WO2011027992A3 - 사파이어 단결정 성장방법과 그 장치 - Google Patents

사파이어 단결정 성장방법과 그 장치 Download PDF

Info

Publication number
WO2011027992A3
WO2011027992A3 PCT/KR2010/005731 KR2010005731W WO2011027992A3 WO 2011027992 A3 WO2011027992 A3 WO 2011027992A3 KR 2010005731 W KR2010005731 W KR 2010005731W WO 2011027992 A3 WO2011027992 A3 WO 2011027992A3
Authority
WO
WIPO (PCT)
Prior art keywords
single crystal
growing
sapphire single
crucible
quality
Prior art date
Application number
PCT/KR2010/005731
Other languages
English (en)
French (fr)
Other versions
WO2011027992A2 (ko
Inventor
안준태
Original Assignee
주식회사 크리스텍
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 크리스텍 filed Critical 주식회사 크리스텍
Priority to US13/394,031 priority Critical patent/US9790618B2/en
Priority to JP2012527816A priority patent/JP5596788B2/ja
Priority to EP10813901.5A priority patent/EP2474651A4/en
Priority to CN2010800499683A priority patent/CN102597334A/zh
Priority to RU2012113230/05A priority patent/RU2520472C2/ru
Publication of WO2011027992A2 publication Critical patent/WO2011027992A2/ko
Publication of WO2011027992A3 publication Critical patent/WO2011027992A3/ko

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/02Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method without using solvents
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/20Aluminium oxides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/003Heating or cooling of the melt or the crystallised material
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/36Single-crystal growth by pulling from a melt, e.g. Czochralski method characterised by the seed, e.g. its crystallographic orientation
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B17/00Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1092Shape defined by a solid member other than seed or product [e.g., Bridgman-Stockbarger]

Abstract

본 발명은 사파이어 단결정 성장방법과 그 장치에 관한 것으로, 더욱 상세하게는 직사각형의 긴 도가니를 사용하고, c-축 방향으로 긴 종자결정을 사용함에 있어, 짧은 시간 내에 고품질의 긴 단결정을 획득할 수 있는 사파이어 단결정 성장방법과 그 장치에 관한 것이다. 본 발명에 따른 사파이어 단결정 성장방법과 그 장치를 이용하면, 직사각형의 도가니를 이용하여도 도가니 내부의 수평방향의 온도를 균일하게 유지할 수 있어, 고품질의 단결정을 획득할 수 있을 뿐만 아니라, 단결정성장에 있어서 실패 확률을 낮추는 효과가 있다.
PCT/KR2010/005731 2009-09-05 2010-08-26 사파이어 단결정 성장방법과 그 장치 WO2011027992A2 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US13/394,031 US9790618B2 (en) 2009-09-05 2010-08-26 Method and apparatus for growing sapphire single crystals
JP2012527816A JP5596788B2 (ja) 2009-09-05 2010-08-26 サファイア単結晶成長方法とその装置
EP10813901.5A EP2474651A4 (en) 2009-09-05 2010-08-26 METHOD AND APPARATUS FOR GROWING A MONOCRYSTAL OF SAPHIR
CN2010800499683A CN102597334A (zh) 2009-09-05 2010-08-26 生长蓝宝石单晶的方法和设备
RU2012113230/05A RU2520472C2 (ru) 2009-09-05 2010-08-26 Способ и устройство для выращивания монокристаллов сапфира

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0083722 2009-09-05
KR1020090083722A KR101136143B1 (ko) 2009-09-05 2009-09-05 사파이어 단결정 성장방법과 그 장치

Publications (2)

Publication Number Publication Date
WO2011027992A2 WO2011027992A2 (ko) 2011-03-10
WO2011027992A3 true WO2011027992A3 (ko) 2011-07-21

Family

ID=43649757

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/005731 WO2011027992A2 (ko) 2009-09-05 2010-08-26 사파이어 단결정 성장방법과 그 장치

