TW414726B - Method and apparatus for coating diamond-like networks onto particles - Google Patents
Method and apparatus for coating diamond-like networks onto particles Download PDFInfo
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- TW414726B TW414726B TW087118313A TW87118313A TW414726B TW 414726 B TW414726 B TW 414726B TW 087118313 A TW087118313 A TW 087118313A TW 87118313 A TW87118313 A TW 87118313A TW 414726 B TW414726 B TW 414726B
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
- B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/16—Metallic particles coated with a non-metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4417—Methods specially adapted for coating powder
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/103—Diamond-like carbon coating, i.e. DLC
- Y10S427/106—Utilizing plasma, e.g. corona, glow discharge, cold plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/979,072 US6015597A (en) | 1997-11-26 | 1997-11-26 | Method for coating diamond-like networks onto particles |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW414726B true TW414726B (en) | 2000-12-11 |
Family
ID=25526671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW087118313A TW414726B (en) | 1997-11-26 | 1998-11-04 | Method and apparatus for coating diamond-like networks onto particles |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US6015597A (enExample) |
| EP (1) | EP1034320B1 (enExample) |
| JP (1) | JP4336040B2 (enExample) |
| KR (1) | KR100582134B1 (enExample) |
| CN (1) | CN1109776C (enExample) |
| AU (1) | AU9687898A (enExample) |
| DE (1) | DE69803096T2 (enExample) |
| TW (1) | TW414726B (enExample) |
| WO (1) | WO1999027157A1 (enExample) |
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| KR102488995B1 (ko) * | 2020-08-03 | 2023-01-16 | 전남대학교산학협력단 | 분말 입자 코팅을 위한 증착 장치를 사용하여 분말 입자 표면을 균일하게 코팅하는 방법 |
| CN115261816A (zh) * | 2022-09-05 | 2022-11-01 | 西安交通大学 | 粉体表面类金刚石沉积的悬臂梁式振动等离子体流化床 |
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| JPS59137311A (ja) * | 1983-01-21 | 1984-08-07 | Natl Inst For Res In Inorg Mater | 多結晶質ダイヤモンドの合成法 |
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| DE69021821T2 (de) * | 1989-09-20 | 1996-05-30 | Sumitomo Electric Industries | Verfahren und Anlage zum Herstellen von Hartstoff. |
| WO1991010341A1 (en) * | 1990-01-04 | 1991-07-11 | Savas Stephen E | A low frequency inductive rf plasma reactor |
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| DE4122834A1 (de) * | 1991-07-10 | 1993-01-14 | Siemens Ag | Verfahren zur beschichtung von lwl-fasern |
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| US5587207A (en) * | 1994-11-14 | 1996-12-24 | Gorokhovsky; Vladimir I. | Arc assisted CVD coating and sintering method |
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| JPH08316205A (ja) * | 1995-05-19 | 1996-11-29 | Hitachi Ltd | プラズマ処理方法及びプラズマ処理装置 |
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| JP3585591B2 (ja) * | 1995-07-29 | 2004-11-04 | 株式会社半導体エネルギー研究所 | エッチング装置及びエッチング方法 |
| EP0949200A1 (en) * | 1996-06-05 | 1999-10-13 | R-Amtech International, Inc. | Method for forming conformal diamond-type carbon coatings, hard diamond-type carbon coating and porous filtration element using the same |
| US5948166A (en) * | 1996-11-05 | 1999-09-07 | 3M Innovative Properties Company | Process and apparatus for depositing a carbon-rich coating on a moving substrate |
| JP3040953U (ja) | 1997-02-26 | 1997-09-05 | 株式会社 サン・マテック | コンクリート打設用の床トラス鉄筋付き床構成材 |
| JPH10261371A (ja) * | 1997-03-17 | 1998-09-29 | Futaba Corp | 蛍光体及び表示管 |
| US6015597A (en) * | 1997-11-26 | 2000-01-18 | 3M Innovative Properties Company | Method for coating diamond-like networks onto particles |
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- 1997-11-26 US US08/979,072 patent/US6015597A/en not_active Expired - Fee Related
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1998
- 1998-10-07 CN CN98811433A patent/CN1109776C/zh not_active Expired - Fee Related
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- 1998-10-07 DE DE69803096T patent/DE69803096T2/de not_active Expired - Lifetime
- 1998-10-07 EP EP98950973A patent/EP1034320B1/en not_active Expired - Lifetime
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- 1998-10-07 AU AU96878/98A patent/AU9687898A/en not_active Abandoned
- 1998-11-04 TW TW087118313A patent/TW414726B/zh active
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1999
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| AU9687898A (en) | 1999-06-15 |
| EP1034320B1 (en) | 2001-12-19 |
| US6197120B1 (en) | 2001-03-06 |
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| WO1999027157A1 (en) | 1999-06-03 |
| US6015597A (en) | 2000-01-18 |
| DE69803096T2 (de) | 2002-08-22 |
| KR100582134B1 (ko) | 2006-05-23 |
| JP2001524603A (ja) | 2001-12-04 |
| DE69803096D1 (de) | 2002-01-31 |
| CN1279729A (zh) | 2001-01-10 |
| CN1109776C (zh) | 2003-05-28 |
| JP4336040B2 (ja) | 2009-09-30 |
| EP1034320A1 (en) | 2000-09-13 |
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