TWI249474B - Method of manufacturing ink jet recording head, ink jet recording head, and ink jet cartridge - Google Patents
Method of manufacturing ink jet recording head, ink jet recording head, and ink jet cartridge Download PDFInfo
- Publication number
- TWI249474B TWI249474B TW093136598A TW93136598A TWI249474B TW I249474 B TWI249474 B TW I249474B TW 093136598 A TW093136598 A TW 093136598A TW 93136598 A TW93136598 A TW 93136598A TW I249474 B TWI249474 B TW I249474B
- Authority
- TW
- Taiwan
- Prior art keywords
- ink
- filter
- layer
- substrate
- ink jet
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 100
- 238000005728 strengthening Methods 0.000 claims description 37
- 239000011248 coating agent Substances 0.000 claims description 23
- 238000000576 coating method Methods 0.000 claims description 23
- 239000007788 liquid Substances 0.000 claims description 21
- 229910052770 Uranium Inorganic materials 0.000 claims description 14
- 238000007599 discharging Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 10
- 230000003014 reinforcing effect Effects 0.000 claims description 8
- 238000004891 communication Methods 0.000 claims description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims description 4
- 238000003860 storage Methods 0.000 claims description 3
- 230000000903 blocking effect Effects 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical group [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims 1
- 238000005530 etching Methods 0.000 abstract description 31
- 239000012528 membrane Substances 0.000 abstract description 10
- 230000002708 enhancing effect Effects 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000010408 film Substances 0.000 description 106
- 229920005989 resin Polymers 0.000 description 45
- 239000011347 resin Substances 0.000 description 45
- 239000000463 material Substances 0.000 description 25
- 230000001681 protective effect Effects 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 229910004298 SiO 2 Inorganic materials 0.000 description 11
- 239000002585 base Substances 0.000 description 10
- 229910052681 coesite Inorganic materials 0.000 description 10
- 229910052906 cristobalite Inorganic materials 0.000 description 10
- 229910052682 stishovite Inorganic materials 0.000 description 10
- 229910052905 tridymite Inorganic materials 0.000 description 10
- 239000013078 crystal Substances 0.000 description 9
- 229920003180 amino resin Polymers 0.000 description 8
- 239000000428 dust Substances 0.000 description 8
- 238000004528 spin coating Methods 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- 239000004721 Polyphenylene oxide Substances 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 229920000570 polyether Polymers 0.000 description 6
- 238000005374 membrane filtration Methods 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229920005992 thermoplastic resin Polymers 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- -1 yarn Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000002940 repellent Effects 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005576 amination reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14403—Structure thereof only for on-demand ink jet heads including a filter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14475—Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003399219 | 2003-11-28 | ||
| JP2004319362A JP4455282B2 (ja) | 2003-11-28 | 2004-11-02 | インクジェットヘッドの製造方法、インクジェットヘッドおよびインクジェットカートリッジ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200526421A TW200526421A (en) | 2005-08-16 |
| TWI249474B true TWI249474B (en) | 2006-02-21 |
