US20060053969A1 - Thermoelectric material and method for producing same - Google Patents

Thermoelectric material and method for producing same Download PDF

Info

Publication number
US20060053969A1
US20060053969A1 US10/536,879 US53687905A US2006053969A1 US 20060053969 A1 US20060053969 A1 US 20060053969A1 US 53687905 A US53687905 A US 53687905A US 2006053969 A1 US2006053969 A1 US 2006053969A1
Authority
US
United States
Prior art keywords
thermoelectric material
thermal conductivity
thermoelectric
particle size
sintering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/536,879
Other languages
English (en)
Inventor
Takashi Harada
Naohiro Toda
Hitoshi Sumiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Assigned to SUMITOMO ELECTRIC INDUSTRIES, LTD. reassignment SUMITOMO ELECTRIC INDUSTRIES, LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HARADA, TAKASHI, SUMIYA, HITOSHI, TODA, NAOHIRO
Publication of US20060053969A1 publication Critical patent/US20060053969A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/80Constructional details
    • H10N10/85Thermoelectric active materials
    • H10N10/851Thermoelectric active materials comprising inorganic compositions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12Both compacting and sintering
    • B22F3/14Both compacting and sintering simultaneously
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N11/00Generators or motors not provided for elsewhere; Alleged perpetua mobilia obtained by electric or magnetic means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/01Manufacture or treatment

