JP2008525309A5 - - Google Patents

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Publication number
JP2008525309A5
JP2008525309A5 JP2007549589A JP2007549589A JP2008525309A5 JP 2008525309 A5 JP2008525309 A5 JP 2008525309A5 JP 2007549589 A JP2007549589 A JP 2007549589A JP 2007549589 A JP2007549589 A JP 2007549589A JP 2008525309 A5 JP2008525309 A5 JP 2008525309A5
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JP
Japan
Prior art keywords
preform
ppm
concentration
less
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007549589A
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English (en)
Japanese (ja)
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JP5202959B2 (ja
JP2008525309A (ja
Filing date
Publication date
Priority claimed from US11/148,764 external-priority patent/US7506522B2/en
Application filed filed Critical
Publication of JP2008525309A publication Critical patent/JP2008525309A/ja
Publication of JP2008525309A5 publication Critical patent/JP2008525309A5/ja
Application granted granted Critical
Publication of JP5202959B2 publication Critical patent/JP5202959B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007549589A 2004-12-29 2005-12-28 高屈折率均一性溶融シリカガラスおよびその製造方法 Expired - Fee Related JP5202959B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US64073204P 2004-12-29 2004-12-29
US60/640,732 2004-12-29
US11/148,764 2005-06-08
US11/148,764 US7506522B2 (en) 2004-12-29 2005-06-08 High refractive index homogeneity fused silica glass and method of making same
PCT/US2005/047257 WO2006071936A2 (en) 2004-12-29 2005-12-28 High refractive index homogeneity fused silica glass and method of making same

Publications (3)

Publication Number Publication Date
JP2008525309A JP2008525309A (ja) 2008-07-17
JP2008525309A5 true JP2008525309A5 (enExample) 2008-12-11
JP5202959B2 JP5202959B2 (ja) 2013-06-05

Family

ID=36367617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007549589A Expired - Fee Related JP5202959B2 (ja) 2004-12-29 2005-12-28 高屈折率均一性溶融シリカガラスおよびその製造方法

Country Status (5)

Country Link
US (1) US7506522B2 (enExample)
JP (1) JP5202959B2 (enExample)
DE (1) DE112005003308B4 (enExample)
TW (1) TWI308557B (enExample)
WO (1) WO2006071936A2 (enExample)

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US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
WO2006136184A1 (de) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag Projektionsobjektiv für die mikrolithographie und abschlusselement dafür
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
US20070059533A1 (en) * 2005-09-12 2007-03-15 Burdette Steven R Thermal reflow of glass and fused silica body
US20070105703A1 (en) * 2005-11-07 2007-05-10 Bookbinder Dana C Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
US7635658B2 (en) * 2005-11-07 2009-12-22 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
WO2007086617A1 (en) * 2006-01-30 2007-08-02 Asahi Glass Co., Ltd. Synthetic quartz glass with fast axes of birefringence distributed in concentric-circle tangent directions and process for producing the same
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
JP5365826B2 (ja) * 2007-02-01 2013-12-11 ウシオ電機株式会社 放電ランプ
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
JP5719590B2 (ja) * 2007-05-09 2015-05-20 コーニング インコーポレイテッド Ｏｈ、ｏｄレベルの低いガラス
US8062986B2 (en) * 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
KR100989125B1 (ko) * 2008-07-16 2010-10-20 삼성모바일디스플레이주식회사 원장기판 절단 장치 및 이에 의하여 절단된 유기발광표시장치
US8328417B2 (en) * 2009-08-20 2012-12-11 Corning Incorporated Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples
US8596094B2 (en) * 2009-10-21 2013-12-03 Corning Incorporated Synthetic silica glass with uniform fictive temperature
JP5476982B2 (ja) * 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
KR101273801B1 (ko) 2011-10-17 2013-06-11 에쓰이에이치에프코리아 (주) 구부림 손실 강화 광섬유
DE102011119374A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119339A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) * 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
DE102013101328B3 (de) * 2013-02-11 2014-02-13 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung
RU2527359C1 (ru) * 2013-04-09 2014-08-27 ФГБОУ ВПО "Уральский государственный горный университет" Способ контроля оптической однородности расплава стекла
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
WO2017165769A1 (en) * 2016-03-24 2017-09-28 Corning Incorporated Laser sintering system and method for forming high purity, low roughness, low warp silica glass
US10893577B2 (en) * 2016-09-19 2021-01-12 Corning Incorporated Millimeter wave heating of soot preform
JP7049327B2 (ja) * 2016-09-21 2022-04-06 コーニング インコーポレイテッド 変化するクラッド屈折率を有する光ファイバ、およびそれを形成する方法
DE102016012003A1 (de) 2016-10-06 2018-04-12 Karlsruher Institut für Technologie Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung
JP7068309B2 (ja) 2016-12-21 2022-05-16 コーニング インコーポレイテッド 焼結システム及び焼結済み物品
JP2020012933A (ja) * 2018-07-17 2020-01-23 住友電気工業株式会社 光ファイバ
DE102019115928B4 (de) * 2019-06-12 2023-07-27 J-Fiber Gmbh Quarzfaser mit Wasserstoff-Barriereschicht und Verfahren zu deren Herstellung

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US5325230A (en) 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
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US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
JP3521681B2 (ja) * 1996-08-13 2004-04-19 住友電気工業株式会社 光ファイバ母材の製造方法
JP3403317B2 (ja) 1997-05-20 2003-05-06 信越石英株式会社 高出力真空紫外線用合成シリカガラス光学材料およびその製造方法
US6143676A (en) * 1997-05-20 2000-11-07 Heraeus Quarzglas Gmbh Synthetic silica glass used with uv-rays and method producing the same
US6376401B1 (en) 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
WO2000024685A1 (fr) * 1998-10-28 2000-05-04 Asahi Glass Company Ltd. Verre en quartz synthetique et procede de fabrication
JP4240709B2 (ja) * 1998-12-25 2009-03-18 旭硝子株式会社 合成石英ガラスおよびその製造方法
JP4531904B2 (ja) 1999-01-21 2010-08-25 東ソー株式会社 紫外線用光学材料およびその製造方法
KR100651146B1 (ko) 1999-07-02 2006-11-28 신에쓰 가가꾸 고교 가부시끼가이샤 유리 모재를 제조하는 장치 및 그 방법
JP3730448B2 (ja) * 1999-07-22 2006-01-05 信越化学工業株式会社 多孔質ガラス母材の製造方法と製造装置
JP3069562B1 (ja) * 1999-10-19 2000-07-24 信越石英株式会社 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法
JP3865039B2 (ja) * 2000-08-18 2007-01-10 信越化学工業株式会社 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板
WO2003027033A1 (en) * 2001-09-27 2003-04-03 Corning Incorporated Improved methods and furnaces for fused silica production
JP4054983B2 (ja) * 2001-12-11 2008-03-05 信越化学工業株式会社 合成石英ガラス部材
JP4114039B2 (ja) * 2001-12-11 2008-07-09 信越石英株式会社 合成石英ガラス部材
WO2003057637A1 (en) * 2001-12-21 2003-07-17 Corning Incorporated Fused silica containing aluminum

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