JP5171002B2 - インクジェット記録ヘッドの製造方法 - Google Patents
インクジェット記録ヘッドの製造方法 Download PDFInfo
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- JP5171002B2 JP5171002B2 JP2006258680A JP2006258680A JP5171002B2 JP 5171002 B2 JP5171002 B2 JP 5171002B2 JP 2006258680 A JP2006258680 A JP 2006258680A JP 2006258680 A JP2006258680 A JP 2006258680A JP 5171002 B2 JP5171002 B2 JP 5171002B2
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- ink
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- recording head
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- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 238000000034 method Methods 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims description 67
- 238000005530 etching Methods 0.000 claims description 62
- 239000010410 layer Substances 0.000 claims description 57
- 239000011241 protective layer Substances 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 29
- 230000007797 corrosion Effects 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 claims description 2
- 229920005989 resin Polymers 0.000 description 21
- 239000011347 resin Substances 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000001788 irregular Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/06—Apparatus for electrographic processes using a charge pattern for developing
- G03G15/10—Apparatus for electrographic processes using a charge pattern for developing using a liquid developer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2215/00—Apparatus for electrophotographic processes
- G03G2215/06—Developing structures, details
- G03G2215/0634—Developing device
- G03G2215/0658—Liquid developer devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
(1)電気熱変換素子が形成された基板に、エッチング停止層を形成する工程
(2)基板の電気熱変換素子を形成していない面に、インク供給口形成の際のマスクである裏面エッチングマスクを形成する工程
(3)基板上に、溶解可能な樹脂にてインク流路およびリブ状突起のパターンを形成する工程
(4)溶解可能な樹脂層上に被覆樹脂層を形成する工程
(5)被覆樹脂層にインク吐出口を形成する工程
(6)基板にインク供給口を形成する工程
(7)裏面エッチングマスクを除去する工程
(8)基板上に形成されているエッチング停止層を除去する工程
(8)溶解可能な樹脂層を除去する工程
図1は本発明の実施例1に係るインクジェット記録ヘッドの模式的上面図であり、図2は図1に示したインクジェット記録ヘッドのA−A線に沿った断面の一部を拡大して示す図である。
(1)吐出口プレート5がインクと接触しても不純物が吐出口プレート5からインクに溶出しないこと。
(2)吐出口プレート5がシリコン基板1に良好に密着し、経時的変化によって基板1からの剥がれが起きないこと。
図4は、本実施例に対する比較例として作製されるインクジェット記録ヘッドの製造工程を示す図である。この比較例によるインクジェット記録ヘッドは、リブ状突起6の下面部分に保護層12および密着向上層13が設けられていない。本比較例はこの点を除いて本実施例と同様である。
図5は本発明の実施例2に係るインクジェット記録ヘッドの模式的上面図であり、図6は図5に示したインクジェット記録ヘッドのB−B線に沿った断面の一部を拡大して示す図である。
3 電気熱変換素子
4 樹脂層
5 吐出口プレート
6 リブ状突起
7 吐出口
9 インク供給口
11 エッチング停止層
12 保護層
16 インク流路
Claims (4)
- インク滴を吐出するエネルギーを発生させる複数のエネルギー発生素子と、前記エネルギー発生素子の配列方向に沿って延在する貫通口からなるインク供給口とを有する基板と、
前記複数のエネルギー発生素子に対応する複数のインク吐出口と、前記エネルギー発生素子を内包し、かつ前記インク供給口と前記各インク吐出口とを連通する複数のインク流路とを形成する、該基板上に設けられた吐出口プレートと、
を有し、前記吐出口プレートの前記インク供給口に面する部分には、前記エネルギー発生素子の配列方向に沿って延在するリブ状突起が形成されているインクジェット記録ヘッドの製造方法において、
前記基板の前記エネルギー発生素子が形成されている面の前記インク供給口が形成される部分に、前記基板に前記インク供給口を形成する異方性エッチングにおいて用いられるエッチング液に対して耐侵食性を有するエッチング停止層を形成する工程と、
前記エッチング停止層上の前記リブ状突起が形成される部分に、前記エッチング停止層をエッチングから保護する保護層を形成する工程と、
前記基板の前記面上の少なくとも前記保護層を除く位置に、前記インク流路となる部分を占有する型材を形成する工程と、
前記基板および前記型材の上に前記吐出口を備えた吐出口プレートを形成する工程と、
前記基板にエッチング液を用いた異方性エッチングによって前記インク供給口を形成する工程と、
前記エッチング停止層を除去する工程と、
前記型材を除去する工程と、