Country Status (8)

Country Link
US (1) US9790618B2 (ko)
EP (1) EP2474651A4 (ko)
JP (1) JP5596788B2 (ko)
KR (1) KR101136143B1 (ko)
CN (2) CN102597334A (ko)
RU (1) RU2520472C2 (ko)
TW (1) TWI404843B (ko)
WO (1) WO2011027992A2 (ko)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102330144A (zh) * 2011-10-08 2012-01-25 陕西合木实业有限公司 一种成品大面积籽晶和矩形大面积籽晶的制备方法及设备
US9206525B2 (en) * 2011-11-30 2015-12-08 General Electric Company Method for configuring a system to grow a crystal by coupling a heat transfer device comprising at least one elongate member beneath a crucible
KR101196445B1 (ko) 2012-05-03 2012-11-01 주식회사 크리스텍 사파이어 단결정 성장장치 및 이를 이용한 사파이어 단결정 성장방법
CN102828232A (zh) * 2012-09-25 2012-12-19 倪屹 三维蓝宝石晶体生长装置
KR101439380B1 (ko) * 2012-10-31 2014-09-11 주식회사 사파이어테크놀로지 사파이어 단결정 열처리 방법 및 장치
KR101420841B1 (ko) 2012-10-31 2014-07-17 주식회사 사파이어테크놀로지 사파이어 단결정 성장방법
CN103806101A (zh) * 2012-11-15 2014-05-21 上海中电振华晶体技术有限公司 一种方形蓝宝石晶体的生长方法及设备
CN103074668A (zh) * 2013-01-11 2013-05-01 元亮科技有限公司 水平温度梯度法生长大尺寸高温晶体的装置及方法
DE102013103271A1 (de) 2013-04-02 2014-10-02 Schott Ag Verfahren und Anordnung zur gerichteten Erstarrung eines einkristallinen plattenförmigen Körpers
CN103147121B (zh) * 2013-04-03 2015-10-21 中国科学院上海硅酸盐研究所 提拉泡生法生长晶体的装置
CN105401220B (zh) * 2014-09-12 2018-07-17 浙江汇锋塑胶科技有限公司 一种消除蓝宝石薄片应力的方法及设备
KR101654856B1 (ko) * 2015-01-22 2016-09-06 주식회사 사파이어테크놀로지 단결정 성장용 히터 및 이를 이용한 단결정 성장장치 및 성장방법.
CN104711676B (zh) * 2015-03-16 2017-05-24 内蒙古京晶光电科技有限公司 一种宝石单晶生长方法
TWI614473B (zh) * 2015-07-20 2018-02-11 茂迪股份有限公司 長晶爐設備
CN105088145B (zh) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 用于oled蒸发源的坩埚及其制造方法
KR101639627B1 (ko) 2015-09-07 2016-07-14 에스엠엔티 주식회사 도가니 지지체를 이용한 사파이어 단결정 성장장치 및 이를 이용한 사파이어 단결정 성장방법
CN105386125A (zh) * 2015-12-03 2016-03-09 河南西格马晶体科技有限公司 一种制备蓝宝石单晶体的控制方法
CN105350069A (zh) * 2015-12-24 2016-02-24 洛阳西格马炉业股份有限公司 一种蓝宝石晶体生长炉及制备蓝宝石晶体的方法
KR101785038B1 (ko) * 2016-03-21 2017-11-20 에스엠엔티 주식회사 보조 발열부가 구비된 결정성장장치
CN109725178A (zh) * 2017-10-27 2019-05-07 江苏维福特科技发展股份有限公司 晶体夹头
CN107881550B (zh) * 2017-11-08 2020-11-06 中国科学院合肥物质科学研究院 一种大尺寸晶体的熔体法晶体生长方法
KR20200046468A (ko) 2018-10-24 2020-05-07 주식회사 에스티씨 사파이어 단결정 성장장치용 도가니
KR20200046467A (ko) 2018-10-24 2020-05-07 주식회사 에스티씨 사파이어 단결정 성장장치 및 성장방법
JP7477997B2 (ja) 2019-03-25 2024-05-02 京セラ株式会社 サファイアリボンおよび単結晶リボン製造装置
CN109898136A (zh) * 2019-04-03 2019-06-18 贝民贤 多重蓝宝石单晶生长装置及生长方法
CN111411394A (zh) * 2020-04-08 2020-07-14 内蒙古露笑蓝宝石有限公司 一种大尺寸蓝宝石单晶的防断裂泡生制备方法
CN114318494B (zh) * 2021-11-30 2023-09-19 江苏吉星新材料有限公司 减少蓝宝石晶体长晶缺陷的方法及蓝宝石长晶炉
CN115044962A (zh) * 2022-07-13 2022-09-13 北京铭镓半导体有限公司 一种vgf法彩色宝石晶体生长坩埚盖

