TWI320571B - Dynamic nonvolatile random access memory ne transistor cell and random access memory array - Google Patents

Dynamic nonvolatile random access memory ne transistor cell and random access memory array

Info

Publication number
TWI320571B
TWI320571B TW092125058A TW92125058A TWI320571B TW I320571 B TWI320571 B TW I320571B TW 092125058 A TW092125058 A TW 092125058A TW 92125058 A TW92125058 A TW 92125058A TW I320571 B TWI320571 B TW I320571B
Authority
TW
Taiwan
Prior art keywords
random access
access memory
transistor cell
memory array
dynamic nonvolatile
Prior art date
Application number
TW092125058A
Other languages
English (en)
Other versions
TW200421345A (en
Inventor
Barry Harrison H
Dimitrijev Sima
Original Assignee
Qs Semiconductor Australia Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from AU2002951339A external-priority patent/AU2002951339A0/en
Priority claimed from AU2003900911A external-priority patent/AU2003900911A0/en
Application filed by Qs Semiconductor Australia Pty Ltd filed Critical Qs Semiconductor Australia Pty Ltd
Publication of TW200421345A publication Critical patent/TW200421345A/zh
Application granted granted Critical
Publication of TWI320571B publication Critical patent/TWI320571B/zh

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/8213—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using SiC technology
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)
TW092125058A 2002-09-12 2003-09-10 Dynamic nonvolatile random access memory ne transistor cell and random access memory array TWI320571B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AU2002951339A AU2002951339A0 (en) 2002-09-12 2002-09-12 Non volatile memory cell
AU2003900911A AU2003900911A0 (en) 2003-02-28 2003-02-28 Nonvolatile memory cell

Publications (2)

Publication Number Publication Date
TW200421345A TW200421345A (en) 2004-10-16
TWI320571B true TWI320571B (en) 2010-02-11

Family

ID=31994781

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092125058A TWI320571B (en) 2002-09-12 2003-09-10 Dynamic nonvolatile random access memory ne transistor cell and random access memory array

Country Status (6)

Country Link
US (1) US7362609B2 (zh)
EP (2) EP1537585A4 (zh)
JP (2) JP2005538552A (zh)
KR (2) KR20100107084A (zh)
TW (1) TWI320571B (zh)
WO (1) WO2004025660A1 (zh)

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Also Published As

Publication number Publication date
TW200421345A (en) 2004-10-16
KR20100107084A (ko) 2010-10-04
JP2011091395A (ja) 2011-05-06
US7362609B2 (en) 2008-04-22
KR101032870B1 (ko) 2011-05-06
EP1537585A1 (en) 2005-06-08
EP2296151A1 (en) 2011-03-16
US20060007727A1 (en) 2006-01-12
JP2005538552A (ja) 2005-12-15
KR20050053658A (ko) 2005-06-08
WO2004025660A1 (en) 2004-03-25
EP1537585A4 (en) 2007-08-15

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MM4A Annulment or lapse of patent due to non-payment of fees