DE112005003308B4 - Quarzglas mit hoher Brechungsindex-Homogenität und Verfahren zur Herstellung desselben - Google Patents

Quarzglas mit hoher Brechungsindex-Homogenität und Verfahren zur Herstellung desselben Download PDF

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Publication number
DE112005003308B4
DE112005003308B4 DE112005003308.2T DE112005003308T DE112005003308B4 DE 112005003308 B4 DE112005003308 B4 DE 112005003308B4 DE 112005003308 T DE112005003308 T DE 112005003308T DE 112005003308 B4 DE112005003308 B4 DE 112005003308B4
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Germany
Prior art keywords
less
preform
glass
ppm
soot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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DE112005003308.2T
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German (de)
English (en)
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DE112005003308T5 (de
Inventor
Dana Craig Bookbinder
Richard Michael Fiacco
Kenneth Edward Hrdina
Pushkar Tandon
Daniel Joseph Bleaking
John Edward Maxon
Kimberly Ann Wilbert
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Corning Inc
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Corning Inc
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Publication of DE112005003308T5 publication Critical patent/DE112005003308T5/de
Application granted granted Critical
Publication of DE112005003308B4 publication Critical patent/DE112005003308B4/de
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Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE112005003308.2T 2004-12-29 2005-12-28 Quarzglas mit hoher Brechungsindex-Homogenität und Verfahren zur Herstellung desselben Expired - Fee Related DE112005003308B4 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US64073204P 2004-12-29 2004-12-29
US60/640,732 2004-12-29
US11/148,764 2005-06-08
US11/148,764 US7506522B2 (en) 2004-12-29 2005-06-08 High refractive index homogeneity fused silica glass and method of making same
PCT/US2005/047257 WO2006071936A2 (en) 2004-12-29 2005-12-28 High refractive index homogeneity fused silica glass and method of making same

Publications (2)

Publication Number Publication Date
DE112005003308T5 DE112005003308T5 (de) 2008-03-20
DE112005003308B4 true DE112005003308B4 (de) 2017-07-06

Family

ID=36367617

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112005003308.2T Expired - Fee Related DE112005003308B4 (de) 2004-12-29 2005-12-28 Quarzglas mit hoher Brechungsindex-Homogenität und Verfahren zur Herstellung desselben

Country Status (5)

Country Link
US (1) US7506522B2 (enExample)
JP (1) JP5202959B2 (enExample)
DE (1) DE112005003308B4 (enExample)
TW (1) TWI308557B (enExample)
WO (1) WO2006071936A2 (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
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DE102004009557B3 (de) * 2004-02-25 2005-04-21 Autoflug Gmbh Land-, Luft- oder Seefahrzeug mit einem Transportraum zur Aufnahme von Gütern und/oder von der Personenbeförderung dienenden, am Fahrzeug gehalterten Sitzen
US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
WO2006136184A1 (de) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag Projektionsobjektiv für die mikrolithographie und abschlusselement dafür
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
US20070059533A1 (en) * 2005-09-12 2007-03-15 Burdette Steven R Thermal reflow of glass and fused silica body
US7635658B2 (en) * 2005-11-07 2009-12-22 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
US20070105703A1 (en) * 2005-11-07 2007-05-10 Bookbinder Dana C Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
WO2007086617A1 (en) * 2006-01-30 2007-08-02 Asahi Glass Co., Ltd. Synthetic quartz glass with fast axes of birefringence distributed in concentric-circle tangent directions and process for producing the same
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
JP5365826B2 (ja) * 2007-02-01 2013-12-11 ウシオ電機株式会社 放電ランプ
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
CN101730667B (zh) * 2007-05-09 2013-03-27 康宁股份有限公司 Oh、od含量低的玻璃
US8062986B2 (en) * 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
KR100989125B1 (ko) * 2008-07-16 2010-10-20 삼성모바일디스플레이주식회사 원장기판 절단 장치 및 이에 의하여 절단된 유기발광표시장치
US8328417B2 (en) 2009-08-20 2012-12-11 Corning Incorporated Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples
US8596094B2 (en) * 2009-10-21 2013-12-03 Corning Incorporated Synthetic silica glass with uniform fictive temperature
JP5476982B2 (ja) * 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
KR101273801B1 (ko) * 2011-10-17 2013-06-11 에쓰이에이치에프코리아 (주) 구부림 손실 강화 광섬유
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119373A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119339A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011119374A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) * 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
DE102013101328B3 (de) * 2013-02-11 2014-02-13 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung
RU2527359C1 (ru) * 2013-04-09 2014-08-27 ФГБОУ ВПО "Уральский государственный горный университет" Способ контроля оптической однородности расплава стекла
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
WO2017165769A1 (en) * 2016-03-24 2017-09-28 Corning Incorporated Laser sintering system and method for forming high purity, low roughness, low warp silica glass
US10893577B2 (en) * 2016-09-19 2021-01-12 Corning Incorporated Millimeter wave heating of soot preform
JP7049327B2 (ja) * 2016-09-21 2022-04-06 コーニング インコーポレイテッド 変化するクラッド屈折率を有する光ファイバ、およびそれを形成する方法
DE102016012003A1 (de) 2016-10-06 2018-04-12 Karlsruher Institut für Technologie Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung
KR102586150B1 (ko) 2016-12-21 2023-10-06 코닝 인코포레이티드 소결 시스템 및 소결된 물품
JP2020012933A (ja) * 2018-07-17 2020-01-23 住友電気工業株式会社 光ファイバ
DE102019115928B4 (de) * 2019-06-12 2023-07-27 J-Fiber Gmbh Quarzfaser mit Wasserstoff-Barriereschicht und Verfahren zu deren Herstellung

Citations (9)

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Publication number Priority date Publication date Assignee Title
US5086352A (en) * 1989-06-09 1992-02-04 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks or synthetic silica glass and method for their production
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
US5410428A (en) * 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP1094040A2 (en) * 1999-10-19 2001-04-25 Heraeus Quarzglas GmbH Silica glass optical material for excimer laser and excimer lamp, and method for producing the same
EP1188723A1 (en) * 2000-08-18 2002-03-20 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass and method of production
US6376401B1 (en) * 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
US20030139277A1 (en) * 2001-12-21 2003-07-24 Maxon John E. Fused silica having improved index homogeneity
US6698248B2 (en) * 2001-09-27 2004-03-02 Corning Incorporated Methods and furnaces for fused silica production

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Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5086352A (en) * 1989-06-09 1992-02-04 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks or synthetic silica glass and method for their production
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
US5410428A (en) * 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
US6376401B1 (en) * 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
EP1094040A2 (en) * 1999-10-19 2001-04-25 Heraeus Quarzglas GmbH Silica glass optical material for excimer laser and excimer lamp, and method for producing the same
EP1188723A1 (en) * 2000-08-18 2002-03-20 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass and method of production
US6698248B2 (en) * 2001-09-27 2004-03-02 Corning Incorporated Methods and furnaces for fused silica production
US20030139277A1 (en) * 2001-12-21 2003-07-24 Maxon John E. Fused silica having improved index homogeneity

Also Published As

Publication number Publication date
US20060137398A1 (en) 2006-06-29
JP2008525309A (ja) 2008-07-17
WO2006071936A3 (en) 2006-08-24
JP5202959B2 (ja) 2013-06-05
DE112005003308T5 (de) 2008-03-20
TWI308557B (en) 2009-04-11
TW200700339A (en) 2007-01-01
WO2006071936A2 (en) 2006-07-06
US7506522B2 (en) 2009-03-24

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