Definitions

  • the present invention relates to a thermoelectric material that is a constituent of a thermoelectric element used for thermoelectric power generation utilizing the Seebeck effect and for direct cooling/heating utilizing the Peltier effect.
  • the thermoelectric material used for the thermoelectric element includes such known materials as Bi 2 Te 3 -based material, CoSb 3 -based intermetallic compound with the Skutterudite structure, ZrNiSn for example with the half-Heusler structure (MgAgAs), FeSi 2 , and MnSi 1.73 .
  • thermoelectric technology including the thermoelectric power generation utilizing the Seebeck effect and the direct cooling/heating utilizing the Peltier effect has the following characteristics as compared with the conventional compressor-based technology:
  • thermoelectric technology is thus potentially and considerably excellent.
  • the energy conversion efficiency of a thermoelectric element is lower than that of the conventional system using a compressor. Therefore, the thermoelectric element is only used for cooling a high performance CPU and an LD used for long-haul optical communication or used as a Peltier element of a portable refrigerator, for example.
  • thermoelectric characteristics of the thermoelectric material have to be improved.
  • the Seebeck coefficient depends on the electronic structure of a substance, the Seebeck coefficient is substantially determined by the material and composition thereof. Thus, for increasing the Seebeck coefficient, it is important to search through materials and optimize doping agents and amount, for example.
  • the electrical resistivity is affected not only by the electronic structure but also by such factors as lattice vibration and impurities. Further, regarding the thermal conductivity, lattice vibration generally contributes to more than a half of factors that determine the magnitude of the thermal conductivity of a high performance thermoelectric material. Therefore, in order to decrease the electrical resistivity and thermal conductivity, structural control for example in terms of materials engineering would be important.
  • thermoelectric material Studies on improvements in performance of the thermoelectric material have been conducted with the purpose of decreasing the thermal conductivity. Specifically, miniaturization of crystal size of the structure or impurity doping has been performed in order to increase phonon scattering.
  • Japanese Patent Laying-Open No. 56-136635 discloses a method according to which two types of ultrafine powder and powder that is larger in particle size than the ultrafine powder are mixed together and sintered to produce a highly dense sintered body without pores.
  • Japanese Patent Laying-Open No. 2-27779 discloses a technique using the arc plasma sputtering.
  • Japanese Patent Laying-Open No. 2000-252526 discloses a method of producing a thermoelectric material by synthesizing a fine powder to be used as a raw material through the solution processing for example and sintering the powder.
  • Japanese Patent Laying-Open No. 2000-349354 discloses a method of producing a thermoelectric material by preparing a fine powder using the mechanical alloying method and plasma-sintering the powder.
  • Japanese Patent Laying-Open No. 10-209508 discloses a method of improving the performance by providing a particle size of at least 50 nm and at most a carrier diffusion length and discloses that a particle size of less than 50 nm causes an empirical deterioration in performance. Although no reason for the performance deterioration is mentioned, it is considered that the smaller particle size causes an increase of impurities and a decrease of the relative density.
  • Japanese Patent Laying-Open No. 2002-76452 discloses a thermoelectric conversion material having crystals with a particle size of at least 0.5 nm and at most 100 nm that are deposited or dispersed therein. This thermoelectric conversion material, however, has a problem of a low relative density resulting in a deterioration in performance due to the deposition or dispersion of the crystals that are components of the thermoelectric conversion material.
  • thermoelectric figure of merit of the thermoelectric material in terms of the decrease of the thermal conductivity, is achieved to some degree by, for example, using the above-described ultrafine powder as a row material and thereby making the structure finer or by impurity doping.
  • the phonon scattering is increased to lower the thermal conductivity.
  • the improvement in performance is limited within a certain range, since there are limits to the technique of producing ultrafine powders and the sintering technique and thus it has been impossible to produce a sintered body having a fine crystal structure.
  • thermoelectric figure of merit as a whole is not increased in some cases.
  • An object of the present invention is to provide a thermoelectric material of high performance by solving the above-described problems of the conventional art and lowering the thermal conductivity of the thermoelectric material with a minimum increase in electrical resistivity.
  • the present invention is a thermoelectric material having an average crystal particle size of at most 50 nm and having a relative density of at least 85%.
  • an EDS analysis of a grain boundary portion of the thermoelectric material shows that impurity elements have a detected intensity of at most one-fifth of a maximum detected intensity of an element among constituent elements of the thermoelectric material.
  • the thermoelectric material has an electrical resistivity of at most 1 ⁇ 10 ⁇ 3 ⁇ m.
  • the thermoelectric material has a thermal conductivity of at most 5 W/mK.
  • the thermoelectric material has a thermal conductivity of at most 1 W/mK.
  • thermoelectric material is a method of manufacturing a thermoelectric material including the steps of preparing a fine powder and sintering or compacting the fine powder under a pressure of at least 1.0 GPa and at most 10 GPa.
  • the method of manufacturing a thermoelectric material further includes the step of annealing polycrystalline body resultant from said sintering or compacting step.
  • the inventors of the present invention have conducted studies with the purpose of solving the aforementioned problems to find that an average particle size of at most 50 nm of crystals constituting a thermoelectric material provides a remarkable decrease in thermal conductivity and accordingly a small increase in electrical resistivity, and further find that it is effective for lowering the electrical resistivity to reduce unavoidable impurities that are present at grain boundaries.
  • the inventors further find a manufacturing method controlling impurities to minimize the impurities being present at grain boundaries and thereby obtain a fine crystal structure.
  • thermoelectric material of the present invention has a feature that an average crystal particle size is at most 50 nm.
  • the average crystal particle size is controlled so that the size is at most 50 nm, and accordingly, phonon scattering in a sintered body can be enhanced to lower the thermal conductivity and thereby improve the performance of the thermoelectric material.
  • the average crystal particle size that is at most 50 nm provides a greater effect of lowering the thermal conductivity. It is presumed the reason therefor is that the average crystal particle size is sufficiently small relative to a mean free path of phonons to increase phonon scattering and lower the thermal conductivity of the thermoelectric material.
  • the average crystal particle size of the thermoelectric material herein refers to an average size of a plurality of crystallites (fine crystals that can be regarded as single crystals) constituting one crystal grain of the thermoelectric material that can be identified by an observation using a transmission electron microscope. Specifically, the average crystal particle size is determined in the following way. On an arbitrary area of an image of a transmission electron microscope (hereinafter abbreviated as TEM), a straight line is drawn that passes through 50 crystallites. Then, the sum of respective lengths of sections of the straight line that pass through respective crystals is divided by 50, which is the number of the crystallites, and the numerical value determined by the division is used as the average crystal particle size of the thermoelectric material.
  • TEM transmission electron microscope
  • the thermoelectric material of the present invention has a relative density of at least 85% which is more preferably at least 90%.
  • a relative density of the thermoelectric material that is less than 85% slightly lowers the thermal conductivity of the thermoelectric material.
  • the relative density refers to the ratio of the volume of the thermoelectric material except for pores to the volume of the whole thermoelectric material.
