating polymer network is formed by the addition of a radiation curable methacrylate to an epoxy amine laminating adhesive forming a matrix for quantum dots.
• the radiation curable methacrylate increases a viscosity of the epoxy amine laminating adhesive and reduces defects that would otherwise be created during the thermal acceleration of the epoxy amine.
• the radiation curable methacrylate is provided in a relatively low level (e.g., 5-25 %wt) without reducing the functional properties of the epoxy amine polymer. Following radiation cure, the viscosity of the system is increased greatly allowing for easier handling of the product on the coating and processing line.
• the radiation cure can occur right after lamination of the two barrier films.
• the increase in viscosity locks in the coating quality right after lamination.
• the radiation cure of the methacrylate portion of the laminating adhesive provides greater control over coating, curing and web handling as compared to traditional thermal curing of an epoxy only laminating adhesive. While the present disclosure is not so limited, an appreciation of various aspects of the disclosure will be gained through a discussion of the examples provided below.
• FIG. 1 is a schematic side elevation view of an illustrative quantum dot film 10.
• FIG. 2 is a flow diagram of an illustrative method 100 of forming a quantum dot film.
• a quantum dot (QD) film article 10 includes a first barrier film 32, a second barrier film 34, and a quantum dot layer 20 separating the first barrier 32 from the second barrier film 34.
• the quantum dot layer 20 includes quantum dots dispersed in a polymer material.
• the polymer material includes a methacrylate polymer, an epoxy polymer and a photoinitiator.
• a method of forming a quantum dot film article 100 includes coating a quantum dot material on a first barrier layer 102 and disposing a second barrier layer on the quantum dot material 104.
• the quantum dot material includes quantum dots, photoinitiator, 5 to 25 %wt methacrylate polymer precursors and 70 to 90 wt% epoxy polymer precursors.
• the quantum dot material has a first viscosity at a first temperature.
• the method of forming a quantum dot film article 100 includes polymerizing (e.g., radiation curing) the methacrylate polymer precursors to form a partially cured quantum dot material 106 and polymerizing (e.g., thermal curing) the epoxy polymer precursors of the partially cured quantum dot material to form a cured quantum dot material 108.
• the method of forming a quantum dot film article includes forming a partially cured quantum dot material having a second viscosity at the first temperature being at least 10 times greater or at least 20 times greater than the first viscosity. In one or more embodiments the first viscosity is less than 10000 centipoise and the second viscosity is greater than 100000 centipoise.
• Barrier films 32, 34 can be formed of any useful film material that can protect the quantum dots from environmental conditions such as oxygen and moisture.
• Suitable barrier films include polymers, glass or dielectric materials, for example.
• Suitable barrier layer materials include, but are not limited to, polymers such as polyethylene terephthalate (PET); oxides such as silicon oxide, titanium oxide, or aluminum oxide (e.g., S1O 2 , S1 2 O 3 , T1O 2 , or AI 2 O 3 ); and suitable combinations thereof.
• PET polyethylene terephthalate
• oxides such as silicon oxide, titanium oxide, or aluminum oxide (e.g., S1O 2 , S1 2 O 3 , T1O 2 , or AI 2 O 3 ); and suitable combinations thereof.
• each barrier layer of the QD film includes at least two layers of different materials or compositions, such that the multi-layered barrier eliminates or reduces pinhole defect alignment in the barrier layer, providing an effective barrier to oxygen and moisture penetration into the QD phosphor material.
• the QD film can include any suitable material or combination of materials and any suitable number of barrier layers on either or both sides of the QD phosphor material.
• the materials, thickness, and number of barrier layers will depend on the particular application, and will suitably be chosen to maximize barrier protection and brightness of the QD phosphor while minimizing thickness of the QD film.
• each barrier layer is a laminate film, such as a dual laminate film, where the thickness of each barrier layer is sufficiently thick to eliminate wrinkling in roll-to-roll or laminate manufacturing processes.
• the barrier films are polyester films (e.g., PET) having an oxide layer.
• the quantum dot material 20 can include one or more populations of quantum dot material.
• Exemplary quantum dots or quantum dot material emit green light and red light upon down-conversion of blue primary light from the blue LED to secondary light emitted by the quantum dots. The respective portions of red, green, and blue light can be controlled to achieve a desired white point for the white light emitted by a display device incorporating the quantum dot film article.
