TWI308557B - High refractive index homogeneity fused silica glass and method of making same - Google Patents
High refractive index homogeneity fused silica glass and method of making same Download PDFInfo
- Publication number
- TWI308557B TWI308557B TW094147458A TW94147458A TWI308557B TW I308557 B TWI308557 B TW I308557B TW 094147458 A TW094147458 A TW 094147458A TW 94147458 A TW94147458 A TW 94147458A TW I308557 B TWI308557 B TW I308557B
- Authority
- TW
- Taiwan
- Prior art keywords
- dust
- less
- glass
- preform
- density
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000005350 fused silica glass Substances 0.000 title description 3
- 239000000428 dust Substances 0.000 claims description 142
- 239000011521 glass Substances 0.000 claims description 122
- 238000000034 method Methods 0.000 claims description 72
- 239000000463 material Substances 0.000 claims description 63
- 239000004575 stone Substances 0.000 claims description 45
- 230000008859 change Effects 0.000 claims description 41
- 239000010455 vermiculite Substances 0.000 claims description 39
- 229910052902 vermiculite Inorganic materials 0.000 claims description 39
- 235000019354 vermiculite Nutrition 0.000 claims description 39
- 230000008569 process Effects 0.000 claims description 38
- 230000003287 optical effect Effects 0.000 claims description 37
- 238000000151 deposition Methods 0.000 claims description 21
- 239000002245 particle Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 16
- 239000002243 precursor Substances 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 13
- 230000007062 hydrolysis Effects 0.000 claims description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 12
- 238000007596 consolidation process Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 229910052723 transition metal Inorganic materials 0.000 claims description 8
- 239000001307 helium Substances 0.000 claims description 7
- 229910052734 helium Inorganic materials 0.000 claims description 7
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 7
- 238000012360 testing method Methods 0.000 claims description 7
- 239000002689 soil Substances 0.000 claims description 5
- 150000003624 transition metals Chemical class 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 3
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 3
- 238000005056 compaction Methods 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 241000282320 Panthera leo Species 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
- 238000009826 distribution Methods 0.000 description 27
- 238000005245 sintering Methods 0.000 description 16
- 238000010521 absorption reaction Methods 0.000 description 14
- 239000000843 powder Substances 0.000 description 13
- 239000000047 product Substances 0.000 description 13
- 239000001257 hydrogen Substances 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
- 230000006378 damage Effects 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 230000010355 oscillation Effects 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 9
- 238000012937 correction Methods 0.000 description 8
- 230000001965 increasing effect Effects 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000000265 homogenisation Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000001939 inductive effect Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000010436 fluorite Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 230000036541 health Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 239000012768 molten material Substances 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000009417 prefabrication Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- 244000144730 Amygdalus persica Species 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241000283690 Bos taurus Species 0.000 description 1
- 235000002566 Capsicum Nutrition 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 241000283973 Oryctolagus cuniculus Species 0.000 description 1
- 241000282376 Panthera tigris Species 0.000 description 1
- 239000006002 Pepper Substances 0.000 description 1
- 244000082204 Phyllostachys viridis Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 235000016761 Piper aduncum Nutrition 0.000 description 1
- 235000017804 Piper guineense Nutrition 0.000 description 1
- 244000203593 Piper nigrum Species 0.000 description 1
- 235000008184 Piper nigrum Nutrition 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 235000006040 Prunus persica var persica Nutrition 0.000 description 1
- 238000001237 Raman spectrum Methods 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 244000126002 Ziziphus vulgaris Species 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 210000000232 gallbladder Anatomy 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 210000000003 hoof Anatomy 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 210000001161 mammalian embryo Anatomy 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 210000003205 muscle Anatomy 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 239000008385 outer phase Substances 0.000 description 1
- 210000004681 ovum Anatomy 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- -1 矽 矽 compound Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US64073204P | 2004-12-29 | 2004-12-29 | |
| US11/148,764 US7506522B2 (en) | 2004-12-29 | 2005-06-08 | High refractive index homogeneity fused silica glass and method of making same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200700339A TW200700339A (en) | 2007-01-01 |
| TWI308557B true TWI308557B (en) | 2009-04-11 |
Family
ID=36367617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094147458A TWI308557B (en) | 2004-12-29 | 2005-12-29 | High refractive index homogeneity fused silica glass and method of making same |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7506522B2 (enExample) |
| JP (1) | JP5202959B2 (enExample) |
| DE (1) | DE112005003308B4 (enExample) |
| TW (1) | TWI308557B (enExample) |
| WO (1) | WO2006071936A2 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004009557B3 (de) * | 2004-02-25 | 2005-04-21 | Autoflug Gmbh | Land-, Luft- oder Seefahrzeug mit einem Transportraum zur Aufnahme von Gütern und/oder von der Personenbeförderung dienenden, am Fahrzeug gehalterten Sitzen |
| US7506521B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High transmission synthetic silica glass and method of making same |
| WO2006136184A1 (de) * | 2005-06-21 | 2006-12-28 | Carl Zeiss Smt Ag | Projektionsobjektiv für die mikrolithographie und abschlusselement dafür |
| US20070049482A1 (en) * | 2005-08-11 | 2007-03-01 | Shin-Etsu Chemical Co., Ltd. | Synthetic quartz glass substrate for excimer lasers and making method |
| US20070059533A1 (en) * | 2005-09-12 | 2007-03-15 | Burdette Steven R | Thermal reflow of glass and fused silica body |
| US20070105703A1 (en) * | 2005-11-07 | 2007-05-10 | Bookbinder Dana C | Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same |
| US7635658B2 (en) * | 2005-11-07 | 2009-12-22 | Corning Inc | Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same |
| WO2007086617A1 (en) * | 2006-01-30 | 2007-08-02 | Asahi Glass Co., Ltd. | Synthetic quartz glass with fast axes of birefringence distributed in concentric-circle tangent directions and process for producing the same |
| US7964522B2 (en) * | 2006-08-31 | 2011-06-21 | Corning Incorporated | F-doped silica glass and process of making same |
| JP5365826B2 (ja) * | 2007-02-01 | 2013-12-11 | ウシオ電機株式会社 | 放電ランプ |
| US20080268201A1 (en) * | 2007-04-27 | 2008-10-30 | Richard Michael Fiacco | Low OH glass for infrared applications |
| JP5719590B2 (ja) * | 2007-05-09 | 2015-05-20 | コーニング インコーポレイテッド | Ｏｈ、ｏｄレベルの低いガラス |
| US8062986B2 (en) * | 2007-07-27 | 2011-11-22 | Corning Incorporated | Fused silica having low OH, OD levels and method of making |
| KR100989125B1 (ko) * | 2008-07-16 | 2010-10-20 | 삼성모바일디스플레이주식회사 | 원장기판 절단 장치 및 이에 의하여 절단된 유기발광표시장치 |
| US8328417B2 (en) * | 2009-08-20 | 2012-12-11 | Corning Incorporated | Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples |
| US8596094B2 (en) * | 2009-10-21 | 2013-12-03 | Corning Incorporated | Synthetic silica glass with uniform fictive temperature |
| JP5476982B2 (ja) * | 2009-12-25 | 2014-04-23 | 信越化学工業株式会社 | チタニアドープ石英ガラスの選定方法 |
| KR101273801B1 (ko) | 2011-10-17 | 2013-06-11 | 에쓰이에이치에프코리아 (주) | 구부림 손실 강화 광섬유 |
| DE102011119374A1 (de) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| DE102011119341A1 (de) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode |
| DE102011119339A1 (de) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas |
| DE102011119373A1 (de) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| JP5935765B2 (ja) * | 2012-07-10 | 2016-06-15 | 信越化学工業株式会社 | ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド |
| JP6241276B2 (ja) * | 2013-01-22 | 2017-12-06 | 信越化学工業株式会社 | Ｅｕｖリソグラフィ用部材の製造方法 |
| DE102013101328B3 (de) * | 2013-02-11 | 2014-02-13 | Heraeus Quarzglas Gmbh & Co. Kg | Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung |
| RU2527359C1 (ru) * | 2013-04-09 | 2014-08-27 | ФГБОУ ВПО "Уральский государственный горный университет" | Способ контроля оптической однородности расплава стекла |
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| JPH0627014B2 (ja) * | 1989-06-19 | 1994-04-13 | 信越石英株式会社 | 紫外線レーザ用合成シリカガラス光学体及びその製造方法 |
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| JPH06234545A (ja) * | 1993-02-10 | 1994-08-23 | Sumitomo Metal Ind Ltd | 光透過用合成石英ガラス |
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| US6143676A (en) * | 1997-05-20 | 2000-11-07 | Heraeus Quarzglas Gmbh | Synthetic silica glass used with uv-rays and method producing the same |
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| WO2000024685A1 (fr) * | 1998-10-28 | 2000-05-04 | Asahi Glass Company Ltd. | Verre en quartz synthetique et procede de fabrication |
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| KR100651146B1 (ko) | 1999-07-02 | 2006-11-28 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 유리 모재를 제조하는 장치 및 그 방법 |
| JP3730448B2 (ja) * | 1999-07-22 | 2006-01-05 | 信越化学工業株式会社 | 多孔質ガラス母材の製造方法と製造装置 |
| JP3069562B1 (ja) * | 1999-10-19 | 2000-07-24 | 信越石英株式会社 | エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法 |
| JP3865039B2 (ja) * | 2000-08-18 | 2007-01-10 | 信越化学工業株式会社 | 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板 |
| WO2003027033A1 (en) * | 2001-09-27 | 2003-04-03 | Corning Incorporated | Improved methods and furnaces for fused silica production |
| JP4054983B2 (ja) * | 2001-12-11 | 2008-03-05 | 信越化学工業株式会社 | 合成石英ガラス部材 |
| JP4114039B2 (ja) * | 2001-12-11 | 2008-07-09 | 信越石英株式会社 | 合成石英ガラス部材 |
| WO2003057637A1 (en) * | 2001-12-21 | 2003-07-17 | Corning Incorporated | Fused silica containing aluminum |
-
2005
- 2005-06-08 US US11/148,764 patent/US7506522B2/en active Active
- 2005-12-28 DE DE112005003308.2T patent/DE112005003308B4/de not_active Expired - Fee Related
- 2005-12-28 JP JP2007549589A patent/JP5202959B2/ja not_active Expired - Fee Related
- 2005-12-28 WO PCT/US2005/047257 patent/WO2006071936A2/en not_active Ceased
- 2005-12-29 TW TW094147458A patent/TWI308557B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE112005003308B4 (de) | 2017-07-06 |
| WO2006071936A3 (en) | 2006-08-24 |
| US7506522B2 (en) | 2009-03-24 |
| WO2006071936A2 (en) | 2006-07-06 |
| DE112005003308T5 (de) | 2008-03-20 |
| TW200700339A (en) | 2007-01-01 |
| US20060137398A1 (en) | 2006-06-29 |
| JP5202959B2 (ja) | 2013-06-05 |
| JP2008525309A (ja) | 2008-07-17 |
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