  • the detected intensity of impurity elements is preferably at most one-fifth of the maximum one of detected intensities of respective constituent elements of the thermoelectric material.
  • the electrical resistivity of the thermoelectric material can be kept low to further improve the performance of the thermoelectric material.
  • Impurities present at crystal grain boundaries contribute to phonon scattering and thus are effective in lowering the thermal conductivity of the thermoelectric material. Therefore, it is preferable that a small amount of impurities are present. However, the impurities have an adverse effect of considerably hindering electrical conduction between particles that form the crystal grain boundaries.
  • the amount of impurities is fairly small.
  • the fact that the detected intensity of impurity elements is at most one-fifth of the maximum detected intensity of an element among the constituent elements of the thermoelectric material may involve the fact that an EDS analysis of grain boundaries does not detect the intensity since the amount of impurity elements is smaller than the detection limit of the machine.
  • the EDS analysis refers to an analysis by means of an X-ray energy dispersion spectrometer.
  • the thermoelectric material has an electrical resistivity of at most 1 ⁇ 10 ⁇ 3 ⁇ m. This is for the reason that a lowered electrical resistivity of the thermoelectric material can increase the above-described thermoelectric figure of merit.
  • the thermoelectric material of the present invention has a thermal conductivity of at most 5 W/mK.
  • a thermal conductivity of the thermoelectric material of the present invention that is at most 1 W/mK is further preferable since it can further improve the thermoelectric figure of merit of the thermoelectric material.
  • thermoelectric material varies depending on for example the type of the thermoelectric material, the amount of impurities and the crystal structure
  • a manufacturing method of the present invention can adjust the thermal conductivity within the above-described range (at most 5 W/mK or at most 1 W/mk).
  • thermoelectric material of the present invention is manufactured by a method including the-steps of preparing a fine powder and sintering or compacting the fine powder under a pressure of at least 0.5 GPa and at most 10 GPa, which is preferably at least 1.0 GPa and at most 10 GPa.
  • the fine powder used for the present invention may be particles for example having an average particle size of at most 50 nm, since the particles with the average particle size of 50 nm or less can be used to produce a thermoelectric material having an average crystal particle size of at most 50 nm.
  • the fine powder includes secondary particles with the particle size of 0.1 ⁇ m to 100 ⁇ m composed of crystallites with an average particle size of at most 50 nm that are coupled and adhered to each other.
  • required particles should have a considerably small particle size and thus the particles are highly active. Accordingly, the surfaces of the particles are likely to be contaminated by impurities.
  • the fine powder includes particles containing dislocations. This is for the following reason.
  • particles contain dislocations or defects recrystallization occurs from any dislocation or defect in a sintering or compacting process or an annealing process preceding or following the sintering or compacting process and accordingly the thermoelectric material of the present invention can have a fine crystal structure.
  • particles containing dislocations refer to particles containing dislocations or defects and having a crystallinity of at most 70% that is measured by X-ray diffraction.
  • the crystallinity measured by the X-ray diffraction can be determined by a value (%) that is the ratio (%) of the X-ray scattering intensity of a crystalline portion of particles containing dislocations to the X-ray scattering intensity of particles with 100% crystallinity, or is calculated by subtracting from 100 the ratio (%) of the X-ray scattering intensity of an amorphous portion of particles containing dislocations to the X-ray scattering intensity of 100% amorphous particles.
  • the fine powder used for the present invention may be prepared by such a mechanical milling method as ball milling, gas atomization in a vacuum or inactive atmosphere, or through a process of preparing a fine powder by means of thermal plasma.
  • the mechanical milling method refers to a method of milling particles by shear force exerted between balls and a pot of the ball milling for example. With this method, particles that are reduced in particle size can form secondary particles having crystals that are coupled and adhered to each other by pressure from the balls and pot, or dislocations or defects can be caused in particles constituting the fine powder.
  • the gas atomization can reduce the amount of impurities to a greater degree as compared with such a mechanical milling as ball milling.
  • the process for preparing a fine powder by thermal plasma is a method that the raw material of the fine powder vaporized by high-temperature plasma is quenched and condensed thereby fine particles containing many defects are produced.
  • the dislocations and defects generated by these methods serve as origins from which recrystallization occurs to constitute a fine structure and further serve as an origin of phonon scattering in a sintered body to provide the effect of lowering the thermal conductivity of the thermoelectric material.
  • the fine powder prepared through any of the methods described above is sintered or compacted under a pressure of at least 0.5 GPa and at most 10 GPa that is preferably at least 1.0 GPa and at most 10 GPa. This process is performed for sintering or compacting the fine powder and thereby making it highly dense without causing an excessive growth of particles.
  • a fracture process by pressurization, a process of allowing particles to slide over each other and a densification process through such a process as plastic flow are necessary.
  • sintering refers to a phenomenon of causing two or more particles to be coupled to each other through heating.
  • compacting refers to a phenomenon of causing two or more particles to be coupled to each other by any process other than the sintering.
  • the process of sintering or compacting the fine powder is carried out at a temperature of at least 25% and at most 60% of the lowest melting point T1 (K) on the absolute-temperature-basis of any of constituent materials of the fine powder.
  • T1 lowest melting point
  • the method of manufacturing a thermoelectric material of the present invention includes the step of annealing polycrystalline body after the sintering or compacting step.
  • the inventors of the present invention have found that a process of heating (annealing) the polycrystalline body at a predetermined temperature after the sintering or compacting provides an improvement in performance of the thermoelectric material while suppressing particle growth.
  • the annealing is effective in removing distortions for example of grain boundaries in the polycrystalline body after the sintering or compacting. Further, this annealing is also effective, as different from normal annealing, in that the former causes almost no particle growth in the polycrystalline body after the sintering or compacting.
  • the annealing is performed at a temperature of at least 45% and at most 65% of a lowest melting point T2 (K) of any of constituent materials of the polycrystalline body after the sintering or compacting.
  • Annealing at a temperature lower than 45% of melting point T2 (K) tends to make it difficult to achieve the effect of removing distortions for example of grain boundaries.
  • Annealing at a temperature higher than 65% of melting point T2 (K) tends to deteriorate the performance of the thermoelectric material due to a sudden particle growth that results in a considerable increase in thermal conductivity of the thermoelectric material.
  • the step of preparing a fine powder and the step of sintering or compacting the fine powder are performed in an inactive gas atmosphere or vacuum atmosphere, for preventing impurities from contaminating the thermoelectric material.
  • thermoelectric material FeSi 2 whose material is cheap and easy to be obtained was selected to verify effects of the present invention.
  • a commercially available FeSi 2 powder (particle size: 10 to 20 ⁇ m) was enclosed in an iron pot together with iron balls, and the atmosphere therein was an inactive gas atmosphere generated by Ar substitution. Then, by planetary ball milling, the powder was ground for 10 hours. After the grinding, it was confirmed through an SEM observation that the particle size of secondary particles of the FeSi 2 powder was 0.5 to 2 ⁇ m. The size of crystallite was determined based on the integral breadth obtained from XRD measurement of the FeSi 2 powder (Hall method), and it was found that the crystal size was 5 to 10 nm (average crystal particle size: 8 nm).