• Exemplary quantum dots for use in quantum dot film articles described herein include CdSe with ZnS shells.
• Suitable quantum dots for use in quantum dot film articles described herein include core/shell luminescent nanocrystals including CdSe/ZnS, InP/ZnS, PbSe/PbS, CdSe/CdS, CdTe/CdS or CdTe/ZnS.
• the luminescent nanocrystals include an outer ligand coating and are dispersed in a polymeric matrix.
• Quantum dot and quantum dot material are commercially available from Nanosys Inc., Palo Alto, CA.
• the quantum dot layer can have any useful amount of quantum dots.
• the quantum dot layer can have from 0.1 to l%wt quantum dots.
• the quantum dot material 20 can include scattering beads or particles. These scattering beads or particles have a different refractive index than the refractive index of the epoxy polymer such as, by at least 0.05 or by at least 0.1. These scattering beads or particles can include polymers such as silicone, acrylic, nylon, etc. These scattering beads or particles can include inorganics such as T1O 2 , SiO x , A10 x , etc. The inclusion of scattering particles results in a longer optical path length and improved quantum dot absorption and efficiency. In many embodiments, the particle size is in a range from 1 to 10 micrometers, or from 2 to 6 micrometers. In many embodiments, the quantum dot material 20 can include fillers such fumed silica.
• methacrylates are used to preserve the working time of the epoxy amine polymer system.
• An interpenetrating polymer network is formed by the addition of a radiation curable methacrylate to the epoxy amine laminating adhesive forming a matrix for quantum dots.
• the radiation curable methacrylate increases a viscosity of the epoxy amine laminating adhesive and reduces defects that would otherwise be created during the thermal acceleration of the epoxy amine.
• the radiation curable methacrylate is provided in a relatively low level without reducing the functional properties of the epoxy amine polymer.
• the methacrylate polymer forms 5 to 25 wt% or 10 to 20 wt% of the quantum dot layer.
• the methacrylate polymer forms more than 25 wt% of the quantum dot layer, it has been found that the methacrylate polymer fails to adhere to the barrier film and fails to provide adequate barrier properties. If the methacrylate polymer forms less than 5 wt% of the quantum dot layer, it has been found that the methacrylate polymer fails to adequately increase viscosity of the quantum dot layer.
• the methacrylate polymer is formed by radiation polymerization of di- or tri- functional methacrylate polymer precursors.
• Useful methacrylates are those with acceptable barrier properties, for example those with a bisphenol-A , bisphenol-F and resorcinol backbones.
• Methacrylates with high Tg and high crosslink densities will provide improved gas and water vapor barrier properties.
• the viscosity of the system is increased greatly, thereby allowing for easier handling of the product on the coating and processing lines.
• the radiation cure can occur right after lamination of the two barrier films.
• the increase in viscosity locks in the coating quality right after lamination.
• the UV cured methacrylate increases the viscosity to a point that the resin acts like a pressure sensitive adhesive (PSA) and holds the laminate together during the thermal cure of the epoxy amine and greatly reduces defects during a high temperature cure (70 to 120 degrees centigrade) of the epoxy amine.
• PSA pressure sensitive adhesive
• the radiation cure of the methacrylate portion of the laminating adhesive provides greater control over coating, curing and web handling as compared to traditional thermal curing of an epoxy only laminating adhesive.
• the epoxy polymer includes an epoxy amine polymer.
• the epoxy polymer is formed by thermal polymerization of difunctional amine and diepoxide.
• the epoxy polymer forms 70 to 90 wt% of the quantum dot layer.
• the refractive index of the epoxy amine polymer material is in a range from 1.48 to 1.60 or from 1.50 to 1.57.
• the higher refractive index improves scattering when low refractive index particles or emulsions are used. This results in a longer optical path length and improved quantum dot efficiency. Conjugation in high refractive index materials also decreases the water vapor and oxygen transport rates.
• the components and amounts of the control solution, Solution A, are shown in Table 1.
• the control solution was thus an epoxy-only formulation.
• Epon 828 was a general purpose epoxy resin available from Momentive Specialty Chemicals (Columbus, OH).
