PL394857A1 - Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalę - Google Patents
Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalęInfo
- Publication number
- PL394857A1 PL394857A1 PL394857A PL39485709A PL394857A1 PL 394857 A1 PL394857 A1 PL 394857A1 PL 394857 A PL394857 A PL 394857A PL 39485709 A PL39485709 A PL 39485709A PL 394857 A1 PL394857 A1 PL 394857A1
- Authority
- PL
- Poland
- Prior art keywords
- ammonothermal
- production
- large scale
- gallium nitride
- crystals
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/403—AIII-nitrides
- C30B29/406—Gallium nitride
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
- C30B7/10—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by application of pressure, e.g. hydrothermal processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8680108P | 2008-08-07 | 2008-08-07 | |
US8679908P | 2008-08-07 | 2008-08-07 | |
US8713508P | 2008-08-07 | 2008-08-07 | |
US8680008P | 2008-08-07 | 2008-08-07 | |
US8712208P | 2008-08-07 | 2008-08-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
PL394857A1 true PL394857A1 (pl) | 2011-09-26 |
Family
ID=41663958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL394857A PL394857A1 (pl) | 2008-08-07 | 2009-08-04 | Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalę |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2011530471A (pl) |
CN (1) | CN102144052A (pl) |
PL (1) | PL394857A1 (pl) |
WO (1) | WO2010017232A1 (pl) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9834863B2 (en) | 2006-04-07 | 2017-12-05 | Sixpoint Materials, Inc. | Group III nitride bulk crystals and fabrication method |
US9518340B2 (en) | 2006-04-07 | 2016-12-13 | Sixpoint Materials, Inc. | Method of growing group III nitride crystals |
US9202872B2 (en) | 2006-04-07 | 2015-12-01 | Sixpoint Materials, Inc. | Method of growing group III nitride crystals |
US20140084297A1 (en) | 2012-09-26 | 2014-03-27 | Seoul Semiconductor Co., Ltd. | Group iii nitride wafers and fabrication method and testing method |
US9790617B2 (en) | 2006-04-07 | 2017-10-17 | Sixpoint Materials, Inc. | Group III nitride bulk crystals and their fabrication method |
JP2012017212A (ja) * | 2010-07-06 | 2012-01-26 | Tohoku Univ | 窒化物単結晶の製造方法、窒化物単結晶、基板およびデバイス |
JP5953684B2 (ja) * | 2011-09-14 | 2016-07-20 | 株式会社リコー | 13族窒化物結晶の製造方法 |
JP2013071889A (ja) * | 2011-09-28 | 2013-04-22 | Mitsubishi Chemicals Corp | Iii族窒化物結晶の製造方法とそれに用いるシード |
JP6144347B2 (ja) | 2012-08-28 | 2017-06-07 | シックスポイント マテリアルズ, インコーポレイテッド | Iii族窒化物ウエハおよびその生産方法 |
PL229568B1 (pl) * | 2013-05-30 | 2018-07-31 | Ammono Spolka Akcyjna | Sposób wytwarzania monokrystalicznego azotku zawierającego gal i monokrystaliczny azotek zawierający gal, wytworzony tym sposobem |
CN103540994A (zh) * | 2013-11-12 | 2014-01-29 | 青岛大学 | 一种kdp类晶体锥面定向生长装置 |
EP3094766B1 (en) * | 2014-01-17 | 2021-09-29 | SixPoint Materials, Inc. | Group iii nitride bulk crystals and fabrication method |
EP3146093A1 (en) * | 2014-05-23 | 2017-03-29 | Sixpoint Materials, Inc. | Group iii nitride bulk crystals and their fabrication method |
CN104645888A (zh) * | 2015-02-25 | 2015-05-27 | 王建伟 | 一种工业化大批量稳定制备量子点的并联装置 |
EP3434816A4 (en) * | 2016-03-23 | 2019-10-30 | Tokuyama Corporation | METHOD FOR MANUFACTURING A SINGLE CRYSTAL SUBSTRATE OF ALUMINUM NITRIDE |
CN107522174B (zh) * | 2017-08-09 | 2020-02-14 | 江苏理工学院 | 一种制备三元钼系氮化物纳米材料的方法 |
CN110195258A (zh) * | 2019-07-10 | 2019-09-03 | 上海玺唐半导体科技有限公司 | 氮化镓晶体生长装置及其生长方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4030966A (en) * | 1975-06-27 | 1977-06-21 | Western Electric Company, Inc. | Method of hydrothermally growing quartz |
US6090202A (en) * | 1998-04-29 | 2000-07-18 | Sawyer Research Products, Inc. | Method and apparatus for growing crystals |
UA82180C2 (uk) * | 2001-10-26 | 2008-03-25 | АММОНО Сп. с о. о | Об'ємний монокристал нітриду галію (варіанти) і основа для епітаксії |
WO2004061923A1 (en) * | 2002-12-27 | 2004-07-22 | General Electric Company | Gallium nitride crystal, homoepitaxial gallium-nitride-based devices and method for producing same |
US7786503B2 (en) * | 2002-12-27 | 2010-08-31 | Momentive Performance Materials Inc. | Gallium nitride crystals and wafers and method of making |
PL1769105T3 (pl) * | 2004-06-11 | 2014-11-28 | Ammono S A | Objętościowy monokrystaliczny azotek galu oraz sposób jego wytwarzania |
PL371405A1 (pl) * | 2004-11-26 | 2006-05-29 | Ammono Sp.Z O.O. | Sposób wytwarzania objętościowych monokryształów metodą wzrostu na zarodku |
US7316746B2 (en) * | 2005-03-18 | 2008-01-08 | General Electric Company | Crystals for a semiconductor radiation detector and method for making the crystals |
EP2041794A4 (en) * | 2006-06-21 | 2010-07-21 | Univ California | OPTOELECTRONIC AND ELECTRONIC DEVICES USING N-FACIAL OR M-PLANNED GAN SUBSTRATES PREPARED BY AMMONIOTHERMIC GROWTH |
JP2008174439A (ja) * | 2006-12-21 | 2008-07-31 | Mitsubishi Chemicals Corp | 窒素元素とガリウム元素を含む粉末の製造方法、およびそれを利用した窒化ガリウム単結晶の製造方法 |
-
2009
- 2009-08-04 PL PL394857A patent/PL394857A1/pl not_active Application Discontinuation
- 2009-08-04 JP JP2011522191A patent/JP2011530471A/ja active Pending
- 2009-08-04 CN CN2009801348762A patent/CN102144052A/zh active Pending
- 2009-08-04 WO PCT/US2009/052750 patent/WO2010017232A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP2011530471A (ja) | 2011-12-22 |
CN102144052A (zh) | 2011-08-03 |
WO2010017232A1 (en) | 2010-02-11 |
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Legal Events
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REFS | Decisions on refusal to grant patents (taken after the publication of the particulars of the applications) |