  • the FeSi 2 powder was enclosed in a capsule made of Ni to fill the capsule and sintered under a pressure of 3 GPa at 700° C. for 30 minutes. From XRD measurement after the sintering, it was confirmed that the sintered body was FeSi 2 single phase. From a TEM observation of the structure of the sintered body, it was found that crystals constituting the sintered body have an average particle size of 15 nm. The relative density of the sintered body was 93%.
  • Comparative Example 1 the powder was used as it was and the powder was sintered under 200 MPa at 1150° C. for one hour. Then, annealing was performed at 800° C. for 10 hours for causing a high-temperature phase resultant from transformation by the sintering to return to a low-temperature phase. It was confirmed through XRD measurement that this sintered body was also FeSi 2 single phase. A sample which was also in the shape of a disk was produced from the sintered body. The thermal conductivity of the sample was 10 W/mK.
  • a sintered body was produced through the same process as that of Example 1 except that the time for grinding by ball milling was five hours, and the average particle size of crystals constituting the sintered body and thermal conductivity were measured.
  • the results are shown in Table 1 below.
  • No. 4 shows the results of Example 2
  • No. 5 shows the results of Example 1.
  • the average crystal particle size after ball milling was 35 nm. From the results shown in Table 1, it is found that the thermal conductivity considerably lowers when the particle size of crystals of the sintered body structure is 0.05 ⁇ m or less.
  • a sintered body was produced through the same process as that of Example 1 except that the time for grinding by ball milling was zero hour, one hour and two hours, and the average particle size of crystals constituting the sintered body and thermal conductivity were measured.
  • the results are shown in Table 1 below.
  • No. 1 corresponds to the milling time of zero hour
  • No. 2 corresponds to the milling time of one hour
  • No. 3 corresponds to the milling time of two hours.
  • Respective average crystal particle sizes after ball milling were at least 5 ⁇ m (No. 1), 0.9 ⁇ m (No. 2) and 85 nm (No. 3) respectively.
  • TABLE 1 Results of Examples 1 and 2 and Comparative Example 2 ball mill average particle size thermal conductivity No. time (hr) of sintered body ( ⁇ m) (W/mK) 1 0 20 10 2 1 1 1 6.4 3 2 0.1 3.9 4 5 0.05 2.0 5 10 0.015 0.98
  • Example 1 From the sintered body of Example 1 (No. 5 in Table 1), a sample of 1 mm ⁇ 1 mm ⁇ 15 mm in size was cut, and the electrical resistivity was measured by the four-terminal method. Further, through an EDS analysis of a grain boundary portion of the sintered body, constituent elements were identified. In addition, under the same conditions as those of No. 5, two types of sintered bodies were produced by ball milling in air with no Ar substitution (No. 6) and by enclosing in atmosphere the powder in the Ni capsule before sintering (No. 7). For these sintered bodies, the electrical resistivity was measured and the EDS analysis was conducted in the manner as described above. The results are shown in Table 2.
  • Example 1 This powder was enclosed and sintered as done in Example 1.
  • the resultant sintered body was TEM-observed to find that the sintered body had a crystal particle size of 5 to 20 nm (average particle size: 15 nm). Further, the thermal conductivity of the sintered body was measured as done in Example 1 to find that the thermal conductivity was 0.94 W/mK. It is thus seen that the gas atomizing method is also appropriate for manufacturing a sintered body having a fine crystal structure.
  • a sintered body was produced as Example 1 except that sintering was performed under 0.2 GPa at 700° C. for 30 minutes. The resultant sintered body was brittle and had a lower relative density of 70%. Then, the sintering temperature was changed to 1000° C. A sintered body thus produced had a relative density of 90% with a certain degree of strength. This sintered body, however, had a crystal particle size of 0.1 to 2 ⁇ m, which means that a fine crystal structure could not be obtained. The measurement of the thermal conductivity of this sintered body was 5.9 W/mK and the electrical resistivity thereof was 8 ⁇ 10 ⁇ 4 ⁇ m. Thus, under any sintering conditions that are out of the sintering conditions of the present invention, no thermoelectric material having a fine crystal structure like the desired one of the present invention could be obtained.
  • the sintered bodies produced in Example 1 and Example 2 were annealed at respective temperatures of 670 K (45% of melting point T2), 800 K (54% of melting point T2) and 960 K (65% of melting point T2) for one hour in an Ar atmosphere.
  • sintered bodies annealed at respective temperatures of 670 K and 800 K had the thermal conductivity that was unchanged while they had improved electrical conductivity that was 1.3 times and 1.5 times respectively as high as the original one.
  • the sintered body annealed at 960 K had the electrical resistivity and the thermal conductivity that were respectively twice and 1.5 times as high as original ones.
  • the sintered bodies produced in Example 1 and Example 2 were annealed in an Ar atmosphere at respective temperatures of 600 K (41% of melting point T2) and 1030 K (70% of melting point T2) for one hour.
  • the sintered body annealed at 600 K had its thermal conductivity and electrical conductivity that were unchanged and had no change in structure found through electron microscope observations.
  • Any sintered bodies annealed at 1030 K had the electrical conductivity that was twice as high as the original one while the thermal conductivity thereof was increased to approximately 6 W/mK that was in the range from three times (relative to that of Example 2) to six times (relative to that of Example 1) as high as the original one, leading to a decrease in thermoelectric figure of merit.
  • thermoelectric materials except for FeSi 2 were examined as done for Examples 1 to 4. The results are shown in Table 3 (No. 8-No. 19) below. The Seebeck coefficient had almost no dependency on the particle size. Therefore, Table 3 shows nothing about this. It was found that, under the sintering conditions of the present invention, a thermoelectric material having a fine crystal structure that was a desired one of the present invention could be produced. It was also found that a thermoelectric material of the present invention having an average crystal particle size of at most 50 nm and a relative density of at least 85% had a tendency to have a relatively lower electrical resistivity and a relatively lower thermal conductivity at a room temperature (25° C.).
  • Example 6 Comparison impurity to relative thermal average oxygen intensity electrical conductivity sintering sintering particle size relative relative to resistivity at room material ball mill temperature pressure of sintered density peak intensity (comparison temperature No. system time (hr) (° C.) (GPa) body ( ⁇ m) (%) by EDS to HP: times) (W/mK) 8 ZnO 4 900 1 0.05 89 — 1.00 10 9 ZnO 4 900 3 0.035 — 0.98 8 10 ZnO 4 820 5 0.023 96 — 1.03 4.8 11 CoSb 3 10 600 1 0.050 85 0.03 0.98 4 12 CoSb 3 10 600 3 0.030 90 0.03 0.95 3.5 13 CoSb 3 10 500 10 0.025 98 0.04 0.87 3.1 14 Zn 4 Sb 3 8 250 2 0.010 100 0.01 1.00 0.36 15 Zn 4 Sb 3 8 250 5 0.010 100 0.01 1.02 0.35 16 Mg 2 Si 4 400 3 0.020 100 0.08
  • material system refers to the composition of a constituent material of a thermoelectric material.
  • Zn of ZnO in Table 3 and Table 4 (No. 8-No. 10, No. 20-No. 26) refers to Zn doped with 2 atomic % of Al.
  • impurity oxygen intensity relative to peak intensity by EDS refers to the ratio of the intensity of oxygen impurities to the maximum intensity detected through an EDS analysis. Since oxygen is not impurities for the material of the composition ZnO (No. 8-No. 10, No. 20-No. 26), the impurity oxygen intensity relative to peak intensity by EDS is indicated as “ ⁇ ”.
  • the value of the relative electrical resistivity is represented as a ratio to the value obtained when hot press (HP) sintering is performed under a pressure of 0.1 GPa.
  • the value of 1.0 or less of the relative electrical resistivity indicates that the electrical resistivity decreases.
  • thermoelectric material of the present invention as well as the method of manufacturing a thermoelectric material of the present invention can minimize an increase in electrical resistivity to lower the thermal conductivity and thereby improve the thermoelectric performance.
  • the present invention is applicable to any material other than those used in Examples, contributing to improvements in performance of existing thermoelectric materials.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Powder Metallurgy (AREA)
US10/536,879 2002-11-28 2003-11-27 Thermoelectric material and method for producing same Abandoned US20060053969A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002344763 2002-11-28
JP2002-344763 2002-11-28
PCT/JP2003/015194 WO2004049464A1 (ja) 2002-11-28 2003-11-27 熱電材料及びその製造方法

Publications (1)

Publication Number Publication Date
US20060053969A1 true US20060053969A1 (en) 2006-03-16

Family

ID=32375967

Family Applications (1)

Application Number Title Priority Date Filing Date
US10/536,879 Abandoned US20060053969A1 (en) 2002-11-28 2003-11-27 Thermoelectric material and method for producing same

Country Status (6)

Country Link
US (1) US20060053969A1 (zh)
JP (1) JP4569298B2 (zh)
KR (1) KR100924054B1 (zh)
CN (1) CN100459201C (zh)
AU (1) AU2003284476A1 (zh)
WO (1) WO2004049464A1 (zh)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060102224A1 (en) * 2004-10-29 2006-05-18 Mass Institute Of Technology (Mit) Nanocomposites with high thermoelectric figures of merit
US20080202575A1 (en) * 2004-10-29 2008-08-28 Massachusetts Institute Of Technology (Mit) Methods for high figure-of-merit in nanostructured thermoelectric materials
US20090087370A1 (en) * 2007-09-28 2009-04-02 Stion Corporation Method and material for purifying iron disilicide for photovoltaic application
US20090227065A1 (en) * 2007-09-28 2009-09-10 Stion Corporation Method and material for processing iron disilicide for photovoltaic application
US20090272416A1 (en) * 2006-06-26 2009-11-05 Diamond Innovations, Inc. Increasing the seebeck coefficient of semiconductors by hpht sintering
WO2010080153A1 (en) * 2009-01-09 2010-07-15 Diamond Innovations, Inc. Affecting the thermoelectric figure of merit (zt) by high pressure, high temperature sintering
US20100295202A1 (en) * 2009-05-19 2010-11-25 Yanshan University Fabrication of High Performance Densified Nanocrystalline Bulk Thermoelectric Materials Using High Pressure Sintering Technique
US7939454B1 (en) 2008-05-31 2011-05-10 Stion Corporation Module and lamination process for multijunction cells
US20110108778A1 (en) * 2008-04-30 2011-05-12 Massachusetts Institute Of Technology Thermoelectric skutterudite compositions and methods for producing the same
US8075723B1 (en) 2008-03-03 2011-12-13 Stion Corporation Laser separation method for manufacture of unit cells for thin film photovoltaic materials
CN102383023A (zh) * 2011-11-08 2012-03-21 天津大学 硅锰铁合金热电材料的制备方法
US8207008B1 (en) 2008-08-01 2012-06-26 Stion Corporation Affixing method and solar decal device using a thin film photovoltaic
US20130001480A1 (en) * 2010-03-11 2013-01-03 Diamond Innovations, Inc. Affecting the thermoelectric figure of merit (zt) and the power factor by high pressure, high temperature sintering
US8440903B1 (en) 2008-02-21 2013-05-14 Stion Corporation Method and structure for forming module using a powder coating and thermal treatment process
US8772078B1 (en) 2008-03-03 2014-07-08 Stion Corporation Method and system for laser separation for exclusion region of multi-junction photovoltaic materials
EP2824076A3 (de) * 2013-07-08 2015-01-28 Deutsches Zentrum für Luft- und Raumfahrt e.V. Herstellung von Skutterudit
WO2015031584A1 (en) * 2013-09-01 2015-03-05 Alphabet Energy, Inc. Thermoelectric devices having reduced thermal stress and contact resistance, and methods of forming and using the same
US20150147590A1 (en) * 2013-11-22 2015-05-28 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Bulk Monolithic Nano-Heterostructures and Method of Making the Same
US9048004B2 (en) 2010-12-20 2015-06-02 Gmz Energy, Inc. Half-heusler alloys with enhanced figure of merit and methods of making
US9257627B2 (en) 2012-07-23 2016-02-09 Alphabet Energy, Inc. Method and structure for thermoelectric unicouple assembly
US9318682B2 (en) 2012-01-25 2016-04-19 Alphabet Energy, Inc Modular thermoelectric units for heat recovery systems and methods thereof
US10833236B2 (en) 2017-01-20 2020-11-10 Hitachi Metals, Ltd. P-type thermoelectric conversion material, thermoelectric conversion module, and method of manufacturing p-type thermoelectric conversion material
US20220077372A1 (en) * 2012-02-07 2022-03-10 Ethan James Ciccotelli Method and device for the generation of electricity directly from heat
US11957052B2 (en) 2016-07-28 2024-04-09 Kabushiki Kaisha Toshiba Thermoelectric material, manufacturing method of thermoelectric material, thermoelectric conversion element, and thermoelectric conversion module
US11963448B2 (en) 2020-03-23 2024-04-16 Proterial, Ltd. Method for producing thermoelectric conversion element

