TW343388B - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- TW343388B TW343388B TW086102184A TW86102184A TW343388B TW 343388 B TW343388 B TW 343388B TW 086102184 A TW086102184 A TW 086102184A TW 86102184 A TW86102184 A TW 86102184A TW 343388 B TW343388 B TW 343388B
- Authority
- TW
- Taiwan
- Prior art keywords
- electrically connected
- electrode node
- semiconductor device
- conductive
- semiconductor substrate
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 239000003990 capacitor Substances 0.000 abstract 2
- 239000002019 doping agent Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Dram (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8162068A JPH1012838A (ja) | 1996-06-21 | 1996-06-21 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW343388B true TW343388B (en) | 1998-10-21 |
Family
ID=15747488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086102184A TW343388B (en) | 1996-06-21 | 1997-02-15 | Semiconductor device |
Country Status (5)
Country | Link |
---|---|
US (2) | US6034391A (zh) |
JP (1) | JPH1012838A (zh) |
KR (1) | KR100243895B1 (zh) |
CN (1) | CN1153297C (zh) |
TW (1) | TW343388B (zh) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6292050B1 (en) | 1997-01-29 | 2001-09-18 | Cardiac Pacemakers, Inc. | Current and temperature compensated voltage reference having improved power supply rejection |
US5998257A (en) * | 1997-03-13 | 1999-12-07 | Micron Technology, Inc. | Semiconductor processing methods of forming integrated circuitry memory devices, methods of forming capacitor containers, methods of making electrical connection to circuit nodes and related integrated circuitry |
US6207523B1 (en) * | 1997-07-03 | 2001-03-27 | Micron Technology, Inc. | Methods of forming capacitors DRAM arrays, and monolithic integrated circuits |
JP3178399B2 (ja) * | 1997-12-04 | 2001-06-18 | 日本電気株式会社 | 半導体集積回路、その素子配置方法およびその製造方法 |
US6285050B1 (en) * | 1997-12-24 | 2001-09-04 | International Business Machines Corporation | Decoupling capacitor structure distributed above an integrated circuit and method for making same |
JP2000123592A (ja) * | 1998-10-19 | 2000-04-28 | Mitsubishi Electric Corp | 半導体装置 |
WO2000051184A1 (fr) * | 1999-02-23 | 2000-08-31 | Hitachi, Ltd | Dispositif a circuit integre en semiconducteur |
EP1063013B1 (en) * | 1999-06-24 | 2005-10-12 | ENI S.p.A. | Catalytic composition for the aromatization of hydrocarbons |
JP2002042496A (ja) * | 2000-07-26 | 2002-02-08 | Matsushita Electric Ind Co Ltd | 強誘電体メモリ |
US6381491B1 (en) | 2000-08-18 | 2002-04-30 | Cardiac Pacemakers, Inc. | Digitally trimmable resistor for bandgap voltage reference |
DE10045692A1 (de) * | 2000-09-15 | 2002-04-04 | Infineon Technologies Ag | Integrierter Speicher mit Speicherzellen und Pufferkapazitäten |
JP2002334577A (ja) * | 2001-05-07 | 2002-11-22 | Mitsubishi Electric Corp | 半導体集積回路装置 |
US6552383B2 (en) * | 2001-05-11 | 2003-04-22 | Micron Technology, Inc. | Integrated decoupling capacitors |
JP2003332447A (ja) * | 2002-05-13 | 2003-11-21 | Mitsubishi Electric Corp | 容量素子 |
JP2004119857A (ja) * | 2002-09-27 | 2004-04-15 | Toshiba Corp | 半導体記憶装置およびその製造方法 |
JP2004297028A (ja) * | 2003-02-04 | 2004-10-21 | Sharp Corp | 半導体記憶装置 |
US7177135B2 (en) * | 2003-09-23 | 2007-02-13 | Samsung Electronics Co., Ltd. | On-chip bypass capacitor and method of manufacturing the same |
JP2005101609A (ja) * | 2003-09-23 | 2005-04-14 | Samsung Electronics Co Ltd | オンチップバイパスキャパシタの製造方法及びチップ |
JP2005123378A (ja) * | 2003-10-16 | 2005-05-12 | Sony Corp | 半導体装置およびその製造方法 |
KR100534101B1 (ko) * | 2004-01-08 | 2005-12-06 | 삼성전자주식회사 | 반도체 메모리 장치 및 이 장치의 디커플링 캐패시터배치방법 |
JP4795670B2 (ja) * | 2004-06-18 | 2011-10-19 | 三星電子株式会社 | 共有ディカップリングキャパシタンス |
JP4969771B2 (ja) * | 2004-07-12 | 2012-07-04 | ソニー株式会社 | 固体撮像装置及びそのキャパシタ調整方法 |
JP4996046B2 (ja) | 2004-08-30 | 2012-08-08 | 富士通セミコンダクター株式会社 | 半導体装置の中間電位生成回路 |
US7473979B2 (en) * | 2006-05-30 | 2009-01-06 | International Business Machines Corporation | Semiconductor integrated circuit devices having high-Q wafer back-side capacitors |
