TWI590951B - 積層體、阻氣薄膜、積層體之製造方法及積層體製造裝置 - Google Patents
積層體、阻氣薄膜、積層體之製造方法及積層體製造裝置 Download PDFInfo
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- TWI590951B TWI590951B TW101127103A TW101127103A TWI590951B TW I590951 B TWI590951 B TW I590951B TW 101127103 A TW101127103 A TW 101127103A TW 101127103 A TW101127103 A TW 101127103A TW I590951 B TWI590951 B TW I590951B
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
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| JP2011165904 | 2011-07-28 | ||
| JP2011165903 | 2011-07-28 |
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| TW201323226A TW201323226A (zh) | 2013-06-16 |
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| US (1) | US20140141218A1 (fr) |
| EP (1) | EP2740593A4 (fr) |
| JP (2) | JP6123672B2 (fr) |
| KR (1) | KR102081210B1 (fr) |
| CN (1) | CN103732393B (fr) |
| TW (1) | TWI590951B (fr) |
| WO (1) | WO2013015417A1 (fr) |
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| WO2013015412A1 (fr) * | 2011-07-28 | 2013-01-31 | 凸版印刷株式会社 | Corps stratifié, film de barrière au gaz et procédé de production de corps stratifié et de film de barrière au gaz |
| JP6477462B2 (ja) * | 2013-03-27 | 2019-03-06 | 凸版印刷株式会社 | 積層体及びガスバリアフィルム |
| WO2014156932A1 (fr) * | 2013-03-27 | 2014-10-02 | 凸版印刷株式会社 | Corps stratifié, film de barrière et procédé de fabrication de ceux-ci |
| TWI700180B (zh) * | 2013-12-11 | 2020-08-01 | 日商凸版印刷股份有限公司 | 積層體、及阻氣性薄膜 |
| JP6330316B2 (ja) * | 2013-12-19 | 2018-05-30 | 凸版印刷株式会社 | 積層体、バリアフィルム、及びこれらの製造方法 |
| JP2015132007A (ja) * | 2014-01-15 | 2015-07-23 | 凸版印刷株式会社 | 積層体の製造方法、及び積層体製造装置 |
| WO2015133441A1 (fr) * | 2014-03-04 | 2015-09-11 | 東洋製罐グループホールディングス株式会社 | Stratifié faisant barrière contre les gaz |
| JP2015166170A (ja) * | 2014-03-04 | 2015-09-24 | 東洋製罐グループホールディングス株式会社 | ガスバリア性積層体 |
| JP2015178231A (ja) * | 2014-03-19 | 2015-10-08 | 東洋製罐グループホールディングス株式会社 | ガスバリア性積層構造体 |
| JP6442874B2 (ja) * | 2014-05-30 | 2018-12-26 | 凸版印刷株式会社 | 積層体の製造方法、及び積層体製造装置 |
| KR102459808B1 (ko) * | 2014-06-13 | 2022-10-28 | 바스프 코팅스 게엠베하 | 유기물-무기물 라미네이트의 제조 방법 |
| CN106661727B (zh) * | 2014-07-29 | 2020-05-05 | 凸版印刷株式会社 | 层叠体及其制造方法、以及阻气膜及其制造方法 |
| JP6554810B2 (ja) * | 2015-02-16 | 2019-08-07 | 凸版印刷株式会社 | 積層体及びその製造方法、並びにガスバリアフィルム |
| JP6524702B2 (ja) | 2015-02-26 | 2019-06-05 | 凸版印刷株式会社 | ガスバリア性フィルムの製造方法及びガスバリア性フィルム |
| JP5906507B1 (ja) * | 2015-02-27 | 2016-04-20 | 株式会社昭和真空 | 多層膜被覆樹脂基板およびその製造方法 |
| WO2016167348A1 (fr) * | 2015-04-16 | 2016-10-20 | 凸版印刷株式会社 | Stratifié et film formant barrière aux gaz |
| JP6657588B2 (ja) * | 2015-04-17 | 2020-03-04 | 凸版印刷株式会社 | 積層体及びその製造方法 |
| DE102015122024A1 (de) * | 2015-12-16 | 2017-06-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Herstellen eines Schichtverbundes bestehend aus einer Kunststofffolie und einer darauf abgeschiedenen Schicht |
| CN108472927B (zh) * | 2015-12-28 | 2022-02-25 | 凸版印刷株式会社 | 层叠体及其制造方法、阻气膜及其制造方法、以及有机发光元件 |
| JP6849874B2 (ja) * | 2016-07-27 | 2021-03-31 | 株式会社Flosfia | 積層構造体の製造方法 |
| JP6944664B2 (ja) * | 2016-08-05 | 2021-10-06 | 大日本印刷株式会社 | バリア性フィルム |
| JP6834230B2 (ja) * | 2016-08-05 | 2021-02-24 | 大日本印刷株式会社 | バリア性フィルム |
