JP5202959B2 - 高屈折率均一性溶融シリカガラスおよびその製造方法 - Google Patents

高屈折率均一性溶融シリカガラスおよびその製造方法 Download PDF

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Publication number
JP5202959B2
JP5202959B2 JP2007549589A JP2007549589A JP5202959B2 JP 5202959 B2 JP5202959 B2 JP 5202959B2 JP 2007549589 A JP2007549589 A JP 2007549589A JP 2007549589 A JP2007549589 A JP 2007549589A JP 5202959 B2 JP5202959 B2 JP 5202959B2
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Prior art keywords
soot
glass
preform
ppm
less
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Expired - Fee Related
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JP2007549589A
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English (en)
Japanese (ja)
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JP2008525309A5 (enExample
JP2008525309A (ja
Inventor
シー ブックバインダー，ダナ
エム フィアッコ，リチャード
イー フルディナ，ケネス
タンドン，プシュカー
ジェイ ブリーキング，ダニエル
イー マクソン，ジョン
エイ ウィルバート，キンバリー
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Corning Inc
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Corning Inc
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Publication of JP2008525309A5 publication Critical patent/JP2008525309A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2007549589A 2004-12-29 2005-12-28 高屈折率均一性溶融シリカガラスおよびその製造方法 Expired - Fee Related JP5202959B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US64073204P 2004-12-29 2004-12-29
US60/640,732 2004-12-29
US11/148,764 2005-06-08
US11/148,764 US7506522B2 (en) 2004-12-29 2005-06-08 High refractive index homogeneity fused silica glass and method of making same
PCT/US2005/047257 WO2006071936A2 (en) 2004-12-29 2005-12-28 High refractive index homogeneity fused silica glass and method of making same

Publications (3)

Publication Number Publication Date
JP2008525309A JP2008525309A (ja) 2008-07-17
JP2008525309A5 JP2008525309A5 (enExample) 2008-12-11
JP5202959B2 true JP5202959B2 (ja) 2013-06-05

Family

ID=36367617

Family Applications (1)

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JP2007549589A Expired - Fee Related JP5202959B2 (ja) 2004-12-29 2005-12-28 高屈折率均一性溶融シリカガラスおよびその製造方法

Country Status (5)

Country Link
US (1) US7506522B2 (enExample)
JP (1) JP5202959B2 (enExample)
DE (1) DE112005003308B4 (enExample)
TW (1) TWI308557B (enExample)
WO (1) WO2006071936A2 (enExample)

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DE102004009557B3 (de) * 2004-02-25 2005-04-21 Autoflug Gmbh Land-, Luft- oder Seefahrzeug mit einem Transportraum zur Aufnahme von Gütern und/oder von der Personenbeförderung dienenden, am Fahrzeug gehalterten Sitzen
US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
WO2006136184A1 (de) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag Projektionsobjektiv für die mikrolithographie und abschlusselement dafür
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
US20070059533A1 (en) * 2005-09-12 2007-03-15 Burdette Steven R Thermal reflow of glass and fused silica body
US20070105703A1 (en) * 2005-11-07 2007-05-10 Bookbinder Dana C Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
US7635658B2 (en) * 2005-11-07 2009-12-22 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
WO2007086617A1 (en) * 2006-01-30 2007-08-02 Asahi Glass Co., Ltd. Synthetic quartz glass with fast axes of birefringence distributed in concentric-circle tangent directions and process for producing the same
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
JP5365826B2 (ja) * 2007-02-01 2013-12-11 ウシオ電機株式会社 放電ランプ
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
JP5719590B2 (ja) * 2007-05-09 2015-05-20 コーニング インコーポレイテッド Ｏｈ、ｏｄレベルの低いガラス
US8062986B2 (en) * 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
KR100989125B1 (ko) * 2008-07-16 2010-10-20 삼성모바일디스플레이주식회사 원장기판 절단 장치 및 이에 의하여 절단된 유기발광표시장치
US8328417B2 (en) * 2009-08-20 2012-12-11 Corning Incorporated Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples
US8596094B2 (en) * 2009-10-21 2013-12-03 Corning Incorporated Synthetic silica glass with uniform fictive temperature
JP5476982B2 (ja) * 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
KR101273801B1 (ko) 2011-10-17 2013-06-11 에쓰이에이치에프코리아 (주) 구부림 손실 강화 광섬유
DE102011119374A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119339A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) * 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
DE102013101328B3 (de) * 2013-02-11 2014-02-13 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung
RU2527359C1 (ru) * 2013-04-09 2014-08-27 ФГБОУ ВПО "Уральский государственный горный университет" Способ контроля оптической однородности расплава стекла
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
WO2017165769A1 (en) * 2016-03-24 2017-09-28 Corning Incorporated Laser sintering system and method for forming high purity, low roughness, low warp silica glass
US10893577B2 (en) * 2016-09-19 2021-01-12 Corning Incorporated Millimeter wave heating of soot preform
JP7049327B2 (ja) * 2016-09-21 2022-04-06 コーニング インコーポレイテッド 変化するクラッド屈折率を有する光ファイバ、およびそれを形成する方法
DE102016012003A1 (de) 2016-10-06 2018-04-12 Karlsruher Institut für Technologie Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung
JP7068309B2 (ja) 2016-12-21 2022-05-16 コーニング インコーポレイテッド 焼結システム及び焼結済み物品
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Also Published As

Publication number Publication date
TWI308557B (en) 2009-04-11
DE112005003308B4 (de) 2017-07-06
WO2006071936A3 (en) 2006-08-24
US7506522B2 (en) 2009-03-24
WO2006071936A2 (en) 2006-07-06
DE112005003308T5 (de) 2008-03-20
TW200700339A (en) 2007-01-01
US20060137398A1 (en) 2006-06-29
JP2008525309A (ja) 2008-07-17

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