JP2008077705A (ja) | 2006-09-19 | 2008-04-03 | Fujitsu Ltd | 半導体記憶装置 |
JP2008147338A (ja) * | 2006-12-08 | 2008-06-26 | Nec Electronics Corp | 半導体集積回路装置 |
KR20090083197A (ko) | 2008-01-29 | 2009-08-03 | 삼성전자주식회사 | 컬러필터기판의 제조 방법 |
US20090236908A1 (en) * | 2008-03-21 | 2009-09-24 | Kun-Woo Park | Reservoir capacitor and semiconductor memory device including the same |
JP5700907B2 (ja) * | 2008-06-26 | 2015-04-15 | ピーエスフォー ルクスコ エスエイアールエルPS4 Luxco S.a.r.l. | 半導体記憶装置 |
JP2010067661A (ja) * | 2008-09-09 | 2010-03-25 | Nec Electronics Corp | 半導体装置 |
KR101444381B1 (ko) * | 2008-09-30 | 2014-11-03 | 삼성전자주식회사 | 파워 디커플링 커패시터를 포함하는 반도체 메모리 장치 및그것의 제조 방법 |
US8143699B2 (en) * | 2009-02-25 | 2012-03-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Dual-dielectric MIM capacitors for system-on-chip applications |
US8604586B2 (en) * | 2009-08-06 | 2013-12-10 | Qualcomm Incorporated | High breakdown voltage embedded MIM capacitor structure |
JP5136544B2 (ja) * | 2009-12-16 | 2013-02-06 | 三菱電機株式会社 | 半導体装置 |
JP2011165824A (ja) * | 2010-02-08 | 2011-08-25 | Nec Corp | 半導体装置 |
JP2012027983A (ja) * | 2010-07-23 | 2012-02-09 | Elpida Memory Inc | 半導体装置 |
JP2011119018A (ja) * | 2011-01-13 | 2011-06-16 | Renesas Electronics Corp | 半導体装置 |
JP2015070368A (ja) * | 2013-09-27 | 2015-04-13 | 三菱電機株式会社 | 半導体装置 |
US9607680B2 (en) * | 2014-03-04 | 2017-03-28 | Apple Inc. | EDRAM/DRAM fabricated capacitors for use in on-chip PMUS and as decoupling capacitors in an integrated EDRAM/DRAM and PMU system |
TWI774372B (zh) * | 2021-05-14 | 2022-08-11 | 旺宏電子股份有限公司 | 內容可定址記憶體及其操作方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS589289A (ja) * | 1981-07-09 | 1983-01-19 | Mitsubishi Electric Corp | Mosダイナミツクメモリ |
JPS6150282A (ja) * | 1984-08-17 | 1986-03-12 | Hitachi Ltd | 電荷蓄積型半導体記憶装置 |
JP2659723B2 (ja) | 1987-09-19 | 1997-09-30 | 株式会社日立製作所 | 半導体集積回路装置 |
JP2643298B2 (ja) * | 1988-05-23 | 1997-08-20 | 三菱電機株式会社 | 半導体メモリのセンスアンプ駆動装置及びその駆動方法 |
US5032892A (en) * | 1988-05-31 | 1991-07-16 | Micron Technology, Inc. | Depletion mode chip decoupling capacitor |
JP2721909B2 (ja) * | 1989-01-18 | 1998-03-04 | 三菱電機株式会社 | 半導体記憶装置 |
US4879631A (en) * | 1989-01-18 | 1989-11-07 | Micron Technology, Inc. | Short-resistant decoupling capacitor system for semiconductor circuits |
JPH0697682B2 (ja) * | 1990-03-20 | 1994-11-30 | 株式会社東芝 | 半導体装置の製造方法 |
EP0469555B1 (en) * | 1990-07-31 | 1996-04-17 | Nec Corporation | Charge storage capacitor electrode and method of manufacturing the same |
JP2621609B2 (ja) * | 1990-07-31 | 1997-06-18 | 日本電気株式会社 | 電荷蓄積容量を備えた半導体装置及びその製造方法 |
JPH04188869A (ja) * | 1990-11-22 | 1992-07-07 | Mitsubishi Electric Corp | 接合型電界効果トランジスタとキャパシタとを含む半導体記憶装置およびその製造方法 |
US5274284A (en) * | 1991-01-24 | 1993-12-28 | Texas Instruments Incorporated | Output buffer circuits with controlled Miller effect capacitance |
JPH06215570A (ja) * | 1993-01-21 | 1994-08-05 | Mitsubishi Electric Corp | 1/2電源電圧発生回路 |
JP2842770B2 (ja) * | 1993-09-29 | 1999-01-06 | 日鉄セミコンダクター株式会社 | 半導体集積回路およびその製造方法 |
JP3406127B2 (ja) | 1995-09-04 | 2003-05-12 | 三菱電機株式会社 | 半導体装置 |
US5739576A (en) * | 1995-10-06 | 1998-04-14 | Micron Technology, Inc. | Integrated chip multilayer decoupling capacitors |
-
1996
- 1996-06-21 JP JP8162068A patent/JPH1012838A/ja not_active Withdrawn
-
1997
- 1997-02-15 TW TW086102184A patent/TW343388B/zh not_active IP Right Cessation
- 1997-02-21 US US08/805,016 patent/US6034391A/en not_active Expired - Fee Related
- 1997-03-17 KR KR1019970008968A patent/KR100243895B1/ko not_active IP Right Cessation
- 1997-05-16 CN CNB971111944A patent/CN1153297C/zh not_active Expired - Fee Related
-
1999
- 1999-09-15 US US09/395,987 patent/US6222223B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH1012838A (ja) | 1998-01-16 |
US6222223B1 (en) | 2001-04-24 |
CN1169594A (zh) | 1998-01-07 |
KR100243895B1 (ko) | 2000-02-01 |
US6034391A (en) | 2000-03-07 |
KR980006394A (ko) | 1998-03-30 |
CN1153297C (zh) | 2004-06-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |