WO2009050858A1 - ヒートモード型記録材料層の洗浄方法、凹凸製品の製造方法、発光素子の製造方法および光学素子の製造方法 - Google Patents

ヒートモード型記録材料層の洗浄方法、凹凸製品の製造方法、発光素子の製造方法および光学素子の製造方法 Download PDF

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Publication number
WO2009050858A1
WO2009050858A1 PCT/JP2008/002818 JP2008002818W WO2009050858A1 WO 2009050858 A1 WO2009050858 A1 WO 2009050858A1 JP 2008002818 W JP2008002818 W JP 2008002818W WO 2009050858 A1 WO2009050858 A1 WO 2009050858A1
Authority
WO
WIPO (PCT)
Prior art keywords
manufacturing
heat mode
mode type
projection
recess
Prior art date
Application number
PCT/JP2008/002818
Other languages
English (en)
French (fr)
Inventor
Yoshihisa Usami
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Priority to EP08838953.1A priority Critical patent/EP2202008A4/en
Priority to US12/738,024 priority patent/US20100236584A1/en
Publication of WO2009050858A1 publication Critical patent/WO2009050858A1/ja

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/268—Post-production operations, e.g. initialising phase-change recording layers, checking for defects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005—Processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Led Devices (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Optical Recording Or Reproduction (AREA)

Abstract

ヒートモードの形状変化が可能な記録材料層（１２）に、集光した光を照射することで複数の凹部（１５）を形成する際に生じる異物（Ｄ）を除去するためのヒートモード型記録材料層の洗浄方法であって、記録材料層（１２）に対して未反応となる液体（Ｌ）によって、異物（Ｄ）を除去することを特徴とする方法を提供する。このヒートモード型記録材料層の洗浄方法は、凹凸製品の製造方法、発光素子の製造方法および光学素子の製造方法に適用可能である。
PCT/JP2008/002818 2007-10-15 2008-10-07 ヒートモード型記録材料層の洗浄方法、凹凸製品の製造方法、発光素子の製造方法および光学素子の製造方法 WO2009050858A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP08838953.1A EP2202008A4 (en) 2007-10-15 2008-10-07 METHOD FOR CLEANING THERMAL MODE TYPE RECORDING MEDIUM LAYER, METHOD FOR MANUFACTURING PRODUCT COMPRISING HOLES AND PROJECTS, METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT
US12/738,024 US20100236584A1 (en) 2007-10-15 2008-10-07 Method for cleaning heat mode type recording material layer, method for manufacturing pit-projection product, method for manufacturing light emitting element, and method for manufacturing optical element

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007267664 2007-10-15
JP2007-267664 2007-10-15

Publications (1)

Publication Number Publication Date
WO2009050858A1 true WO2009050858A1 (ja) 2009-04-23

Family

ID=40567146

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/002818 WO2009050858A1 (ja) 2007-10-15 2008-10-07 ヒートモード型記録材料層の洗浄方法、凹凸製品の製造方法、発光素子の製造方法および光学素子の製造方法

Country Status (5)

Country Link
US (1) US20100236584A1 (ja)
EP (1) EP2202008A4 (ja)
JP (1) JP2009117019A (ja)
TW (1) TW200929207A (ja)
WO (1) WO2009050858A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5214696B2 (ja) * 2010-09-27 2013-06-19 富士フイルム株式会社 パタン形成方法、基板製造方法、及びモールド製造方法

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JPS6018387A (ja) 1983-07-11 1985-01-30 Tdk Corp 光記録媒体
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JPS6044555A (ja) 1983-08-20 1985-03-09 Tdk Corp 光記録媒体
JPS6044390A (ja) 1983-08-23 1985-03-09 Tdk Corp 光記録媒体
JPS6044389A (ja) 1983-08-23 1985-03-09 Tdk Corp 光記録媒体
JPS6047069A (ja) 1983-08-24 1985-03-14 Tdk Corp 光記録媒体
JPS6054892A (ja) 1983-09-05 1985-03-29 Tdk Corp 光記録媒体
JPS63209995A (ja) 1987-02-27 1988-08-31 Fuji Photo Film Co Ltd 光学的情報記録媒体
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JPH02139733A (ja) * 1988-08-26 1990-05-29 Taiyo Yuden Co Ltd 光情報記録媒体およびその光情報記録方法
JPH0425492A (ja) 1990-05-21 1992-01-29 Tdk Corp 光記録媒体
JPH0474690A (ja) 1990-07-17 1992-03-10 Ricoh Co Ltd 光情報記録媒体
JPH0626028B2 (ja) 1984-02-06 1994-04-06 株式会社リコー 光情報記録媒体
JPH07161080A (ja) 1993-12-08 1995-06-23 Nikon Corp スタンパーの製造方法
JPH08127174A (ja) 1994-10-31 1996-05-21 Sony Corp 光記録媒体
JPH1153758A (ja) 1997-07-30 1999-02-26 Mitsubishi Chem Corp 記録再生方法
JPH11334207A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JPH11334206A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JPH11334205A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JPH11334204A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JP2000043423A (ja) 1998-05-27 2000-02-15 Mitsubishi Chemicals Corp 光学記録媒体
JP2000108513A (ja) 1998-10-05 2000-04-18 Mitsui Chemicals Inc 光記録媒体
JP2000158818A (ja) 1998-12-01 2000-06-13 Mitsui Chemicals Inc 光記録媒体
JP3096239B2 (ja) 1996-04-01 2000-10-10 太陽誘電株式会社 光ディスクのランニングｏｐｃ方法及び光ディスク記録再生装置
JP2003203348A (ja) 2001-10-31 2003-07-18 Yamaha Corp 光ディスク記録装置および画像形成方法
JP2004139662A (ja) * 2002-10-17 2004-05-13 Matsushita Electric Ind Co Ltd 原盤記録方法および原盤、光情報記録媒体
JP2005196819A (ja) * 2003-12-26 2005-07-21 Ricoh Co Ltd 光情報記録媒体及びその製造方法
JP2006287208A (ja) * 2005-03-09 2006-10-19 Showa Denko Kk 窒化物半導体発光素子及びその製造方法

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JPS5984356A (ja) * 1982-11-05 1984-05-16 Ricoh Co Ltd 光デイスク原盤の作成方法
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JPH1083577A (ja) * 1996-09-06 1998-03-31 Fuji Photo Film Co Ltd 光情報記録媒体の製造方法
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JP2002015474A (ja) * 2000-06-27 2002-01-18 Hitachi Ltd 光ディスク原盤及び光ディスク基板の作製方法
JP2002124504A (ja) * 2000-10-17 2002-04-26 Dainippon Screen Mfg Co Ltd 基板洗浄装置および基板洗浄方法
JP3787515B2 (ja) * 2001-10-11 2006-06-21 キヤノン株式会社 光ディスク基板用スタンパーおよびその製造方法
JP4136834B2 (ja) * 2003-07-16 2008-08-20 富士フイルム株式会社 光情報記録媒体
JP2006323927A (ja) * 2005-05-18 2006-11-30 Ricoh Co Ltd 光情報記録媒体製造用原盤並びにスタンパの製造方法
JP5232369B2 (ja) * 2006-02-03 2013-07-10 日立化成株式会社 光半導体素子搭載用パッケージ基板の製造方法およびこれを用いた光半導体装置の製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE350399C (de) 1919-09-19 1922-03-20 Qu Bernd Ziemert Projektionsschirm
JPS58175693A (ja) 1982-04-08 1983-10-14 Ricoh Co Ltd 高密度光情報記録媒体
JPH0138680B2 (ja) 1982-09-27 1989-08-15 Tdk Electronics Co Ltd
JPS5981194A (ja) 1982-11-01 1984-05-10 Tdk Corp 光記録媒体
JPS6018387A (ja) 1983-07-11 1985-01-30 Tdk Corp 光記録媒体
JPS6019586A (ja) 1983-07-13 1985-01-31 Tdk Corp 光記録媒体
JPS6019587A (ja) 1983-07-13 1985-01-31 Tdk Corp 光記録媒体
JPS6035054A (ja) 1983-08-05 1985-02-22 Tdk Corp 光記録媒体
JPS6036191A (ja) 1983-08-09 1985-02-25 Tdk Corp 光記録媒体
JPS6036190A (ja) 1983-08-09 1985-02-25 Tdk Corp 光記録媒体
JPS6044554A (ja) 1983-08-20 1985-03-09 Tdk Corp 光記録媒体
JPS6044555A (ja) 1983-08-20 1985-03-09 Tdk Corp 光記録媒体
JPS6044390A (ja) 1983-08-23 1985-03-09 Tdk Corp 光記録媒体
JPS6044389A (ja) 1983-08-23 1985-03-09 Tdk Corp 光記録媒体
JPS6047069A (ja) 1983-08-24 1985-03-14 Tdk Corp 光記録媒体
JPS6054892A (ja) 1983-09-05 1985-03-29 Tdk Corp 光記録媒体
JPH0626028B2 (ja) 1984-02-06 1994-04-06 株式会社リコー 光情報記録媒体
JPS63209995A (ja) 1987-02-27 1988-08-31 Fuji Photo Film Co Ltd 光学的情報記録媒体
JPH02139733A (ja) * 1988-08-26 1990-05-29 Taiyo Yuden Co Ltd 光情報記録媒体およびその光情報記録方法
JPH0425492A (ja) 1990-05-21 1992-01-29 Tdk Corp 光記録媒体
JPH0474690A (ja) 1990-07-17 1992-03-10 Ricoh Co Ltd 光情報記録媒体
JPH07161080A (ja) 1993-12-08 1995-06-23 Nikon Corp スタンパーの製造方法
JPH08127174A (ja) 1994-10-31 1996-05-21 Sony Corp 光記録媒体
JP3096239B2 (ja) 1996-04-01 2000-10-10 太陽誘電株式会社 光ディスクのランニングｏｐｃ方法及び光ディスク記録再生装置
JPH1153758A (ja) 1997-07-30 1999-02-26 Mitsubishi Chem Corp 記録再生方法
JP2000043423A (ja) 1998-05-27 2000-02-15 Mitsubishi Chemicals Corp 光学記録媒体
JPH11334205A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JPH11334204A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JPH11334206A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JPH11334207A (ja) 1998-05-27 1999-12-07 Mitsubishi Chemical Corp 光学記録媒体
JP2000108513A (ja) 1998-10-05 2000-04-18 Mitsui Chemicals Inc 光記録媒体
JP2000158818A (ja) 1998-12-01 2000-06-13 Mitsui Chemicals Inc 光記録媒体
JP2003203348A (ja) 2001-10-31 2003-07-18 Yamaha Corp 光ディスク記録装置および画像形成方法
JP2004139662A (ja) * 2002-10-17 2004-05-13 Matsushita Electric Ind Co Ltd 原盤記録方法および原盤、光情報記録媒体
JP2005196819A (ja) * 2003-12-26 2005-07-21 Ricoh Co Ltd 光情報記録媒体及びその製造方法
JP2006287208A (ja) * 2005-03-09 2006-10-19 Showa Denko Kk 窒化物半導体発光素子及びその製造方法

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Title
NIPPON KAGAKU KAISHI, October 1992 (1992-10-01), pages 1141
See also references of EP2202008A4 *

Also Published As

Publication number Publication date
US20100236584A1 (en) 2010-09-23
EP2202008A1 (en) 2010-06-30
JP2009117019A (ja) 2009-05-28
TW200929207A (en) 2009-07-01
EP2202008A4 (en) 2013-10-23

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