Family
ID=34622231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093136598A TWI249474B (en) | 2003-11-28 | 2004-11-26 | Method of manufacturing ink jet recording head, ink jet recording head, and ink jet cartridge |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US7287847B2 (enExample) |
| JP (1) | JP4455282B2 (enExample) |
| KR (1) | KR100788065B1 (enExample) |
| CN (1) | CN1621236B (enExample) |
| TW (1) | TWI249474B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11738556B2 (en) | 2020-11-24 | 2023-08-29 | Microjet Technology Co., Ltd. | Wafer structure |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4455282B2 (ja) * | 2003-11-28 | 2010-04-21 | キヤノン株式会社 | インクジェットヘッドの製造方法、インクジェットヘッドおよびインクジェットカートリッジ |
| US7377625B2 (en) * | 2004-06-25 | 2008-05-27 | Canon Kabushiki Kaisha | Method for producing ink-jet recording head having filter, ink-jet recording head, substrate for recording head, and ink-jet cartridge |
| US7470375B2 (en) * | 2004-10-22 | 2008-12-30 | Canon Kabushiki Kaisha | Method for manufacturing liquid ejection head, substrate for liquid ejection head, and liquid ejection head |
| JP4881081B2 (ja) * | 2005-07-25 | 2012-02-22 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| US20070024705A1 (en) * | 2005-08-01 | 2007-02-01 | Richter Roger K | Systems and methods for video stream selection |
| JP2007069435A (ja) * | 2005-09-06 | 2007-03-22 | Brother Ind Ltd | 液滴吐出装置 |
| US7712884B2 (en) | 2005-10-11 | 2010-05-11 | Silverbrook Research Pty Ltd | High density thermal ink jet printhead |
| US7401910B2 (en) * | 2005-10-11 | 2008-07-22 | Silverbrook Research Pty Ltd | Inkjet printhead with bubble trap |
| US7744195B2 (en) * | 2005-10-11 | 2010-06-29 | Silverbrook Research Pty Ltd | Low loss electrode connection for inkjet printhead |
| US7753496B2 (en) | 2005-10-11 | 2010-07-13 | Silverbrook Research Pty Ltd | Inkjet printhead with multiple chambers and multiple nozzles for each drive circuit |
| US7712876B2 (en) * | 2005-10-11 | 2010-05-11 | Silverbrook Research Pty Ltd | Inkjet printhead with opposing actuator electrode polarities |
| US7465032B2 (en) * | 2005-10-11 | 2008-12-16 | Silverbrook Research Pty Ltd. | Printhead with inlet filter for ink chamber |
| JP4298697B2 (ja) * | 2005-11-25 | 2009-07-22 | キヤノン株式会社 | インクジェット記録ヘッド、インクジェット記録ヘッドを備えるインクジェットカートリッジ、及びインクジェット記録装置 |
| JP4665747B2 (ja) * | 2005-12-16 | 2011-04-06 | ブラザー工業株式会社 | プレート積層構造及び液体吐出ヘッド |
| JP2007203623A (ja) * | 2006-02-02 | 2007-08-16 | Canon Inc | インクジェット記録ヘッド及びその製造方法 |
| US8037603B2 (en) * | 2006-04-27 | 2011-10-18 | Canon Kabushiki Kaisha | Ink jet head and producing method therefor |
| KR100773983B1 (ko) * | 2006-06-26 | 2007-11-08 | 삼성전기주식회사 | 잉크젯 헤드 및 그 제조방법 |
| JP5171002B2 (ja) * | 2006-09-25 | 2013-03-27 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| KR100818277B1 (ko) * | 2006-10-02 | 2008-03-31 | 삼성전자주식회사 | 잉크젯 프린트헤드의 제조방법 |
| US8511808B2 (en) * | 2007-04-20 | 2013-08-20 | Canon Kabushiki Kaisha | Liquid-ejecting recording head and liquid-ejecting recording apparatus |
| JP2009119650A (ja) * | 2007-11-13 | 2009-06-04 | Canon Inc | インクジェットヘッドの製造方法 |
| US20090136875A1 (en) * | 2007-11-15 | 2009-05-28 | Canon Kabushiki Kaisha | Manufacturing method of liquid ejection head |
| JP2009154376A (ja) * | 2007-12-26 | 2009-07-16 | Canon Inc | インクジェット記録ヘッド、およびインクジェット記録装置 |
| JP5511191B2 (ja) * | 2008-01-28 | 2014-06-04 | キヤノン株式会社 | 液体吐出ヘッド、液体吐出ヘッドの製造方法および構造体の形成方法 |
| JP2009208393A (ja) * | 2008-03-05 | 2009-09-17 | Canon Inc | インクジェット記録ヘッド |
| JP2009220286A (ja) * | 2008-03-13 | 2009-10-01 | Canon Inc | 液体吐出記録ヘッド及その製造方法 |
| JP5355223B2 (ja) | 2008-06-17 | 2013-11-27 | キヤノン株式会社 | 液体吐出ヘッド |
| JP5224929B2 (ja) * | 2008-06-24 | 2013-07-03 | キヤノン株式会社 | 液体吐出記録ヘッドの製造方法 |
| US8241540B2 (en) * | 2008-10-29 | 2012-08-14 | Canon Kabushiki Kaisha | Method of manufacturing liquid discharge head |
| JP5335396B2 (ja) * | 2008-12-16 | 2013-11-06 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| JP5578859B2 (ja) * | 2010-01-14 | 2014-08-27 | キヤノン株式会社 | 液体吐出ヘッド及び液体吐出ヘッドの製造方法 |
| US8523327B2 (en) * | 2010-02-25 | 2013-09-03 | Eastman Kodak Company | Printhead including port after filter |
| JP5693068B2 (ja) | 2010-07-14 | 2015-04-01 | キヤノン株式会社 | 液体吐出ヘッド及びその製造方法 |
| JP5517848B2 (ja) | 2010-09-08 | 2014-06-11 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP5500017B2 (ja) * | 2010-09-11 | 2014-05-21 | 株式会社リコー | 液体吐出ヘッド及び画像形成装置 |
| JP5701014B2 (ja) * | 2010-11-05 | 2015-04-15 | キヤノン株式会社 | 吐出素子基板の製造方法 |
| US8608303B2 (en) | 2010-12-07 | 2013-12-17 | Canon Kabushiki Kaisha | Ink jet recording head |
| JP5701119B2 (ja) | 2011-03-23 | 2015-04-15 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| US8702216B2 (en) * | 2011-12-21 | 2014-04-22 | Xerox Corporation | Polymer internal contamination filter for ink jet printhead |
| US9033482B2 (en) * | 2012-02-21 | 2015-05-19 | Hewlett-Packard Development Company, L.P. | Fluid dispenser |
| US8991977B2 (en) | 2012-03-12 | 2015-03-31 | Ricoh Company, Ltd. | Liquid discharge head and image forming apparatus |
| JP2014028471A (ja) | 2012-07-31 | 2014-02-13 | Canon Inc | 液体吐出ヘッド及びその製造方法 |
| JP6119276B2 (ja) * | 2013-02-06 | 2017-04-26 | 株式会社リコー | 液体吐出ヘッド、画像形成装置 |
| JP6202869B2 (ja) | 2013-04-17 | 2017-09-27 | キヤノン株式会社 | 液体吐出ヘッド |
| JP6223006B2 (ja) | 2013-06-12 | 2017-11-01 | キヤノン株式会社 | 液体吐出ヘッドチップ及びその製造方法 |
| JP6193715B2 (ja) * | 2013-10-08 | 2017-09-06 | キヤノン株式会社 | 液体吐出ヘッド |
| JP2015080918A (ja) | 2013-10-23 | 2015-04-27 | キヤノン株式会社 | 液体吐出ヘッドおよび該液体吐出ヘッドの製造方法 |
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| US9815284B2 (en) * | 2015-04-07 | 2017-11-14 | Ricoh Company, Ltd. | Liquid discharge head, liquid discharge device, and liquid discharge apparatus |
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2004
- 2004-11-02 JP JP2004319362A patent/JP4455282B2/ja not_active Expired - Fee Related
- 2004-11-18 US US10/990,492 patent/US7287847B2/en not_active Expired - Fee Related
- 2004-11-26 CN CN2004100973106A patent/CN1621236B/zh not_active Expired - Fee Related
- 2004-11-26 TW TW093136598A patent/TWI249474B/zh not_active IP Right Cessation
- 2004-11-26 KR KR1020040098015A patent/KR100788065B1/ko not_active Expired - Fee Related
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2007
- 2007-08-17 US US11/840,383 patent/US7753502B2/en not_active Expired - Fee Related
- 2007-08-17 US US11/840,404 patent/US7862158B2/en not_active Expired - Fee Related
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| US11738556B2 (en) | 2020-11-24 | 2023-08-29 | Microjet Technology Co., Ltd. | Wafer structure |
| TWI826747B (zh) * | 2020-11-24 | 2023-12-21 | 研能科技股份有限公司 | 晶圓結構 |
Also Published As
| Publication number | Publication date |
|---|---|
| US7287847B2 (en) | 2007-10-30 |
| US20070289942A1 (en) | 2007-12-20 |
| TW200526421A (en) | 2005-08-16 |
| JP4455282B2 (ja) | 2010-04-21 |
| JP2005178364A (ja) | 2005-07-07 |
| US7753502B2 (en) | 2010-07-13 |
| KR100788065B1 (ko) | 2007-12-21 |
| US20050117005A1 (en) | 2005-06-02 |
| KR20050052391A (ko) | 2005-06-02 |
| CN1621236B (zh) | 2010-09-29 |
| CN1621236A (zh) | 2005-06-01 |
| US20070295687A1 (en) | 2007-12-27 |
| US7862158B2 (en) | 2011-01-04 |
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