を含み、
前記保護層を形成する工程において、前記保護層を、前記インク流路となる部分を占有する前記型材とは異なる材料で形成することを特徴とするインクジェット記録ヘッドの製造方法。 - 前記保護層と前記リブ状突起との接合を強固にする密着向上層を前記保護層上に形成する工程を含む、請求項1に記載のインクジェット記録ヘッドの製造方法。
- 前記エッチング停止層を除去する工程の後には、前記リブ状突起の前記インク供給口に対向する面上に前記保護層が残っている、請求項1または2に記載のインクジェット記録ヘッドの製造方法。
- 前記保護層をTaで形成することを含む、請求項1から3のいずれか1項に記載のインクジェット記録ヘッドの製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006258680A JP5171002B2 (ja) | 2006-09-25 | 2006-09-25 | インクジェット記録ヘッドの製造方法 |
US11/860,330 US7828419B2 (en) | 2006-09-25 | 2007-09-24 | Ink jet recording head and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006258680A JP5171002B2 (ja) | 2006-09-25 | 2006-09-25 | インクジェット記録ヘッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008074045A JP2008074045A (ja) | 2008-04-03 |
JP5171002B2 true JP5171002B2 (ja) | 2013-03-27 |
Family
ID=39224466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006258680A Expired - Fee Related JP5171002B2 (ja) | 2006-09-25 | 2006-09-25 | インクジェット記録ヘッドの製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7828419B2 (ja) |
JP (1) | JP5171002B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101970573B (zh) * | 2008-03-25 | 2013-10-16 | 旭化成化学株式会社 | 弹性体组合物和气囊装置的收纳罩 |
US10703103B2 (en) | 2018-01-17 | 2020-07-07 | Canon Kabushiki Kaisha | Liquid ejection head and manufacturing method thereof |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009023159A (ja) * | 2007-07-18 | 2009-02-05 | Canon Inc | インクジェット記録装置及びインクジェット記録装置のメンテナンス方法 |
JP5930853B2 (ja) * | 2012-06-05 | 2016-06-08 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法、インクジェット記録ヘッドおよびインクジェット記録装置 |
BR112016012011B8 (pt) | 2013-11-26 | 2021-12-14 | Hewlett Packard Development Co | Cabeçote de impressão de ejeção de fluido, aparelho de ejeção de fluido e método |
JP6344916B2 (ja) * | 2014-01-09 | 2018-06-20 | キヤノン株式会社 | 液体吐出ヘッド |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6137510A (en) | 1996-11-15 | 2000-10-24 | Canon Kabushiki Kaisha | Ink jet head |
US6540335B2 (en) | 1997-12-05 | 2003-04-01 | Canon Kabushiki Kaisha | Ink jet print head and ink jet printing device mounting this head |
IT1320599B1 (it) * | 2000-08-23 | 2003-12-10 | Olivetti Lexikon Spa | Testina di stampa monolitica con scanalatura autoallineata e relativoprocesso di fabbricazione. |
JP2003089209A (ja) * | 2001-09-18 | 2003-03-25 | Canon Inc | 液体吐出ヘッドの製造方法、および液体吐出ヘッド |
JP2005028714A (ja) * | 2003-07-11 | 2005-02-03 | Fuji Xerox Co Ltd | 微小中空体の製造方法、微小中空体、及びインクジェット記録ヘッド |
JP4455282B2 (ja) * | 2003-11-28 | 2010-04-21 | キヤノン株式会社 | インクジェットヘッドの製造方法、インクジェットヘッドおよびインクジェットカートリッジ |
-
2006
- 2006-09-25 JP JP2006258680A patent/JP5171002B2/ja not_active Expired - Fee Related
-
2007
- 2007-09-24 US US11/860,330 patent/US7828419B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101970573B (zh) * | 2008-03-25 | 2013-10-16 | 旭化成化学株式会社 | 弹性体组合物和气囊装置的收纳罩 |
US10703103B2 (en) | 2018-01-17 | 2020-07-07 | Canon Kabushiki Kaisha | Liquid ejection head and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2008074045A (ja) | 2008-04-03 |
US20080074470A1 (en) | 2008-03-27 |
US7828419B2 (en) | 2010-11-09 |
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