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010017991A (ko) * 1999-08-16 2001-03-05 이민상 개선된 단결정성장로
KR20020056247A (ko) * 2000-12-29 2002-07-10 김병관 사파이어 단결정 제조장치
KR20050057815A (ko) * 2003-12-11 2005-06-16 주식회사 모노세라피아 단결정 성장장치
JP2008007353A (ja) * 2006-06-28 2008-01-17 Sumitomo Metal Mining Co Ltd サファイア単結晶育成装置およびそれを用いた育成方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10010484A1 (de) * 2000-03-03 2001-09-13 Schott Glas Verfahren und Vorrichtung zur Züchtung von großvolumigen orientierten Einkristallen
US3898051A (en) 1973-12-28 1975-08-05 Crystal Syst Crystal growing
JPS59165469U (ja) * 1983-04-22 1984-11-06 株式会社トーキン るつぼ支持台
JPS6456394A (en) * 1987-08-28 1989-03-03 Nippon Mining Co Device for growing single crystal
US5116456A (en) * 1988-04-18 1992-05-26 Solon Technologies, Inc. Apparatus and method for growth of large single crystals in plate/slab form
JPH03115184A (ja) * 1989-09-29 1991-05-16 Tokin Corp フェライト単結晶の製造装置
JPH06166588A (ja) * 1992-11-30 1994-06-14 Furukawa Electric Co Ltd:The 単結晶製造用るつぼ
JP3368113B2 (ja) * 1995-09-05 2003-01-20 シャープ株式会社 多結晶半導体の製造方法
JPH10139580A (ja) * 1996-11-13 1998-05-26 Japan Steel Works Ltd:The 一方向凝固材の製造方法および一方向凝固装置
JP3520957B2 (ja) * 1997-06-23 2004-04-19 シャープ株式会社 多結晶半導体インゴットの製造方法および装置
JP3988217B2 (ja) * 1997-09-09 2007-10-10 株式会社ニコン 大口径蛍石の製造装置および製造方法
US6309461B1 (en) * 1999-06-07 2001-10-30 Sandia Corporation Crystal growth and annealing method and apparatus
DE19934940C2 (de) * 1999-07-26 2001-12-13 Ald Vacuum Techn Ag Vorrichtung zum Herstellen von gerichtet erstarrten Blöcken und Betriebsverfahren hierfür
KR20010011553A (ko) 1999-07-29 2001-02-15 김영환 반도체 소자의 게이트 전극 형성 방법
US6423136B1 (en) * 2000-03-20 2002-07-23 Carl Francis Swinehart Crucible for growing macrocrystals
US20030172870A1 (en) * 2002-03-14 2003-09-18 Axt, Inc. Apparatus for growing monocrystalline group II-VI and III-V compounds
JP2003342098A (ja) * 2002-05-27 2003-12-03 Canon Inc フッ化物結晶の製造装置及び製造方法