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4497981B2 (ja) * 2004-03-30 2010-07-07 株式会社東芝 熱電材料および熱電変換素子
FR2884353B1 (fr) 2005-04-06 2007-07-13 Centre Nat Rech Scient Realisation de materiaux thermoelectriques par mecanosynthese
JP2010206024A (ja) * 2009-03-04 2010-09-16 Yanmar Co Ltd 熱電モジュールおよび熱電モジュールの製造方法
JP2012023201A (ja) * 2010-07-14 2012-02-02 Toyota Motor Corp 熱電変換材料の製造方法
KR20140040072A (ko) * 2010-12-20 2014-04-02 트러스티스 오브 보스톤 칼리지 성능 지수가 향상된 반 호이슬러 합금과 이를 제조하는 방법
WO2013141065A1 (ja) * 2012-03-21 2013-09-26 リンテック株式会社 熱電変換材料及びその製造方法
JP2014220506A (ja) * 2014-06-17 2014-11-20 ダイヤモンドイノベイションズ インコーポレーテッド 高圧高温焼結による熱電性能指数(zt)の影響
CN104022218A (zh) * 2014-06-23 2014-09-03 武汉理工大学 一种高性能SbAgSeS基热电材料及其制备方法
CN105355771B (zh) * 2015-10-16 2018-09-28 中国科学院上海硅酸盐研究所 一种高功率因子氧化锌热电材料及其制备方法
CN108701749B (zh) * 2016-02-24 2022-02-01 三菱综合材料株式会社 镁系热电转换材料的制造方法、镁系热电转换元件的制造方法、镁系热电转换材料、镁系热电转换元件及热电转换装置
KR102490113B1 (ko) 2018-06-12 2023-01-17 주식회사 케이티 재난 방송 장치 및 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929351A (en) * 1997-04-23 1999-07-27 Matsushita Electric Industrial Co., Ltd. Co-Sb based thermoelectric material and a method of producing the same
US6313392B1 (en) * 1998-10-12 2001-11-06 Komatsu Ltd. Thermoelectric semiconductor material, thermoelectric element, method of manufacturing these and method of manufacturing thermoelectric module and device for manufacturing thermoelectric semiconductor material
US20020026856A1 (en) * 2000-09-04 2002-03-07 Akiko Suzuki Thermoelectric material and method of manufacturing the same
US7002071B1 (en) * 1999-03-10 2006-02-21 Sumitomo Special Metals Co. Ltd. Thermoelectric conversion material and method of producing the same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06237018A (ja) * 1993-02-09 1994-08-23 Onoda Cement Co Ltd 熱電変換材料の製造方法
US6043424A (en) * 1996-07-03 2000-03-28 Yamaha Corporation Thermoelectric alloy achieving large figure of merit by reducing oxide and process of manufacturing thereof
JPH10209508A (ja) * 1997-01-22 1998-08-07 Toshiba Corp 熱電変換素子及びその製造方法
JPH10303468A (ja) * 1997-04-23 1998-11-13 Matsushita Electric Ind Co Ltd 熱電材料とその製造方法
JP3958857B2 (ja) * 1998-03-13 2007-08-15 株式会社小松製作所 熱電半導体材料の製造方法
JPH11284237A (ja) * 1998-03-31 1999-10-15 Matsushita Electric Works Ltd P型熱電変換材料の製造方法
US6307143B1 (en) * 1998-10-22 2001-10-23 Yamaha Corporation Thermoelectric materials and thermoelectric conversion element
JP2000307158A (ja) * 1999-04-19 2000-11-02 Yamaha Corp 熱電材料の製造方法
JP3594008B2 (ja) * 2000-11-30 2004-11-24 ヤマハ株式会社 熱電材料、その製造方法及びペルチェモジュール
JP3580778B2 (ja) * 2001-01-29 2004-10-27 京セラ株式会社 熱電変換素子及びその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929351A (en) * 1997-04-23 1999-07-27 Matsushita Electric Industrial Co., Ltd. Co-Sb based thermoelectric material and a method of producing the same
US6313392B1 (en) * 1998-10-12 2001-11-06 Komatsu Ltd. Thermoelectric semiconductor material, thermoelectric element, method of manufacturing these and method of manufacturing thermoelectric module and device for manufacturing thermoelectric semiconductor material
US7002071B1 (en) * 1999-03-10 2006-02-21 Sumitomo Special Metals Co. Ltd. Thermoelectric conversion material and method of producing the same
US20020026856A1 (en) * 2000-09-04 2002-03-07 Akiko Suzuki Thermoelectric material and method of manufacturing the same