| WO2018056401A1 (fr) * | 2016-09-23 | 2018-03-29 | 凸版印刷株式会社 | Film optique barrière aux gaz et dispositif d'affichage électroluminescent (el) organique |
| CN111971168B (zh) * | 2018-02-02 | 2023-09-05 | 凸版印刷株式会社 | 阻气膜及其制造方法 |
| KR102202929B1 (ko) | 2018-04-17 | 2021-01-14 | 주식회사 엘지화학 | 광확산성 배리어 필름 |
| CN109442101B (zh) * | 2018-10-08 | 2024-03-01 | 上海伟星新型建材有限公司 | 一种具有外层疏水功能的阻氧管材 |
| JP6550198B1 (ja) * | 2019-02-28 | 2019-07-24 | 株式会社アドマップ | ＳｉＣ膜構造体 |
| JP7221758B2 (ja) * | 2019-03-28 | 2023-02-14 | 東レエンジニアリング株式会社 | 成膜装置、及び成膜方法 |
| JP2021172841A (ja) * | 2020-04-22 | 2021-11-01 | 東京エレクトロン株式会社 | 成膜方法 |
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| JP2007516347A (ja) | 2003-05-16 | 2007-06-21 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 原子層蒸着によって製造されたプラスチック基板用のバリアフィルム |
| US20050172897A1 (en) | 2004-02-09 | 2005-08-11 | Frank Jansen | Barrier layer process and arrangement |
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| JP4954574B2 (ja) | 2006-03-02 | 2012-06-20 | 日東電工株式会社 | 透明ガスバリア性フィルムの製造方法および透明ガスバリア性フィルムの製造装置 |
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| JP5092624B2 (ja) * | 2007-08-24 | 2012-12-05 | 大日本印刷株式会社 | ガスバリア膜の作製方法及び作製装置 |
| TWI438953B (zh) * | 2008-01-30 | 2014-05-21 | Osram Opto Semiconductors Gmbh | 電子組件之製造方法及電子組件 |
| DE102008048472A1 (de) * | 2008-09-23 | 2010-03-25 | Osram Opto Semiconductors Gmbh | Vorrichtung mit Verkapselungsanordnung |
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| JP2010016286A (ja) * | 2008-07-07 | 2010-01-21 | Toppan Printing Co Ltd | 太陽電池裏面封止用シート |
| JP5776132B2 (ja) * | 2009-04-03 | 2015-09-09 | 凸版印刷株式会社 | 成膜装置 |
| JP2011165903A (ja) | 2010-02-10 | 2011-08-25 | Rohm Co Ltd | 半導体モジュールおよび半導体モジュールの製造方法 |
| JP5668294B2 (ja) * | 2010-02-23 | 2015-02-12 | 凸版印刷株式会社 | ガスバリアフィルムおよびその製造方法 |
| CN103732393B (zh) * | 2011-07-28 | 2016-10-05 | 凸版印刷株式会社 | 层叠体、阻气膜、层叠体的制造方法及层叠体制造装置 |
-
2012
- 2012-07-27 CN CN201280037062.9A patent/CN103732393B/zh active Active
- 2012-07-27 KR KR1020147001358A patent/KR102081210B1/ko active IP Right Grant
- 2012-07-27 WO PCT/JP2012/069191 patent/WO2013015417A1/fr active Application Filing
- 2012-07-27 JP JP2013525782A patent/JP6123672B2/ja not_active Expired - Fee Related
- 2012-07-27 TW TW101127103A patent/TWI590951B/zh not_active IP Right Cessation
- 2012-07-27 EP EP12817195.6A patent/EP2740593A4/fr not_active Withdrawn
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2014
- 2014-01-27 US US14/164,766 patent/US20140141218A1/en not_active Abandoned
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2017
- 2017-04-06 JP JP2017076189A patent/JP6508245B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN103732393B (zh) | 2016-10-05 |
| CN103732393A (zh) | 2014-04-16 |
| JP6123672B2 (ja) | 2017-05-10 |
| KR102081210B1 (ko) | 2020-02-25 |
| JP2017124633A (ja) | 2017-07-20 |
| TW201323226A (zh) | 2013-06-16 |
| JP6508245B2 (ja) | 2019-05-08 |
| EP2740593A4 (fr) | 2015-04-15 |
| US20140141218A1 (en) | 2014-05-22 |
| EP2740593A1 (fr) | 2014-06-11 |
| KR20140043787A (ko) | 2014-04-10 |
| WO2013015417A1 (fr) | 2013-01-31 |
| JPWO2013015417A1 (ja) | 2015-02-23 |
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| MM4A | Annulment or lapse of patent due to non-payment of fees |