• Part B was Epic RMX91B, a difuntional amine curative, (available from Epic Resins, Palmyra, WI) with a 15% white quantum dot concentrate (available from Nanosys Corp., Palo Alto, CA) which results in a final quantum dot concentration of 0.1 to 1 wt% in the cured epoxy quantum dot layer.
• Solution B a hybrid epoxy/methacrylate formulation
• Three different versions of Solution B were prepared, each with a different methacrylate.
• the chosen methacrylates were SR348, SR540, and SR239, all from Sartomer USA, LLC (Exton, PA).
• Epon 824 was an epoxy resin available from Momentive Specialty Chemicals (Columbus, OH).
• Each of the three variations of Solution B used the amount of methacrylate shown in Table 2.
• Darocur 4265 a photoinitiator, was available from BASF Resins (Wyandotte, MI). All components except for curing agent Part B (Epic RMX91B with 15% quantum dots) were added and mixed together. The Part B was mixed with the rest of the solution immediately before coating.
• Each of the solutions were mixed and coated between two 2 mil silicon release liners at a thickness of 50 micrometers with a knife coater.
• the coatings were first cured with ultraviolet (UV) radiation using a Fusion F600 VPS system (from Fusion US Systems Inc, Gaithersburg MD) at a line speed of 30 feet per minute and with an output in the UVA band of 1.88 Joules/cm 2 , and then thermally cured in an oven at 220° F for 5 minutes.
• Water vapor transmission rates were then measured (WVTR) using a Mocon Permatran-W Model 1/50 G (available from Mocon Corporation, Minneapolis, MN). Table 3 shows the results of the test for Solution A and the three variations of Solution B. Addition of the methacrylate did not adversely affect the water vapor barrier properties of the film compared to Solution A-coated film with no methacrylate.
• a solution similar to Solution B was prepared, except that 14% of the SR348 bisphenol A based di- methacrylate was used as the methacrylate.
• Viscosity of the solution was measured before and after curing using a Discovery Hybrid Rheometer HR-2 from TA Instruments (New Castle, DE). The initial viscosity was measured at a shear rate of 40 sec "1 . The viscosity after UV-curing was measured using an oscillation technique. Results are shown in Table 4. A dramatic increase in viscosity was observed. Such viscosity increases are advantageous in dramatically reducing defects seen during thermal curing.
• Example 2 Control Solution A was prepared as in Example 1. Solutions B through G were prepared as with the methacrylate solutions of Example 1 except that the methacrylate used was SR348 at six different levels ranging from 5% to 30% by weight. Components of all solutions are shown in Table 5.
• Part B 35.0% 29.9% 24.3% 26.1% 27.8% 31.3% 33.1%
• Example 1 The above solutions were mixed and coated between two 2 mil silicon release liners at a thickness of 50 micrometers with a knife coater as before, then UV and thermally cured as in Example 1. Water vapor transmission rates were measured as in Example 1. Results are shown in Table 6. Water vapor transmission properties were relatively insensitive to the amount of methacrylate.
• Example 3 Two solutions were prepared to compare the peel strength performance of films with and without quantum dots.
• Solution J was prepared with the proportions described in Table 7 below and was similar to previous formulations.
• Solution B was similar except that the Part B component was Epic RMX91B without the quantum dot concentrate The components of each solution are shown in Table 7.
• the two solutions were coated at 20 feet per minute on a pilot coater using a slot fed die with 1 ⁇ 4 inch face and rear feed.
• Part A consisted of DER362 (diepoxy from Dow Chemical, Midland, MI), SR348 and Darocur 4265 and was fed via one pressure pot under nitrogen and Part B (the Epic RMX91B with or without quantum dots) was fed by another pressure pot, also under nitrogen. The two parts were fed into a static mixer before feeding into the die.
• the ratio of Part A to Part B was 2.3 to 1.
• Each solution was coated onto a 2 mil barrier film (previously described) and then immediately laminated to another 2 mil barrier film.
• a nitrogen purge box was place around the coating head to insure that the oxygen concentration at the coating head stayed below 50 parts per million.
• the coatings were UV-cured as in Example 2, and left to cure at room temperature for 2 days. Then they were cured in an oven at 90° C. for 2 hours. Peel testing was done as described in Example 3. The results are shown in Table 8.

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