Cited By (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060102224A1 (en) * 2004-10-29 2006-05-18 Mass Institute Of Technology (Mit) Nanocomposites with high thermoelectric figures of merit
US20080202575A1 (en) * 2004-10-29 2008-08-28 Massachusetts Institute Of Technology (Mit) Methods for high figure-of-merit in nanostructured thermoelectric materials
US7465871B2 (en) 2004-10-29 2008-12-16 Massachusetts Institute Of Technology Nanocomposites with high thermoelectric figures of merit
US20090068465A1 (en) * 2004-10-29 2009-03-12 Massachusetts Institute Of Technology (Mit) Nanocomposites with high thermoelectric figures of merit
US8293168B2 (en) 2004-10-29 2012-10-23 Massachusetts Institute Of Technology Nanocomposites with high thermoelectric figures of merit
US8865995B2 (en) 2004-10-29 2014-10-21 Trustees Of Boston College Methods for high figure-of-merit in nanostructured thermoelectric materials
US9011763B2 (en) 2004-10-29 2015-04-21 Massachusetts Institute Of Technology Nanocomposites with high thermoelectric figures of merit
US8394729B2 (en) * 2006-06-26 2013-03-12 Diamond Innovations, Inc. Increasing the seebeck coefficient of semiconductors by HPHT sintering
US20090272416A1 (en) * 2006-06-26 2009-11-05 Diamond Innovations, Inc. Increasing the seebeck coefficient of semiconductors by hpht sintering
WO2009045747A1 (en) * 2007-09-28 2009-04-09 Stion Corporation Method and material for purifying iron disilicide for photovoltaic application
US8058092B2 (en) 2007-09-28 2011-11-15 Stion Corporation Method and material for processing iron disilicide for photovoltaic application
US20090227065A1 (en) * 2007-09-28 2009-09-10 Stion Corporation Method and material for processing iron disilicide for photovoltaic application
US8614396B2 (en) 2007-09-28 2013-12-24 Stion Corporation Method and material for purifying iron disilicide for photovoltaic application
CN101578693B (zh) * 2007-09-28 2014-06-18 思阳公司 光电池装置用二硅化铁的制作方法
US20090087370A1 (en) * 2007-09-28 2009-04-02 Stion Corporation Method and material for purifying iron disilicide for photovoltaic application
US8440903B1 (en) 2008-02-21 2013-05-14 Stion Corporation Method and structure for forming module using a powder coating and thermal treatment process
US8075723B1 (en) 2008-03-03 2011-12-13 Stion Corporation Laser separation method for manufacture of unit cells for thin film photovoltaic materials
US8772078B1 (en) 2008-03-03 2014-07-08 Stion Corporation Method and system for laser separation for exclusion region of multi-junction photovoltaic materials
US8883047B2 (en) * 2008-04-30 2014-11-11 Massachusetts Institute Of Technology Thermoelectric skutterudite compositions and methods for producing the same
US20110108778A1 (en) * 2008-04-30 2011-05-12 Massachusetts Institute Of Technology Thermoelectric skutterudite compositions and methods for producing the same
US7939454B1 (en) 2008-05-31 2011-05-10 Stion Corporation Module and lamination process for multijunction cells
US8207008B1 (en) 2008-08-01 2012-06-26 Stion Corporation Affixing method and solar decal device using a thin film photovoltaic
WO2010080153A1 (en) * 2009-01-09 2010-07-15 Diamond Innovations, Inc. Affecting the thermoelectric figure of merit (zt) by high pressure, high temperature sintering
US20100295202A1 (en) * 2009-05-19 2010-11-25 Yanshan University Fabrication of High Performance Densified Nanocrystalline Bulk Thermoelectric Materials Using High Pressure Sintering Technique
US20130001480A1 (en) * 2010-03-11 2013-01-03 Diamond Innovations, Inc. Affecting the thermoelectric figure of merit (zt) and the power factor by high pressure, high temperature sintering
US9123856B2 (en) * 2010-03-11 2015-09-01 Diamond Innovations, Inc. Affecting the thermoelectric figure of merit (ZT) and the power factor by high pressure, high temperature sintering
US9048004B2 (en) 2010-12-20 2015-06-02 Gmz Energy, Inc. Half-heusler alloys with enhanced figure of merit and methods of making
CN102383023A (zh) * 2011-11-08 2012-03-21 天津大学 硅锰铁合金热电材料的制备方法
US9318682B2 (en) 2012-01-25 2016-04-19 Alphabet Energy, Inc Modular thermoelectric units for heat recovery systems and methods thereof
US11968899B2 (en) * 2012-02-07 2024-04-23 Ethan James Ciccotelli Method and device for the generation of electricity directly from heat
US20220077372A1 (en) * 2012-02-07 2022-03-10 Ethan James Ciccotelli Method and device for the generation of electricity directly from heat
US9257627B2 (en) 2012-07-23 2016-02-09 Alphabet Energy, Inc. Method and structure for thermoelectric unicouple assembly
EP2824076A3 (de) * 2013-07-08 2015-01-28 Deutsches Zentrum für Luft- und Raumfahrt e.V. Herstellung von Skutterudit
WO2015031584A1 (en) * 2013-09-01 2015-03-05 Alphabet Energy, Inc. Thermoelectric devices having reduced thermal stress and contact resistance, and methods of forming and using the same
US9608188B2 (en) 2013-09-01 2017-03-28 Alphabet Energy, Inc. Thermoelectric devices having reduced thermal stress and contact resistance, and methods of forming and using the same
US9065017B2 (en) 2013-09-01 2015-06-23 Alphabet Energy, Inc. Thermoelectric devices having reduced thermal stress and contact resistance, and methods of forming and using the same
US10751801B2 (en) * 2013-11-22 2020-08-25 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Bulk monolithic nano-heterostructures and method of making the same
US20150147590A1 (en) * 2013-11-22 2015-05-28 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Bulk Monolithic Nano-Heterostructures and Method of Making the Same
US11957052B2 (en) 2016-07-28 2024-04-09 Kabushiki Kaisha Toshiba Thermoelectric material, manufacturing method of thermoelectric material, thermoelectric conversion element, and thermoelectric conversion module
US10833236B2 (en) 2017-01-20 2020-11-10 Hitachi Metals, Ltd. P-type thermoelectric conversion material, thermoelectric conversion module, and method of manufacturing p-type thermoelectric conversion material
US11963448B2 (en) 2020-03-23 2024-04-16 Proterial, Ltd. Method for producing thermoelectric conversion element

