KR100521999B1 - 샌드블래스트 레지스트용 감광성수지 조성물 - Google Patents

샌드블래스트 레지스트용 감광성수지 조성물 Download PDF

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Publication number
KR100521999B1
KR100521999B1 KR10-2002-0052692A KR20020052692A KR100521999B1 KR 100521999 B1 KR100521999 B1 KR 100521999B1 KR 20020052692 A KR20020052692 A KR 20020052692A KR 100521999 B1 KR100521999 B1 KR 100521999B1
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KR
South Korea
Prior art keywords
formula
integer
compound
resin composition
group
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR10-2002-0052692A
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English (en)
Korean (ko)
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KR20040021185A (ko
Inventor
최준혁
한국현
노중현
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주식회사 코오롱
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Application filed by 주식회사 코오롱 filed Critical 주식회사 코오롱
Priority to KR10-2002-0052692A priority Critical patent/KR100521999B1/ko
Priority to TW092124076A priority patent/TWI258057B/zh
Priority to US10/526,696 priority patent/US20060111493A1/en
Priority to EP03794316A priority patent/EP1546808A4/en
Priority to AU2003261622A priority patent/AU2003261622A1/en
Priority to JP2004533842A priority patent/JP2005537514A/ja
Priority to PCT/KR2003/001791 priority patent/WO2004023212A1/en
Priority to CNA03820942XA priority patent/CN1678957A/zh
Publication of KR20040021185A publication Critical patent/KR20040021185A/ko
Application granted granted Critical
Publication of KR100521999B1 publication Critical patent/KR100521999B1/ko
Assigned to 코오롱인더스트리 주식회사 reassignment 코오롱인더스트리 주식회사 권리의 전부이전등록 Assignors: 주식회사 코오롱
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C08K5/103—Esters; Ether-esters of monocarboxylic acids with polyalcohols

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
KR10-2002-0052692A 2002-09-03 2002-09-03 샌드블래스트 레지스트용 감광성수지 조성물 Expired - Fee Related KR100521999B1 (ko)

Priority Applications (8)

Application Number Priority Date Filing Date Title
KR10-2002-0052692A KR100521999B1 (ko) 2002-09-03 2002-09-03 샌드블래스트 레지스트용 감광성수지 조성물
TW092124076A TWI258057B (en) 2002-09-03 2003-09-01 Photopolymerizable resin composition for sandblast resist
EP03794316A EP1546808A4 (en) 2002-09-03 2003-09-02 POLYMERIZABLE RESIN COMPOSITION FOR SAND MASK
AU2003261622A AU2003261622A1 (en) 2002-09-03 2003-09-02 Photopolymerizable resin composition for sandblast resist
US10/526,696 US20060111493A1 (en) 2002-09-03 2003-09-02 Photopolymerizable resin composition for sandblast resist
JP2004533842A JP2005537514A (ja) 2002-09-03 2003-09-02 サンドブラストレジスト用感光性樹脂組成物
PCT/KR2003/001791 WO2004023212A1 (en) 2002-09-03 2003-09-02 Photopolymerizable resin composition for sandblast resist
CNA03820942XA CN1678957A (zh) 2002-09-03 2003-09-02 用于喷砂保护层的光聚合树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2002-0052692A KR100521999B1 (ko) 2002-09-03 2002-09-03 샌드블래스트 레지스트용 감광성수지 조성물

Publications (2)

Publication Number Publication Date
KR20040021185A KR20040021185A (ko) 2004-03-10
KR100521999B1 true KR100521999B1 (ko) 2005-10-18

Family

ID=36461777

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2002-0052692A Expired - Fee Related KR100521999B1 (ko) 2002-09-03 2002-09-03 샌드블래스트 레지스트용 감광성수지 조성물

Country Status (8)

Country Link
US (1) US20060111493A1 (https=)
EP (1) EP1546808A4 (https=)
JP (1) JP2005537514A (https=)
KR (1) KR100521999B1 (https=)
CN (1) CN1678957A (https=)
AU (1) AU2003261622A1 (https=)
TW (1) TWI258057B (https=)
WO (1) WO2004023212A1 (https=)

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KR101073620B1 (ko) * 2004-05-07 2011-10-14 주식회사 동진쎄미켐 감광성 수지 조성물
JP2007101863A (ja) * 2005-10-04 2007-04-19 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
KR101369268B1 (ko) * 2006-04-24 2014-03-04 코오롱인더스트리 주식회사 내화학성이 우수한 감광성 수지 조성물
JP2007316298A (ja) * 2006-05-25 2007-12-06 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物
KR101356573B1 (ko) * 2007-01-16 2014-01-29 코오롱인더스트리 주식회사 감광성 수지 조성물
KR100814407B1 (ko) * 2007-02-08 2008-03-18 삼성전자주식회사 미세 패턴 형성용 조성물 및 이를 이용한 패턴의 형성 방법
DE102008024214A1 (de) * 2008-05-19 2009-11-26 Flint Group Germany Gmbh Fotopolymerisierbare Flexodruckelemente für den Druck mit UV-Farben
TWI474918B (zh) * 2010-05-26 2015-03-01 Hon Hai Prec Ind Co Ltd 具預定圖案的滾輪之製作方法
CN102262355A (zh) * 2010-05-28 2011-11-30 鸿富锦精密工业（深圳）有限公司 具预定图案的滚轮的制作方法
CN102964761A (zh) * 2011-09-02 2013-03-13 田菱精细化工（昆山）有限公司 喷砂加工立体保护膜用树脂组合物
KR20130073509A (ko) * 2011-12-23 2013-07-03 코오롱인더스트리 주식회사 드라이 필름 포토 레지스트용 감광성 수지 조성물
JP6273690B2 (ja) * 2013-04-08 2018-02-07 日立化成株式会社 感光性樹脂組成物及びこれを用いた感光性フィルム
WO2014200138A1 (ko) * 2013-06-14 2014-12-18 (주) 엘지화학 에스테르계 가소제의 제조방법 및 이로부터 제조된 에스테르계 가소제
KR101675822B1 (ko) * 2013-08-07 2016-11-15 코오롱인더스트리 주식회사 드라이 필름 포토 레지스트용 감광성 수지 조성물
TWI687769B (zh) 2015-05-12 2020-03-11 日商三菱製紙股份有限公司 噴砂用感光性樹脂組成物及噴砂處理方法
US10574014B2 (en) * 2017-03-27 2020-02-25 Aptiv Technologies Limited Method for sealing electric terminal assembly
TWI874662B (zh) 2020-06-05 2025-03-01 日商三菱製紙股份有限公司 噴砂用感光性樹脂組成物及噴砂用感光性薄膜
WO2022030014A1 (ja) * 2020-08-07 2022-02-10 株式会社ダイセル セルロースアセテート樹脂組成物
KR102825901B1 (ko) * 2021-04-09 2025-06-25 코오롱인더스트리 주식회사 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 레지스터 패턴, 회로기판, 및 디스플레이 장치
CN120215209A (zh) * 2025-05-28 2025-06-27 杭州福斯特电子材料有限公司 感光性树脂组合物、层压体和应用

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09152713A (ja) * 1995-11-30 1997-06-10 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物及びそれを用いた感光性樹脂積層フィルム
KR19990029621A (ko) * 1997-09-09 1999-04-26 마쯔모또 에이찌 감방사선성 조성물
KR100198725B1 (ko) * 1995-05-01 1999-06-15 나카네 히사시 샌드블라스트레지스트용 감광성수지조성물
KR20000017292A (ko) * 1998-08-17 2000-03-25 나카네 히사시 샌드블라스팅용 감광성 조성물 및 이를 포함하는 감광성 필름적층체
KR20020006671A (ko) * 1999-03-03 2002-01-24 이사오 우치가사키 감광성 수지 조성물, 이를 사용한 감광성 소자, 레지스트패턴의 제조 방법 및 프린트 배선판의 제조 방법
KR20020035756A (ko) * 2000-11-07 2002-05-15 나카네 히사시 샌드블래스팅용 감광성 조성물 및 이를 사용한 감광성 필름

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US4248958A (en) * 1979-05-23 1981-02-03 Hoechst Aktiengesellschaft Photopolymerizable mixture containing polyurethanes
US4822705A (en) * 1987-02-24 1989-04-18 Ricoh Company, Ltd. Electrophotographic photoconductor with layer preventing charge injection
TW475098B (en) * 1995-10-27 2002-02-01 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition and photosensitive resin laminated film containing the same
JPH09204044A (ja) * 1996-01-25 1997-08-05 Asahi Chem Ind Co Ltd 光硬化性樹脂積層体
JPH11174667A (ja) * 1997-12-09 1999-07-02 Asahi Chem Ind Co Ltd 光重合性樹脂組成物及び積層体
JP4108243B2 (ja) * 1999-04-14 2008-06-25 旭化成エレクトロニクス株式会社 感光性樹脂積層体
WO2001098832A1 (fr) * 2000-06-22 2001-12-27 Hitachi Chemical Co., Ltd. Composition de resine photosensible, element photosensible la contenant, procede de production d'un motif de resist et procede de production d'une carte a circuit imprime
JP2002148796A (ja) * 2001-08-06 2002-05-22 Hitachi Chem Co Ltd 印刷回路板およびそれに用いる感光性樹脂組成物、感光性フィルム
EP1324139A3 (en) * 2001-12-06 2003-10-22 Ricoh Company, Ltd. Electrophotographic photoconductor, process cartridge, image forming apparatus and image forming method

Patent Citations (6)

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Publication number Priority date Publication date Assignee Title
KR100198725B1 (ko) * 1995-05-01 1999-06-15 나카네 히사시 샌드블라스트레지스트용 감광성수지조성물
JPH09152713A (ja) * 1995-11-30 1997-06-10 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物及びそれを用いた感光性樹脂積層フィルム
KR19990029621A (ko) * 1997-09-09 1999-04-26 마쯔모또 에이찌 감방사선성 조성물
KR20000017292A (ko) * 1998-08-17 2000-03-25 나카네 히사시 샌드블라스팅용 감광성 조성물 및 이를 포함하는 감광성 필름적층체
KR20020006671A (ko) * 1999-03-03 2002-01-24 이사오 우치가사키 감광성 수지 조성물, 이를 사용한 감광성 소자, 레지스트패턴의 제조 방법 및 프린트 배선판의 제조 방법
KR20020035756A (ko) * 2000-11-07 2002-05-15 나카네 히사시 샌드블래스팅용 감광성 조성물 및 이를 사용한 감광성 필름

Also Published As

Publication number Publication date
KR20040021185A (ko) 2004-03-10
WO2004023212A1 (en) 2004-03-18
AU2003261622A1 (en) 2004-03-29
TWI258057B (en) 2006-07-11
CN1678957A (zh) 2005-10-05
US20060111493A1 (en) 2006-05-25
JP2005537514A (ja) 2005-12-08
EP1546808A1 (en) 2005-06-29
TW200421021A (en) 2004-10-16
EP1546808A4 (en) 2007-07-25

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