CN1485467A (zh) 2003-08-08 2004-03-31 中国科学院上海光学精密机械研究所 大面积晶体的温梯法生长装置及其生长晶体的方法
US20070151510A1 (en) * 2003-08-27 2007-07-05 Andreas Muhe Crystal-Growing Furnace, In Particular A Vertical Bridgman Crystal-Growing Furnace Or A Vertical Gradient Freeze Crystal-Growing Furnace Having A Jacket Heater And A Method of Regulating The Heat Output of the Jacket Heater
RU2261297C1 (ru) * 2004-08-05 2005-09-27 Амосов Владимир Ильич Способ выращивания монокристаллов из расплава методом амосова
US20070195852A1 (en) * 2005-08-18 2007-08-23 Bp Corporation North America Inc. Insulation Package for Use in High Temperature Furnaces
US7344596B2 (en) * 2005-08-25 2008-03-18 Crystal Systems, Inc. System and method for crystal growing
DE102006017621B4 (de) * 2006-04-12 2008-12-24 Schott Ag Vorrichtung und Verfahren zur Herstellung von multikristallinem Silizium
DE102006020234A1 (de) * 2006-04-27 2007-10-31 Deutsche Solar Ag Ofen für Nichtmetall-Schmelzen
CN100436659C (zh) * 2007-01-17 2008-11-26 上海晶生实业有限公司 蓝宝石晶体多坩埚熔体生长技术
JP2008247706A (ja) * 2007-03-30 2008-10-16 Jfe Mineral Co Ltd コランダム単結晶の育成方法、コランダム単結晶およびコランダム単結晶ウェーハ
US20080257254A1 (en) * 2007-04-17 2008-10-23 Dieter Linke Large grain, multi-crystalline semiconductor ingot formation method and system
DE102007038851A1 (de) * 2007-08-16 2009-02-19 Schott Ag Verfahren zur Herstellung von monokristallinen Metall- oder Halbmetallkörpern
CN101323978B (zh) * 2008-07-29 2011-03-23 成都东骏激光股份有限公司 大尺寸蓝宝石晶体制备工艺及其生长装置
TWI519685B (zh) * 2009-07-22 2016-02-01 國立大學法人信州大學 藍寶石單結晶之製造方法以及藍寶石單結晶之製造裝置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010017991A (ko) * 1999-08-16 2001-03-05 이민상 개선된 단결정성장로
KR20020056247A (ko) * 2000-12-29 2002-07-10 김병관 사파이어 단결정 제조장치
KR20050057815A (ko) * 2003-12-11 2005-06-16 주식회사 모노세라피아 단결정 성장장치
JP2008007353A (ja) * 2006-06-28 2008-01-17 Sumitomo Metal Mining Co Ltd サファイア単結晶育成装置およびそれを用いた育成方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2474651A4 *