Also Published As

Publication number Publication date
JPWO2004049464A1 (ja) 2006-03-30
JP4569298B2 (ja) 2010-10-27
WO2004049464A1 (ja) 2004-06-10
KR20050085179A (ko) 2005-08-29
CN1717814A (zh) 2006-01-04
KR100924054B1 (ko) 2009-10-27
AU2003284476A1 (en) 2004-06-18
CN100459201C (zh) 2009-02-04

Similar Documents

Publication Publication Date Title
US20060053969A1 (en) Thermoelectric material and method for producing same
KR101616109B1 (ko) 열전재료 및 칼코게나이드 화합물
KR100398939B1 (ko) 열전 변환 재료
KR101087355B1 (ko) 휴슬러 합금, 반-휴슬러 합금, 채워진 스커테루다이트계합금의 제조 방법, 및 이것을 사용하는 열전변환 시스템
US20100147352A1 (en) Thermoelectric material and method of manufacturing the material
US10121953B2 (en) Thermoelectric conversion material
CN102339946B (zh) 一种高性能热电复合材料及其制备方法
CN102031416B (zh) 一种填充方钴矿基复合材料及其制备方法
JP2007158191A (ja) 熱電材料およびこの材料を用いた熱電変換素子
JP4374578B2 (ja) 熱電材料及びその製造方法
US8883047B2 (en) Thermoelectric skutterudite compositions and methods for producing the same
KR102059674B1 (ko) P형 스커테루다이트 열전재료, 이의 제조 방법 및 이를 포함하는 열전 소자
JP2014192468A (ja) 熱電変換材料
JP6661514B2 (ja) n型熱電変換材料及びその製造方法
US9478724B2 (en) N-type thermoelectric material
WO2021131408A1 (ja) 熱電変換素子、熱電変換モジュール、接合材、熱電変換素子を製造する方法
JP4900819B2 (ja) 熱電材料及びその製造方法
KR102268703B1 (ko) 퍼밍기어타이트 열전재료의 제조 방법
KR101469759B1 (ko) 이터븀이 충진된 철-안티몬계 열전재료의 제조방법
US20200044132A1 (en) Alloy, sintered article, thermoelectric module and method for the production of a sintered article
KR102073949B1 (ko) P형 스커테루다이트 열전재료 및 이를 포함하는 열전 소자
JP4521215B2 (ja) 熱電変換材料及び熱電変換素子
KR101339880B1 (ko) Sb 도핑된 ZrNiSn 하프-호이즐러 합금 및 그 제조방법
Choi et al. Thermoelectric properties of higher manganese silicide consolidated by flash-sintering technique
JP2006315932A (ja) 導電性多結晶体の製造方法

Legal Events

Date Code Title Description
AS Assignment

Owner name: SUMITOMO ELECTRIC INDUSTRIES, LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HARADA, TAKASHI;TODA, NAOHIRO;SUMIYA, HITOSHI;REEL/FRAME:017310/0422

Effective date: 20050524

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION