TWI525816B - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof Download PDF

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Publication number
TWI525816B
TWI525816B TW100129953A TW100129953A TWI525816B TW I525816 B TWI525816 B TW I525816B TW 100129953 A TW100129953 A TW 100129953A TW 100129953 A TW100129953 A TW 100129953A TW I525816 B TWI525816 B TW I525816B
Authority
TW
Taiwan
Prior art keywords
conductivity type
gate electrode
diffusion layer
film
oxide film
Prior art date
Application number
TW100129953A
Other languages
English (en)
Chinese (zh)
Other versions
TW201214708A (en
Inventor
橋谷雅幸
Original Assignee
精工電子有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 精工電子有限公司 filed Critical 精工電子有限公司
Publication of TW201214708A publication Critical patent/TW201214708A/zh
Application granted granted Critical
Publication of TWI525816B publication Critical patent/TWI525816B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/63—Vertical IGFETs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H01L21/26586—Bombardment with radiation with high-energy radiation producing ion implantation characterised by the angle between the ion beam and the crystal planes or the main crystal surface
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/025—Manufacture or treatment of FETs having insulated gates [IGFET] of vertical IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117—Shapes of semiconductor bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149—Source or drain regions of field-effect devices
    • H10D62/151—Source or drain regions of field-effect devices of IGFETs 
    • H10D62/152—Source regions of DMOS transistors
    • H10D62/154—Dispositions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/519—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
TW100129953A 2010-08-30 2011-08-22 Semiconductor device and manufacturing method thereof TWI525816B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010192634A JP5616720B2 (ja) 2010-08-30 2010-08-30 半導体装置およびその製造方法

Publications (2)

Publication Number Publication Date
TW201214708A TW201214708A (en) 2012-04-01
TWI525816B true TWI525816B (zh) 2016-03-11

Family

ID=45695989

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100129953A TWI525816B (zh) 2010-08-30 2011-08-22 Semiconductor device and manufacturing method thereof

Country Status (5)

Country Link
US (1) US8643093B2 (enExample)
JP (1) JP5616720B2 (enExample)
KR (1) KR101798241B1 (enExample)
CN (1) CN102386233B (enExample)
TW (1) TWI525816B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5616720B2 (ja) * 2010-08-30 2014-10-29 セイコーインスツル株式会社 半導体装置およびその製造方法
JP6077251B2 (ja) * 2012-09-28 2017-02-08 エスアイアイ・セミコンダクタ株式会社 半導体装置
KR102046987B1 (ko) 2013-08-30 2019-11-20 삼성전자 주식회사 반도체 소자 및 그 제조방법
TWI559531B (zh) * 2014-08-20 2016-11-21 新唐科技股份有限公司 絕緣閘極雙極性電晶體及其製造方法
JP2018117070A (ja) * 2017-01-19 2018-07-26 エイブリック株式会社 半導体装置及びその製造方法
CN109461769B (zh) * 2018-12-10 2024-03-12 无锡紫光微电子有限公司 一种沟槽栅igbt器件结构及其制作方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2876670B2 (ja) 1989-12-26 1999-03-31 日本電気株式会社 不揮発性半導体記憶装置の製造方法
JP3092834B2 (ja) 1992-01-17 2000-09-25 三菱電機株式会社 素子分離のための半導体装置およびその製造方法
JP2917922B2 (ja) 1996-07-15 1999-07-12 日本電気株式会社 半導体装置及びその製造方法
JP2000223705A (ja) * 1999-01-29 2000-08-11 Nissan Motor Co Ltd 半導体装置
US6413822B2 (en) * 1999-04-22 2002-07-02 Advanced Analogic Technologies, Inc. Super-self-aligned fabrication process of trench-gate DMOS with overlying device layer
US6617226B1 (en) * 1999-06-30 2003-09-09 Kabushiki Kaisha Toshiba Semiconductor device and method for manufacturing the same
JP4091242B2 (ja) * 1999-10-18 2008-05-28 セイコーインスツル株式会社 縦形ｍｏｓトランジスタ及びその製造方法
KR100381953B1 (ko) * 2001-03-16 2003-04-26 삼성전자주식회사 노어형 플래시 메모리 소자의 제조방법
JP4025063B2 (ja) * 2001-12-06 2007-12-19 株式会社ルネサステクノロジ 半導体装置
US6861701B2 (en) * 2003-03-05 2005-03-01 Advanced Analogic Technologies, Inc. Trench power MOSFET with planarized gate bus
JP4945055B2 (ja) * 2003-08-04 2012-06-06 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP4176734B2 (ja) * 2004-05-14 2008-11-05 株式会社東芝 トレンチｍｏｓｆｅｔ
JP5302493B2 (ja) * 2005-03-30 2013-10-02 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 半導体装置
JP5984282B2 (ja) 2006-04-27 2016-09-06 富士電機株式会社 縦型トレンチ型絶縁ゲートｍｏｓ半導体装置
JP2008085278A (ja) * 2006-09-29 2008-04-10 Ricoh Co Ltd 半導体装置及びその製造方法
US8431958B2 (en) * 2006-11-16 2013-04-30 Alpha And Omega Semiconductor Ltd Optimized configurations to integrate steering diodes in low capacitance transient voltage suppressor (TVS)
WO2008153142A1 (ja) * 2007-06-15 2008-12-18 Rohm Co., Ltd. 半導体装置
JP5767430B2 (ja) 2007-08-10 2015-08-19 ローム株式会社 半導体装置および半導体装置の製造方法
JP5386120B2 (ja) 2008-07-15 2014-01-15 ローム株式会社 半導体装置および半導体装置の製造方法
JP2010147219A (ja) * 2008-12-18 2010-07-01 Renesas Electronics Corp 半導体装置及びその製造方法
JP5626356B2 (ja) * 2010-05-27 2014-11-19 富士電機株式会社 Ｍｏｓ駆動型半導体装置およびｍｏｓ駆動型半導体装置の製造方法
DE102010030768B4 (de) * 2010-06-30 2012-05-31 GLOBALFOUNDRIES Dresden Module One Ltd. Liability Company & Co. KG Herstellverfahren für ein Halbleiterbauelement als Transistor mit eingebettetem Si/Ge-Material mit geringerem Abstand und besserer Gleichmäßigkeit und Transistor
JP5616720B2 (ja) * 2010-08-30 2014-10-29 セイコーインスツル株式会社 半導体装置およびその製造方法
JP6031681B2 (ja) * 2011-04-20 2016-11-24 パナソニックＩｐマネジメント株式会社 縦型ゲート半導体装置およびその製造方法

Also Published As

Publication number Publication date
JP2012049466A (ja) 2012-03-08
US8643093B2 (en) 2014-02-04
CN102386233B (zh) 2015-11-11
KR101798241B1 (ko) 2017-11-15
KR20120021240A (ko) 2012-03-08
JP5616720B2 (ja) 2014-10-29
CN102386233A (zh) 2012-03-21
US20120049275A1 (en) 2012-03-01
TW201214708A (en) 2012-04-01

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