TWI258057B - Photopolymerizable resin composition for sandblast resist - Google Patents

Photopolymerizable resin composition for sandblast resist Download PDF

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Publication number
TWI258057B
TWI258057B TW092124076A TW92124076A TWI258057B TW I258057 B TWI258057 B TW I258057B TW 092124076 A TW092124076 A TW 092124076A TW 92124076 A TW92124076 A TW 92124076A TW I258057 B TWI258057 B TW I258057B
Authority
TW
Taiwan
Prior art keywords
integer
compound
meth
methyl
hydrogen
Prior art date
Application number
TW092124076A
Other languages
English (en)
Chinese (zh)
Other versions
TW200421021A (en
Inventor
Jun-Hyeak Choi
Kook-Hyeon Han
Jung-Hyun Noh
Original Assignee
Kolon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kolon Inc filed Critical Kolon Inc
Publication of TW200421021A publication Critical patent/TW200421021A/zh
Application granted granted Critical
Publication of TWI258057B publication Critical patent/TWI258057B/zh

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/10Esters; Ether-esters
    • C08K5/101Esters; Ether-esters of monocarboxylic acids
    • C08K5/103Esters; Ether-esters of monocarboxylic acids with polyalcohols

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
TW092124076A 2002-09-03 2003-09-01 Photopolymerizable resin composition for sandblast resist TWI258057B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2002-0052692A KR100521999B1 (ko) 2002-09-03 2002-09-03 샌드블래스트 레지스트용 감광성수지 조성물

Publications (2)

Publication Number Publication Date
TW200421021A TW200421021A (en) 2004-10-16
TWI258057B true TWI258057B (en) 2006-07-11

Family

ID=36461777

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092124076A TWI258057B (en) 2002-09-03 2003-09-01 Photopolymerizable resin composition for sandblast resist

Country Status (8)

Country Link
US (1) US20060111493A1 (https=)
EP (1) EP1546808A4 (https=)
JP (1) JP2005537514A (https=)
KR (1) KR100521999B1 (https=)
CN (1) CN1678957A (https=)
AU (1) AU2003261622A1 (https=)
TW (1) TWI258057B (https=)
WO (1) WO2004023212A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI474918B (zh) * 2010-05-26 2015-03-01 Hon Hai Prec Ind Co Ltd 具預定圖案的滾輪之製作方法

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KR101073620B1 (ko) * 2004-05-07 2011-10-14 주식회사 동진쎄미켐 감광성 수지 조성물
JP2007101863A (ja) * 2005-10-04 2007-04-19 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
KR101369268B1 (ko) * 2006-04-24 2014-03-04 코오롱인더스트리 주식회사 내화학성이 우수한 감광성 수지 조성물
JP2007316298A (ja) * 2006-05-25 2007-12-06 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物
KR101356573B1 (ko) * 2007-01-16 2014-01-29 코오롱인더스트리 주식회사 감광성 수지 조성물
KR100814407B1 (ko) * 2007-02-08 2008-03-18 삼성전자주식회사 미세 패턴 형성용 조성물 및 이를 이용한 패턴의 형성 방법
DE102008024214A1 (de) * 2008-05-19 2009-11-26 Flint Group Germany Gmbh Fotopolymerisierbare Flexodruckelemente für den Druck mit UV-Farben
CN102262355A (zh) * 2010-05-28 2011-11-30 鸿富锦精密工业(深圳)有限公司 具预定图案的滚轮的制作方法
CN102964761A (zh) * 2011-09-02 2013-03-13 田菱精细化工(昆山)有限公司 喷砂加工立体保护膜用树脂组合物
KR20130073509A (ko) * 2011-12-23 2013-07-03 코오롱인더스트리 주식회사 드라이 필름 포토 레지스트용 감광성 수지 조성물
JP6273690B2 (ja) * 2013-04-08 2018-02-07 日立化成株式会社 感光性樹脂組成物及びこれを用いた感光性フィルム
WO2014200138A1 (ko) * 2013-06-14 2014-12-18 (주) 엘지화학 에스테르계 가소제의 제조방법 및 이로부터 제조된 에스테르계 가소제
KR101675822B1 (ko) * 2013-08-07 2016-11-15 코오롱인더스트리 주식회사 드라이 필름 포토 레지스트용 감광성 수지 조성물
TWI687769B (zh) 2015-05-12 2020-03-11 日商三菱製紙股份有限公司 噴砂用感光性樹脂組成物及噴砂處理方法
US10574014B2 (en) * 2017-03-27 2020-02-25 Aptiv Technologies Limited Method for sealing electric terminal assembly
TWI874662B (zh) 2020-06-05 2025-03-01 日商三菱製紙股份有限公司 噴砂用感光性樹脂組成物及噴砂用感光性薄膜
WO2022030014A1 (ja) * 2020-08-07 2022-02-10 株式会社ダイセル セルロースアセテート樹脂組成物
KR102825901B1 (ko) * 2021-04-09 2025-06-25 코오롱인더스트리 주식회사 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 레지스터 패턴, 회로기판, 및 디스플레이 장치
CN120215209A (zh) * 2025-05-28 2025-06-27 杭州福斯特电子材料有限公司 感光性树脂组合物、层压体和应用

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US4822705A (en) * 1987-02-24 1989-04-18 Ricoh Company, Ltd. Electrophotographic photoconductor with layer preventing charge injection
JP3638660B2 (ja) * 1995-05-01 2005-04-13 松下電器産業株式会社 感光性樹脂組成物、それを用いたサンドブラスト用感光性ドライフィルム及びそれを用いた食刻方法
JP3468959B2 (ja) * 1995-11-30 2003-11-25 東京応化工業株式会社 感光性樹脂組成物及びそれを用いた感光性樹脂積層フィルム
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JP3473696B2 (ja) * 1999-03-03 2003-12-08 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP4108243B2 (ja) * 1999-04-14 2008-06-25 旭化成エレクトロニクス株式会社 感光性樹脂積層体
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JP2002148796A (ja) * 2001-08-06 2002-05-22 Hitachi Chem Co Ltd 印刷回路板およびそれに用いる感光性樹脂組成物、感光性フィルム
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI474918B (zh) * 2010-05-26 2015-03-01 Hon Hai Prec Ind Co Ltd 具預定圖案的滾輪之製作方法

Also Published As

Publication number Publication date
KR20040021185A (ko) 2004-03-10
WO2004023212A1 (en) 2004-03-18
AU2003261622A1 (en) 2004-03-29
CN1678957A (zh) 2005-10-05
US20060111493A1 (en) 2006-05-25
JP2005537514A (ja) 2005-12-08
EP1546808A1 (en) 2005-06-29
TW200421021A (en) 2004-10-16
KR100521999B1 (ko) 2005-10-18
EP1546808A4 (en) 2007-07-25

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