PL394857A1 - Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalę - Google Patents

Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalę

Info

Publication number
PL394857A1
PL394857A1 PL394857A PL39485709A PL394857A1 PL 394857 A1 PL394857 A1 PL 394857A1 PL 394857 A PL394857 A PL 394857A PL 39485709 A PL39485709 A PL 39485709A PL 394857 A1 PL394857 A1 PL 394857A1
Authority
PL
Poland
Prior art keywords
ammonothermal
production
large scale
gallium nitride
crystals
Prior art date
Application number
PL394857A
Other languages
English (en)
Inventor
Mark P. D'evelyn
Original Assignee
Sorra, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sorra, Inc. filed Critical Sorra, Inc.
Publication of PL394857A1 publication Critical patent/PL394857A1/pl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403AIII-nitrides
    • C30B29/406Gallium nitride
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C30B7/10Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by application of pressure, e.g. hydrothermal processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
PL394857A 2008-08-07 2009-08-04 Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalę PL394857A1 (pl)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US8680108P 2008-08-07 2008-08-07
US8679908P 2008-08-07 2008-08-07
US8713508P 2008-08-07 2008-08-07
US8680008P 2008-08-07 2008-08-07
US8712208P 2008-08-07 2008-08-07

Publications (1)

Publication Number Publication Date
PL394857A1 true PL394857A1 (pl) 2011-09-26

Family

ID=41663958

Family Applications (1)

Application Number Title Priority Date Filing Date
PL394857A PL394857A1 (pl) 2008-08-07 2009-08-04 Sposób amonotermalnego wytwarzania kryształów ciągnionych azotku galu na dużą skalę

Country Status (4)

Country Link
JP (1) JP2011530471A (pl)
CN (1) CN102144052A (pl)
PL (1) PL394857A1 (pl)
WO (1) WO2010017232A1 (pl)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9834863B2 (en) 2006-04-07 2017-12-05 Sixpoint Materials, Inc. Group III nitride bulk crystals and fabrication method
US9518340B2 (en) 2006-04-07 2016-12-13 Sixpoint Materials, Inc. Method of growing group III nitride crystals
US9202872B2 (en) 2006-04-07 2015-12-01 Sixpoint Materials, Inc. Method of growing group III nitride crystals
US20140084297A1 (en) 2012-09-26 2014-03-27 Seoul Semiconductor Co., Ltd. Group iii nitride wafers and fabrication method and testing method
US9790617B2 (en) 2006-04-07 2017-10-17 Sixpoint Materials, Inc. Group III nitride bulk crystals and their fabrication method
JP2012017212A (ja) * 2010-07-06 2012-01-26 Tohoku Univ 窒化物単結晶の製造方法、窒化物単結晶、基板およびデバイス
JP5953684B2 (ja) * 2011-09-14 2016-07-20 株式会社リコー 13族窒化物結晶の製造方法
JP2013071889A (ja) * 2011-09-28 2013-04-22 Mitsubishi Chemicals Corp Iii族窒化物結晶の製造方法とそれに用いるシード
JP6144347B2 (ja) 2012-08-28 2017-06-07 シックスポイント マテリアルズ, インコーポレイテッド Iii族窒化物ウエハおよびその生産方法
PL229568B1 (pl) * 2013-05-30 2018-07-31 Ammono Spolka Akcyjna Sposób wytwarzania monokrystalicznego azotku zawierającego gal i monokrystaliczny azotek zawierający gal, wytworzony tym sposobem
CN103540994A (zh) * 2013-11-12 2014-01-29 青岛大学 一种kdp类晶体锥面定向生长装置
EP3094766B1 (en) * 2014-01-17 2021-09-29 SixPoint Materials, Inc. Group iii nitride bulk crystals and fabrication method
EP3146093A1 (en) * 2014-05-23 2017-03-29 Sixpoint Materials, Inc. Group iii nitride bulk crystals and their fabrication method
CN104645888A (zh) * 2015-02-25 2015-05-27 王建伟 一种工业化大批量稳定制备量子点的并联装置
EP3434816A4 (en) * 2016-03-23 2019-10-30 Tokuyama Corporation METHOD FOR MANUFACTURING A SINGLE CRYSTAL SUBSTRATE OF ALUMINUM NITRIDE
CN107522174B (zh) * 2017-08-09 2020-02-14 江苏理工学院 一种制备三元钼系氮化物纳米材料的方法
CN110195258A (zh) * 2019-07-10 2019-09-03 上海玺唐半导体科技有限公司 氮化镓晶体生长装置及其生长方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4030966A (en) * 1975-06-27 1977-06-21 Western Electric Company, Inc. Method of hydrothermally growing quartz
US6090202A (en) * 1998-04-29 2000-07-18 Sawyer Research Products, Inc. Method and apparatus for growing crystals
UA82180C2 (uk) * 2001-10-26 2008-03-25 АММОНО Сп. с о. о Об'ємний монокристал нітриду галію (варіанти) і основа для епітаксії
WO2004061923A1 (en) * 2002-12-27 2004-07-22 General Electric Company Gallium nitride crystal, homoepitaxial gallium-nitride-based devices and method for producing same
US7786503B2 (en) * 2002-12-27 2010-08-31 Momentive Performance Materials Inc. Gallium nitride crystals and wafers and method of making
PL1769105T3 (pl) * 2004-06-11 2014-11-28 Ammono S A Objętościowy monokrystaliczny azotek galu oraz sposób jego wytwarzania
PL371405A1 (pl) * 2004-11-26 2006-05-29 Ammono Sp.Z O.O. Sposób wytwarzania objętościowych monokryształów metodą wzrostu na zarodku
US7316746B2 (en) * 2005-03-18 2008-01-08 General Electric Company Crystals for a semiconductor radiation detector and method for making the crystals
EP2041794A4 (en) * 2006-06-21 2010-07-21 Univ California OPTOELECTRONIC AND ELECTRONIC DEVICES USING N-FACIAL OR M-PLANNED GAN SUBSTRATES PREPARED BY AMMONIOTHERMIC GROWTH
JP2008174439A (ja) * 2006-12-21 2008-07-31 Mitsubishi Chemicals Corp 窒素元素とガリウム元素を含む粉末の製造方法、およびそれを利用した窒化ガリウム単結晶の製造方法

Also Published As

Publication number Publication date
JP2011530471A (ja) 2011-12-22
CN102144052A (zh) 2011-08-03
WO2010017232A1 (en) 2010-02-11

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