Also Published As

Publication number Publication date
KR101136143B1 (ko) 2012-04-17
WO2011027992A2 (ko) 2011-03-10
RU2520472C2 (ru) 2014-06-27
JP5596788B2 (ja) 2014-09-24
EP2474651A2 (en) 2012-07-11
TWI404843B (zh) 2013-08-11
TW201109487A (en) 2011-03-16
JP2013503810A (ja) 2013-02-04
US9790618B2 (en) 2017-10-17
RU2012113230A (ru) 2013-10-20
CN102597334A (zh) 2012-07-18
EP2474651A4 (en) 2013-07-31
US20120174857A1 (en) 2012-07-12
KR20110025716A (ko) 2011-03-11
CN106978628A (zh) 2017-07-25

Similar Documents

Publication Publication Date Title
WO2011027992A3 (ko) 사파이어 단결정 성장방법과 그 장치
WO2011084596A3 (en) Gallium nitride wafer substrate for solid state lighting devices, and associated systems and methods
WO2012134092A3 (en) Method of manufacturing single crystal ingot, and single crystal ingot and wafer manufactured thereby
EP2309039A4 (en) Seed cristal for growing silicium carbenedicle cristals, method for making same, and silicon carbyne cristalline, and method for making the same
PL394857A1 (pl) Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalę
PH12014501407A1 (en) Plant artificial seeds and methods for the production thereof
EP2557205A4 (en) PROCESS FOR PREPARING AN EPITACTIC SINGLE CRYSTAL SILICON CARBIDE SUBSTRATE AND EPITACTIC SINGLE CRYSTAL SILICON CARBIDE SUBSTRATE PRODUCED IN THIS METHOD
EP2554718A4 (en) METHOD FOR MANUFACTURING SINGLE CRYSTALLINE 3C-SIC SUBSTRATE AND RESULTING SINGLE CRYSTALLINE 3C-SIC SUBSTRATE
EP2548999A4 (en) GALLIUM NITRIDE CRYSTAL, NITRIDE CRYSTAL OF GROUP 13 ELEMENT, CRYSTALLINE SUBSTRATE, AND PROCESS FOR PRODUCTION THEREOF
PL2388802T3 (pl) Podłoże o zmienionej strukturze wewnętrznej do wzrostu epitaksjalnego i sposób jego wytwarzania
EP1997941A4 (en) PROCESS FOR PRODUCING ZNO MONOCRYSTAL BY THE LIQUID PHASE GROWTH PROCESS
PH12014501439A1 (en) Plant artificial seeds having multilayers and methods for the production thereof
EP2395133A4 (en) MONOCRYSTALLINE EPITAXIAL SILICON CARBIDE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
EP2722422A4 (en) DEVICE FOR PRODUCING A SIC-EINCRISTALLS BY A SOLUTION RENTAL PROCESS, METHOD FOR THE PRODUCTION OF A SIC-EINKRISTALLS WITH THE DEVICE FOR THE PRODUCTION OF A SIC-EINKRISTALLS BY A SOLUTION RENTAL PROCESS, AND IN THE DEVICE FOR PRODUCING A SIC-EINKRISTALLS BY A SOLUTION RENTAL PROCESSING DEVICE USED
EP2642001A4 (en) PROCESS FOR PREPARING AN EPITACTIC SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE
EP2405038A4 (en) MIRROR, DEVICE AND METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTALS
EP2505696A4 (en) METHOD FOR PRODUCING NITRIDE CRYSTALS AND PRODUCTION VESSELS AND ELEMENTS THEREFOR
EP2518191A4 (en) EPITAXIAL GROWTH JIG AND METHOD OF MANUFACTURING THE SAME
WO2011050170A3 (en) Crystal growth methods and systems
EP2602362A4 (en) METHOD FOR GROWING GROUP III ELEMENT NITRIDE CRYSTAL
PL2570523T3 (pl) Sposób wytwarzania gazowego trójchlorku galu oraz sposób wytwarzania kryształu półprzewodnika azotkowego
EP2559791A4 (en) SINGLE CRYSTAL SUBSTRATE, SINGLE CRYSTAL SUBSTRATE USING A CRYSTALLINE FILM, CRYSTALLINE FILM, METHOD FOR PRODUCING THE SINGLE CRYSTAL SUBSTRATE WITH THE CRYSTALLINE FILM, METHOD FOR THE PRODUCTION OF A CRYSTALLINE SUBSTRATE AND METHOD FOR THE PRODUCTION OF AN ELEMENT
WO2009140406A3 (en) Crystal growth apparatus for solar cell manufacturing
WO2012151155A3 (en) Apparatus and method for producing a multicrystalline material having large grain sizes
EP2660365A4 (en) METHOD FOR MANUFACTURING SEMICONDUCTOR CRYSTALS, DEVICE FOR MANUFACTURING CRYSTALS, AND GROUP 13 NITRIDE SEMICONDUCTOR CRYSTALS

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201080049968.3

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10813901

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2010813901

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2012527816

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 13394031

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 2012113230

Country of ref document: RU